CN221133331U - Surface cleaning device for monocrystalline silicon piece production - Google Patents
Surface cleaning device for monocrystalline silicon piece production Download PDFInfo
- Publication number
- CN221133331U CN221133331U CN202322955305.5U CN202322955305U CN221133331U CN 221133331 U CN221133331 U CN 221133331U CN 202322955305 U CN202322955305 U CN 202322955305U CN 221133331 U CN221133331 U CN 221133331U
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- China
- Prior art keywords
- fixedly connected
- driving
- monocrystalline silicon
- screw rod
- water pump
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- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 45
- 238000004140 cleaning Methods 0.000 title claims abstract description 31
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 30
- 238000011010 flushing procedure Methods 0.000 claims abstract description 12
- 238000003860 storage Methods 0.000 claims abstract description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 9
- 235000012431 wafers Nutrition 0.000 abstract description 12
- 230000000694 effects Effects 0.000 description 7
- 238000005406 washing Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000010405 clearance mechanism Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model relates to the technical field of monocrystalline silicon wafer production and discloses a surface cleaning device for monocrystalline silicon wafer production, which comprises a bottom plate, wherein the top of the bottom plate is fixedly connected with a storage plate and a support frame, the top of the storage plate is movably connected with a plurality of clamping plates through a clamping mechanism, the top of the support frame is fixedly connected with a water tank, a driving box and a water pump, the water tank, the driving box and the water pump are fixedly connected through pipelines, one side of the driving box, which is far away from the water pump, is fixedly connected with a flushing head through a pipeline, the bottom of the support frame is movably connected with an electric push rod, and the bottom of the electric push rod is fixedly connected with a cleaning brush, so that the device can clean the surface of monocrystalline silicon wafers by driving the cleaning brush through the driving mechanism while flushing by using the flushing head, and the device can clean the surfaces of monocrystalline silicon wafers better, and further the cleaning quality of the device is greatly improved.
Description
Technical Field
The utility model relates to the technical field of monocrystalline silicon wafer production, in particular to a surface cleaning device for monocrystalline silicon wafer production.
Background
Monocrystalline silicon wafers are crystals with a basically complete lattice structure, have different properties in different directions, are good semiconductor materials, and are widely used for manufacturing semiconductor devices, solar cells and the like. The surface of the monocrystalline silicon grinding piece slice is easy to be attached with more dust and adhesive in the processing process, and the usability of the silicon piece is affected if the silicon piece slice is not cleaned in time, so that the surface of the monocrystalline silicon piece slice is required to be cleaned by a cleaning device in the production process of the monocrystalline silicon piece.
For example, chinese patent No. 202020201862.1 is a surface cleaning device for monocrystalline silicon piece processing, this patent is through starting the motor in the clearance mechanism, the motor rotates and drives the fixed block and rotate with the clearance strip, monocrystalline silicon piece upper surface in the rethread standing groove is cleared up with the clearance strip contact, the clearance is accomplished the rethread and is promoted the push rod, outside making the dead lever release standing groove, drive monocrystalline silicon piece simultaneously and expose outside the standing groove, the rethread holds monocrystalline silicon piece and does not clear up the one side and take, the effectual current monocrystalline silicon piece processing clearance that has realized, need not the manual work and clear up, the cleaning efficiency improves, can not touch the surface just cleared up in the time of taking simultaneously, the clearance area is even.
But above-mentioned patent is when utilizing the clearance strip to clear up monocrystalline silicon piece to lead to monocrystalline silicon piece skew easily to can lead to monocrystalline silicon piece clearance not comprehensive enough, and then seriously influence monocrystalline silicon piece's clearance quality, and above-mentioned device is just scraped the brush through the clearance strip when clearing up in addition and is cleared up it and not is washed with the washing liquid, thereby makes the holistic clearance effect of monocrystalline silicon piece not good.
Disclosure of utility model
The utility model aims to provide a surface cleaning device for monocrystalline silicon piece production, which solves the problems in the background technology.
The embodiment of the application provides a surface cleaning device for monocrystalline silicon wafer production, which comprises a bottom plate, wherein the top of the bottom plate is fixedly connected with a storage plate and a support frame, the top of the storage plate is movably connected with a plurality of clamping plates through a clamping mechanism, the top of the support frame is fixedly connected with a water tank, a driving box and a water pump, the water tank, the driving box and the water pump are fixedly connected through pipelines, one side, far away from the water pump, of the driving box is fixedly connected with a flushing head through a pipeline, the bottom of the support frame is movably connected with an electric push rod through a driving mechanism, and the bottom of the electric push rod is fixedly connected with a cleaning brush.
Through adopting above-mentioned technical scheme for this device can utilize the washing head to wash monocrystalline silicon piece, utilize the clearance brush to align simultaneously and rotate and scrape the brush processing, thereby improved the clearance quality of this device greatly.
Optionally, the actuating mechanism is including setting up the drive disk in the drive box is inside, the surface fixedly connected with multiunit drive vane of drive disk, the inside fixedly connected with drive shaft of drive disk, the other end of drive shaft extends to the below of support frame and with electric putter fixed connection.
Through adopting above-mentioned technical scheme, utilize actuating mechanism to make this device need not to add new power supply and can realize the washing and rotate the scraping brush in the time of, and then improved the energy-conserving nature of this device greatly.
Optionally, fixture is including installing the motor at putting the thing board surface, the output of motor extends to the inner chamber of putting the thing board and fixedly connected with positive and negative lead screw, the middle-end surface fixedly connected with first conical gear of positive and negative lead screw, the equal meshing in both sides of first conical gear is connected with second conical gear, the inside fixedly connected with lead screw of second conical gear, two the equal swing joint of the positive and negative screw's of surface and positive and negative screw nut, the top fixedly connected with connecting rod of lead screw nut, the top of connecting rod extends to the outside of putting the thing board and with splint fixed connection through the spout.
Through adopting above-mentioned technical scheme for this device can be fixed monocrystalline silicon piece through fixture, thereby can avoid monocrystalline silicon piece to take place the skew when the clearance, and then make this device can fully comprehensive clearance to monocrystalline silicon piece surface.
Optionally, the surface fixedly connected with blotter of splint, the antiskid line has been seted up to the surface of blotter.
By adopting the technical scheme, the friction resistance can be increased by utilizing the anti-skid patterns, so that the clamping effect of the clamping plate can be greatly improved.
Optionally, the outer surface of the pipeline that the driving box is connected with the water pump is fixedly connected with a booster valve.
Through adopting above-mentioned technical scheme, utilize the booster valve can increase water pressure to make the drive effect of driving case better.
Optionally, the surface fixedly connected with controller of support frame, the surface fixedly connected with control switch of controller.
Through adopting above-mentioned technical scheme, utilize the controller can be more convenient to the inside electrical apparatus of this device control to the practicality of this device has been improved greatly.
Compared with the prior art, the technical scheme of the application has the following beneficial effects:
1. according to the technical scheme, the water tank, the driving box, the water pump, the driving disk, the driving blade, the driving shaft, the electric push rod, the cleaning brush and the flushing head are arranged, so that the cleaning brush can be driven by the driving mechanism to rotate and scrape the monocrystalline silicon piece while the flushing head is utilized to flush, the surface of the monocrystalline silicon piece can be cleaned better, and the cleaning quality of the device is greatly improved.
2. According to the technical scheme, the motor, the front and back screw rods, the first conical gear, the second conical gear, the screw rod nut, the connecting rod, the sliding groove and the clamping plate are arranged, so that the monocrystalline silicon piece can be fixed through the clamping mechanism, deviation of the monocrystalline silicon piece during cleaning can be avoided, and the surface of the monocrystalline silicon piece can be cleaned fully and comprehensively.
Drawings
Other features, objects and advantages of the present utility model will become more apparent upon reading of the detailed description of non-limiting embodiments, given with reference to the accompanying drawings in which:
FIG. 1 is a front view showing the whole surface cleaning apparatus for producing a silicon single crystal wafer according to the present utility model;
FIG. 2 is a schematic view showing the internal structure of a driving box of a surface cleaning device for producing monocrystalline silicon wafers;
FIG. 3 is a schematic view showing the internal structure of a part of a storage plate of a surface cleaning apparatus for producing a silicon single crystal wafer according to the present utility model;
FIG. 4 is a top view of a storage plate of a surface cleaning apparatus for producing a silicon single crystal wafer according to the present utility model.
In the figure: 1. a bottom plate; 2. a storage plate; 3. a support frame; 4. a clamping plate; 5. a water tank; 6. a drive box; 7. a water pump; 8. a flushing head; 9. an electric push rod; 10. cleaning a hairbrush; 11. a drive plate; 12. a driving blade; 13. a drive shaft; 14. a motor; 15. a positive and negative screw rod; 16. a first bevel gear; 17. a second bevel gear; 18. a screw rod; 19. a screw nut; 20. a connecting rod; 21. a chute; 22. and a controller.
Detailed Description
Referring to fig. 1-4, the present utility model provides a technical solution: the utility model provides a monocrystalline silicon piece production is with surface cleaning device, including bottom plate 1, the top fixedly connected with of bottom plate 1 puts thing board 2 and support frame 3, the top of putting thing board 2 is through fixture swing joint has a plurality of splint 4, the top fixedly connected with water tank 5 of support frame 3, drive case 6 and water pump 7, pass through pipeline fixed connection between water tank 5, drive case 6 and the water pump 7, one side that drive case 6 kept away from the water pump is through pipeline fixed connection flushing head 8, the bottom of support frame 3 is through drive mechanism swing joint has electric putter 9, electric putter 9's bottom fixedly connected with clearance brush 10.
Through adopting above-mentioned technical scheme for this device can utilize cleaning brush 10 to align to rotate to scrape the brush processing in the same time to wash monocrystalline silicon piece with rinsing head 8, thereby improved the clearance quality of this device greatly.
In the embodiment of the application, as shown in fig. 1-2, the driving mechanism comprises a driving disc 11 arranged in the driving box 6, a plurality of groups of driving blades 12 are fixedly connected to the outer surface of the driving disc 11, a driving shaft 13 is fixedly connected to the inside of the driving disc 11, and the other end of the driving shaft 13 extends to the lower part of the supporting frame 3 and is fixedly connected with the electric push rod 9.
Through adopting above-mentioned technical scheme, utilize actuating mechanism to make this device need not to add new power supply and can realize the washing and rotate the scraping brush in the time of, and then improved the energy-conserving nature of this device greatly.
In the embodiment of the application, as shown in fig. 1 and 3, the clamping mechanism comprises a motor 14 arranged on the outer surface of the object placing plate 2, the output end of the motor 14 extends to the inner cavity of the object placing plate 2 and is fixedly connected with a front and back screw rod 15, the outer surface of the middle end of the front and back screw rod 15 is fixedly connected with a first conical gear 16, two sides of the first conical gear 16 are respectively connected with a second conical gear 17 in a meshed manner, the inside of the second conical gear 17 is fixedly connected with screw rods 18, the outer surfaces of the two screw rods 18 and the front and back screw threads of the front and back screw rod 15 are respectively and movably connected with screw rod nuts 19, the top of the screw rod nuts 19 is fixedly connected with a connecting rod 20, and the top of the connecting rod 20 extends to the outside of the object placing plate 2 through a chute 21 and is fixedly connected with the clamping plate 4.
Through adopting above-mentioned technical scheme for this device can be fixed monocrystalline silicon piece through fixture, thereby can avoid monocrystalline silicon piece to take place the skew when the clearance, and then make this device can fully comprehensive clearance to monocrystalline silicon piece surface.
In the embodiment of the present application, as shown in fig. 4, a cushion pad is fixedly connected to the outer surface of the clamping plate 4, and anti-slip patterns are formed on the outer surface of the cushion pad.
By adopting the technical scheme, the friction resistance can be increased by utilizing the anti-skid lines, so that the clamping effect of the clamping plate 4 can be greatly improved.
In the embodiment of the present application, as shown in fig. 1, a pressurizing valve is fixedly connected to the outer surface of a pipe where the driving tank 6 is connected to the water pump 7.
By adopting the technical scheme, the water pressure can be increased by using the booster valve, so that the driving effect of the driving box 6 is better.
In the embodiment of the present application, as shown in fig. 1, the controller 22 is fixedly connected to the outer surface of the support frame 3, and the control switch is fixedly connected to the outer surface of the controller 22.
Through adopting above-mentioned technical scheme, utilize controller 22 can be more convenient to the inside electrical apparatus of this device control to the practicality of this device has been improved greatly.
During the use, operating personnel places monocrystalline silicon piece on putting thing board 2 earlier, then start motor 14 through controller 22, make motor 14 drive positive and negative lead screw 15 rotate, thereby make positive and negative lead screw 15 drive first bevel gear 16 rotate, when first bevel gear 16 rotates, it can drive the second bevel gear 17 of both sides under the mode of meshing and rotate, when second bevel gear 17 rotates, it can drive lead screw 18 and rotate, thereby make both sides lead screw 18 and positive and negative lead screw 15 positive and negative screw thread portion's lead screw nut 19 all move in opposite directions under the spacing effect of connecting rod 20 and spout 21, and then make lead screw nut 19 can drive splint 4 through connecting rod 4 and press from both sides tight fixed to monocrystalline silicon piece, thereby can avoid monocrystalline silicon piece to take place the skew when the clearance, and then make this device can carry out abundant comprehensive clearance to monocrystalline silicon piece surface, after monocrystalline silicon piece is fixed, make water pump 7 carry out the flushing treatment through pipeline and flushing head 8, and in the flushing process, and can drive box 6, thereby make inside blade 12 can drive the blade 12 and take place under the effect of connecting rod 20 and drive the blade 12 and make the drive shaft 10 and rotate, thereby can make the surface of the device can be rotated by the brush 13 and the surface of the drive plate is rotated, thereby can be rotated by the surface of the device is rotated, and the surface of the device is driven by the surface of the device is rotated, and is driven by the surface of the device is more is driven by the device is driven by the blade 11.
Claims (6)
1. The utility model provides a monocrystalline silicon piece production is with surface cleaning device, includes bottom plate (1), its characterized in that: the utility model discloses a cleaning brush, including bottom plate (1), supporting frame, electric putter (9) are passed through at the top fixedly connected with of bottom plate (1), thing board (2) and supporting frame (3) are put to the top fixedly connected with of bottom plate (1), a plurality of splint (4) are passed through fixture swing joint in the top of putting thing board (2), top fixedly connected with water tank (5), driving box (6) and water pump (7) of supporting frame (3), pass through pipeline fixed connection between water tank (5), driving box (6) and water pump (7), one side that the water pump was kept away from to driving box (6) is through pipeline fixedly connected with flushing head (8), electric putter (9) are passed through driving mechanism swing joint in the bottom of supporting frame (3), electric putter (9)'s bottom fixedly connected with clearance brush (10).
2. The surface cleaning apparatus for producing a silicon single crystal wafer according to claim 1, wherein: the driving mechanism comprises a driving disc (11) arranged inside the driving box (6), a plurality of groups of driving blades (12) are fixedly connected to the outer surface of the driving disc (11), a driving shaft (13) is fixedly connected to the inside of the driving disc (11), and the other end of the driving shaft (13) extends to the lower portion of the supporting frame (3) and is fixedly connected with the electric push rod (9).
3. The surface cleaning apparatus for producing a silicon single crystal wafer according to claim 1, wherein: the clamping mechanism comprises a motor (14) arranged on the outer surface of a storage plate (2), the output end of the motor (14) extends to the inner cavity of the storage plate (2) and is fixedly connected with a positive and negative screw rod (15), the outer surface of the middle end of the positive and negative screw rod (15) is fixedly connected with a first bevel gear (16), two sides of the first bevel gear (16) are respectively connected with a second bevel gear (17) in a meshed mode, a screw rod (18) is fixedly connected with the inside of the second bevel gear (17), screw rod nuts (19) are respectively and movably connected with the outer surface of the screw rod (18) and the positive and negative screw thread parts of the positive and negative screw rod (15), the top of the screw rod nuts (19) is fixedly connected with a connecting rod (20), and the top of the connecting rod (20) extends to the outer part of the storage plate (2) through a sliding groove (21) and is fixedly connected with a clamping plate (4).
4. The surface cleaning apparatus for producing a silicon single crystal wafer according to claim 1, wherein: the outer surface of the clamping plate (4) is fixedly connected with a buffer pad, and anti-skid patterns are formed on the outer surface of the buffer pad.
5. The surface cleaning apparatus for producing a silicon single crystal wafer according to claim 1, wherein: the outer surface of a pipeline connected with the driving box (6) and the water pump (7) is fixedly connected with a booster valve.
6. The surface cleaning apparatus for producing a silicon single crystal wafer according to claim 1, wherein: the outer surface of the supporting frame (3) is fixedly connected with a controller (22), and the outer surface of the controller (22) is fixedly connected with a control switch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322955305.5U CN221133331U (en) | 2023-11-02 | 2023-11-02 | Surface cleaning device for monocrystalline silicon piece production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322955305.5U CN221133331U (en) | 2023-11-02 | 2023-11-02 | Surface cleaning device for monocrystalline silicon piece production |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN221133331U true CN221133331U (en) | 2024-06-14 |
Family
ID=91430469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322955305.5U Active CN221133331U (en) | 2023-11-02 | 2023-11-02 | Surface cleaning device for monocrystalline silicon piece production |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN221133331U (en) |
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2023
- 2023-11-02 CN CN202322955305.5U patent/CN221133331U/en active Active
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