DE102005054833A1 - Method and device for characterizing a sample by means of double-beam laser interferometry - Google Patents
Method and device for characterizing a sample by means of double-beam laser interferometry Download PDFInfo
- Publication number
- DE102005054833A1 DE102005054833A1 DE200510054833 DE102005054833A DE102005054833A1 DE 102005054833 A1 DE102005054833 A1 DE 102005054833A1 DE 200510054833 DE200510054833 DE 200510054833 DE 102005054833 A DE102005054833 A DE 102005054833A DE 102005054833 A1 DE102005054833 A1 DE 102005054833A1
- Authority
- DE
- Germany
- Prior art keywords
- sample
- double
- beam laser
- characterizing
- laser interferometry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000004556 laser interferometry Methods 0.000 title 1
- 238000012512 characterization method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R29/00—Arrangements for measuring or indicating electric quantities not covered by groups G01R19/00 - G01R27/00
- G01R29/22—Measuring piezoelectric properties
Abstract
Die Erfindung betrifft ein Verfahren und eine Vorrichtung für die Charakterisierung einer Probe mittels eines Doppelstrahl-Laserinterferometers. Als Probe wird beispielsweise eine dünne piezoelektrische Schicht untersucht, die auf einem Wafer, also auf einer kreisrunden dünnen, selbsttragenden Scheibe, aufgebracht ist.The invention relates to a method and a device for the characterization of a sample by means of a double-beam laser interferometer. As a sample, for example, a thin piezoelectric layer is examined, which is applied to a wafer, ie on a circular thin, self-supporting disc.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200510054833 DE102005054833A1 (en) | 2005-11-15 | 2005-11-15 | Method and device for characterizing a sample by means of double-beam laser interferometry |
PCT/EP2006/068501 WO2007057414A1 (en) | 2005-11-15 | 2006-11-15 | Method and device for characterizing a sample by means of double-beam laser interferometry |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200510054833 DE102005054833A1 (en) | 2005-11-15 | 2005-11-15 | Method and device for characterizing a sample by means of double-beam laser interferometry |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102005054833A1 true DE102005054833A1 (en) | 2007-05-16 |
Family
ID=37810004
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE200510054833 Withdrawn DE102005054833A1 (en) | 2005-11-15 | 2005-11-15 | Method and device for characterizing a sample by means of double-beam laser interferometry |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102005054833A1 (en) |
WO (1) | WO2007057414A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114034942B (en) * | 2021-11-10 | 2022-11-15 | 山东大学 | High-flux measurement method for piezoelectric coefficient of piezoelectric film |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6690473B1 (en) * | 1999-02-01 | 2004-02-10 | Sensys Instruments Corporation | Integrated surface metrology |
-
2005
- 2005-11-15 DE DE200510054833 patent/DE102005054833A1/en not_active Withdrawn
-
2006
- 2006-11-15 WO PCT/EP2006/068501 patent/WO2007057414A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2007057414A1 (en) | 2007-05-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
R012 | Request for examination validly filed |
Effective date: 20120914 |
|
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |
Effective date: 20140603 |