DE102005029360B4 - Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen - Google Patents

Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen Download PDF

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Publication number
DE102005029360B4
DE102005029360B4 DE102005029360A DE102005029360A DE102005029360B4 DE 102005029360 B4 DE102005029360 B4 DE 102005029360B4 DE 102005029360 A DE102005029360 A DE 102005029360A DE 102005029360 A DE102005029360 A DE 102005029360A DE 102005029360 B4 DE102005029360 B4 DE 102005029360B4
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DE
Germany
Prior art keywords
workpiece
electrode
plasma
treated
barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE102005029360A
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German (de)
English (en)
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DE102005029360A1 (de
Inventor
Dipl.-Phys. Prinz Eckhard
Dr. Palm Peter
Dr. Förster Frank
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SOFTAL CORONA & PLASMA GMBH, DE
Original Assignee
Softal Corona and Plasma GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE102005029360A priority Critical patent/DE102005029360B4/de
Application filed by Softal Corona and Plasma GmbH filed Critical Softal Corona and Plasma GmbH
Priority to US11/993,095 priority patent/US7989034B2/en
Priority to EP06754430A priority patent/EP1894449B1/de
Priority to AT06754430T priority patent/ATE533339T1/de
Priority to PCT/EP2006/005838 priority patent/WO2007000255A2/de
Priority to DK06762073T priority patent/DK1902156T3/da
Priority to PL06754430T priority patent/PL1894449T3/pl
Priority to CN2006800214983A priority patent/CN101198718B/zh
Priority to EP06762073A priority patent/EP1902156B1/de
Priority to US11/993,362 priority patent/US20100112235A1/en
Priority to AT06762073T priority patent/ATE432379T1/de
Priority to JP2008517388A priority patent/JP2008547166A/ja
Priority to PCT/EP2006/005839 priority patent/WO2007016999A2/de
Priority to DE502006003822T priority patent/DE502006003822D1/de
Publication of DE102005029360A1 publication Critical patent/DE102005029360A1/de
Application granted granted Critical
Publication of DE102005029360B4 publication Critical patent/DE102005029360B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2437—Multilayer systems
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DE102005029360A 2005-06-24 2005-06-24 Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen Expired - Fee Related DE102005029360B4 (de)

Priority Applications (14)

Application Number Priority Date Filing Date Title
DE102005029360A DE102005029360B4 (de) 2005-06-24 2005-06-24 Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
AT06762073T ATE432379T1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder beschichtung von werkstücken
AT06754430T ATE533339T1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung von werkstücken, insbesondere materialplatten oder -bahnen
PCT/EP2006/005838 WO2007000255A2 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder -beschichtung von werkstücken
DK06762073T DK1902156T3 (da) 2005-06-24 2006-06-19 Fremgangsmåde til plasmabehandling og/eller plasmabelægning af emner under kontinuerligt atmosfæretryk
PL06754430T PL1894449T3 (pl) 2005-06-24 2006-06-19 Sposób ciągłej obróbki plazmowej pod ciśnieniem atmosferycznym przedmiotów obrabianych, w szczególności materiału w postaci płyt lub pasm
CN2006800214983A CN101198718B (zh) 2005-06-24 2006-06-19 用于在连续气压下对工件，尤其是材料板或带进行等离子放电和/或涂层处理的方法
EP06762073A EP1902156B1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder beschichtung von werkstücken
US11/993,095 US7989034B2 (en) 2005-06-24 2006-06-19 Method for continuous atmospheric pressure plasma treatment of workpieces
EP06754430A EP1894449B1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung von werkstücken, insbesondere materialplatten oder -bahnen
JP2008517388A JP2008547166A (ja) 2005-06-24 2006-06-19 製品、特にプレート材または棒材を大気圧で連続的にプラズマ処理およびプラズマコーティングの少なくともいずれかをする方法
PCT/EP2006/005839 WO2007016999A2 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung von werkstücken, insbesondere materialplatten oder -bahnen
DE502006003822T DE502006003822D1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder beschichtung von werkstücken
US11/993,362 US20100112235A1 (en) 2005-06-24 2006-06-19 Method for treating plasma under continuous atmospheric pressure of work pieces, in particular, material plates or strips

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102005029360A DE102005029360B4 (de) 2005-06-24 2005-06-24 Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen

Publications (2)

Publication Number Publication Date
DE102005029360A1 DE102005029360A1 (de) 2006-12-28
DE102005029360B4 true DE102005029360B4 (de) 2011-11-10

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Family Applications (2)

Application Number Title Priority Date Filing Date
DE102005029360A Expired - Fee Related DE102005029360B4 (de) 2005-06-24 2005-06-24 Zwei Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
DE502006003822T Active DE502006003822D1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder beschichtung von werkstücken

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE502006003822T Active DE502006003822D1 (de) 2005-06-24 2006-06-19 Verfahren zur kontinuierlichen atmosphärendruck plasmabehandlung und/oder beschichtung von werkstücken

Country Status (9)

Country Link
US (2) US20100112235A1 (https=)
EP (2) EP1902156B1 (https=)
JP (1) JP2008547166A (https=)
CN (1) CN101198718B (https=)
AT (2) ATE533339T1 (https=)
DE (2) DE102005029360B4 (https=)
DK (1) DK1902156T3 (https=)
PL (1) PL1894449T3 (https=)
WO (2) WO2007000255A2 (https=)

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DE102010024086A1 (de) * 2010-06-17 2011-12-22 WPNLB UG (haftungsbeschränkt) & Co. KG Vorrichtung zur kontinuierlichen Plasmabehandlung und/oder Plasmabeschichtung eines Materialstücks
US8765232B2 (en) * 2011-01-10 2014-07-01 Plasmasi, Inc. Apparatus and method for dielectric deposition
JP5670229B2 (ja) * 2011-03-10 2015-02-18 積水化学工業株式会社 表面処理方法及び装置
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US9299956B2 (en) 2012-06-13 2016-03-29 Aixtron, Inc. Method for deposition of high-performance coatings and encapsulated electronic devices
US10526708B2 (en) 2012-06-19 2020-01-07 Aixtron Se Methods for forming thin protective and optical layers on substrates
US20130337657A1 (en) * 2012-06-19 2013-12-19 Plasmasi, Inc. Apparatus and method for forming thin protective and optical layers on substrates
WO2014097620A1 (en) * 2012-12-21 2014-06-26 Asahi Glass Company Limited Ignition process and device for pairs of dbd electrodes
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DE102016105976A1 (de) * 2016-04-01 2017-10-05 Dieffenbacher GmbH Maschinen- und Anlagenbau Vorrichtung zum Transport von Material
DE102016109044B3 (de) * 2016-05-17 2017-07-06 Leonhard Kurz Stiftung & Co. Kg Vorrichtung zur Oberflächenbehandlung eines Substrats
DE102016118569A1 (de) * 2016-09-30 2018-04-05 Cinogy Gmbh Elektrodenanordnung zur Ausbildung einer dielektrisch behinderten Plasmaentladung
DE102017118652A1 (de) 2017-08-16 2019-02-21 Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen Plasmageneratormodul und dessen Verwendung
EP3585136A1 (en) * 2018-06-20 2019-12-25 Masarykova Univerzita A method and device for generating low-temperature electrical water-based plasma at near-atmospheric pressures and its use
EP3814423B1 (en) 2018-06-29 2023-10-18 Dow Global Technologies LLC Foam bead and sintered foam structure
DE102019101997A1 (de) 2019-01-28 2020-07-30 Koenig & Bauer Ag Verfahren und Druckmaschine jeweils zum Bedrucken eines metallischen Bedruckstoffes

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Also Published As

Publication number Publication date
ATE533339T1 (de) 2011-11-15
CN101198718B (zh) 2010-05-26
DK1902156T3 (da) 2009-08-24
DE502006003822D1 (de) 2009-07-09
EP1894449A2 (de) 2008-03-05
US7989034B2 (en) 2011-08-02
WO2007000255A3 (de) 2007-04-26
EP1902156A2 (de) 2008-03-26
ATE432379T1 (de) 2009-06-15
WO2007000255A2 (de) 2007-01-04
WO2007016999A3 (de) 2009-09-03
US20100112235A1 (en) 2010-05-06
EP1902156B1 (de) 2009-05-27
US20100221451A1 (en) 2010-09-02
CN101198718A (zh) 2008-06-11
EP1894449B1 (de) 2011-11-09
DE102005029360A1 (de) 2006-12-28
JP2008547166A (ja) 2008-12-25
WO2007016999A2 (de) 2007-02-15
PL1894449T3 (pl) 2012-04-30

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