DE10392942T5 - Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung - Google Patents
Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung Download PDFInfo
- Publication number
- DE10392942T5 DE10392942T5 DE10392942T DE10392942T DE10392942T5 DE 10392942 T5 DE10392942 T5 DE 10392942T5 DE 10392942 T DE10392942 T DE 10392942T DE 10392942 T DE10392942 T DE 10392942T DE 10392942 T5 DE10392942 T5 DE 10392942T5
- Authority
- DE
- Germany
- Prior art keywords
- glass substrate
- mask blank
- producing
- precision polishing
- main surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
- C03C15/02—Surface treatment of glass, not in the form of fibres or filaments, by etching for making a smooth surface
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Surface Treatment Of Glass (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002208049 | 2002-07-17 | ||
JP2002-208049 | 2002-07-17 | ||
PCT/JP2003/009103 WO2004008247A1 (fr) | 2002-07-17 | 2003-07-17 | Substrat de verre destine a une plaque de masquage et procede de production de celui-ci |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10392942T5 true DE10392942T5 (de) | 2005-08-11 |
Family
ID=30112834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10392942T Withdrawn DE10392942T5 (de) | 2002-07-17 | 2003-07-17 | Glassubstrat für einen Maskenrohling und Verfahren zu seiner Herstellung |
Country Status (3)
Country | Link |
---|---|
US (1) | US20040137828A1 (fr) |
DE (1) | DE10392942T5 (fr) |
WO (1) | WO2004008247A1 (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009019122A1 (de) * | 2009-04-29 | 2010-08-26 | Carl Zeiss Smt Ag | Verfahren zur Herstellung einer Projektionsbelichtungsanlage für die Mikrolithographie |
DE102022200021A1 (de) | 2022-01-04 | 2022-12-29 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004014954A1 (de) * | 2003-03-27 | 2005-03-10 | Hoya Corp | Verfahren zur Herstellung eines Glassubstrats für einen Maskenrohling und Verfahren zur Herstellung eines Maskenrohlings |
KR100710960B1 (ko) | 2004-09-29 | 2007-04-24 | 호야 가부시키가이샤 | 마스크 블랭크용 기판, 마스크 블랭크, 노광용 마스크,마스크 블랭크용 기판의 제조방법 및 반도체 제조방법 |
KR100745065B1 (ko) * | 2004-12-27 | 2007-08-01 | 주식회사 하이닉스반도체 | 위상반전 마스크의 성장성 이물질 제거방법 |
JP2008293552A (ja) * | 2007-05-22 | 2008-12-04 | Fujitsu Ltd | 基板、磁気記録媒体及びその製造方法、並びに磁気記憶装置 |
KR101512213B1 (ko) | 2007-12-18 | 2015-04-14 | 호야 가부시키가이샤 | 휴대 단말기용 커버 글래스 및 그 제조 방법, 및 휴대 단말 장치 |
US8673163B2 (en) * | 2008-06-27 | 2014-03-18 | Apple Inc. | Method for fabricating thin sheets of glass |
US7810355B2 (en) | 2008-06-30 | 2010-10-12 | Apple Inc. | Full perimeter chemical strengthening of substrates |
US9190096B2 (en) * | 2008-10-17 | 2015-11-17 | Hoya Corporation | Method for producing glass substrate and method for producing magnetic recording medium |
EP2404228B1 (fr) | 2009-03-02 | 2020-01-15 | Apple Inc. | Techniques de renforcement de protections en verre pour dispositifs électroniques portables |
US9778685B2 (en) | 2011-05-04 | 2017-10-03 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9213451B2 (en) | 2010-06-04 | 2015-12-15 | Apple Inc. | Thin glass for touch panel sensors and methods therefor |
US10189743B2 (en) | 2010-08-18 | 2019-01-29 | Apple Inc. | Enhanced strengthening of glass |
US8824140B2 (en) | 2010-09-17 | 2014-09-02 | Apple Inc. | Glass enclosure |
US10781135B2 (en) | 2011-03-16 | 2020-09-22 | Apple Inc. | Strengthening variable thickness glass |
US9725359B2 (en) | 2011-03-16 | 2017-08-08 | Apple Inc. | Electronic device having selectively strengthened glass |
US9128666B2 (en) | 2011-05-04 | 2015-09-08 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9944554B2 (en) | 2011-09-15 | 2018-04-17 | Apple Inc. | Perforated mother sheet for partial edge chemical strengthening and method therefor |
US9516149B2 (en) | 2011-09-29 | 2016-12-06 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US10144669B2 (en) | 2011-11-21 | 2018-12-04 | Apple Inc. | Self-optimizing chemical strengthening bath for glass |
US10133156B2 (en) | 2012-01-10 | 2018-11-20 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US8684613B2 (en) | 2012-01-10 | 2014-04-01 | Apple Inc. | Integrated camera window |
US8773848B2 (en) | 2012-01-25 | 2014-07-08 | Apple Inc. | Fused glass device housings |
US9946302B2 (en) | 2012-09-19 | 2018-04-17 | Apple Inc. | Exposed glass article with inner recessed area for portable electronic device housing |
CN104620176B (zh) * | 2012-09-26 | 2019-02-26 | 大日本印刷株式会社 | 玻璃再生处理方法、再生玻璃基板及使用其的光掩模坯料和光掩模 |
US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
US9886062B2 (en) | 2014-02-28 | 2018-02-06 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
JP6154860B2 (ja) * | 2015-07-17 | 2017-06-28 | 野村マイクロ・サイエンス株式会社 | 洗浄用水素水の製造方法及び製造装置 |
WO2017154673A1 (fr) * | 2016-03-08 | 2017-09-14 | 株式会社荏原製作所 | Dispositif de nettoyage de substrat, procédé de nettoyage de substrat, dispositif de traitement de substrat et dispositif de séchage de substrat |
CN106217235B (zh) * | 2016-07-20 | 2018-02-23 | 华侨大学 | 蓝宝石晶片腐蚀抛光复合加工方法 |
CN109031883A (zh) * | 2018-08-23 | 2018-12-18 | 苏州瑞而美光电科技有限公司 | 一种报废光刻掩膜版的回收处理方法 |
TW202106647A (zh) * | 2019-05-15 | 2021-02-16 | 美商康寧公司 | 在高溫下用高濃度鹼金屬氫氧化物減少紋理化玻璃、玻璃陶瓷以及陶瓷製品之厚度的方法 |
KR20230090601A (ko) * | 2021-12-15 | 2023-06-22 | 에스케이엔펄스 주식회사 | 블랭크 마스크, 블랭크 마스크 성막장치 및 블랭크 마스크의 제조방법 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2372536A (en) * | 1942-05-08 | 1945-03-27 | Alncin Inc | Method of producing optical surfaces and the like |
US3171768A (en) * | 1961-04-25 | 1965-03-02 | Ball Brothers Co Inc | Method of detecting flaws in glass surfaces and solution used therefor |
JPS486925B1 (fr) * | 1966-08-31 | 1973-03-01 | ||
JPS63114866A (ja) * | 1986-10-31 | 1988-05-19 | Hoya Corp | ガラスの加工方法 |
US6120942A (en) * | 1997-02-18 | 2000-09-19 | Micron Technology, Inc. | Method for making a photomask with multiple absorption levels |
US6106979A (en) * | 1997-12-30 | 2000-08-22 | Micron Technology, Inc. | Use of attenuating phase-shifting mask for improved printability of clear-field patterns |
US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
US6440531B1 (en) * | 1999-05-13 | 2002-08-27 | Nippon Sheet Glass Co., Ltd | Hydrofluoric acid etched substrate for information recording medium |
FR2797060B1 (fr) * | 1999-07-29 | 2001-09-14 | Commissariat Energie Atomique | Structure pour masque de lithographie en reflexion et procede pour sa realisation |
TWI268286B (en) * | 2000-04-28 | 2006-12-11 | Kao Corp | Roll-off reducing agent |
US6541168B2 (en) * | 2000-04-28 | 2003-04-01 | Corning Incorporated | Vacuum ultraviolet transmitting direct deposit vitrified silicon oxyfluoride lithography glass photomask blanks |
JP3377500B2 (ja) * | 2000-05-26 | 2003-02-17 | 三井金属鉱業株式会社 | 磁気記録媒体用ガラス基板の製造方法 |
JP3351419B2 (ja) * | 2000-06-16 | 2002-11-25 | 日本板硝子株式会社 | 情報記録媒体用ガラス基板の製造方法 |
US6737201B2 (en) * | 2000-11-22 | 2004-05-18 | Hoya Corporation | Substrate with multilayer film, reflection type mask blank for exposure, reflection type mask for exposure and production method thereof as well as production method of semiconductor device |
JP3874066B2 (ja) * | 2000-12-27 | 2007-01-31 | 信越化学工業株式会社 | シリカガラス基板の選別方法 |
US6596042B1 (en) * | 2001-11-16 | 2003-07-22 | Ferro Corporation | Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process |
-
2003
- 2003-07-15 US US10/619,181 patent/US20040137828A1/en not_active Abandoned
- 2003-07-17 DE DE10392942T patent/DE10392942T5/de not_active Withdrawn
- 2003-07-17 WO PCT/JP2003/009103 patent/WO2004008247A1/fr unknown
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009019122A1 (de) * | 2009-04-29 | 2010-08-26 | Carl Zeiss Smt Ag | Verfahren zur Herstellung einer Projektionsbelichtungsanlage für die Mikrolithographie |
DE102022200021A1 (de) | 2022-01-04 | 2022-12-29 | Carl Zeiss Smt Gmbh | Verfahren zum Bearbeiten eines Werkstücks bei der Herstellung eines optischen Elements |
Also Published As
Publication number | Publication date |
---|---|
US20040137828A1 (en) | 2004-07-15 |
WO2004008247A1 (fr) | 2004-01-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8110 | Request for examination paragraph 44 | ||
R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: G03F0001140000 Ipc: G03F0001600000 |
|
R079 | Amendment of ipc main class |
Free format text: PREVIOUS MAIN CLASS: G03F0001000000 Ipc: G03F0001600000 Effective date: 20111212 |
|
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |
Effective date: 20130201 |