CN220239428U - Cleaning device for gallium oxide substrate - Google Patents
Cleaning device for gallium oxide substrate Download PDFInfo
- Publication number
- CN220239428U CN220239428U CN202321620848.5U CN202321620848U CN220239428U CN 220239428 U CN220239428 U CN 220239428U CN 202321620848 U CN202321620848 U CN 202321620848U CN 220239428 U CN220239428 U CN 220239428U
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- Prior art keywords
- gallium oxide
- clamping
- oxide substrate
- cleaning
- cleaning device
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- 239000000758 substrate Substances 0.000 title claims abstract description 74
- 238000004140 cleaning Methods 0.000 title claims abstract description 73
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 229910001195 gallium oxide Inorganic materials 0.000 title claims abstract description 69
- 239000007921 spray Substances 0.000 claims abstract description 22
- 239000007788 liquid Substances 0.000 claims description 24
- 239000002699 waste material Substances 0.000 claims description 20
- 238000005406 washing Methods 0.000 claims description 11
- 238000010992 reflux Methods 0.000 claims description 3
- 241001233242 Lontra Species 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model relates to the technical field of gallium oxide substrate processing and discloses a cleaning device for a gallium oxide substrate. According to the gallium oxide substrate cleaning device, the clamping faces with V-shaped structures on the first clamping seat and the second clamping seat in the clamping mechanism are utilized, the frame of the gallium oxide substrate can be clamped in a frame clamping mode, on one hand, the gallium oxide substrate cleaning device has good butt clamping stability, on the other hand, the face of the gallium oxide substrate is not covered, the cleaning comprehensiveness of the gallium oxide substrate is ensured, and the gallium oxide substrate can be driven to horizontally rotate by utilizing the combination of the rotating motor and the rotating disc, so that the gallium oxide substrate is cleaned more comprehensively by the cleaning spray pipe.
Description
Technical Field
The utility model relates to the technical field of gallium oxide substrate processing, in particular to a cleaning device for a gallium oxide substrate.
Background
The gallium oxide substrate is a common semiconductor material, has a plurality of unique characteristics, has very wide application fields, and is widely applied to manufacturing high-performance semiconductor devices such as LEDs, lasers, solar cells, photodetectors and the like; in addition, gallium oxide substrates are widely used for manufacturing high-frequency electronic devices, microwave devices, and the like, and gallium oxide substrates are one of semiconductor materials, and in the production and processing process, a cleaning process is required to be performed to remove oil molecules, dust, and the like adhered to the surfaces of the gallium oxide substrates, for example, as shown in the prior patent technology: through searching, china patent net discloses a semiconductor substrate cleaning device (publication No. CN 213529815U), and the device is convenient to detach and mount the substrate by moving a clamp through a chute, and then uses the spraying cleaning of an atomization nozzle to thoroughly clean the substrate and avoid damage.
However, there are some disadvantages to the substrate cleaning apparatuses adopted in the above-mentioned published patent and the existing market: the clamp is used for clamping the semiconductor substrate, and then the atomizing nozzle is used for spraying and cleaning, so that the clamp is used for clamping part of the semiconductor substrate in the clamping process, the semiconductor substrate can be firmly clamped, however, part of the semiconductor substrate cannot be effectively cleaned under the clamping of the clamp, the cleaning of the substrate is relatively incomplete, and the cleaning quality is low. To this end, a cleaning apparatus for gallium oxide substrates is provided by those skilled in the art to solve the problems set forth in the background art described above.
Disclosure of Invention
The utility model mainly aims to provide a cleaning device for a gallium oxide substrate, which can effectively solve the problem that the existing gallium oxide substrate in the background art is not completely cleaned during cleaning.
In order to achieve the above purpose, the technical scheme adopted by the utility model is as follows: the utility model provides a belt cleaning device for gallium oxide substrate, includes washs the case, the front and back side of the box of washs the case is all installed and is opened and close the door, and washs the bottom of the case and install the grid board, the otter board mid-mounting of grid board has the rotating electrical machines, the rotary disk is installed to the output of rotating electrical machines, and the face mid-mounting of rotary disk has fixture mechanism, the inside multiunit washing spray tube that is provided with of arranging along the round platform circumference of rotary disk of the box of washs, the waste liquid case is installed to the bottom of the case of washing.
As still further aspects of the utility model: the clamp mechanism comprises a butt-clamping rail arranged in the middle of the surface of the rotating disc, a butt-clamping screw rod is connected to the inside of a guide rail of the butt-clamping rail in a rotating mode, a fixed supporting table is fixedly arranged in the middle of the guide rail of the butt-clamping rail, a first clamping seat is arranged above a rack of the fixed supporting table, two groups of movable sliding tables are symmetrically sleeved at the shaft rod ends of the butt-clamping screw rod, and two groups of second clamping seats are symmetrically arranged above the rack of the movable sliding tables.
As still further aspects of the utility model: the output end of one end of the opposite clamping screw rod is provided with a handle, the opposite clamping screw rod is bounded by a central line, the two sides of the central line are respectively provided with a positive screw tooth and a negative screw tooth which are symmetrically arranged with each other, and the opposite clamping screw rod is symmetrically sleeved with the two groups of movable sliding tables through the positive screw tooth and the negative screw tooth.
As still further aspects of the utility model: the clamping surface ends of the first clamping seat and the second clamping seat are of V-shaped structures.
As still further aspects of the utility model: the cleaning spray pipes are annularly and symmetrically arranged relative to the circle center of the rotating disk, and the pipeline ends of the cleaning spray pipes are provided with a plurality of groups of cleaning spray heads pointing to the rotating disk.
As still further aspects of the utility model: the waste liquid box comprises a backflow box body arranged at the bottom of the cleaning box body, a first drawing frame and a second drawing frame are sequentially inserted into the upper half part of the backflow box body from top to bottom, a first filter plate is arranged in the frame of the first drawing frame, a second filter plate is arranged in the frame of the second drawing frame, and a drain valve is communicated with the bottom of the backflow box body.
As still further aspects of the utility model: the inner wall of the reflux box body is sequentially provided with a first guide clamping block and a second guide clamping block which are matched with the first drawing frame and the second drawing frame from top to bottom.
Compared with the prior art, the utility model has the following beneficial effects:
1. according to the gallium oxide substrate cleaning device, the clamping surfaces with V-shaped structures on the first clamping seat and the second clamping seat in the clamping mechanism are utilized, the frame of the gallium oxide substrate can be clamped in a frame clamping mode, on one hand, the gallium oxide substrate cleaning device has good butt clamping stability, stability in the gallium oxide substrate cleaning process can be ensured, on the other hand, the gallium oxide substrate surface can not be covered, the comprehensiveness of gallium oxide substrate cleaning is ensured, and in addition, the gallium oxide substrate can be driven to horizontally rotate by utilizing the combination of the rotating motor and the rotating disk while cleaning, so that the gallium oxide substrate can be cleaned more comprehensively by the cleaning spray pipe.
2. In the process of cleaning the gallium oxide substrate by using the cleaning device, the cleaning impurities in the waste liquid can be filtered and isolated by filtering and refluxing the cleaning waste liquid by using the waste liquid tank, so that the cleaning impurities are convenient for workers to directly treat, and the subsequent treatment intensity is reduced.
Drawings
Fig. 1 is a schematic structural view of a cleaning apparatus for gallium oxide substrate according to the present utility model;
fig. 2 is a schematic view showing the structure of the inside of a cleaning apparatus for gallium oxide substrate according to the present utility model;
FIG. 3 is a schematic view showing the structure of a jig mechanism in a cleaning apparatus for gallium oxide substrates according to the utility model;
fig. 4 is a schematic structural view of a waste liquid tank in a cleaning apparatus for gallium oxide substrate according to the utility model.
In the figure: 1. a cleaning box; 2. a waste liquid tank; 21. a reflow box; 22. a first drawing frame; 23. a second drawing frame; 24. a first filter plate; 25. a second filter plate; 26. a drain valve; 3. opening and closing a door; 4. cleaning the spray pipe; 5. cleaning the spray head; 6. a grid plate; 7. a rotating disc; 8. a rotating electric machine; 9. a clamp mechanism; 91. a butt-clamping rail; 92. a handle; 93. a butt-clamping screw rod; 94. a fixed support table; 95. a first clamping seat; 96. a movable slipway; 97. and a second clamping seat.
Detailed Description
The utility model is further described in connection with the following detailed description, in order to make the technical means, the creation characteristics, the achievement of the purpose and the effect of the utility model easy to understand.
In the description of the present utility model, it should be noted that the directions or positional relationships indicated by the terms "upper", "lower", "inner", "outer", "front", "rear", "both ends", "one end", "the other end", etc. are based on the directions or positional relationships shown in the drawings, are merely for convenience of describing the present utility model and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a specific direction, be configured and operated in the specific direction, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and the like, are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present utility model, it should be noted that, unless explicitly specified and limited otherwise, the terms "mounted," "provided," "connected," and the like are to be construed broadly, and may be fixedly connected, detachably connected, or integrally connected, for example; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between two elements. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
Referring to fig. 1-4, a cleaning device for gallium oxide substrate comprises a cleaning box 1, opening and closing doors 3 are respectively installed at front and rear sides of a box body of the cleaning box 1, a grid plate 6 is installed at bottom end of the cleaning box 1, a rotating motor 8 is installed at middle part of a screen plate of the grid plate 6, a rotating disk 7 is installed at output end of the rotating motor 8, a clamp mechanism 9 is installed at middle part of a plate surface of the rotating disk 7, the clamp mechanism 9 comprises a butt clamping rail 91 installed at middle part of the plate surface of the rotating disk 7, a butt clamping screw rod 93 is rotatably connected inside a guide rail of the butt clamping rail 91, a fixed supporting table 94 is fixedly installed at middle part of the guide rail of the butt clamping rail 91, a first clamping seat 95 is installed above a rack of the fixed supporting table 94, two groups of movable sliding tables 96 are symmetrically sleeved at shaft rod ends of the butt clamping screw rod 93, two groups of second clamping seats 97 are symmetrically installed above racks of the two groups of movable sliding tables 96, the handle 92 is arranged at the output end of one end of the opposite clamping screw rod 93, the opposite clamping screw rod 93 is bounded by a central line, the two sides of the central line are respectively provided with positive and negative screw teeth which are symmetrically arranged, the opposite clamping screw rod 93 is symmetrically sleeved with two groups of movable sliding tables 96 through the positive and negative screw teeth, the clamping surface ends of the first clamping seat 95 and the second clamping seat 97 are of V-shaped structures, when the cleaning device is used for cleaning gallium oxide substrates, the opening and closing door 3 is opened, the bottom frame of the gallium oxide substrates to be cleaned is placed on the first clamping seat 95, the handle 92 is screwed to drive the opposite clamping screw rod 93 to rotate, the positive and negative screw teeth which are symmetrically arranged are used for converting rotary thrust into horizontal thrust to push the two groups of movable sliding tables 96 to symmetrically slide along the opposite clamping rail 91, the two groups of second clamping seats 97 are oppositely clamped on the side frames of the gallium oxide liners in a triangular clamping manner to fix the gallium oxide, on one hand, the gallium oxide substrate cleaning device has good clamping stability, can ensure the stability of the gallium oxide substrate in the cleaning process, and on the other hand, the gallium oxide substrate surface is not covered, so that the cleaning comprehensiveness of the gallium oxide substrate is ensured.
The inside round platform circumference of rotary disk 7 of box of wasing box 1 arranges and is provided with multiunit washing spray tube 4, multiunit washing spray tube 4 is annular symmetrical arrangement for the centre of a circle of rotary disk 7, and multiunit washing spray tube 4's pipeline end has all been seted up the multiunit and has been washed shower nozzle 5 that point to rotary disk 7, after finishing to the gallium oxide substrate is fixed, close and open and close door 3, then carry multiunit washing liquid to washing spray tube 4 with the washing liquid through water pump equipment, under the directional spraying of washing shower nozzle 5, carry out the cleaning to the gallium oxide substrate on the fixture mechanism 9, and when wasing, rotating electrical machines 8 synchronous operation, drive rotary disk 7 and rotate, promote the gallium oxide substrate horizontal direction rotation on the fixture mechanism 9, make multiunit washing spray tube 4 carry out comprehensive cleaning to the gallium oxide substrate all the positions, ensure abluent comprehensiveness.
The waste liquid tank 2 is installed to the bottom of the tank body of wasing tank 1, waste liquid tank 2 is including installing the backward flow box 21 at wasing tank 1 bottom of the tank body, backward flow box 21's box upper half has been inserted in proper order from last to closing first pull frame 22, second pull frame 23, first filter plate 24 is installed to the frame internally mounted of first pull frame 22, second filter plate 25 is installed to the frame internally mounted of second pull frame 23, the bottom of the tank end intercommunication of backward flow box 21 has drain valve 26, backward flow box 21's box inner wall from last to having set gradually first guide block with first pull frame 22 and second pull frame 23 looks adaptation down, the second guide block, in utilizing belt cleaning device to wash the gallium oxide substrate in-process, wash the waste liquid that produces through grid plate 6 drain to waste liquid tank 2 in, keep apart through the filtration of first filter plate 24, the impurity in the second filter plate 25, to reduce the follow-up staff to wasing waste liquid's treatment intensity, and the filtration keep apart impurity, the staff still can take out first filter plate 22, the second filter plate 23, the whole filter plate is moved to the filter plate 25, the high efficiency is carried out to the filter plate 25, the whole is convenient operation mode, the whole is easy to handle.
The working principle of the utility model is as follows: when the gallium oxide substrate is cleaned by utilizing the cleaning device, the opening and closing door 3 is opened, the bottom frame of the gallium oxide substrate to be cleaned is placed on the first clamping seat 95, then the handle 92 is screwed, the opposite clamping screw rods 93 are driven to rotate, the rotary thrust is converted into horizontal thrust by the opposite wire teeth which are symmetrically arranged with each other, the two groups of movable sliding tables 96 are pushed to symmetrically slide along the direction of the opposite clamping rail 91, the two groups of second clamping seats 97 are clamped on the two side frames of the gallium oxide liner in a triangular clamping mode, gallium oxide is firmly fixed, the gallium oxide substrate plate surfaces are not covered, the comprehensiveness of gallium oxide substrate cleaning is ensured, further after the gallium oxide substrate is completely fixed, the opening and closing door 3 is closed, then cleaning liquid is conveyed into the multiple groups of cleaning spray pipes 4 through the water pump equipment, the gallium oxide substrate on the clamp mechanism 9 is subjected to cleaning work under the directional spraying of the cleaning spray heads 5, and simultaneously the rotary motor 8 is driven to rotate, the gallium oxide substrate on the clamp mechanism 9 is pushed to rotate in the horizontal direction, the clamp spray pipes 4 are clamped on the two side frames of the two groups of the gallium oxide substrate, the faces of the spray pipes are enabled to cover the gallium oxide substrate, the multiple groups of the spray pipes 4 to clean the gallium oxide substrate plates in the directions, the directions of the multiple groups of the gallium oxide substrate plates respectively, the gallium oxide substrate plates are subjected to clean the first waste liquid and the waste liquid is subjected to the second waste liquid to clean the waste liquid and the waste liquid to the waste liquid from the filter cleaning liquid cleaning through the filter plate and the filter plate cleaning device.
The foregoing has shown and described the basic principles and main features of the present utility model and the advantages of the present utility model. It will be understood by those skilled in the art that the present utility model is not limited to the embodiments described above, and that the above embodiments and descriptions are merely illustrative of the principles of the present utility model, and various changes and modifications may be made without departing from the spirit and scope of the utility model, which is defined in the appended claims. The scope of the utility model is defined by the appended claims and equivalents thereof.
Claims (7)
1. The utility model provides a belt cleaning device for gallium oxide substrate, includes washs case (1), its characterized in that, the front and back side of the box of washs case (1) is all installed and is opened and close door (3), and washs the bottom of the case end of case (1) and install grid board (6), the otter board mid-mounting of grid board (6) has rotating electrical machines (8), rotating disk (7) are installed to the output of rotating electrical machines (8), and the face mid-mounting of rotating disk (7) has fixture mechanism (9), the round platform circumference of rotating disk (7) is arranged along inside the box of washs case (1) and is provided with multiunit washing spray tube (4), waste liquid case (2) are installed to the bottom of the case of washs case (1).
2. The cleaning device for the gallium oxide substrate according to claim 1, wherein the clamp mechanism (9) comprises a butt clamping rail (91) arranged in the middle of the surface of the rotating disc (7), a butt clamping screw rod (93) is rotatably connected in the guide rail of the butt clamping rail (91), a fixed supporting table (94) is fixedly arranged in the middle of the guide rail of the butt clamping rail (91), a first clamping seat (95) is arranged above a rack of the fixed supporting table (94), two groups of movable sliding tables (96) are symmetrically sleeved at shaft rod ends of the butt clamping screw rod (93), and two groups of second clamping seats (97) are symmetrically arranged above racks of the movable sliding tables (96).
3. The cleaning device for gallium oxide substrates according to claim 2, wherein a handle (92) is arranged at one end output end of the opposite clamping screw rod (93), the opposite clamping screw rod (93) is bounded by a central line, two sides of the central line are respectively provided with positive and negative screw teeth which are symmetrically arranged with each other, and the opposite clamping screw rod (93) is symmetrically sleeved with two groups of movable sliding tables (96) through the positive and negative screw teeth.
4. A cleaning apparatus for gallium oxide substrates according to claim 2, wherein the clamping face ends of the first clamping seat (95) and the second clamping seat (97) are both V-shaped structures.
5. A cleaning device for gallium oxide substrates according to claim 1, wherein a plurality of groups of cleaning spray pipes (4) are arranged in an annular symmetrical manner relative to the center of the rotating disk (7), and the pipe ends of the plurality of groups of cleaning spray pipes (4) are provided with a plurality of groups of cleaning spray heads (5) pointing to the rotating disk (7).
6. The cleaning device for the gallium oxide substrate according to claim 1, wherein the waste liquid tank (2) comprises a backflow tank body (21) arranged at the bottom of the cleaning tank body (1), a first drawing frame (22) and a second drawing frame (23) are sequentially inserted into the upper half part of the backflow tank body (21) from top to bottom, a first filter plate (24) is arranged in the frame of the first drawing frame (22), a second filter plate (25) is arranged in the frame of the second drawing frame (23), and a drain valve (26) is communicated with the bottom of the backflow tank body (21).
7. The cleaning device for gallium oxide substrates according to claim 6, wherein the inner wall of the reflux box (21) is provided with a first guide clamping block and a second guide clamping block which are matched with the first drawing frame (22) and the second drawing frame (23) in sequence from top to bottom.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321620848.5U CN220239428U (en) | 2023-06-26 | 2023-06-26 | Cleaning device for gallium oxide substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321620848.5U CN220239428U (en) | 2023-06-26 | 2023-06-26 | Cleaning device for gallium oxide substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220239428U true CN220239428U (en) | 2023-12-26 |
Family
ID=89233579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321620848.5U Active CN220239428U (en) | 2023-06-26 | 2023-06-26 | Cleaning device for gallium oxide substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220239428U (en) |
-
2023
- 2023-06-26 CN CN202321620848.5U patent/CN220239428U/en active Active
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