DE112005003613A5 - Projektionsobjektiv für die Mikrolithographie und Abschlusselement dafür - Google Patents

Projektionsobjektiv für die Mikrolithographie und Abschlusselement dafür Download PDF

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Publication number
DE112005003613A5
DE112005003613A5 DE112005003613T DE112005003613T DE112005003613A5 DE 112005003613 A5 DE112005003613 A5 DE 112005003613A5 DE 112005003613 T DE112005003613 T DE 112005003613T DE 112005003613 T DE112005003613 T DE 112005003613T DE 112005003613 A5 DE112005003613 A5 DE 112005003613A5
Authority
DE
Germany
Prior art keywords
microlithography
projection objective
final element
final
objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE112005003613T
Other languages
English (en)
Other versions
DE112005003613B4 (de
Inventor
Eric Dr. Eva
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE112005003613A5 publication Critical patent/DE112005003613A5/de
Application granted granted Critical
Publication of DE112005003613B4 publication Critical patent/DE112005003613B4/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Glass Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Melting And Manufacturing (AREA)
DE112005003613.8T 2005-06-21 2005-06-21 Projektionsobjektiv für die Mikrolithographie, dessen Verwendung und Abschlusselement dafür Expired - Fee Related DE112005003613B4 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2005/006654 WO2006136184A1 (de) 2005-06-21 2005-06-21 Projektionsobjektiv für die mikrolithographie und abschlusselement dafür

Publications (2)

Publication Number Publication Date
DE112005003613A5 true DE112005003613A5 (de) 2008-05-08
DE112005003613B4 DE112005003613B4 (de) 2015-07-23

Family

ID=36650838

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112005003613.8T Expired - Fee Related DE112005003613B4 (de) 2005-06-21 2005-06-21 Projektionsobjektiv für die Mikrolithographie, dessen Verwendung und Abschlusselement dafür

Country Status (4)

Country Link
US (1) US20100149500A1 (de)
JP (1) JP5091128B2 (de)
DE (1) DE112005003613B4 (de)
WO (1) WO2006136184A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102013215292A1 (de) 2013-08-02 2015-02-05 Carl Zeiss Smt Gmbh Verfahren zum Beladen eines Rohlings aus Quarzglas mit Wasserstoff, Linsenelement und Projektionsobjektiv

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US5679125A (en) * 1994-07-07 1997-10-21 Nikon Corporation Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
JP3125630B2 (ja) * 1994-07-07 2001-01-22 株式会社ニコン 真空紫外用石英ガラスの製造方法および石英ガラス光学部材
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
US5958809A (en) * 1996-08-21 1999-09-28 Nikon Corporation Fluorine-containing silica glass
US6291377B1 (en) * 1997-08-21 2001-09-18 Nikon Corporation Silica glass and its manufacturing method
JPH1067526A (ja) * 1996-08-22 1998-03-10 Nikon Corp 石英ガラス光学部材
US6499317B1 (en) * 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
EP1067097A4 (de) * 1998-12-25 2004-03-31 Asahi Glass Co Ltd Synthetisches quartz glass und verfahren zur herstellung
WO2000058231A1 (fr) * 1999-03-25 2000-10-05 Asahi Glass Company, Limited Verre de silice synthetique pour element optique, son procede de fabrication et d'utilisation
DE19921795A1 (de) * 1999-05-11 2000-11-23 Zeiss Carl Fa Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie
JP2001176789A (ja) * 1999-12-21 2001-06-29 Nikon Corp 投影露光装置および該投影露光装置を用いたデバイスの製造方法
JP4228493B2 (ja) * 1999-12-22 2009-02-25 旭硝子株式会社 合成石英ガラス
JP3865039B2 (ja) * 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板
US6856713B2 (en) * 2001-08-20 2005-02-15 Polymicro Technologies, Llc Optical component and method of making the same
JP4104338B2 (ja) * 2002-01-31 2008-06-18 信越石英株式会社 ＡｒＦ露光装置用合成石英ガラス素材
JP4213413B2 (ja) * 2002-06-26 2009-01-21 東ソー株式会社 真空紫外光用高均質合成石英ガラス、その製造方法及びこれを用いた真空紫外光用マスク基板
JP3531870B2 (ja) * 2002-03-27 2004-05-31 独立行政法人 科学技術振興機構 合成石英ガラス
DE60329671D1 (de) * 2002-04-23 2009-11-26 Asahi Glass Co Ltd Jektionsbelichtungsvorrichtung und projektionsbelichtungsverfahren
DE102004017031B4 (de) * 2004-04-02 2008-10-23 Heraeus Quarzglas Gmbh & Co. Kg Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben
US7506522B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High refractive index homogeneity fused silica glass and method of making same

Also Published As

Publication number Publication date
JP5091128B2 (ja) 2012-12-05
JP2008546622A (ja) 2008-12-25
US20100149500A1 (en) 2010-06-17
DE112005003613B4 (de) 2015-07-23
WO2006136184A1 (de) 2006-12-28

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Legal Events

Date Code Title Description
8127 New person/name/address of the applicant

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE

R012 Request for examination validly filed

Effective date: 20120322

R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee