CN220680330U - Polishing device for realizing large-area polishing of optical parts - Google Patents

Polishing device for realizing large-area polishing of optical parts Download PDF

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Publication number
CN220680330U
CN220680330U CN202322270761.6U CN202322270761U CN220680330U CN 220680330 U CN220680330 U CN 220680330U CN 202322270761 U CN202322270761 U CN 202322270761U CN 220680330 U CN220680330 U CN 220680330U
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polishing
optical part
ring
optical
area
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李文强
李洋
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Beijing Trans Manufacture And Trade Co ltd
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Beijing Trans Manufacture And Trade Co ltd
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Abstract

The utility model relates to the technical field of optical part processing, and provides a polishing device for realizing large-area polishing of an optical part, which comprises: the rotary table, the positioning ring, the ring polishing space ring and the plurality of matched plates; the positioning ring is rotatably arranged on the upper side of the turntable, the ring polishing spacing ring is limited in the positioning ring, and the ring polishing spacing ring is provided with a positioning hole; the distribution discs are used for being adhered to the side wall of the optical part, and the distribution discs are arranged along the circumferential direction of the optical part and are limited in the positioning holes; the turntable is provided with a polishing surface which is used for being respectively attached to the bottom surface of the distribution plate and the surface to be processed of the bottom of the optical part. The utility model not only can enlarge the polishing area based on a plurality of matched discs in the polishing process of the optical part and realize the control of the stability of the surface shape of the optical part, but also can prevent the optical part from slightly tilting in microcosmic due to the impact in the ring polishing space ring, thereby being beneficial to ensuring the polishing surface shape and the smoothness of the optical part and further ensuring the polishing quality of the optical part.

Description

Polishing device for realizing large-area polishing of optical parts
Technical Field
The utility model relates to the technical field of optical part machining, in particular to a polishing device for realizing large-area polishing of an optical part.
Background
The optical polishing technology is a high-precision surface processing technology, and is mainly applied to the fields of optical elements, semiconductor materials, precision mechanical parts and the like, and the polishing technology mainly ensures that the surface of the optical part meets the requirements of high precision and high smoothness through the interaction of mechanical grinding and chemical reaction.
At present, a ring polishing machine is mainly adopted to directly polish small-size optical parts, when the optical parts with high precision and large size are repaired in a single piece, the stability of the optical parts in the polishing process is difficult to control due to the fact that the length of the optical parts is larger than the ratio of the width to the height of the optical parts, and the optical parts can be microscopically deformed due to the impact on a ring polishing spacer ring, so that the polishing surface shape and the polishing finish of the optical parts are difficult to control.
Disclosure of Invention
The utility model provides a polishing device for realizing large-area polishing of an optical part, which is used for solving the problem of ensuring the polishing quality of an elongated optical part at present.
The utility model provides a polishing device for realizing large-area polishing of optical parts, which comprises: the rotary table, the positioning ring, the ring polishing space ring and the plurality of matched plates;
the positioning ring is rotatably arranged on the upper side of the turntable, the ring-polishing spacing ring is limited in the positioning ring, and the ring-polishing spacing ring is provided with a positioning hole;
the distribution plate is used for being adhered to the side wall of the optical part, and a plurality of distribution plates are arranged along the circumferential direction of the optical part and are limited in the positioning holes;
the turntable is provided with a polishing surface which is used for being respectively attached to the bottom surface of the distribution plate and the surface to be processed of the bottom of the optical part.
According to the polishing device for realizing large-area polishing of the optical parts, the plurality of matched discs at least comprise a first matched disc, a second matched disc, a third matched disc and a fourth matched disc; the first matching disc is adhered to a first side wall close to the first end of the optical part, and the second matching disc is adhered to a second side wall close to the first end of the optical part;
the third matching disc is adhered to a first side wall close to the second end of the optical part, and the fourth matching disc is adhered to a second side wall close to the second end of the optical part;
the first side wall and the second side wall are opposite and are arranged in parallel.
According to the polishing device for realizing large-area polishing of the optical part, one end of the first distribution plate, which is away from the third distribution plate, and one end of the third distribution plate, which is away from the fourth distribution plate, are protruded out of the end face of the first end of the optical part;
and/or, one end of the third matching disc, which is away from the first matching disc, and one end of the fourth matching disc, which is away from the third matching disc, are both protruded out of the end face of the second end of the optical part.
According to the polishing device for realizing large-area polishing of the optical parts, which is provided by the utility model, the polishing device further comprises an optical rubber disc;
the optical cement disc is used for providing an optical cement reference surface for the matched discs and the optical parts so as to adhere the matched discs to the side walls of the optical parts.
According to the polishing device for realizing large-area polishing of the optical part, a plurality of positioning holes are formed, and the plurality of positioning holes are arranged in a central symmetry mode relative to the center of the ring polishing space ring.
According to the polishing device for realizing large-area polishing of the optical part, provided by the utility model, the polishing device further comprises a pressing block; the pressing block is used for pressing and covering the upper side of the optical part to be polished.
According to the polishing device for realizing large-area polishing of the optical part, which is provided by the utility model, the polishing device further comprises a protective adhesive tape;
the protection adhesive tape is wound on the peripheral walls of the plurality of distribution plates along the circumferential direction, and one side surface of the protection adhesive tape, which is away from the distribution plates, is contacted with the hole wall of the positioning hole.
According to the polishing device for realizing large-area polishing of the optical part, the turntable is used for rotating along the first rotating direction, the positioning ring is used for rotating along the second rotating direction, and the rotating directions corresponding to the first rotating direction and the second rotating direction are opposite.
According to the polishing device for realizing large-area polishing of the optical part, provided by the utility model, the polishing device further comprises a correction disc and a driving part;
the correcting disk is arranged on the upper side of the turntable, a correcting surface is arranged at the bottom of the correcting disk, and the correcting surface is contacted with the polishing surface;
the driving part is connected with the correction disk to drive the correction disk to rotate and drive the correction disk to adjust the position along the radial direction of the turntable.
According to the polishing device for realizing large-area polishing of the optical part, which is provided by the utility model, the surface of the optical part except the surface to be processed is provided with the protective coating.
According to the polishing device for realizing large-area polishing of the optical part, the plurality of matched discs are arranged along the circumferential direction of the optical part, so that the polishing area can be enlarged based on the plurality of matched discs in the polishing process of the optical part, the stability of the surface shape of the optical part is realized, the optical part can be prevented from slightly tilting in microcosmic due to the impact in the ring polishing spacer, the polishing surface shape and the smoothness of the optical part are ensured, and the polishing quality of the optical part is ensured.
Drawings
In order to more clearly illustrate the utility model or the technical solutions of the prior art, the following description will briefly explain the drawings used in the embodiments or the description of the prior art, and it is obvious that the drawings in the following description are some embodiments of the utility model, and other drawings can be obtained according to the drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic view of the structure of an optical component provided by the present utility model;
FIG. 2 is a schematic diagram of a polishing apparatus for realizing large-area polishing of an optical part according to the present utility model;
FIG. 3 is a second schematic view of a polishing apparatus for realizing large-area polishing of an optical part according to the present utility model;
FIG. 4 is a schematic diagram of the structure of the bonding of the optical parts to the mating disc based on the photoresist datum pair on the photoresist disc;
fig. 5 is a schematic structural view of the ring-polished spacer provided by the utility model.
Reference numerals:
100. an optical component;
1. a turntable; 2. a positioning ring; 3. ring polishing space rings; 31. positioning holes;
4. a tray is arranged; 41. a first distribution plate; 42. a second distribution plate; 43. a third distribution plate; 44. a fourth distribution plate;
5. a photoresist plate; 6. briquetting; 7. an orthotic disc.
Detailed Description
For the purpose of making the objects, technical solutions and advantages of the present utility model more apparent, the technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some embodiments of the present utility model, not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
The polishing device for realizing the large-area polishing of the optical part provided by the embodiment of the utility model is described in detail below with reference to fig. 1 to 5 by means of a specific embodiment and application scenario thereof.
As shown in fig. 1 to 3, an embodiment of the present utility model provides a polishing apparatus for realizing large-area polishing of an optical part, comprising: the rotary table 1, the positioning ring 2, the ring polishing spacing ring 3 and a plurality of matched discs 4.
The positioning ring 2 is rotatably arranged on the upper side of the turntable 1, the ring polishing spacing ring 3 is limited in the positioning ring 2, and the ring polishing spacing ring 3 is provided with a positioning hole 31.
The mating discs 4 are adhered to the side wall of the optical component 100, and the mating discs 4 are disposed along the circumferential direction of the optical component 100 and are defined in the positioning holes 31.
The turntable 1 has a polishing surface for adhering to the bottom surface of the turntable 4 and the surface to be processed of the bottom of the optical part 100, respectively.
It is understood that the optical component 100 is rectangular, and the optical component 100 may be long: width: elongated mirrors with height not less than 9:1:1. Alternatively, the optical component 100 has a length×width×height: 210 mm. Times.22 mm. Times.20 mm.
The tray 4 and the optical component 100 are made of the same material, and the tray 4 is rectangular, so that when the optical component 100 is subjected to tray forming polishing, the tray 4 is used as a component for assisting tray forming processing, and the main function of the tray forming polishing is to increase the polishing area.
As shown in fig. 1, the optical part 100 has a surface S1 to be processed, a bottom surface S3, a first side wall S2, a second side wall S4, a first end surface P1, and a second end surface P2, and the plurality of matching discs 4 may be disposed on at least two of the first side wall S2, the second side wall S4, the first end surface P1, and the second end surface P2 by adhesive. Wherein the bottom surfaces of the plurality of mating trays 4 are flush with the surface to be processed of the optical component 100 during polishing.
Because the plurality of distribution plates 4 are arranged along the circumferential direction of the optical part 100, not only the polishing area can be increased based on the plurality of distribution plates 4 to control the stability of the surface shape of the optical part 100 in the polishing process, but also the optical part 100 can be firmly limited in the positioning hole 31 based on the contact fit between the side walls of the plurality of distribution plates 4 and the hole walls of the positioning hole 31 to prevent the optical part 100 from being directly contacted with the ring polishing space ring 3.
In this way, during the polishing treatment of the surface to be processed of the optical part 100, the optical part 100 can be prevented from slightly tilting microscopically due to the impact in the ring-polished spacer 3, which is advantageous in ensuring the polished surface shape and finish of the optical part 100.
Further, the turntable 1 may be a plastic disk, and the turntable 1 may spin around its central axis under the drive of the rotation driving mechanism. The positioning ring 2 can be a marble ring, the positioning ring 2 is used for providing accommodating spaces for the optical part 100, the ring polishing spacer ring 3 and the plurality of distribution plates 4, ensuring that under the limit of the ring polishing spacer ring 3, the polishing surface respectively maintains a stable contact state with the bottom surface of the distribution plates 4 and the surface to be processed at the bottom of the optical part 100, and further realizing polishing treatment on the surface to be processed according to relative rotation between the optical part 100 and the turntable 1.
In order to ensure the polishing effect on the surface to be processed on the optical component 100, the turntable 1 may be configured to rotate in a first rotation direction, and the positioning ring 2 may be configured to rotate in a second rotation direction, where the rotation directions corresponding to the first and second rotation directions are opposite.
As is apparent from the above, the polishing apparatus according to the present utility model can not only control the stability of the surface shape of the optical part 100 by enlarging the polishing area based on the plurality of distribution plates 4 during the polishing of the optical part 100, but also prevent the optical part 100 from slightly tilting in microscopic scale due to the impact in the ring polishing spacer 3, which is advantageous for ensuring the surface shape and the finish of the polishing of the optical part 100, thereby ensuring the polishing quality of the optical part 100.
It should be noted here that, for the optical component 100 described above, the effective light-transmitting aperture of the S1 face: 200mm x 18mm (length, width direction), peak-to-valley PV < 300nm (N < 0.94 fr), peak-to-valley PV <50nm (DeltaN < 0.157 fr) in any 18mm x 50mm region.
Because the optical part 100 and the matching disc 4 are adhered together, residual stress exists in the optical part 100, a specific surface shape requirement is needed in the single-piece finishing process, and the surface shape of the optical part 100 in a required area after the matching disc 4 is added is finished to lambda/20.
In some embodiments, as shown in fig. 2, 3, and 4, the plurality of trays 4 includes at least a first tray 41, a second tray 42, a third tray 43, and a fourth tray 44; the first mating disc 41 is adhered to the first sidewall S2 near the first end of the optical component 100, and the second mating disc 42 is adhered to the second sidewall S4 near the first end of the optical component 100.
The third mating disc 43 is affixed to the first sidewall S2 near the second end of the optical component 100 and the fourth mating disc 44 is affixed to the second sidewall S4 near the second end of the optical component 100. The first sidewall S2 and the second sidewall S4 are opposite and are disposed in parallel.
In practical application, the optical disc 4 and the optical part 100 may be bonded based on the optical adhesive reference surface on the optical adhesive disc 5, and the operation thereof is as follows:
first, according to the arrangement of fig. 4, the bottom surface S3 of the optical component 100, the top surfaces of the first distribution plate 41, the second distribution plate 42, the third distribution plate 43 and the fourth distribution plate 44 are respectively adhered to the photoresist reference surface on the photoresist plate 5 until the aperture is seen, so as to realize the photoresist on the photoresist reference surface of the optical component 100 and each distribution plate 4.
Wherein the distance between the optical component 100 and the opposite end surfaces of each of the mating plates 4 is kept about 0.2 mm.
Then, glue is injected into the four gaps, so that the glue is prevented from being smeared on the S1 surface of the optical part 100, and the optical part is kept stand for a period of time until the glue is solidified, so that a bonding assembly is formed. Wherein, the adhesive can be 417 adhesive.
Finally, the adhesive assembly is subjected to a disc feeding operation.
In this way, the optical cement disc 5 of the present embodiment is used for providing the optical cement reference surface for the matching disc 4 and the optical component 100, so as to adhere the plurality of matching discs 4 to the side wall of the optical component 100.
Further, in order to prevent the first end face P1 and the second end face P2 of the optical part 100 from touching the ring polishing spacer ring 3 during polishing, an end of the first mating disc 41 facing away from the third mating disc 43 and an end of the third mating disc 43 facing away from the fourth mating disc 44 may both protrude from an end face of the first end of the optical part 100, or an end of the third mating disc 43 facing away from the first mating disc 41 and an end of the fourth mating disc 44 facing away from the third mating disc 43 may both protrude from an end face of the second end of the optical part 100.
In some examples, the end of the first mating disc 41 facing away from the third mating disc 43 and the end of the third mating disc 43 facing away from the fourth mating disc 44 are flush, and the distance protruding from the first end face P1 may be set to 2-3mm.
Accordingly, the end of the third mating disk 43 facing away from the first mating disk 41 and the end of the fourth mating disk 44 facing away from the third mating disk 43, and the distance protruding from the second end face P2 may be set to 2-3mm.
In some embodiments, as shown in fig. 5, a plurality of positioning holes 31 are provided on the ring-shaped polishing spacer 3, and the plurality of positioning holes 31 are arranged in a central symmetry with respect to the center of the ring-shaped polishing spacer 3.
It will be appreciated that in the case where a plurality of positioning holes 31 are provided, a plurality of positioning holes 31 and the plurality of adhesive assemblies are provided in one-to-one correspondence.
By arranging the plurality of positioning holes 31 to be arranged in a central symmetry manner relative to the center of the ring-cast spacer ring 3, the plurality of adhesive assemblies can be ensured to be uniformly distributed along the circumferential direction relative to the center of the ring-cast spacer ring 3, so that the plurality of adhesive assemblies and the ring-cast spacer ring 3 can be stably embedded together, the processing efficiency of the optical part 100 is ensured, the processing quality is ensured,
as shown in fig. 5, two positioning holes 31 are formed in the ring-shaped polished spacer ring 3, and the shape of each positioning hole 31 is matched with that of the bonding assembly. Alternatively, the positioning hole 31 may be provided in a rectangular shape.
In some embodiments, as shown in fig. 3, the polishing apparatus further comprises a press block 6; the pressing block 6 is used to press against the upper side of the optical part 100 to be polished.
It is understood that by providing the pressing block 6 on the upper side of the optical part 100, the force between the optical part 100 and the polished surface of the turntable 1 can be increased, so that the stability of the placement of the optical part 100 in the positioning hole 31 can be ensured, and the polishing time period of the optical part 100 can be reduced.
In some examples, the compacts 6 may be provided in a cylindrical shape.
In some examples, the press blocks 6 may be provided in plurality, and the plurality of press blocks 6 are arranged in order along the length direction of the optical part 100.
In some embodiments, the polishing apparatus further comprises a protective tape; the protective tape is circumferentially wound around the peripheral walls of the plurality of distribution plates 4, and one side surface of the protective tape, which is away from the distribution plates 4, is in contact with the wall of the positioning hole 31.
It will be appreciated that as the optical component 100 and the plurality of mating discs 4 are bonded, a bonded assembly is formed. The protective tape is wound on the side wall of the bonding assembly along the circumferential direction, and the protective tape can be wound at least one circle to form protection on the bonding assembly based on the protective tape.
The protective adhesive tape can be a black adhesive tape according to the color, and can be a PVC electrical adhesive tape according to the material.
In some embodiments, as shown in fig. 2 and 3, the polishing apparatus further comprises an orthotic disk 7 and a drive member; the correcting disk 7 is arranged on the upper side of the turntable 1, the bottom of the correcting disk 7 is provided with a correcting surface, and the correcting surface is contacted with the polishing surface.
The driving part is connected with the correcting disk 7 to drive the correcting disk 7 to rotate and drive the correcting disk 7 to adjust the position along the radial direction of the turntable 1.
It is understood that the driving part includes a linear moving part and a rotating part, the linear moving part and the rotating part are connected to drive the rotating part to move in the radial direction of the turntable 1, and the output end of the rotating part is connected to the center of the orthotic disc 7 to drive the orthotic disc 7 to spin about its central axis. Thus, the rotation of the driving orthotic disk 7 is realized based on the cooperation of the linear movement portion and the rotation portion, and the position adjustment of the driving orthotic disk 7 is performed in the radial direction of the turntable 1.
In practical application, the surface shape of the polished surface on the turntable 1 can be corrected by the correction disk 7, and the surface shape of the surface to be processed at the bottom of the optical part 100 can be corrected by the polished surface.
In some embodiments, the surfaces of the optical component 100 other than the surface to be machined are provided with a protective coating. Wherein the protective coating is not illustrated in fig. 1.
It is understood that the protective coating is in particular a layer of protective paint; in the process of polishing the optical part 100, other surfaces of the optical part 100 except for the surface to be processed can be protected by the protective coating, not only can the optical part 100 be prevented from being scratched in the polishing process, but also the optical part 100 can be prevented from being directly contacted with polishing liquid (cerium oxide), so that the cerium oxide is adhered to the surface of the optical part 100 and is difficult to remove.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solution of the present utility model, and are not limiting; while the utility model has been described in detail with reference to the foregoing embodiments, it will be appreciated by those skilled in the art that variations may be made in the techniques described in the foregoing embodiments, or equivalents may be substituted for elements thereof; such modifications and substitutions do not depart from the spirit and scope of the technical solutions of the embodiments of the present utility model.

Claims (10)

1. A polishing apparatus for realizing large-area polishing of an optical part, comprising: the rotary table, the positioning ring, the ring polishing space ring and the plurality of matched plates;
the positioning ring is rotatably arranged on the upper side of the turntable, the ring-polishing spacing ring is limited in the positioning ring, and the ring-polishing spacing ring is provided with a positioning hole;
the distribution plate is used for being adhered to the side wall of the optical part, and a plurality of distribution plates are arranged along the circumferential direction of the optical part and are limited in the positioning holes;
the turntable is provided with a polishing surface which is used for being respectively attached to the bottom surface of the distribution plate and the surface to be processed of the bottom of the optical part.
2. The polishing apparatus for realizing large-area polishing of an optical part according to claim 1, wherein the plurality of mating trays includes at least a first mating tray, a second mating tray, a third mating tray, and a fourth mating tray;
the first matching disc is adhered to a first side wall close to the first end of the optical part, and the second matching disc is adhered to a second side wall close to the first end of the optical part;
the third matching disc is adhered to a first side wall close to the second end of the optical part, and the fourth matching disc is adhered to a second side wall close to the second end of the optical part;
the first side wall and the second side wall are opposite and are arranged in parallel.
3. The polishing apparatus for realizing large-area polishing of an optical part according to claim 2, wherein an end of the first mating disk facing away from the third mating disk and an end of the third mating disk facing away from the fourth mating disk both protrude from an end face of the first end of the optical part;
and/or, one end of the third matching disc, which is away from the first matching disc, and one end of the fourth matching disc, which is away from the third matching disc, are both protruded out of the end face of the second end of the optical part.
4. The polishing apparatus for realizing large-area polishing of an optical part according to claim 1, wherein the polishing apparatus further comprises an optical cement disc;
the optical cement disc is used for providing an optical cement reference surface for the matched discs and the optical parts so as to adhere the matched discs to the side walls of the optical parts.
5. The polishing apparatus for realizing large-area polishing of an optical part according to any one of claims 1 to 4, wherein a plurality of the positioning holes are provided, and a plurality of the positioning holes are arranged in central symmetry with respect to the center of the ring polishing spacer.
6. The polishing apparatus for realizing large-area polishing of an optical part according to any one of claims 1 to 4, further comprising a pressing block;
the pressing block is used for pressing and covering the upper side of the optical part to be polished.
7. The polishing apparatus for realizing large-area polishing of an optical part according to any one of claims 1 to 4, further comprising a protective tape;
the protection adhesive tape is wound on the peripheral walls of the plurality of distribution plates along the circumferential direction, and one side surface of the protection adhesive tape, which is away from the distribution plates, is contacted with the hole wall of the positioning hole.
8. The polishing apparatus for large-area polishing of optical parts according to any one of claims 1 to 4, wherein the turntable is configured to rotate in a first rotation direction, the retainer ring is configured to rotate in a second rotation direction, and the rotation directions of the first rotation direction and the second rotation direction are opposite to each other.
9. The polishing apparatus for realizing large-area polishing of an optical part according to any one of claims 1 to 4, further comprising an orthotic disc and a driving member;
the correcting disk is arranged on the upper side of the turntable, a correcting surface is arranged at the bottom of the correcting disk, and the correcting surface is contacted with the polishing surface;
the driving part is connected with the correction disk to drive the correction disk to rotate and drive the correction disk to adjust the position along the radial direction of the turntable.
10. The polishing apparatus for realizing large-area polishing of an optical component according to any one of claims 1 to 4, wherein the surface of the optical component other than the surface to be processed is provided with a protective coating.
CN202322270761.6U 2023-08-23 2023-08-23 Polishing device for realizing large-area polishing of optical parts Active CN220680330U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202322270761.6U CN220680330U (en) 2023-08-23 2023-08-23 Polishing device for realizing large-area polishing of optical parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202322270761.6U CN220680330U (en) 2023-08-23 2023-08-23 Polishing device for realizing large-area polishing of optical parts

Publications (1)

Publication Number Publication Date
CN220680330U true CN220680330U (en) 2024-03-29

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202322270761.6U Active CN220680330U (en) 2023-08-23 2023-08-23 Polishing device for realizing large-area polishing of optical parts

Country Status (1)

Country Link
CN (1) CN220680330U (en)

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