CN222999262U - A photovoltaic silicon wafer cleaning machine tank with improved fixed arrangement - Google Patents
A photovoltaic silicon wafer cleaning machine tank with improved fixed arrangement Download PDFInfo
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- CN222999262U CN222999262U CN202422057174.3U CN202422057174U CN222999262U CN 222999262 U CN222999262 U CN 222999262U CN 202422057174 U CN202422057174 U CN 202422057174U CN 222999262 U CN222999262 U CN 222999262U
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Abstract
本实用新型公开了一种定排改进的光伏硅片清洗机槽体，涉及光伏硅片清洗机技术领域，包括槽体和设于槽体顶部的槽盖，槽体的内部下端设有多个循环管和鼓泡管，槽体的底部连通设有沉积管，沉积管的内壁下端固定设有横板，横板的内部转动穿设有空心管，空心管的侧壁上端连通设有排液管，排液管的外壁连通设有多个间隔设置的喷头，沉积管的内壁下端固定穿设有导液桶，导液桶的侧壁连通设有固定管，固定管的上端穿进沉积管并转动设于空心管内，固定管的管壁固定套设有泵体。本实用新型使槽内反应副产物硅酸盐在槽体底部实现有效沉积，降低槽内药液硅酸盐浓度，从而提升药液寿命，降低换液频次，同时提升在位时间内有效产出。
The utility model discloses a fixed-row improved photovoltaic silicon wafer cleaning machine tank body, which relates to the technical field of photovoltaic silicon wafer cleaning machines, including a tank body and a tank cover arranged at the top of the tank body, a plurality of circulation pipes and bubbling pipes are arranged at the lower end of the inner part of the tank body, a deposition pipe is connected to the bottom of the tank body, a horizontal plate is fixedly arranged at the lower end of the inner wall of the deposition pipe, a hollow pipe is rotatably penetrated inside the horizontal plate, a liquid discharge pipe is connected to the upper end of the side wall of the hollow pipe, a plurality of nozzles arranged at intervals are connected to the outer wall of the liquid discharge pipe, a liquid guide barrel is fixedly penetrated at the lower end of the inner wall of the deposition pipe, a fixed pipe is connected to the side wall of the liquid guide barrel, the upper end of the fixed pipe penetrates into the deposition pipe and is rotatably arranged in the hollow pipe, and a pump body is fixedly sleeved on the tube wall of the fixed pipe. The utility model enables the silicate, a byproduct of the reaction in the tank, to be effectively deposited at the bottom of the tank body, reduces the silicate concentration of the liquid medicine in the tank, thereby improving the life of the liquid medicine, reducing the frequency of liquid replacement, and improving the effective output during the in-situ time.
Description
Technical Field
The utility model relates to the technical field of photovoltaic silicon wafer cleaning machines, in particular to a fixed-row improved photovoltaic silicon wafer cleaning machine tank body.
Background
The photovoltaic silicon wafer cleaning machine is special equipment for cleaning the surface of a photovoltaic silicon wafer, and has the main effects of removing various pollutants generated in the processing process of the silicon wafer so as to ensure the cleanliness of the silicon wafer and further improve the quality and performance of a photovoltaic product.
When the solar photovoltaic cell is prepared, silicate byproducts generated in the tank body are accumulated at the bottom of the tank body due to gravity sedimentation along with the lapse of reaction time in the process of cleaning the surface of the silicon wafer, the viscosity of the liquid medicine is increased along with the gradual increase of concentration, the surface tension is increased, the reaction rate of the silicon wafer in the liquid medicine is reduced, the service life of the liquid medicine of the tank body is reduced, a certain inclination angle is set on the plane of the bottom of the tank body at present, the silicate is deposited to one side, the deposition bottom is externally connected with a pneumatic liquid discharge valve for discharging liquid, and the discharge of the silicate is realized, but the silicate at the bottom of the tank body of the existing cleaning machine cannot be rapidly discharged in a large quantity after the deposition, so that the liquid is required to be replaced for a plurality of times.
Disclosure of utility model
The utility model is provided in view of the problems of the prior photovoltaic silicon wafer cleaning machine tank body with improved fixed row.
Therefore, the utility model aims to provide a photovoltaic silicon wafer cleaning machine tank body with improved fixed row, which solves the problems that silicate in the tank body of the existing cleaning machine cannot form effective sedimentation at the bottom and the discharge efficiency is reduced under the same condition.
In order to achieve the above object, the present utility model provides the following technical solutions:
The utility model provides a decide photovoltaic silicon chip cleaning machine cell body of modified row, includes the cell body and locates the capping at cell body top, the inside lower extreme of cell body is equipped with a plurality of circulating pipes and bubble pipe, the bottom intercommunication of cell body is equipped with the deposit pipe, the inner wall lower extreme of deposit pipe is fixed with the diaphragm, the inside rotation of diaphragm wears to be equipped with the hollow tube, the lateral wall upper end intercommunication of hollow tube is equipped with the fluid-discharge tube, the outer wall intercommunication of fluid-discharge tube is equipped with the shower nozzle that a plurality of intervals set up;
the inner wall lower extreme of sedimentation pipe is fixed wears to be equipped with the drain bucket, the lateral wall intercommunication of drain bucket is equipped with fixed pipe, the upper end of fixed pipe is worn into the sedimentation pipe and is rotated and locate in the hollow tube, the fixed cover of pipe wall of fixed pipe is equipped with the pump body.
Preferably, the deposition tube is arranged in a funnel shape.
Preferably, a motor is fixedly arranged at the lower end of the outer wall of the deposition tube, an output shaft of the motor penetrates into the deposition tube and is fixedly provided with a first bevel gear, a second bevel gear is fixedly sleeved at the lower end of the outer wall of the hollow tube, and the first bevel gear and the second bevel gear are matched.
Preferably, a plurality of spray heads are arranged obliquely downwards.
Further, the pipe wall of the liquid discharge pipe is fixedly provided with a scraping plate, and the scraping plate is in contact fit with the upper side of the inner wall of the deposition pipe.
Preferably, a liquid receiving plate is fixedly arranged at the lower end of the inner wall of the liquid guiding barrel, and the upper end of the liquid receiving plate is positioned at the lower end of the interior of the deposition tube.
Preferably, the mounting plates are fixedly arranged at two ends of the upper side of the outer wall of the deposition tube, and the mounting plates are fixedly arranged at the bottom of the groove body in a threaded connection manner through connecting bolts.
Preferably, the outer wall of the hollow tube is sleeved with a guide cover, the guide cover is fixedly connected with the top of the transverse plate, and a through hole matched with the hollow tube to rotate is formed in the top of the guide cover.
Preferably, the cross section of the scraping plate is arranged in an inverted triangle.
Preferably, a rubber sleeve is sleeved outside the end of the spray head, and a filter screen is fixedly embedded at the end part of the rubber sleeve.
In the technical scheme, the utility model has the technical effects and advantages that:
1. according to the utility model, the funnel-shaped deposition tube is adopted through the groove body and the deposition tube, so that the effective deposition of the reaction byproduct silicate in the groove at the bottom of the groove body is realized, the concentration of the liquid medicine silicate in the groove is reduced, the service life of the liquid medicine is prolonged, the liquid changing frequency is reduced, and meanwhile, the effective output in the in-situ time is improved.
2. According to the utility model, through the deposition pipe, the transverse plate, the hollow pipe, the liquid discharge pipe, the spray head, the scraping plate, the liquid guide barrel, the fixed pipe and the pump body, the silicate of the tank body can be deposited and discharged, and meanwhile, the water spraying and scraping movement are carried out on the inner wall of the deposition pipe, so that the discharge effect of the deposited silicate can be improved.
Drawings
In order to more clearly illustrate the embodiments of the present utility model or the technical solutions in the prior art, the drawings required for the embodiments will be briefly described below, and it is apparent that the drawings in the following description are only some embodiments described in the present utility model, and other drawings may be obtained according to these drawings for a person having ordinary skill in the art.
FIG. 1 is a schematic diagram of the structure of the present utility model;
FIG. 2 is an enlarged schematic view of portion A of FIG. 1 in accordance with the present utility model;
FIG. 3 is an enlarged schematic view of portion B of FIG. 1 in accordance with the present utility model;
FIG. 4 is a schematic perspective view of a screed according to the present utility model;
fig. 5 is a schematic perspective view of the guide housing of the present utility model.
Reference numerals illustrate:
1. The device comprises a tank body, a tank cover, a tank 3, a circulating pipe, a bubbling pipe, a deposition pipe, a 6, a transverse plate, a 7, a hollow pipe, a 8, a liquid discharge pipe, a 9, a spray head, a 10, a liquid guide barrel, a 11, a fixed pipe, a 12, a pump body, a 13, a motor, a 14, a first bevel gear, a 15, a second bevel gear, a 16, a scraping plate, a 17, a liquid receiving plate, a 18, a mounting plate, a 19, a connecting bolt, a 20, a guide cover, a 21, a rubber sleeve, a 22 and a filter screen.
Detailed Description
In order to make the technical scheme of the present utility model better understood by those skilled in the art, the present utility model will be further described in detail with reference to the accompanying drawings.
The embodiment of the utility model discloses a photovoltaic silicon wafer cleaning machine tank body with improved fixed row.
Example 1
The utility model provides a fixed-row improved photovoltaic silicon wafer cleaning machine groove body as shown in figures 1-5, which comprises a groove body 1 and a groove cover 2 arranged at the top of the groove body 1, wherein a plurality of circulating pipes 3 and bubbling pipes 4 are arranged at the lower end of the inside of the groove body 1, a deposition pipe 5 is communicated with the bottom of the groove body 1, the deposition pipe 5 is arranged in a funnel shape, mounting plates 18 are fixedly arranged at two ends of the upper side of the outer wall of the deposition pipe 5, and the mounting plates 18 are fixedly arranged with the bottom of the groove body 1 in a threaded manner through connecting bolts 19.
When the tank body 1 is arranged and used in the cleaning machine, silicate flowing out of the tank body 1 can be cleaned through the deposition pipe 5 at the bottom of the tank body 1 for deposition, and the deposition pipe 5 is arranged in a funnel shape, so that silicate is piled up on the upper side of the inner wall of the deposition pipe 5, compared with the inside of the tank body inclined horizontally, the funnel-shaped structure can enable effective deposition of reaction byproduct silicate at the bottom of the tank body, the concentration of liquid medicine silicate in the tank is reduced, the service life of the liquid medicine is prolonged, the liquid changing frequency is reduced, the deposition pipe 5 is connected with the tank body 1 through the connecting bolts 19, and convenient replacement of the deposition pipe 5 is facilitated.
Example 2
Embodiment 2 in order to improve the discharging effect when the deposited silicate is discharged on the basis of embodiment 1, as shown in fig. 1 and 3-5, a transverse plate 6 is fixedly arranged at the lower end of the inner wall of the deposition tube 5, a hollow tube 7 is rotatably arranged in the transverse plate 6, a liquid discharge tube 8 is communicated with the upper end of the side wall of the hollow tube 7, a scraping plate 16 is fixedly arranged on the wall of the liquid discharge tube 8, the scraping plate 16 is in inverted triangle arrangement in cross section, the scraping plate 16 is in contact with the upper side of the inner wall of the deposition tube 5, a plurality of spray heads 9 are arranged at intervals in a manner of being in contact with the outer wall of the liquid discharge tube 8, the spray heads 9 are all arranged obliquely downwards, a liquid guide barrel 10 is fixedly arranged at the lower end of the inner wall of the deposition tube 5 in a penetrating manner, a fixed tube 11 is arranged on the side wall of the liquid guide barrel 10 in a communicating manner, a pump body 12 is fixedly sleeved on the wall of the fixed tube 11, a liquid connecting plate 17 is fixedly arranged at the lower end of the inner wall of the liquid guide barrel 10, the upper end of the liquid connecting plate 17 is positioned at the lower end of the deposition tube 5, a rubber sleeve 21 is sleeved on the outer end of the spray head 9, and a filter screen 22 is fixedly sleeved on the end 21 of the rubber sleeve.
When silicate in the deposition tube 5 needs to be matched and discharged, firstly, when liquid is exchanged in the tank body 1, the solution can drive most silicate to be discharged through the lower end of the deposition tube 5, and when the solution falls, the liquid receiving plate 17 can receive and guide part of the solution into the liquid guide barrel 10, at the moment, the pump body 12 is started, the solution in the liquid guide barrel 10 can be discharged into the hollow tube 7 through the fixed tube 11, at the moment, under the arrangement of the liquid discharge tube 8 and the spray head 8, the solution has larger impact force when flowing out, the silicate on the upper side of the inner wall of the deposition tube 5 can be fully flushed out, and at the same time, the hollow tube 7 rotates, the scraping plate 16 can rotate along the inner wall of the deposition tube 5, and silicate adhered to the inner wall of the deposition tube 5 is further discharged.
Example 3
Embodiment 3 in order to enable the hollow tube 7 to stably rotate on the basis of embodiment 2, as shown in fig. 1-2, a motor 13 is fixedly arranged at the lower end of the outer wall of the deposition tube 5, an output shaft of the motor 13 penetrates into the deposition tube 5 and is fixedly provided with a first bevel gear 14, a second bevel gear 15 is fixedly sleeved at the lower end of the outer wall of the hollow tube 7, the first bevel gear 14 and the second bevel gear 15 are matched, a guide cover 20 is sleeved at the outer wall of the hollow tube 7, the guide cover 20 is fixedly connected with the top of the transverse plate 6, and a through hole matched with the rotation of the hollow tube 7 is formed in the top of the guide cover 20.
When the solution is sprayed out through the spray head 9, the motor 13 is started, so that the motor 13 drives the first bevel gear 14 to rotate, at the moment, the hollow pipe 7 can rotate through the cooperation of the first bevel gear 14 and the second bevel gear 15, so that the silicate deposited on the upper side of the inner wall of the deposition pipe 5 can be fully discharged, and meanwhile, under the arrangement of the guide cover 20, the silicate can be prevented from being covered on the outer sides of the first bevel gear 14 and the second bevel gear 15 in the falling process, and the driving work is stable.
While certain exemplary embodiments of the present utility model have been described above by way of illustration only, it will be apparent to those of ordinary skill in the art that modifications may be made to the described embodiments in various different ways without departing from the spirit and scope of the utility model. Accordingly, the drawings and description are to be regarded as illustrative in nature and not as restrictive of the scope of the utility model, which is defined by the appended claims.
Claims (10)
1. The utility model provides a fix row modified photovoltaic silicon chip cleaning machine cell body, includes cell body (1) and locates capping (2) at cell body (1) top, its characterized in that, the inside lower extreme of cell body (1) is equipped with a plurality of circulating pipes (3) and bubble pipe (4), the bottom intercommunication of cell body (1) is equipped with deposition tube (5), the inner wall lower extreme of deposition tube (5) is fixed with diaphragm (6), hollow tube (7) are worn to be equipped with in the inside rotation of diaphragm (6), the lateral wall upper end intercommunication of hollow tube (7) is equipped with fluid-discharge tube (8), the outer wall intercommunication of fluid-discharge tube (8) is equipped with shower nozzle (9) that a plurality of intervals set up;
The inner wall lower extreme of sedimentation pipe (5) is fixed wears to be equipped with drain bucket (10), the lateral wall intercommunication of drain bucket (10) is equipped with fixed pipe (11), the upper end of fixed pipe (11) is worn into sedimentation pipe (5) and is rotated and locate in hollow tube (7), the fixed cover of pipe wall of fixed pipe (11) is equipped with pump body (12).
2. The photovoltaic silicon wafer cleaning machine tank with improved alignment according to claim 1, characterized in that the deposition tube (5) is arranged in a funnel shape.
3. The fixed-row improved photovoltaic silicon wafer cleaning machine groove body according to claim 1, wherein a motor (13) is fixedly arranged at the lower end of the outer wall of the deposition tube (5), an output shaft of the motor (13) penetrates into the deposition tube (5) and is fixedly provided with a first bevel gear (14), a second bevel gear (15) is fixedly sleeved at the lower end of the outer wall of the hollow tube (7), and the first bevel gear (14) and the second bevel gear (15) are matched.
4. The improved photovoltaic silicon wafer cleaning machine tank body with the fixed row according to claim 1 is characterized in that a plurality of spray heads (9) are arranged obliquely downwards.
5. The fixed-row improved photovoltaic silicon wafer cleaning machine tank body according to claim 1, wherein a scraper (16) is fixedly arranged on the pipe wall of the liquid discharge pipe (8), and the scraper (16) is in contact fit with the upper side of the inner wall of the deposition pipe (5).
6. The fixed-row improved photovoltaic silicon wafer cleaning machine tank body according to claim 1, wherein a liquid receiving plate (17) is fixedly arranged at the lower end of the inner wall of the liquid guiding barrel (10), and the upper end of the liquid receiving plate (17) is positioned at the lower end of the interior of the deposition tube (5).
7. The fixed-row improved photovoltaic silicon wafer cleaning machine tank body according to claim 1, wherein mounting plates (18) are fixedly arranged at two ends of the upper side of the outer wall of the deposition tube (5), and the mounting plates (18) are fixedly arranged with the bottom of the tank body (1) in a threaded connection mode through connecting bolts (19).
8. The fixed-row improved photovoltaic silicon wafer cleaning machine groove body according to claim 1, wherein a guide cover (20) is sleeved on the outer wall of the hollow tube (7), the guide cover (20) is fixedly connected with the top of the transverse plate (6), and a through hole matched with the hollow tube (7) to rotate is formed in the top of the guide cover (20).
9. The photovoltaic silicon wafer cleaning machine tank with improved alignment according to claim 5, characterized in that the cross section of the scraper (16) is arranged in an inverted triangle.
10. The fixed-row improved photovoltaic silicon wafer cleaning machine tank body according to claim 1, wherein a rubber sleeve (21) is sleeved outside the end head of the spray head (9), and a filter screen (22) is fixedly embedded at the end part of the rubber sleeve (21).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202422057174.3U CN222999262U (en) | 2024-08-23 | 2024-08-23 | A photovoltaic silicon wafer cleaning machine tank with improved fixed arrangement |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202422057174.3U CN222999262U (en) | 2024-08-23 | 2024-08-23 | A photovoltaic silicon wafer cleaning machine tank with improved fixed arrangement |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN222999262U true CN222999262U (en) | 2025-06-20 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202422057174.3U Active CN222999262U (en) | 2024-08-23 | 2024-08-23 | A photovoltaic silicon wafer cleaning machine tank with improved fixed arrangement |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN222999262U (en) |
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2024
- 2024-08-23 CN CN202422057174.3U patent/CN222999262U/en active Active
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