DD221475A1 - Device for analysis of the characteristic light emission in plasma processes - Google Patents

Device for analysis of the characteristic light emission in plasma processes Download PDF

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Publication number
DD221475A1
DD221475A1 DD25633183A DD25633183A DD221475A1 DD 221475 A1 DD221475 A1 DD 221475A1 DD 25633183 A DD25633183 A DD 25633183A DD 25633183 A DD25633183 A DD 25633183A DD 221475 A1 DD221475 A1 DD 221475A1
Authority
DD
German Democratic Republic
Prior art keywords
concave mirror
arranged
mirror
device
plasma
Prior art date
Application number
DD25633183A
Other languages
German (de)
Inventor
Hans-Juergen Tiller
Friedrich-Wilhelm Breitbarth
Reinhard Fendler
Andreas Vogt
Joerg-Rainer Wurdak
Reinhard Voigt
Original Assignee
Mikroelektronik Zt Forsch Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mikroelektronik Zt Forsch Tech filed Critical Mikroelektronik Zt Forsch Tech
Priority to DD25633183A priority Critical patent/DD221475A1/en
Publication of DD221475A1 publication Critical patent/DD221475A1/en

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Abstract

The invention relates to a device for process control of plasma processes, preferably in the Plasmaaetzen, Zerstaeuben and plasma CVD of semiconductors and their compounds. The aim of the invention is to detect the characteristic of the respective plasma process light emission in the different plasma processes by means of only one device. The solution according to the invention is characterized in that, to limit the width of the light beam, an aperture diaphragm is arranged, which subsequently has an entrance slit and a concave mirror arranged in the further beam path. The concave mirror is associated with a rotatable grating monochromator so that the spectral component to be selected is reflected almost in itself to the concave mirror and is fed from there via a plane mirror at right angles via an exit slit a photoreceptor. Fig. 1

Description

Device for analyzing the characteristic light emission in plasma processes

Field of application of the invention

The invention relates to a device for process control of plasma processes, preferably in plasma etching, sputtering and plasma CVD of semiconductors and their compounds, glasses and ceramic materials, metals and their compounds and organic .Materialien.

Characteristic of the known technical solutions

For the control of plasma processes, it is known that the temporal change of certain spectral components of the plasma emission induced by electron impact light emission is detected during the process by means of a device usually arranged directly on the reactor chamber.

From DE OS 27 3 & 262 it is known that the selection of the spectral components by interference filters, which are connected upstream of suitable photoreceptors is realized. But this solution is liable to the lack of that for each technological problem usually a special interference filter is required and the resolution of the apparatus is limited by the bandwidth of the filter.

ο ο τ

Further, it is also known (e.g., U.S. Patent No. 4,312,732) to realize the selection by means of a grating monochromator or a diffraction prism. By rotating the grating monochromator, a continuous tuning can take place within a fixed tuning range. Compared with interference filters, a multiple better resolution can be achieved by a corresponding dimensioning of the optical components. However, this solution is liable to the defect that the devices are very expensive and volume-intensive due to the essential optical components, which may be a lattice monochromator and two concave mirrors or a Konkavgittermonochromator and two plane mirror according to the selected basic structure.

Z-iel the invention

.Ziel the invention is to detect the characteristic of the respective plasma process light emission in the different plasma processes by means of only one device.

Explanation of the essence of the invention

The invention has for its object to provide a device for process control, which allows continuous tuning, the requirements of the technological process according to their resolution is adjustable and is characterized by a small number of high-quality optical components and a space-saving design. According to the invention the object is achieved in that for limiting the width of the light beam exiting from the recipient an aperture diaphragm is arranged, which are subsequently arranged in the further beam path an entrance slit and a concave mirror,

wherein the concave mirror is associated with a rotatable grating monochromator so that the spectral component to be selected is reflected almost in itself to the concave mirror and from there via a plane arranged in front of the focal plane of the concave mirror plan mirror arranged at right angles through an exit slit one at a distance from the plane mirror Potoempfanger is forwarded. Advantageously, an adjustable aperture diaphragm is arranged to adjust the resolution in front of the entrance slit. Due to the construction of the device according to the invention a twofold use of the concave mirror within the beam path and by the interleaving of the beam path, a very compact construction of the device has been achieved. Another advantage for the overall structure of the device is that the exiting light beam is redirected by the plane mirror so that there is a favorable (space-saving) arrangement of the exit slit and the subsequent photoreceptor.

embodiment

The invention will be explained in more detail with reference to a drawing.

To limit the light beam emerging from the recipient, not shown in the drawing, an aperture stop 1 is provided. The light beam strikes through the entrance slit 2 onto the concave mirror 3 arranged at the focal point distance. From there, it is reflected as a nearly parallel beam on the grating monochromator 4, which is arranged as a tuning lenient and rotatable by the amount. The grating monochromator 4 reflects according to the known wavelength

dependent diffraction the individual spectral components. The grating is now adjusted so that the component to be selected is reflected almost in itself and hits the concave mirror 3 again with a slight offset to the optical axis. Thereafter, this component of the arranged at a distance X in front of the focal plane of the concave mirror 3 plane mirror 5 at right angles through the exit slit 6 the photoreceptor 7 zug- passes.

Claims (3)

  1. Srfindungsanpruch
    1. A device for analyzing the characteristic light emission at. Plasma processes, in particular in the plasma-chemical etching of substrates, in sputtering and plasma CVD, characterized in that to limit the width of the from the Hezipienten
    an aperture diaphragm (1) is arranged, which is subsequently arranged in the further beam path an entrance slit (2) and a concave mirror (3), wherein the concave mirror (3) a rotatable grating monochromator (4) is assigned so that the spectral component to be selected is almost reflected in itself to the concave mirror (3) and from there via a plane of the focal plane of the concave mirror at a distance (X) arranged in front plane mirror (5) at right angles through an at a distance (X) to the plane mirror (5) arranged exit slit (6) a photoreceiver (7) is supplied.
  2. 2. Device according to item 1, characterized in that the concave mirror (3) is designed as a cylindrical mirror.
  3. 3. Device according to item 1, characterized in that an adjustable aperture diaphragm (1) in front of the entrance slit (2) is arranged.
    - For this 1 sheet drawing -
DD25633183A 1983-11-04 1983-11-04 Device for analysis of the characteristic light emission in plasma processes DD221475A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DD25633183A DD221475A1 (en) 1983-11-04 1983-11-04 Device for analysis of the characteristic light emission in plasma processes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD25633183A DD221475A1 (en) 1983-11-04 1983-11-04 Device for analysis of the characteristic light emission in plasma processes

Publications (1)

Publication Number Publication Date
DD221475A1 true DD221475A1 (en) 1985-04-24

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
DD25633183A DD221475A1 (en) 1983-11-04 1983-11-04 Device for analysis of the characteristic light emission in plasma processes

Country Status (1)

Country Link
DD (1) DD221475A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0208966A1 (en) * 1985-07-03 1987-01-21 Gregory A. Roche Apparatus for, and methods of, depositing a substance on a substrate
EP0230652A1 (en) * 1985-12-30 1987-08-05 International Business Machines Corporation Apparatus for creating a vacuum deposited alloy or composition and application of such an apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0208966A1 (en) * 1985-07-03 1987-01-21 Gregory A. Roche Apparatus for, and methods of, depositing a substance on a substrate
EP0230652A1 (en) * 1985-12-30 1987-08-05 International Business Machines Corporation Apparatus for creating a vacuum deposited alloy or composition and application of such an apparatus

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