CN223145452U - General type alkaline cleaner of garrulous silicon chip - Google Patents

Abstract

The utility model discloses a general type alkaline cleaner for broken silicon wafers, and belongs to the technical field of alkaline cleaner equipment. The structure comprises a frame and a stirring bin, wherein the stirring bin is arranged at the inner position of the frame, an upper through hole is formed in the upper position of the stirring bin, a feeding hole and a discharging screen are respectively arranged at the two sides of the stirring bin, and a matching clamping piece is arranged at the connecting position of the stirring bin and the feeding hole. The device can realize mechanized silicon wafer cleaning operation, and the silicon wafer is cleaned by using an automatic stirring cleaning mode of the stirring bin, so that the working mode of the previous manual silicon wafer treatment is replaced, the actual working efficiency is effectively improved, in addition, the device is controllable in internal related parameters, and the use state of the device can be adjusted according to the actual situation, so that the device is suitable for the cleaning task of the alkaline washer silicon wafer under different conditions.

Description

General type alkaline cleaner of garrulous silicon chip

Technical Field

The utility model relates to the technical field of alkaline washing machine equipment, in particular to a general type alkaline washing machine for crushed silicon wafers.

Background

The prospect of the photovoltaic power generation industry is very wide. With the continuous maturation of technology and the exertion of scale effects, the cost of photovoltaic power generation is continuously reduced. The efficiency of solar cells is continuously increasing, and the manufacturing and installation costs of photovoltaic power generation equipment are gradually decreasing.

At present, a photovoltaic module can generate a plurality of unconditional silicon wafers in the production process, the silicon wafers can be subjected to a series of treatments such as acid washing, alkali washing and the like, and finally, the silicon wafers are put into a furnace again for use, and in the current cleaning process of the silicon wafers, the silicon wafers are mainly operated in a manual cleaning mode, however, larger labor force is consumed in the operation process, and the production cost is not beneficial to saving.

Disclosure of utility model

The utility model aims to provide a general type alkaline washer for broken silicon wafers, which is used for improving the actual production efficiency by replacing a manual silicon wafer cleaning mode to solve the problems in the background technology.

In order to achieve the above purpose, the present utility model provides the following technical solutions:

The utility model provides a general alkaline cleaner of garrulous silicon chip, includes frame and stirring storehouse, stirring storehouse sets up in the inside position of frame, stirring storehouse top position is provided with the through-hole, and stirring storehouse both sides position is provided with pan feeding mouth and ejection of compact sieve respectively, and stirring storehouse and pan feeding mouth hookup location are provided with the cooperation fastener, and pan feeding mouth right side position is provided with the cooperation fluted disc, frame below position is provided with driving motor, the output is provided with the cooperation pivot on the driving motor, cooperation pivot top is corresponding with cooperation fluted disc position, and the two passes through the conveyer belt cooperation and be connected, cooperation fluted disc left side position is provided with the spacing dish, spacing dish left side is provided with the auxiliary disc, spacing dish and spacing runner cooperation setting, spacing runner block is installed on the mount, the mount is installed in frame top position, and mount left side position cooperation is provided with down the tray, the tray sets up in pan feeding mouth below position down.

As a further scheme of the utility model, a cleaning water tank is arranged below the stirring bin and comprises an output pipe, a transition water tank and an observation window, the output pipe is arranged at the outermost position of the water tank, the transition water tank is arranged in the output pipe, a liquid control valve is cooperatively arranged at the outer side of the transition water tank, the liquid control valve is arranged at the outer side of the frame, and the observation window 103 is arranged at the upper position of the liquid control valve 5.

As a still further scheme of the utility model, the stirring bin comprises an outer protective shell, a rotary bin and rotary baffle plates, wherein the outer protective shell is arranged at the outer side of the stirring bin, the rotary bin is arranged at the inner side of the outer protective shell and connected with a matched fluted disc, and a plurality of uniformly distributed rotary baffle plates are arranged in the rotary bin.

As a still further proposal of the utility model, an auxiliary frame is arranged above the discharging screen.

Compared with the prior art, the device has the advantages that the device can realize mechanized silicon wafer cleaning operation, the silicon wafer is cleaned by using the automatic stirring and cleaning mode of the stirring bin, the working mode of the previous manual silicon wafer treatment is replaced, the actual working efficiency is effectively improved, in addition, the internal relevant parameters of the device are controllable, and the use state of the device can be adjusted according to the actual situation, so that the device is suitable for the cleaning task of the alkaline washer silicon wafer under different conditions.

Drawings

FIG. 1 is a perspective view of the utility model;

FIG. 2 is a cross-sectional structural view of the utility model;

FIG. 3 is a partial enlarged view of the utility model A;

FIG. 4 is a structural view of the components of the mixing silo of the present utility model.

The device comprises a frame 1, an auxiliary frame 2, a discharging screen 3, an upper through hole 5, a liquid control valve 6, a driving motor 7, a matched rotating shaft 8, a stirring bin 9, a matched fluted disc 10, a limiting disc 11, a feeding port 12, a fixing frame 13, a limiting rotating wheel 14, an auxiliary disc 15, a lower tray 101, an output pipe 102, a transition water tank 103, an observation window 201, an outer protective shell 202, a rotating bin 203 and a rotating baffle.

Detailed Description

The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.

Example 1

Referring to fig. 1-4, this embodiment provides a general type alkaline cleaner for broken silicon wafers, including frame 1 and stirring storehouse 8, stirring storehouse 8 sets up in frame 1 inside position, stirring storehouse 8 top position is provided with upper through hole 4, stirring storehouse 8 both sides position is provided with pan feeding mouth 11 and ejection of compact sieve 3 respectively, stirring storehouse 8 and pan feeding mouth 11 hookup location are provided with the cooperation fastener, and pan feeding mouth 11 right side position is provided with cooperation fluted disc 9, frame 1 below position is provided with driving motor 6, driving motor 6 goes up the output and is provided with cooperation pivot 7, cooperation pivot 7 top and cooperation fluted disc 9 position are corresponding, and both pass through the conveyer belt cooperation and be connected, cooperation fluted disc 9 left side position is provided with spacing dish 10, spacing dish 10 left side is provided with auxiliary disc 14, spacing dish 10 and spacing runner 13 cooperation setting, spacing runner 13 block is installed on mount 12, mount 12 installs in frame 1 top position, and mount 12 left side position cooperation is provided with lower tray 15, the setting tray 15 below pan feeding mouth 11.

Further, the lower position of the stirring bin 8 is provided with a water tank for cleaning, the water tank comprises an output pipe 101, a transition water tank 102 and an observation window 103, the output pipe 101 is arranged at the outermost position of the water tank, the transition water tank 102 is arranged in the output pipe 101, a liquid control valve 5 is arranged outside the transition water tank 102 in a matched mode, the liquid control valve 5 is arranged at the outer position of the frame 1, and the observation window 103 is arranged at the upper position of the liquid control valve 5. In the process of working in the stirring bin 8, relevant solution is added into the cleaning water tank through a water inlet valve, the specific volume of the solution in the cleaning water tank can be observed through an observation window 103, so that the actual volume is adjusted, and after the cleaning is finished, the solution in the cleaning water tank is discharged through a liquid control valve 5.

Still further, stirring storehouse 8 includes outer protective housing 201, rotatory storehouse 202 and rotatory separation blade 203, outer protective housing 201 sets up in stirring storehouse 8 outside position, outer protective housing 201 inboard is provided with rotatory storehouse 202, rotatory storehouse 202 is connected with cooperation fluted disc 9, and the inside rotatory separation blade 203 that is provided with a plurality of evenly distributed of rotatory storehouse 202.

Still further, the ejection of compact sieve 3 top position is provided with auxiliary frame 2. The worker can install corresponding collecting components on the auxiliary frame 2 to collect the processed silicon wafers.

In the working process, unqualified silicon wafers generated in the production of the photovoltaic module fall into an alkaline cleaner, materials are conveyed forward through the rotary baffle 203, and simultaneously, the materials are continuously turned over in the rotary bin 202 along with the rotation of the rotary bin 202, so that the cleaning materials without dead angles of 360 degrees are achieved, and independent spraying pipelines are arranged at the position of the discharging screen 3 to spray residual alkali on the materials.

It is noted that relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without more in the limited case. The term "comprising" an element defined by the term "comprising" does not exclude the presence of other identical elements in a process, method, article or apparatus that comprises the element.

In the present utility model, unless explicitly specified and limited otherwise, the terms "mounted," "configured," "connected," "secured," "screwed," and the like are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally formed, mechanically connected, electrically connected, directly connected, or indirectly connected through an intermediate medium, and may be a communication between two elements or an interaction relationship between two elements, unless explicitly specified otherwise, and it will be understood by those of ordinary skill in the art that the above terms are in specific terms of the present utility model as appropriate.

Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims (4)

1. The utility model provides a general alkaline cleaner of garrulous silicon chip, its characterized in that, including frame (1) and stirring storehouse (8), stirring storehouse (8) set up in frame (1) internal position, stirring storehouse (8) top is provided with upper through hole (4), stirring storehouse (8) both sides position is provided with pan feeding mouth (11) and ejection of compact sieve (3) respectively, stirring storehouse (8) are provided with cooperation fastener with pan feeding mouth (11) hookup location, and pan feeding mouth (11) right side position is provided with cooperation fluted disc (9), frame (1) below position is provided with driving motor (6), driving motor (6) upper output is provided with cooperation pivot (7), cooperation pivot (7) top and cooperation fluted disc (9) position are corresponding, and both pass through the conveyer belt cooperation and connect, cooperation fluted disc (9) left side position is provided with spacing dish (10), spacing dish (10) left side is provided with auxiliary disc (14), spacing dish (10) and spacing runner (13) cooperation setting, spacing dish (13) are installed in frame (12) top position (12) and are installed in frame (1), the lower tray (15) is arranged at the position below the feeding port (11).

2. The general type alkaline washing machine for crushed silicon wafers according to claim 1, wherein a water tank for cleaning is arranged at the lower position of the stirring bin (8), the water tank comprises an output pipe (101), a transition water tank (102) and an observation window (103), the output pipe (101) is arranged at the outermost position of the water tank, the transition water tank (102) is arranged in the output pipe (101), a liquid control valve (5) is arranged at the outer side of the transition water tank (102) in a matched mode, the liquid control valve (5) is arranged at the outer side of the frame (1), and the observation window (103) is arranged at the upper position of the liquid control valve (5).

3. The general type alkaline washing machine for crushed silicon wafers according to claim 1, wherein the stirring bin (8) comprises an outer protection shell (201), a rotary bin (202) and a rotary baffle (203), the outer protection shell (201) is arranged at the outer side of the stirring bin (8), the rotary bin (202) is arranged on the inner side of the outer protection shell (201), the rotary bin (202) is connected with a matched fluted disc (9), and a plurality of uniformly distributed rotary baffles (203) are arranged inside the rotary bin (202).

4. A general type caustic washing machine for broken silicon chips according to claim 3, wherein an auxiliary frame (2) is arranged above the discharge screen (3).