DE112022002001T5 - Quarzglaselement und verfahren zu dessen herstellung - Google Patents

Quarzglaselement und verfahren zu dessen herstellung Download PDF

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Publication number
DE112022002001T5
DE112022002001T5 DE112022002001.6T DE112022002001T DE112022002001T5 DE 112022002001 T5 DE112022002001 T5 DE 112022002001T5 DE 112022002001 T DE112022002001 T DE 112022002001T DE 112022002001 T5 DE112022002001 T5 DE 112022002001T5
Authority
DE
Germany
Prior art keywords
quartz glass
pores
glass element
element according
until
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE112022002001.6T
Other languages
German (de)
English (en)
Inventor
Kazuya Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of DE112022002001T5 publication Critical patent/DE112022002001T5/de
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/10—Forming beads
    • C03B19/1005—Forming solid beads
    • C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/80—Glass compositions containing bubbles or microbubbles, e.g. opaque quartz glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • C03C2203/42—Gas-phase processes using silicon halides as starting materials
    • C03C2203/44—Gas-phase processes using silicon halides as starting materials chlorine containing
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Plasma & Fusion (AREA)
DE112022002001.6T 2021-04-07 2022-03-31 Quarzglaselement und verfahren zu dessen herstellung Pending DE112022002001T5 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2021065433 2021-04-07
JP2021-065433 2021-04-07
JP2021-135895 2021-08-23
JP2021135895 2021-08-23
PCT/JP2022/016901 WO2022215663A1 (ja) 2021-04-07 2022-03-31 シリカガラス部材およびその製造方法

Publications (1)

Publication Number Publication Date
DE112022002001T5 true DE112022002001T5 (de) 2024-01-18

Family

ID=83546077

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112022002001.6T Pending DE112022002001T5 (de) 2021-04-07 2022-03-31 Quarzglaselement und verfahren zu dessen herstellung

Country Status (6)

Country Link
US (1) US20240025795A1 (https=)
JP (1) JPWO2022215663A1 (https=)
KR (1) KR20230167358A (https=)
DE (1) DE112022002001T5 (https=)
TW (1) TW202306917A (https=)
WO (1) WO2022215663A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102825674B1 (ko) 2024-05-31 2025-06-26 신에쯔 세끼에이 가부시키가이샤 성막 처리 가스 노출용 석영 유리 부재 및 이의 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015173154A (ja) 2014-03-11 2015-10-01 東京エレクトロン株式会社 縦型熱処理装置、縦型熱処理装置の運転方法及び記憶媒体
JP2021065433A (ja) 2019-10-23 2021-04-30 日本製紙クレシア株式会社 吸収性物品
JP2021135895A (ja) 2020-02-28 2021-09-13 三菱重工業株式会社 検知装置、検知方法、およびロボット並びにプログラム

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0614480Y2 (ja) * 1988-04-26 1994-04-13 信越石英株式会社 半導体熱処理装置
JP2571181B2 (ja) * 1992-11-24 1997-01-16 日東化学工業株式会社 石英ガラス多孔質成形体およびその製造方法
JP2829227B2 (ja) * 1993-08-24 1998-11-25 信越石英株式会社 不透明石英ガラス
JP3883233B2 (ja) * 1996-07-15 2007-02-21 信越石英株式会社 石英ガラス発泡体の製造方法
JP3827828B2 (ja) * 1997-09-22 2006-09-27 東芝セラミックス株式会社 半導体ウエハ熱処理治具用の多孔質石英ガラス
JP2002362967A (ja) * 2001-06-06 2002-12-18 Koransha Co Ltd シリカガラス焼結体からなる半導体ウエハエッチング用部材とその製造方法
JP5143367B2 (ja) * 2006-03-13 2013-02-13 東ソー・クォーツ株式会社 不透明焼結体

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015173154A (ja) 2014-03-11 2015-10-01 東京エレクトロン株式会社 縦型熱処理装置、縦型熱処理装置の運転方法及び記憶媒体
JP2021065433A (ja) 2019-10-23 2021-04-30 日本製紙クレシア株式会社 吸収性物品
JP2021135895A (ja) 2020-02-28 2021-09-13 三菱重工業株式会社 検知装置、検知方法、およびロボット並びにプログラム

Also Published As

Publication number Publication date
TW202306917A (zh) 2023-02-16
US20240025795A1 (en) 2024-01-25
KR20230167358A (ko) 2023-12-08
WO2022215663A1 (ja) 2022-10-13
JPWO2022215663A1 (https=) 2022-10-13

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