CN218743506U - Rotary cleaning machine for Micro-LED substrate - Google Patents

Rotary cleaning machine for Micro-LED substrate Download PDF

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CN218743506U
CN218743506U CN202223098330.8U CN202223098330U CN218743506U CN 218743506 U CN218743506 U CN 218743506U CN 202223098330 U CN202223098330 U CN 202223098330U CN 218743506 U CN218743506 U CN 218743506U
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swing arm
fixed
micro
bucket
barrel
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袁亚鸿
李素华
钟立华
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Jiangsu Fulat Semiconductor Equipment Co ltd
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Jiangsu Fulate Automation Equipment Co ltd
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Abstract

The utility model discloses a rotatory cleaning machine of Micro-LED base plate, including casing, outer bucket, interior bucket, swing arm, roating seat and spray tube, outer bucket is fixed in the casing, and interior bucket and outer coaxial arranging of bucket, and outer bucket can be in outer vertical up-and-down motion in the bucket, and the roating seat rotates in interior bucket, and the swing arm is fixed in outer bucket one side, and the spray tube is fixed in the swing arm. When the base plate is cleaned, the shutter is lifted to close the feed inlet of the shell, so that cleaning is carried out in a closed cavity, the cleaning liquid is prevented from splashing, in addition, when cleaning is carried out, the inner barrel is lifted, and the liquid sprayed on the base plate can be reduced to splash out of the outer barrel.

Description

一种Micro-LED基板的旋转清洗机A spin cleaning machine for Micro-LED substrates

技术领域:Technical field:

本实用新型涉及一种Micro-LED基板的旋转清洗机。The utility model relates to a rotary cleaning machine for Micro-LED substrates.

背景技术:Background technique:

玻璃基板清洗是Micro LED液晶玻璃制程中重复使用频率最高的步骤,在每一道制程步骤之前都必须将玻璃基板表面清洗干净,以去除污染物,避免原生氧化物薄膜之生成,现有的Micro-LED基板的清洗方式主要包括三种,一种是超声波浸泡清洗,即将基板浸泡在清洗药液中,然后配合超声波对基板进行清洗。一种是旋转喷淋清洗,即将基板置于一个支撑座上,支撑座旋转,通过高压喷淋对支撑座上的基板进行清洗。还有一种就是传送清洗,基板置于传动辊上,在传送过程中,通过高压喷淋清洗液实现对基板的清洗。Glass substrate cleaning is the most frequently used step in the Micro LED liquid crystal glass manufacturing process. Before each process step, the surface of the glass substrate must be cleaned to remove pollutants and avoid the formation of native oxide films. The existing Micro- There are three main cleaning methods for LED substrates. One is ultrasonic immersion cleaning, that is, immersing the substrate in cleaning liquid, and then cleaning the substrate with ultrasonic waves. One is rotary spray cleaning, that is, the substrate is placed on a support base, the support base rotates, and the substrate on the support base is cleaned by high-pressure spraying. Another type is conveying cleaning. The substrate is placed on the transmission roller. During the conveying process, the substrate is cleaned by spraying cleaning liquid under high pressure.

在采用旋转喷淋清洗时,由于基板是处于转动状态,喷淋在基板上的药液会四处飞溅,现有的旋转喷淋清洗机为克服该缺陷普遍都是直接在基板外罩一个防护罩,该结构使用效果十分不理想,因此本申请提供一种全新结构的旋转清洗机,用以解决现有技术存在的不足。When using rotary spray cleaning, since the substrate is in a rotating state, the liquid medicine sprayed on the substrate will splash everywhere. In order to overcome this defect, the existing rotary spray cleaning machines generally directly cover the substrate with a protective cover. The use effect of this structure is very unsatisfactory, so the application provides a rotary cleaning machine with a new structure to solve the shortcomings of the prior art.

发明内容:Invention content:

本实用新型是为了解决上述现有技术存在的问题而提供一种Micro-LED基板的旋转清洗机。The utility model provides a rotary cleaning machine for Micro-LED substrates in order to solve the above-mentioned problems in the prior art.

本实用新型所采用的技术方案有:The technical scheme adopted in the utility model has:

一种Micro-LED基板的旋转清洗机,包括机壳、外桶、内桶、摆臂、旋转座和喷管,所述外桶固定于机壳内,内桶与外桶同轴布置,且外桶可在外桶内竖直上下运动,旋转座转动于内桶内,摆臂固定于外桶一侧,喷管固定于摆臂上。A rotary cleaning machine for Micro-LED substrates, including a casing, an outer barrel, an inner barrel, a swing arm, a rotating seat and a spray pipe, the outer barrel is fixed in the casing, the inner barrel and the outer barrel are coaxially arranged, and the outer barrel It can vertically move up and down in the outer barrel, the swivel seat rotates in the inner barrel, the swing arm is fixed on one side of the outer barrel, and the spray pipe is fixed on the swing arm.

进一步地,所述外桶包括外桶体、挡桶、吸风罩和电机座,所述外桶体和挡桶均为上下均开口的圆桶,挡桶插接于外桶体内,且挡桶与外桶体之间形成空腔,挡桶的上端口壁与外桶体的上端口壁固定,挡桶的底端面高于外桶体的底端面,电机座固定于外桶体下端并将外桶体的下端封闭,在外桶体的外壁上设有吸风槽,吸风罩固定于外桶体外壁上,且吸风槽置于吸风罩内,在电机座上固定用于驱动旋转座转动的电机。Further, the outer barrel includes an outer barrel body, a retaining barrel, a suction hood and a motor seat, the outer barrel body and the retaining barrel are both round barrels with upper and lower openings, the retaining barrel is inserted into the outer barrel, and the shielding A cavity is formed between the barrel and the outer barrel body, the upper port wall of the retaining barrel is fixed to the upper port wall of the outer barrel body, the bottom end surface of the retaining barrel is higher than the bottom end surface of the outer barrel body, the motor seat is fixed on the lower end of the outer barrel body and The lower end of the outer barrel is closed, a suction groove is arranged on the outer wall of the outer barrel, the suction hood is fixed on the outer wall of the outer barrel, and the suction groove is placed in the suction hood, fixed on the motor base for driving A motor that rotates the swivel base.

进一步地,所述外桶的上端面固定有刮板,刮板与内桶的外壁相贴合。Further, a scraper is fixed on the upper surface of the outer barrel, and the scraper is attached to the outer wall of the inner barrel.

进一步地,所述内桶包括内桶体和挡盖和挡圈,所述挡盖固定连接在内桶体的上端面,且挡盖与一气缸的气缸轴相连,挡圈固定在挡盖上,挡圈的内径小于挡盖的内径。Further, the inner barrel includes an inner barrel body, a cover and a retaining ring, the retaining cover is fixedly connected to the upper end surface of the inner barrel, and the retaining cover is connected with the cylinder shaft of a cylinder, the retaining ring is fixed on the retaining cover, and the retaining ring The inner diameter is smaller than the inner diameter of the cover.

进一步地,在机壳的内腔中且位于外桶的一侧设有限位台,内桶下移使挡盖抵触在限位台上。Further, a limiting platform is provided in the inner cavity of the casing and on one side of the outer tub, and the inner tub moves down to make the blocking cover collide with the limiting platform.

进一步地,所述旋转座包括轴套、骨架和限位座,所述骨架与轴套固定连接,八个限位座两两为一组均匀固定在骨架的上端面上。Further, the rotating seat includes a shaft sleeve, a skeleton and a limiting seat, the skeleton is fixedly connected with the shaft sleeve, and eight limiting seats are evenly fixed on the upper end surface of the skeleton in groups of two.

进一步地,所述限位座包括支撑座体和配重块,所述支撑座体上设有直角支撑槽,配重块固定在支撑座体的外壁面上。Further, the limit seat includes a support base and a counterweight, the support base is provided with a right-angle support groove, and the counterweight is fixed on the outer wall of the support base.

进一步地,所述配重块的顶端面上设置一个引入台,引入台的内壁面为向下倾斜的斜面结构。Further, an introduction platform is provided on the top end surface of the counterweight, and the inner wall surface of the introduction platform is a slope structure inclined downward.

进一步地,所述摆臂设置在一个可升降和旋转的的传动机构上,所述传动机构包括摆臂电机、摆臂气缸、滑轨和滑块,所述滑块滑动连接在滑轨上,摆臂电机固定连接在滑块上,摆臂电机的电机轴与摆臂固定连接,摆臂气缸驱动滑块在滑轨上滑动。Further, the swing arm is set on a lifting and rotating transmission mechanism, the transmission mechanism includes a swing arm motor, a swing arm cylinder, a slide rail and a slide block, and the slide block is slidably connected to the slide rail, The swing arm motor is fixedly connected on the slide block, the motor shaft of the swing arm motor is fixedly connected with the swing arm, and the swing arm cylinder drives the slide block to slide on the slide rail.

进一步地,所述机壳上设有透明观察窗和进料口,在进料口的一侧设有一升降的挡门。Further, the casing is provided with a transparent observation window and a feeding port, and a liftable door is provided on one side of the feeding port.

本实用新型具有如下有益效果:The utility model has the following beneficial effects:

1)在基板清洗时,挡门升起将机壳的进料口关闭,使得清洗在一个封闭的腔体内进行,避免清洗液溅出,另外,清洗时,内桶升起,可以减少喷淋在基板上的液体溅出外桶外;1) When the substrate is cleaned, the door is raised to close the feed port of the casing, so that the cleaning is carried out in a closed cavity to avoid splashing of the cleaning liquid. In addition, the inner barrel is raised during cleaning, which can reduce the spraying time. The liquid on the substrate splashes out of the outer barrel;

2)在外桶上设置吸风罩,清洗液在高压喷淋清洗过程中,会产生刺鼻异味,通过在吸风罩内通过负压,将清洗过程中的异味抽走,减少车间的异味。另外外桶中外桶体与挡桶之间形成独特的结构,吸风罩接入负压后,喷淋过程中的药液不会从吸风槽被吸走,结构设计巧妙,紧凑合理,使用效果更好。2) Install a suction hood on the outer barrel. During the high-pressure spray cleaning process, the cleaning liquid will produce pungent odors. By passing negative pressure in the suction hood, the odors during the cleaning process will be sucked away to reduce the odor in the workshop. In addition, a unique structure is formed between the inner and outer barrels and the retaining barrel in the outer barrel. After the suction hood is connected to the negative pressure, the liquid medicine in the spraying process will not be sucked away from the suction groove. The structure design is ingenious, compact and reasonable. Better results.

附图说明:Description of drawings:

图 1 为旋转清洗机的结构图。Figure 1 is a structural diagram of a spin washer.

图 2 为旋转清洗机的结构图。Figure 2 is a structural diagram of a spin washer.

图 3 为旋转清洗机的内部结构图。Figure 3 is a diagram of the internal structure of the spin washer.

图 4 为旋转清洗机内部剖视图。Figure 4 is a sectional view of the interior of the spin washer.

图 5 为外桶的结构图。Figure 5 is a structural diagram of the outer barrel.

图 6 为内桶的结构图。Figure 6 is a structural diagram of the inner barrel.

图 7 为旋转座的结构图。Figure 7 is a structural diagram of the swivel seat.

图 8 为限位座的结构图。Figure 8 is the structural diagram of the limit seat.

图 9 为摆臂的安装结构图。Figure 9 is the installation structure diagram of the swing arm.

具体实施方式:Detailed ways:

下面结合附图对本实用新型作进一步的说明。Below in conjunction with accompanying drawing, the utility model is further described.

如图1至图4,本实用新型一种Micro-LED基板的旋转清洗机,包括机壳41、外桶42、内桶43、摆臂44、旋转座45和喷管,外桶42固定于机壳41内,内桶43与外桶42同轴布置,且外桶42可在外桶42内竖直上下运动,旋转座45转动于内桶43内,摆臂44设于外桶42一侧,喷管固定于摆臂44上。As shown in Figures 1 to 4, the utility model is a rotary cleaning machine for Micro-LED substrates, including a casing 41, an outer barrel 42, an inner barrel 43, a swing arm 44, a rotating seat 45 and a nozzle, and the outer barrel 42 is fixed on the machine. In the shell 41, the inner barrel 43 and the outer barrel 42 are coaxially arranged, and the outer barrel 42 can move vertically up and down in the outer barrel 42, the swivel seat 45 rotates in the inner barrel 43, the swing arm 44 is arranged on one side of the outer barrel 42, and the spray pipe Fixed on the swing arm 44.

外桶42包括外桶体421、挡桶422、吸风罩423和电机座424,外桶体421和挡桶422均为上下均开口的圆桶,挡桶422插接于外桶体421内,且挡桶422与外桶体421之间形成空腔,挡桶422的上端口壁与外桶体421的上端口壁固定,挡桶422的底端面高于外桶体421的底端面,电机座424固定于外桶体421下端并将外桶体421的下端封闭,在外桶体421的外壁上设有吸风槽,吸风罩423固定于外桶体421外壁上,且吸风槽置于吸风罩423内。The outer barrel 42 includes an outer barrel body 421, a retaining barrel 422, a suction cover 423, and a motor seat 424. The outer barrel body 421 and the retaining barrel 422 are all round barrels with upper and lower openings, and the retaining barrel 422 is plugged into the outer barrel body 421. , and a cavity is formed between the blocking barrel 422 and the outer barrel body 421, the upper port wall of the blocking barrel 422 is fixed to the upper port wall of the outer barrel body 421, and the bottom end surface of the blocking barrel 422 is higher than the bottom end surface of the outer barrel body 421, The motor seat 424 is fixed on the lower end of the outer barrel body 421 and the lower end of the outer barrel body 421 is closed, and the outer wall of the outer barrel body 421 is provided with a suction groove, and the suction cover 423 is fixed on the outer wall of the outer barrel body 421, and the air suction groove Placed in the suction hood 423.

如图5,电机座424包括底板4241和安装座4242,安装座4242与底板4241固定连接,在安装座4242上设有电机安装腔4243,驱动旋转座45旋转的电机固定在该电机安装腔4243内。底板4241与外桶体421的底面固定连接,并将外桶体421的底面开口封闭,在底板4241上设有排液孔4244。As shown in Figure 5, the motor seat 424 includes a base plate 4241 and a mounting base 4242, the mounting base 4242 is fixedly connected to the base plate 4241, a motor mounting cavity 4243 is provided on the mounting base 4242, and the motor that drives the rotating base 45 to rotate is fixed in the motor mounting cavity 4243 Inside. The bottom plate 4241 is fixedly connected with the bottom surface of the outer barrel body 421 , and closes the opening of the bottom surface of the outer barrel body 421 , and a drain hole 4244 is provided on the bottom plate 4241 .

如图6,内桶43包括内桶体431、挡盖432和挡圈433,挡圈433和挡盖432上下分层固定在内桶体431的上端面上,且挡盖432与一气缸的气缸轴相连。气缸驱动内桶43在外桶42内竖直上下运动,挡圈433固定在挡盖432上,挡圈433的内径小于挡盖432的内径。在机壳41的内腔中且位于外桶42的一侧设有限位台410,限位台410限制内桶43向下运动的最大位移。As shown in Figure 6, the inner barrel 43 includes an inner barrel body 431, a cover 432 and a retaining ring 433, the retaining ring 433 and the retaining cover 432 are fixed on the upper surface of the inner barrel body 431 in layers, and the retaining cover 432 is connected to the cylinder shaft of a cylinder . The cylinder drives the inner barrel 43 to move vertically up and down in the outer barrel 42 , and the retaining ring 433 is fixed on the retaining cover 432 , and the inner diameter of the retaining ring 433 is smaller than the inner diameter of the retaining cover 432 . In the inner cavity of the casing 41 and on one side of the outer barrel 42 is provided a limiting platform 410 , the limiting platform 410 limits the maximum displacement of the inner barrel 43 moving downward.

在外桶42的上端面固定有刮板46,刮板46与内桶43的外壁相贴合。内桶43竖直运动时,通过刮板46将内桶43的外壁面的粘连杂质刮除。A scraper 46 is fixed on the upper end surface of the outer tub 42 , and the scraper 46 is attached to the outer wall of the inner tub 43 . When the inner barrel 43 moves vertically, the adhesion impurities on the outer wall surface of the inner barrel 43 are scraped off by the scraper 46 .

如图7,旋转座45包括轴套451、骨架452和限位座453,骨架452为圆形骨架,骨架452与轴套451固定连接,八个限位座453两两为一组均匀固定在骨架452的上端面上。基板放置于旋转座45时,每组两个限位座453置于基板的每个边角处。As shown in Figure 7, the swivel base 45 includes a shaft sleeve 451, a skeleton 452 and a limit seat 453, the skeleton 452 is a circular skeleton, the skeleton 452 is fixedly connected with the shaft sleeve 451, and eight limit seats 453 are fixed in pairs as a group. On the upper end face of the skeleton 452 . When the substrate is placed on the rotating seat 45 , each set of two limiting seats 453 is placed at each corner of the substrate.

如图8,限位座453包括支撑座体4531和配重块4532,支撑座体4531上设有直角支撑槽,在支撑座体4531的顶端面上以及直角支撑槽的台阶面上均设有竖直布置的第一支撑销4533,配重块4532固定在支撑座体4531的外壁面上。As shown in Figure 8, the limit seat 453 includes a support base body 4531 and a counterweight 4532. The support base body 4531 is provided with a right-angle support groove, and the top surface of the support base body 4531 and the step surface of the right-angle support groove are provided with The first supporting pin 4533 arranged vertically and the counterweight 4532 are fixed on the outer wall of the supporting base 4531 .

为使得基板更好地落入限位座453上,在配重块4532的顶端面上设置一个引入台4534,引入台4534的内壁面为向下倾斜的斜面结构。In order to make the base plate fall into the limit seat 453 better, an introduction platform 4534 is provided on the top surface of the counterweight 4532, and the inner wall surface of the introduction platform 4534 is a slope structure inclined downward.

为更好的支持基板,在骨架452上还设置若干第二支撑销4535。In order to better support the substrate, several second support pins 4535 are provided on the frame 452 .

结合图9,摆臂44可在内桶43上方作旋转或者升降运动,其是通过设置在一个可升降和旋转的的传动机构上实现,传动机构包括摆臂电机441、摆臂气缸442、滑轨443和滑块444,滑块滑动连接在滑轨443上,摆臂电机441固定连接在滑块上,摆臂电机441的电机轴与摆臂44固定连接,摆臂气缸442驱动滑块在滑轨443上滑动。Referring to Fig. 9, the swing arm 44 can rotate or lift above the inner bucket 43, which is realized by being arranged on a transmission mechanism that can lift and rotate. The transmission mechanism includes a swing arm motor 441, a swing arm cylinder 442, and slide rails. 443 and slide block 444, the slide block is slidably connected on the slide rail 443, the swing arm motor 441 is fixedly connected on the slide block, the motor shaft of the swing arm motor 441 is fixedly connected with the swing arm 44, and the swing arm cylinder 442 drives the slide block on the slide Slide on rail 443.

机壳41上设有透明观察窗411和进料口412,在进料口412的一侧设有一升降的挡门413。The casing 41 is provided with a transparent observation window 411 and a feed port 412 , and a liftable door 413 is provided on one side of the feed port 412 .

基板需要清洗时,挡门413下降,机械手搬运基板通过进料口412将基板送入旋转座45上,机械手退出后,挡门413通过气缸驱动并升起将进料口412封闭,然后内桶43上升,旋转座45转动,喷管喷出高压清洗液以及氮气对旋转座45上的基本进行清洗,清洗过程中摆臂44同时发生摆动。内桶43上升,可以减少喷淋在基板上的液体溅出外桶42外,外桶42外内的液体通过底面的排液孔4244排走。喷淋过程中,吸风罩423内接入负压,可以抽走喷淋清洗过程中清洗液所产生的药味。When the substrate needs to be cleaned, the gate 413 is lowered, and the manipulator carries the substrate through the feed port 412 and sends the substrate to the rotary seat 45. After the manipulator exits, the gate 413 is driven by the cylinder and raised to close the feed port 412, and then the inner barrel 43 Rising, the swivel seat 45 rotates, and the spray pipe ejects high-pressure cleaning liquid and nitrogen to clean the base on the swivel seat 45, and the swing arm 44 swings simultaneously during the cleaning process. The rise of the inner barrel 43 can reduce the liquid sprayed on the substrate from splashing out of the outer barrel 42, and the liquid inside the outer barrel 42 is drained through the drain hole 4244 on the bottom surface. During the spraying process, a negative pressure is connected to the suction hood 423 to remove the medicinal smell produced by the cleaning solution during the spraying cleaning process.

以上所述仅是本实用新型的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本实用新型原理的前提下还可以作出若干改进,这些改进也应视为本实用新型的保护范围。The above is only a preferred embodiment of the utility model, and it should be pointed out that for those of ordinary skill in the art, some improvements can be made without departing from the principle of the utility model, and these improvements should also be regarded as the present invention. Protection scope of utility model.

Claims (10)

1. The utility model provides a rotatory cleaning machine of Micro-LED base plate which characterized in that: the washing machine comprises a machine shell (41), an outer barrel (42), an inner barrel (43), a swing arm (44), a rotary seat (45) and a spray pipe, wherein the outer barrel (42) is fixed in the machine shell (41), the inner barrel (43) and the outer barrel (42) are coaxially arranged, the outer barrel (42) can vertically move up and down in the outer barrel (42), the rotary seat (45) rotates in the inner barrel (43), the swing arm (44) is fixed on one side of the outer barrel (42), and the spray pipe is fixed on the swing arm (44).
2. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: outer bucket (42) are including outer staving (421), keep off bucket (422), cover (423) and motor cabinet (424) induced drafts, outer staving (421) and fender bucket (422) are the cask of equal open-ended from top to bottom, keep off bucket (422) and peg graft in outer staving (421), and keep off and form the cavity between bucket (422) and outer staving (421), the last port wall that keeps off bucket (422) is fixed with the last port wall of outer staving (421), the bottom end face that keeps off bucket (422) is higher than the bottom end face of outer staving (421), motor cabinet (424) are fixed in outer staving (421) lower extreme and seal the lower extreme of outer staving (421), be equipped with the groove of induced drafts on the outer wall of outer staving (421), cover (423) of induced drafts are fixed in outer staving (421), and the groove of induced drafts is arranged in cover (423), fixed being used for driving roating seat (45) pivoted motor on motor cabinet (424).
3. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: a scraper (46) is fixed on the upper end face of the outer barrel (42), and the scraper (46) is attached to the outer wall of the inner barrel (43).
4. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: the inner barrel (43) comprises an inner barrel body (431), a blocking cover (432) and a retaining ring (433), the blocking cover is fixedly connected to the upper end face of the inner barrel body (431) and is connected with a cylinder shaft of a cylinder, the retaining ring (433) is fixed on the blocking cover (432), and the inner diameter of the retaining ring (433) is smaller than that of the blocking cover (432).
5. The rotary cleaning machine for Micro-LED substrates according to claim 4, characterized in that: a limit table (410) is arranged in the inner cavity of the machine shell and positioned on one side of the outer barrel, and the inner barrel (43) moves downwards to enable the blocking cover (432) to abut against the limit table (410).
6. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: the rotating seat (45) comprises a shaft sleeve (451), a framework (452) and a limiting seat (453), the framework (452) is fixedly connected with the shaft sleeve (451), and the eight limiting seats (453) are uniformly fixed on the upper end face of the framework (452) in a group in a pairwise mode.
7. The rotary cleaning machine for Micro-LED substrates of claim 6, wherein: spacing seat (453) are including supporting pedestal (4531) and balancing weight (4532), be equipped with the right angle support groove on supporting pedestal (4531), balancing weight (4532) are fixed on the outer wall of supporting pedestal (4531).
8. The rotary cleaning machine for Micro-LED substrates according to claim 7, wherein: and the top end surface of the balancing weight is provided with an introduction table, and the inner wall surface of the introduction table is of a downward inclined plane structure.
9. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: the swing arm (44) is arranged on a transmission mechanism capable of lifting and rotating, the transmission mechanism comprises a swing arm motor (441), a swing arm cylinder (442), a sliding rail (443) and a sliding block (444), the sliding block is connected to the sliding rail (443) in a sliding mode, the swing arm motor (441) is fixedly connected to the sliding block, a motor shaft of the swing arm motor (441) is fixedly connected with the swing arm (44), and the swing arm cylinder (442) drives the sliding block to slide on the sliding rail (443).
10. The rotary cleaning machine for Micro-LED substrates according to claim 1, characterized in that: the casing (41) is provided with a transparent observation window (411) and a feed inlet (412), and one side of the feed inlet (412) is provided with a lifting stop door (413).
CN202223098330.8U 2022-11-22 2022-11-22 Rotary cleaning machine for Micro-LED substrate Active CN218743506U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202223098330.8U CN218743506U (en) 2022-11-22 2022-11-22 Rotary cleaning machine for Micro-LED substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202223098330.8U CN218743506U (en) 2022-11-22 2022-11-22 Rotary cleaning machine for Micro-LED substrate

Publications (1)

Publication Number Publication Date
CN218743506U true CN218743506U (en) 2023-03-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN202223098330.8U Active CN218743506U (en) 2022-11-22 2022-11-22 Rotary cleaning machine for Micro-LED substrate

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Country Link
CN (1) CN218743506U (en)

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Patentee after: Jiangsu Fulat Semiconductor Equipment Co.,Ltd.

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Address before: Jiangsu ProvinceNanjing CityJiangning DistrictEconomic and Technological Development ZoneHongfeng Science and Technology ParkBuilding C3West SectionThird Floor

Patentee before: Jiangsu fulate automation equipment Co.,Ltd.

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