DE1800663A1 - Fuer Elektronenstrahlen durchlaessige Vorrichtung und Verfahren zu deren Herstellung - Google Patents

Fuer Elektronenstrahlen durchlaessige Vorrichtung und Verfahren zu deren Herstellung

Info

Publication number
DE1800663A1
DE1800663A1 DE19681800663 DE1800663A DE1800663A1 DE 1800663 A1 DE1800663 A1 DE 1800663A1 DE 19681800663 DE19681800663 DE 19681800663 DE 1800663 A DE1800663 A DE 1800663A DE 1800663 A1 DE1800663 A1 DE 1800663A1
Authority
DE
Germany
Prior art keywords
film
carrier
perforated
aluminum oxide
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19681800663
Other languages
German (de)
English (en)
Other versions
DE1800663B2 (enrdf_load_stackoverflow
Inventor
Hidehiko Kawakami
Yoshihiro Uno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE1800663A1 publication Critical patent/DE1800663A1/de
Publication of DE1800663B2 publication Critical patent/DE1800663B2/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00—Cathode ray tubes; Electron beam tubes
    • H01J31/02—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused
    • H01J31/06—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting
    • H01J31/065—Cathode ray tubes; Electron beam tubes having one or more output electrodes which may be impacted selectively by the ray or beam, and onto, from, or over which the ray or beam may be deflected or de-focused with more than two output electrodes, e.g. for multiple switching or counting for electrography or electrophotography, for transferring a charge pattern through the faceplate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G15/00—Apparatus for electrographic processes using a charge pattern
    • G03G15/22—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20
    • G03G15/32—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head
    • G03G15/321—Apparatus for electrographic processes using a charge pattern involving the combination of more than one step according to groups G03G13/02 - G03G13/20 in which the charge pattern is formed dotwise, e.g. by a thermal head by charge transfer onto the recording material in accordance with the image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
    • H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
    • H01J5/18—Windows permeable to X-rays, gamma-rays, or particles

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Measurement Of Radiation (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE19681800663 1967-10-03 1968-10-02 Fuer Elektronenstrahlen durchlaessige Vorrichtung und Verfahren zu deren Herstellung Withdrawn DE1800663A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6419367 1967-10-03

Publications (2)

Publication Number Publication Date
DE1800663A1 true DE1800663A1 (de) 1969-06-04
DE1800663B2 DE1800663B2 (enrdf_load_stackoverflow) 1970-11-19

Family

ID=13250970

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19681800663 Withdrawn DE1800663A1 (de) 1967-10-03 1968-10-02 Fuer Elektronenstrahlen durchlaessige Vorrichtung und Verfahren zu deren Herstellung

Country Status (5)

Country Link
US (1) US3607680A (enrdf_load_stackoverflow)
DE (1) DE1800663A1 (enrdf_load_stackoverflow)
FR (1) FR1585727A (enrdf_load_stackoverflow)
GB (1) GB1239296A (enrdf_load_stackoverflow)
NL (1) NL6814069A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4219562C1 (enrdf_load_stackoverflow) * 1992-06-15 1993-07-15 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715288A (en) * 1970-11-10 1973-02-06 Sensors Inc Method of fabricating film-type sensing structures
US3850762A (en) * 1973-08-13 1974-11-26 Boeing Co Process for producing an anodic aluminum oxide membrane
US4468282A (en) * 1982-11-22 1984-08-28 Hewlett-Packard Company Method of making an electron beam window
US4455561A (en) * 1982-11-22 1984-06-19 Hewlett-Packard Company Electron beam driven ink jet printer
US4494036A (en) * 1982-11-22 1985-01-15 Hewlett-Packard Company Electron beam window
US4659429A (en) * 1983-08-03 1987-04-21 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4662747A (en) * 1983-08-03 1987-05-05 Cornell Research Foundation, Inc. Method and apparatus for production and use of nanometer scale light beams
US4917462A (en) * 1988-06-15 1990-04-17 Cornell Research Foundation, Inc. Near field scanning optical microscopy
FI885554L (fi) * 1988-11-30 1990-05-31 Outokumpu Oy Indikationsfoenster foer analysator och dess framstaellningsfoerfarande.
US5612588A (en) * 1993-05-26 1997-03-18 American International Technologies, Inc. Electron beam device with single crystal window and expansion-matched anode
US5659223A (en) * 1995-07-14 1997-08-19 Science Research Laboratory, Inc. System for extracting a high power beam comprising air dynamic and foil windows
KR20000016521A (ko) 1996-06-12 2000-03-25 워칼로 푸로스 죠지 박막의 모노리틱형 실리콘 막에 의해 형성된 윈도우 영역을 포함하는 애노드를 갖는 화학 방사선 소스
US7030619B2 (en) * 2004-02-19 2006-04-18 Brooks Automation, Inc. Ionization gauge
US7295015B2 (en) * 2004-02-19 2007-11-13 Brooks Automation, Inc. Ionization gauge
US20090160309A1 (en) * 2005-10-15 2009-06-25 Dirk Burth Electron beam exit window
US7768267B2 (en) * 2007-07-11 2010-08-03 Brooks Automation, Inc. Ionization gauge with a cold electron source
WO2011011278A1 (en) * 2009-07-20 2011-01-27 Advanced Electron Beams, Inc. Emitter exit window
US8907554B2 (en) * 2010-02-08 2014-12-09 Tetra Laval Holdings & Finance S.A. Assembly and method for reducing foil wrinkles
US9384934B2 (en) * 2010-12-02 2016-07-05 Tetra Laval Holdings & Finance S.A. Electron exit window foil

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4219562C1 (enrdf_load_stackoverflow) * 1992-06-15 1993-07-15 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5561342A (en) * 1992-06-15 1996-10-01 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Electron beam exit window

Also Published As

Publication number Publication date
NL6814069A (enrdf_load_stackoverflow) 1969-04-09
US3607680A (en) 1971-09-21
DE1800663B2 (enrdf_load_stackoverflow) 1970-11-19
FR1585727A (enrdf_load_stackoverflow) 1970-01-30
GB1239296A (enrdf_load_stackoverflow) 1971-07-14

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Legal Events

Date Code Title Description
E77 Valid patent as to the heymanns-index 1977
EHJ Ceased/non-payment of the annual fee