CN219886241U - Adjusting mechanism and phosphorus bubble device for semiconductor material - Google Patents
Adjusting mechanism and phosphorus bubble device for semiconductor material Download PDFInfo
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- CN219886241U CN219886241U CN202321011367.4U CN202321011367U CN219886241U CN 219886241 U CN219886241 U CN 219886241U CN 202321011367 U CN202321011367 U CN 202321011367U CN 219886241 U CN219886241 U CN 219886241U
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- phosphorus bubble
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- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 98
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 93
- 239000011574 phosphorus Substances 0.000 title claims abstract description 93
- 239000000463 material Substances 0.000 title claims abstract description 18
- 239000004065 semiconductor Substances 0.000 title claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 13
- 230000000149 penetrating effect Effects 0.000 claims abstract description 12
- 230000005540 biological transmission Effects 0.000 claims abstract description 6
- 238000002347 injection Methods 0.000 claims abstract description 6
- 239000007924 injection Substances 0.000 claims abstract description 6
- 238000003825 pressing Methods 0.000 claims description 27
- 238000007789 sealing Methods 0.000 claims description 13
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 5
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 5
- 241001330002 Bambuseae Species 0.000 claims description 5
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 5
- 239000011425 bamboo Substances 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 claims 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 abstract description 25
- 239000013078 crystal Substances 0.000 abstract description 17
- 230000015572 biosynthetic process Effects 0.000 abstract description 14
- 238000003786 synthesis reaction Methods 0.000 abstract description 14
- 239000000155 melt Substances 0.000 abstract description 13
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 230000002194 synthesizing effect Effects 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 4
- 238000001308 synthesis method Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- DMFGNRRURHSENX-UHFFFAOYSA-N beryllium copper Chemical compound [Be].[Cu] DMFGNRRURHSENX-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000002109 crystal growth method Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052950 sphalerite Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
The utility model relates to the technical field of synthesis of semiconductor indium phosphide single crystal furnaces, in particular to an adjusting mechanism and a phosphorus bubble device for semiconductor materials, which comprises a rotary telescopic component, a rotary telescopic component and a rotary component, wherein the rotary telescopic component comprises a shell, an adjusting cylinder and a rotary cylinder; and, a control assembly including a limiter; the transmission assembly comprises a motor body and a linkage tube; the phosphorus injection assembly comprises a phosphorus bubble rod arranged on one end face of the adjusting cylinder, phosphorus bubbles fixedly arranged on the outer wall of the phosphorus bubble rod and phosphorus bubble pipes penetrating through the inner wall of the phosphorus bubbles; the rotary telescopic component is controlled by the control component to respectively realize rotation and telescopic operation, so that the method is simple, convenient, time-saving and labor-saving, reduces equipment cost, optimizes synthesis control flow, and indirectly improves the production efficiency of the indium phosphide single crystal furnace; the adjusting mechanism is arranged to drive the phosphorus bubble to move to the upper part of the melt, the phosphorus bubble rod is extended to enable the phosphorus bubble to be inserted into the melt for full contact reaction, and finally the phosphorus bubble is retracted to enable the phosphorus bubble to be separated, so that the process of synthesizing indium phosphide polycrystal is completed.
Description
Technical Field
The utility model relates to the technical field of synthesis of semiconductor indium phosphide single crystal furnaces, in particular to an adjusting mechanism and a phosphorus bubble device for semiconductor materials.
Background
Indium phosphide is a chemical substance, is a dark gray crystal with asphalt luster, and is a III-V compound semiconductor material with a sphalerite structure and excellent performance. The InP material is mainly prepared by the steps of generating polycrystalline InP through the combination reaction of indium and phosphorus, preparing single crystal material through a crystal growth process, and finally finishing a wafer processing process. The synthesis and growth process of indium phosphide has high difficulty, the synthesis pressure is generally 2-4MPa, and the temperature is about 1100 ℃. Currently, the synthesis methods of polycrystalline InP used by large laboratories and companies around the world are different from single crystal growth methods.
The phosphorus bubble of the indium phosphide single crystal furnace is suitable for a phosphorus injection synthesis method. Compared with other synthesis methods, the method has the advantages of high purity of the indium phosphide material, less impurity compensation in iron-doped, sulfur-doped and undoped materials, higher mobility of the processed indium phosphide wafer and excellent electrical parameters. The indium phosphide polycrystal is synthesized in the indium phosphide single crystal furnace by adopting a phosphorus injection method, and the specific working flow is as follows: firstly, high-purity red phosphorus is filled into phosphorus bubbles, the phosphorus bubbles are horizontally rotated to the upper part of a melt by utilizing a phosphorus bubble lifting device in an indium phosphide single crystal furnace, then are inserted into the melt for indium phosphide synthesis, rise after synthesis is finished, and finally horizontally rotate to be removed from the upper part of the melt. After the synthesis is completed, an indium phosphide crystal growth process is performed.
Therefore, the technical problem to be solved is that in the synthesis of indium phosphide polycrystal, the phosphorus bubble is required to be lifted and rotated in the single crystal furnace, and the high-purity red phosphorus and the melt are fully contacted and reacted and timely separated, so that the synthesis process of indium phosphide in the single crystal furnace is realized; meanwhile, the existing phosphorus-containing bubble device mainly uses two motors to rotate and lift respectively, so that the problems of high cost and complex control flow exist, and the indium phosphide synthesis efficiency is easily affected by mistakes.
Disclosure of Invention
This section is intended to outline some aspects of embodiments of the utility model and to briefly introduce some preferred embodiments. Some simplifications or omissions may be made in this section as well as in the description of the utility model and in the title of the utility model, which may not be used to limit the scope of the utility model.
The utility model is provided in view of the problems of high cost and complex control flow existing in the existing phosphorus-containing bubble device which mainly uses two motors to rotate and lift respectively.
In order to solve the technical problems, the utility model provides the following technical scheme: an adjusting mechanism comprises a rotary telescopic component, a rotary mechanism and a rotary mechanism, wherein the rotary telescopic component comprises a shell, an adjusting cylinder movably arranged in the shell and a rotary cylinder rotatably arranged in the adjusting cylinder; and the control assembly comprises a limiting piece which is movably penetrated through the inner wall of the shell.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the limiting piece comprises a limiting cylinder, a first pressing block, a second pressing block, a limiting strip and a telescopic block, wherein the first pressing block is arranged on the inner wall of the limiting cylinder in a sliding mode, the second pressing block is arranged on the inner wall of the first pressing block in a sliding mode, the limiting strip is arranged on one end face of the second pressing block, and the telescopic block is arranged on one end face of the limiting strip.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the first briquetting outer wall and inner wall are equipped with first fixture block and second fixture block respectively, spacing section of thick bamboo inner wall is equipped with first draw-in groove, second briquetting outer wall is opened there is the second draw-in groove, first fixture block with first draw-in groove slip block is connected, the second fixture block with second draw-in groove slip block is connected.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the second briquetting one end face is equipped with the wedge slider, spacing one end face is opened there is the through-hole, spacing keep away from wedge slider one end face is provided with first elastic component, first elastic component runs through the through-hole and is connected to the wedge slider.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the limiting cylinder outer wall penetrates through and is provided with a limiting hole, the wedge-shaped sliding block is M-shaped and is mutually clamped with the limiting hole, the telescopic block penetrates through and is arranged on the limiting cylinder inner wall in a sliding mode, and a second elastic piece is arranged between the telescopic block and the limiting cylinder inner wall.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the shell inner wall is penetrated and is provided with a sliding rail, the limiting cylinder is arranged on the inner wall of the sliding rail in a sliding manner, and the outer wall of the adjusting cylinder is respectively penetrated and provided with a sliding groove and a first positioning hole.
As a preferred embodiment of the adjusting mechanism according to the utility model, wherein: the outer wall of the rotary cylinder is respectively provided with a second positioning hole and positioning rings distributed in an annular array, two limiting parts are arranged in total, the first limiting part penetrates through the sliding rail and the sliding groove respectively, and the second limiting part penetrates through the first positioning hole and the positioning rings respectively.
The utility model has the beneficial effects that: the rotary telescopic component is controlled by the control component to respectively realize rotation and telescopic operation, so that the device is simple and convenient, time and labor are saved, the equipment cost is reduced, the synthesis control flow is optimized, and the production efficiency of the indium phosphide single crystal furnace is indirectly improved.
In view of the problem that the phosphorus bubbles are required to be fully contacted and separated with the melt in the single crystal furnace in the synthesis of the indium phosphide polycrystal, another technical scheme of the utility model is provided.
In order to solve the technical problems, the utility model also provides the following technical scheme: the phosphorus bubble device for the semiconductor material comprises an adjusting mechanism and a transmission assembly, wherein the transmission assembly comprises a motor body and a linkage pipe arranged at the output end of the motor body; and the phosphorus injection assembly comprises a phosphorus bubble rod arranged on one end face of the adjusting cylinder, phosphorus bubbles fixedly arranged on the outer wall of the phosphorus bubble rod and phosphorus bubble pipes penetrating through the inner wall of the phosphorus bubbles.
As a preferred embodiment of the phosphorus bubble device for semiconductor material according to the present utility model, wherein: the phosphorus bubble and the phosphorus bubble tube are hollow cylinders in the interior and are communicated with each other, the phosphorus bubble and the phosphorus bubble tube are made of high-purity quartz, and one end of the linkage tube is connected with the adjusting cylinder.
As a preferred embodiment of the phosphorus bubble device for semiconductor material according to the present utility model, wherein: the phosphorus bubble pole outer wall slip cap is equipped with the closing plate, can freely slide and rotate between closing plate and the phosphorus bubble pole, the closing plate with sealing connection between the phosphorus bubble pole.
The utility model has the following beneficial effects: the adjusting mechanism is arranged to drive the phosphorus bubble to move to the upper part of the melt, the phosphorus bubble rod is extended to enable the phosphorus bubble to be inserted into the melt for full contact reaction, and finally the phosphorus bubble is retracted to enable the phosphorus bubble to be separated, so that the process of synthesizing indium phosphide polycrystal is completed.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present utility model, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are only some embodiments of the present utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art. Wherein:
FIG. 1 is a schematic view of the external structure of the adjusting mechanism of the present utility model.
Fig. 2 is a schematic view of the internal structure of the adjusting mechanism of the present utility model.
Fig. 3 is a schematic structural view of a limiting member according to the present utility model.
Fig. 4 is a schematic structural view of the adjusting mechanism and the bubble device for semiconductor materials according to the present utility model.
Detailed Description
In order that the above-recited objects, features and advantages of the present utility model will become more readily apparent, a more particular description of the utility model will be rendered by reference to specific embodiments thereof which are illustrated in the appended drawings.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present utility model, but the present utility model may be practiced in other ways other than those described herein, and persons skilled in the art will readily appreciate that the present utility model is not limited to the specific embodiments disclosed below.
Further, reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic can be included in at least one implementation of the utility model. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments.
Example 1
Referring to fig. 1 to 3, a first embodiment of the present utility model provides a fixed anti-drop mechanism, which includes a rotary retraction assembly 100 and a control assembly 200, so as to implement retraction and rotation functions and free switching of the two, respectively.
Specifically, the adjusting mechanism comprises a rotary telescopic assembly 100, a rotary telescopic assembly and a control mechanism, wherein the rotary telescopic assembly comprises a shell 101, an adjusting cylinder 102 movably arranged in the shell 101 and a rotary cylinder 103 rotatably arranged in the adjusting cylinder 102; and the control assembly 200 comprises a limiting piece 201 movably penetrating through the inner wall of the shell 101.
Wherein, the inner wall of the casing 101 is provided with a sliding rail 101a in a penetrating way, the limiting cylinder 201a is arranged on the inner wall of the sliding rail 101a in a sliding way, the outer wall of the adjusting cylinder 102 is provided with a sliding groove 102a and a first positioning hole 102b in a penetrating way, the outer wall of the rotating cylinder 103 is provided with a second positioning hole 103a and positioning rings 103b distributed in an annular array way, the number of limiting parts 201 is two, the first limiting parts 201 penetrate through the sliding rail 101a and the sliding groove 102a respectively, and the second limiting parts 201 penetrate through the first positioning hole 102b and the positioning rings 103b respectively.
Preferably, the limiting piece 201 comprises a limiting cylinder 201a, the limiting cylinder 201a is a novel telescopic rod in the prior art, the telescopic and extension can be realized, the first limiting piece 201 penetrates through the sliding rail 101a and the sliding groove 102a and is fixedly connected with the rotating cylinder 103, the rotating cylinder 103 is fixedly mounted on a fixed object, and the second limiting piece 201 is not fixedly connected with the positioning ring 103 b; the number of the positioning rings 103b is 5 on the outer wall of the rotary cylinder 103 in an array manner, and 12 round holes are formed in each positioning ring 103 on the outer wall of the rotary cylinder 103 in an annular array manner; the chute 102a is spiral.
In summary, when in use, the first limiting piece 201 is extended to penetrate through the sliding groove 102a and the sliding rail 101a and slide therein, the second limiting piece 201 is contracted to prevent the second limiting piece from penetrating through the positioning ring 103b, at this time, the rotating cylinder 103 is fixed, when the adjusting cylinder 102 receives external force to rotate, the limiting of the first limiting piece 201 is received, and when the whole adjusting cylinder 102 rotates around the spiral sliding groove 102a, the whole adjusting cylinder moves downwards to realize the telescopic movement function; when the first limiting piece 201 is contracted so as not to contact with the sliding groove 102a and the sliding rail 101a, the second limiting piece 201 extends and penetrates through the first positioning hole 102b and the positioning ring 103b at the same time, at this time, the rotary cylinder 103 and the adjusting cylinder 102 are matched and blocked, and the whole adjusting cylinder 102 can rotate in the shell 101, so that the rotating function is realized.
Example 2
Referring to fig. 1 to 3, in order to provide a second embodiment of the present utility model, the present embodiment provides a specific implementation of the limiting cylinder 201 based on the previous embodiment, and the limiting cylinder 201 in embodiment 1 may be replaced, so that the adjustment of the telescopic rotation is simpler and faster.
Specifically, the limiting member 201 includes a limiting cylinder 201a, a first pressing block 201b slidably disposed on an inner wall of the limiting cylinder 201a, a second pressing block 201c slidably disposed on an inner wall of the first pressing block 201b, a limiting bar 201d disposed on an end surface of the second pressing block 201c, and a telescopic block 201e disposed on an end surface of the limiting bar 201 d.
The outer wall and the inner wall of the first pressing block 201b are respectively provided with a first clamping block 201b-1 and a second clamping block 201b-2, the inner wall of the limiting cylinder 201a is provided with a first clamping groove 201a-1, the outer wall of the second pressing block 201c is provided with a second clamping groove 201c-1, the first clamping block 201b-1 is connected with the first clamping groove 201a-1 in a sliding clamping manner, the second clamping block 201b-2 is connected with the second clamping groove 201c-1 in a sliding clamping manner, one end face of the second pressing block 201c is provided with a wedge-shaped sliding block 201c-2, one end face of the limiting strip 201d is provided with a through hole 201d-1, one end face of the limiting strip 201d, far away from the wedge-shaped sliding block 201c-2, is provided with a first elastic piece 201d-2, and the first elastic piece 201d-2 penetrates through the through hole 201d-1 and is connected to the wedge-shaped sliding block 201c-2.
Wherein, the outer wall of the limiting cylinder 201a is provided with a limiting hole 201a-2 in a penetrating way, the wedge-shaped sliding block 201c-2 is M-shaped and is mutually clamped with the limiting hole 201a-2, the telescopic block 201e is arranged on the inner wall of the limiting cylinder 201a in a sliding penetrating way, and a second elastic piece 201e-1 is arranged between the telescopic block 201e and the inner wall of the limiting cylinder 201 a.
Preferably, the first elastic member 201d-2 and the second elastic member 201d-2 are both compression springs, the through hole 201d-1 is square and matched with the wedge-shaped sliding block 201c-2, the outer wall of the limiting cylinder 201a is provided with a limiting square hole, the limiting strip 201d is an M-shaped elastic metal strip which is made of beryllium copper alloy to improve the elasticity, the limiting strip 201d is obliquely arranged, and one end of the limiting strip 201d can slide along the inner wall of the limiting cylinder 201a and can be clamped with the limiting square hole.
In summary, when in use, the first pressing block 201b is pushed first, meanwhile, because the second clamping block 201b-2 and the second clamping groove 201c-1 are mutually clamped, the second pressing block 201c is driven to synchronously move simultaneously, at this moment, the first pressing block 201b contacts the limit bar 201d first, pushes the limit bar 201d to slide along the inner wall of the limit cylinder 201a and can be clamped and fixed with the limit square hole, at this moment, the telescopic block 201e simultaneously receives the thrust of the limit bar 201d to start moving, and the telescopic block 201e stretches out of the limit cylinder 201a; when the telescopic block 201e is required to retract, only the second pressing block 201c is required to be pushed independently, at this time, the first pressing block 201b is not moved, the wedge-shaped sliding block 201c-2 at the tail end of the second pressing block 201c slides along the through hole 201d-1, the through hole 201d-1 slides obliquely along the inclined plane of the wedge-shaped sliding block 201c-2, so that the whole limiting strip 201d slides towards the inside of the limiting cylinder 201a, the limiting strip 201d is separated from the clamping fixation of the limiting square hole and is released, and under the elasticity of the first elastic piece 201d-2 and the second elastic piece 201e-1, the first pressing block 201b, the second pressing block 201c and the telescopic block 201e are pushed to be restored to be original, and the releasing of limiting is realized, so that the switching of rotary telescopic is faster and more convenient.
Example 3
Referring to fig. 1 to 4, in a third embodiment of the present utility model, a phosphorus bubble device for semiconductor materials is provided, and an adjusting mechanism is provided to drive a phosphorus bubble to rotate and move to above a melt, and a phosphorus bubble rod is extended to enable the phosphorus bubble to be inserted into the melt for full contact reaction, and finally retracted to enable the phosphorus bubble to be separated, so as to complete the process of synthesizing indium phosphide polycrystal.
Specifically, the phosphorus bubble device for the semiconductor material comprises an adjusting mechanism and a transmission assembly 300, wherein the transmission assembly comprises a motor body 301 and a linkage pipe 302 arranged at the output end of the motor body 301; and the phosphorus injection assembly 400 comprises a phosphorus bubble rod 401 arranged on one end face of the adjusting cylinder 102, phosphorus bubbles 403 fixedly arranged on the outer wall of the phosphorus bubble rod 401 and phosphorus bubble pipes 404 penetrating through the inner wall of the phosphorus bubbles 403.
Wherein, the phosphorus bubble 403 and the phosphorus bubble tube 404 are hollow cylinders and are communicated with each other, the phosphorus bubble 403 and the phosphorus bubble tube 404 are made of high-purity quartz, and one end of the linkage tube 302 is connected with the adjusting cylinder 102; the outer wall of the phosphorus bubble bar 401 is sleeved with a sealing plate 402 in a sliding manner, the sealing plate 402 and the phosphorus bubble bar 401 can slide and rotate freely, and the sealing plate 402 is connected with the phosphorus bubble bar 401 in a sealing manner.
Preferably, the phosphorus bubble rod 401, the phosphorus bubble 403 and the phosphorus bubble tube 404 are made of high-purity quartz so as to adapt to the high-temperature environment in the single crystal furnace, the phosphorus bubble rod 401 and the sealing plate 402 are in sealing connection, and the sealing plate 402 is in sealing and fixed connection above the cover plate of the single crystal furnace.
In summary, when the motor 301 rotates to drive the linkage tube 302 to rotate in use, the switching of the two functions of expansion and rotation is realized through the adjusting mechanism, so as to drive the phosphorus bubble rod 102 connected with the adjusting cylinder 102 to perform corresponding expansion and selection; after the high-purity red phosphorus is loaded in the phosphorus bubble 403, the adjusting mechanism is positioned in the rotating functional area, the phosphorus bubble 403 is controlled to move above the melt of the single crystal furnace by rotating the phosphorus bubble rod 401, the phosphorus bubble 403 is driven to stretch and retract by changing the adjusting mechanism to the stretching functional area, the red phosphorus is injected into the indium melt by the phosphorus bubble pipe 404 after heating, the red phosphorus is used for synthesizing indium phosphide polycrystal, and after synthesis, the functional area is switched to control the shrinkage separation and removal of the phosphorus bubble 403 and the melt by controlling the stretching rotation of the phosphorus bubble rod 401.
It should be noted that the above embodiments are only for illustrating the technical solution of the present utility model and not for limiting the same, and although the present utility model has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solution of the present utility model may be modified or substituted without departing from the spirit and scope of the technical solution of the present utility model, which is intended to be covered in the scope of the claims of the present utility model.
Claims (10)
1. An adjustment mechanism, characterized in that: comprising the steps of (a) a step of,
the rotary telescopic assembly (100) comprises a shell (101), an adjusting cylinder (102) movably arranged in the shell (101) and a rotary cylinder (103) rotatably arranged in the adjusting cylinder (102); the method comprises the steps of,
the control assembly (200) comprises a limiting piece (201) which is movably penetrated through the inner wall of the shell (101).
2. The adjustment mechanism of claim 1, wherein: the limiting piece (201) comprises a limiting cylinder (201 a), a first pressing block (201 b) arranged on the inner wall of the limiting cylinder (201 a) in a sliding mode, a second pressing block (201 c) arranged on the inner wall of the first pressing block (201 b) in a sliding mode, a limiting strip (201 d) arranged on one end face of the second pressing block (201 c) and a telescopic block (201 e) arranged on one end face of the limiting strip (201 d).
3. The adjustment mechanism of claim 2, wherein: the outer wall and the inner wall of the first pressing block (201 b) are respectively provided with a first clamping block (201 b-1) and a second clamping block (201 b-2), the inner wall of the limiting cylinder (201 a) is provided with a first clamping groove (201 a-1), the outer wall of the second pressing block (201 c) is provided with a second clamping groove (201 c-1), the first clamping block (201 b-1) is connected with the first clamping groove (201 a-1) in a sliding clamping mode, and the second clamping block (201 b-2) is connected with the second clamping groove (201 c-1) in a sliding clamping mode.
4. An adjustment mechanism according to claim 2 or 3, wherein: the second briquetting (201 c) one end face is equipped with wedge slider (201 c-2), limit strip (201 d) one end face is opened has through-hole (201 d-1), limit strip (201 d) keep away from wedge slider (201 c-2) one end face is provided with first elastic component (201 d-2), first elastic component (201 d-2) run through-hole (201 d-1) and be connected to wedge slider (201 c-2).
5. The adjustment mechanism of claim 4, wherein: the utility model discloses a spacing section of thick bamboo (201 a), spacing section of thick bamboo (201 a) outer wall runs through and has seted up spacing hole (201 a-2), wedge slider (201 c-2) be M shape and with spacing hole (201 a-2) block each other, flexible piece (201 e) slip runs through and locates spacing section of thick bamboo (201 a) inner wall, flexible piece (201 e) with be equipped with second elastic component (201 e-1) between spacing section of thick bamboo (201 a) inner wall.
6. An adjustment mechanism according to claim 2 or 5, wherein: the inner wall of the shell (101) is provided with a sliding rail (101 a) in a penetrating mode, the limiting cylinder (201 a) is arranged on the inner wall of the sliding rail (101 a) in a sliding mode, and the outer wall of the adjusting cylinder (102) is provided with a sliding groove (102 a) and a first positioning hole (102 b) in a penetrating mode.
7. The adjustment mechanism of claim 6, wherein: the outer wall of the rotary cylinder (103) is respectively provided with a second positioning hole (103 a) and positioning rings (103 b) distributed in an annular array, two limiting pieces (201) are arranged in total, a first limiting piece (201) penetrates through the sliding rail (101 a) and the sliding groove (102 a) respectively, and a second limiting piece (201) penetrates through the first positioning hole (102 b) and the positioning rings (103 b) respectively.
8. A phosphorus bubble device for semiconductor materials, characterized by: comprising an adjusting mechanism as claimed in any one of claims 1 to 7, and,
the transmission assembly (300) comprises a motor body (301) and a linkage pipe (302) arranged at the output end of the motor body (301); the method comprises the steps of,
the phosphorus injection assembly (400) comprises a phosphorus bubble rod (401) arranged on one end face of the adjusting cylinder (102), phosphorus bubbles (403) fixedly arranged on the outer wall of the phosphorus bubble rod (401) and phosphorus bubble pipes (404) penetrating through the inner wall of the phosphorus bubbles (403).
9. The phosphorous bubble apparatus for semiconductor materials as recited in claim 8, wherein: the phosphorus bubble (403) and the phosphorus bubble tube (404) are hollow cylinders, the two are communicated with each other, the phosphorus bubble (403) and the phosphorus bubble tube (404) are made of high-purity quartz, and one end of the linkage tube (302) is connected with the adjusting cylinder (102).
10. A phosphorus bubble device for semiconductor material as claimed in claim 8 or 9, wherein: the outer wall of the phosphorus bubble rod (401) is sleeved with a sealing plate (402) in a sliding mode, the sealing plate (402) and the phosphorus bubble rod (401) can slide and rotate freely, and the sealing plate (402) is connected with the phosphorus bubble rod (401) in a sealing mode.
Priority Applications (1)
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CN202321011367.4U CN219886241U (en) | 2023-04-28 | 2023-04-28 | Adjusting mechanism and phosphorus bubble device for semiconductor material |
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CN202321011367.4U CN219886241U (en) | 2023-04-28 | 2023-04-28 | Adjusting mechanism and phosphorus bubble device for semiconductor material |
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