CN218203021U - Annular part - Google Patents
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- CN218203021U CN218203021U CN202120535365.XU CN202120535365U CN218203021U CN 218203021 U CN218203021 U CN 218203021U CN 202120535365 U CN202120535365 U CN 202120535365U CN 218203021 U CN218203021 U CN 218203021U
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- ring body
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Abstract
The utility model provides an annular piece, the annular piece includes the mounting of ring body and ring body surface, the inside hole that is provided with of mounting, and the central line of hole and the distance of ring body up end are less than the central line of hole and the distance of terminal surface under the ring body, are applied to the sputtering and become the membrane in, long service life, and simple structure, with low costs, easily processing can improve the contact hole coverage of sputtering film-forming medium film.
Description
Technical Field
The utility model relates to a target technical field especially relates to an annular piece.
Background
In the manufacturing process of semiconductor chips, physical Vapor Deposition (PVD) sputtering is an indispensable technological process in one step, and the principle of the PVD sputtering is that a glow discharge effect is utilized, charged particles are used for bombarding a target material, atoms or molecules on the surface of the target material obtain certain kinetic energy, and the atoms or molecules escape from the surface and are deposited on a substrate. Because the direction of the charged particles bombarding the target is uncertain, the directionality of target atoms escaping from the surface of the target is uncertain, namely the target atoms can be separated from the surface of the target from various angles, and finally a required film is formed on the surface of the substrate in a deposition mode.
The ring used in PVD sputtering is a consumable item that is used in PVD sputtering in semiconductor integrated circuit fabrication, mainly to improve contact hole coverage of Ta and/or TaN films. The sputtering in-process has certain requirement to the life of loop forming element, and the life of loop forming element can be prolonged through the thickness that directly increases the loop forming element at present, but also has corresponding increase in relative raw and other materials cost, has in addition to carry out knurling and sandblast to the loop forming element and prolongs life, but has increased the processing degree of difficulty.
CN111469052A discloses a treatment method for prolonging the service life of a ring, wherein a nut is arranged on the outer surface of the ring; the method comprises the following steps: knurling the inner surface, the outer surface and the port of the ring piece; right the nut carries out annular knurl and sand blasting in proper order and handles, nevertheless the utility model relates to annular knurl and sand blasting handle, the processing degree of difficulty increase.
CN106521433A discloses a ring structure and a processing method thereof, comprising: providing a ring piece, wherein patterns are arranged on the surface of the ring piece; and carrying out roughening treatment on the surface of the ring pattern so as to prolong the service life of the ring structure in sputtering, but the processing difficulty is higher.
CN204097558U discloses a long-life sputtering target, which includes a sputtering surface and a cooling surface, the sputtering area of the sputtering surface is thickened within 2mm on the basis of the original sputtering area of the target, the thickened part is smaller than the original sputtering area of the target, and the edge of the thickened part and the original sputtering area of the target are in a step shape or a slope shape, the service life of the target is prolonged by increasing the thickness of the sputtering area, and the cost is increased.
Therefore, it is necessary to develop a sputtering ring unit with simple structure, low cost and long service life, and the application prospect is wide.
SUMMERY OF THE UTILITY MODEL
In view of the problem that exists among the prior art, the utility model provides an annular member, the annular member includes the mounting of ring body and ring body surface, the inside hole that is provided with of mounting, and the distance of the central line of hole and ring body up end is less than the central line of hole and the distance of terminal surface under the ring body, is applied to the sputtering and becomes the membrane, long service life, and simple structure, and is with low costs, and easy to process can improve the contact hole coverage of sputtering film in the membrane.
To achieve the purpose, the utility model adopts the following technical proposal:
the utility model provides an annular element, which comprises an annular body and a fixing part on the outer surface of the annular body; an inner hole is formed in the fixing piece; the distance between the center line of the inner hole and the upper end face of the ring body is smaller than the distance between the center line of the inner hole and the lower end face of the ring body.
The utility model discloses well ring member is provided with the mounting at the external surface, plays the effect of fixed ring spare in the sputtering film forming, and the distance of the central line of ring body hole and ring body up end is less than the central line of hole and the distance of terminal surface under the ring body, is favorable to in the sputtering film forming, has increased the sputtering of ring spare lower half material, makes its sputter the in-process can more be used by the sputtering to ring spare life has been prolonged.
Because the direction of charged particles bombarding the target is uncertain, the directionality of target atoms escaping from the surface of the target is uncertain, namely the target atoms can be separated from the surface of the target from various angles, finally a required film is deposited on the surface of the substrate, and the radio frequency current in the annular piece can ionize metal atoms through an inductive coupling mechanism. The positive metal ions mainly impact the surface of the wafer with negative charges along the vertical direction, and the coverage rate of the contact hole is improved.
Preferably, the outer diameter of the ring body is 380 to 390mm, and may be 380mm, 381mm, 382mm, 383mm, 384mm, 385mm, 386mm, 387mm, 388mm, 389mm, 390mm or the like, for example.
Preferably, the width of the ring body is 48 to 52mm, and may be, for example, 48mm, 48.5mm, 49mm, 49.5mm, 50mm, 50.5mm, 51mm, 51.5mm, 52mm, or the like.
Preferably, the ring body has a thickness of 2.5 to 3.5mm, and may be, for example, 2.5mm, 2.6mm, 2.7mm, 2.8mm, 2.9mm, 3mm, 3.1mm, 3.2mm, 3.3mm, 3.4mm, 3.5mm, or the like.
Preferably, the outer diameter of the fixing member is 18 to 22mm, and may be 18mm, 18.5mm, 19mm, 19.5mm, 20mm, 20.5mm, 21mm, 21.5mm, 22mm, or the like, for example.
Preferably, the inner diameter of the inner bore is 8 to 10mm, and may be 8mm, 8.5mm, 9mm, 9.5mm, 10mm, or the like, for example.
Preferably, the distance between the central line of the inner hole and the upper end face of the ring body is 22-24 mm, for example, 22mm, 22.5mm, 23mm, 23.5mm or 24mm.
Preferably, the distance between the central line of the inner hole and the lower end face of the ring body is 26-28 mm, for example, 26mm, 26.5mm, 27mm, 27.5mm or 28mm.
Preferably, the distance between the center line of the inner hole and the upper end face of the ring body is different from the distance between the center line of the inner hole and the lower end face of the ring body by 2-6 mm, for example, 2mm, 2.4mm, 2.8mm, 3.2mm, 3.6mm, 4mm, 4.4mm, 4.8mm, 5.2mm, 5.6mm or 6mm.
The utility model discloses in, during the loop forming element was applied to the sputter film forming, long service life, and simple structure, it is with low costs, can improve the contact hole coverage of film in the sputter film forming.
Compared with the prior art, the utility model discloses following beneficial effect has at least:
(1) The ring-shaped piece provided by the utility model has simple structure and low manufacturing cost;
(2) The ring-shaped element provided by the utility model is applied to sputtering film forming, and has long service life which is more than or equal to 567 kW.h;
(3) The utility model provides a ring member is applied to during the sputter film forming, can improve the contact hole coverage of film in the sputter film forming, can prolong the life of ring spare simultaneously.
Drawings
Fig. 1 is a plan view of a ring member in embodiment 1 of the present invention.
Fig. 2 is a left side view of the annular member in embodiment 1 of the present invention.
Fig. 3 is a schematic view of a fixing member in a ring member according to embodiment 1 of the present invention.
FIG. 4 is a schematic diagram showing the comparison between before and after the ring member is applied to the sputtering film formation in example 1 of the present invention.
Fig. 5 is a schematic view of a fixing member in the ring member in comparative example 1 of the present invention.
In the figure: 1-upper end face; 2-lower end face; 3-a fixing piece; 4-inner hole; 5-the centre line.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments with reference to the drawings.
The present invention will be described in further detail below. However, the following examples are only simple examples of the present invention, and do not represent or limit the scope of the present invention, which is defined by the appended claims.
1. Examples of the invention
Example 1
The embodiment provides an annular element, as shown in fig. 1, and a left side view is shown in fig. 2, the annular element is made of tantalum, and includes an annular body and a fixed element 3 on an outer surface of the annular body, the fixed element 3 is shown in fig. 3, an inner hole 4 is arranged inside the fixed element 3, and a distance between a center line 5 of the inner hole 4 and an upper end surface 1 of the annular body is smaller than a distance between the center line 5 of the inner hole 4 and a lower end surface 2 of the annular body;
the outer diameter of the ring body is 385mm, the width is 50mm, and the thickness is 3mm; the outer diameter of the fixing piece 3 is 18mm, and the inner diameter is 8mm; the distance between the central line 5 of the inner hole 4 and the upper end surface 1 of the ring body is 23mm, the distance between the central line 5 of the inner hole 4 and the lower end surface 2 of the ring body is 27mm, and the difference between the distance between the central line 5 of the inner hole 4 and the upper end surface 1 of the ring body and the distance between the central line 5 of the inner hole 4 and the lower end surface 2 of the ring body is 4mm.
FIG. 4 is a schematic diagram showing comparison between the ring before and after the ring is sputtered to form a film, where the left part is the ring before use, the right part is the ring after use, the lower half part of the ring after use is sputtered, and the thickness part of the ring is sputtered.
Example 2
The embodiment provides an annular part, which comprises an annular body and a fixed part on the outer surface of the annular body, wherein the fixed part is made of tantalum, an inner hole is formed in the fixed part, and the distance between the center line of the inner hole and the upper end surface of the annular body is smaller than the distance between the center line of the inner hole and the lower end surface of the annular body;
the outer diameter of the ring body is 380mm, the width is 48mm, and the thickness is 2.5mm; the outer diameter of the fixing part of the ring body is 20mm, and the inner diameter of the fixing part of the ring body is 9mm; the distance between the center line of the inner hole and the upper end face of the ring body is 22mm, the distance between the center line of the inner hole and the lower end face of the ring body is 28mm, and the difference between the distance between the center line of the inner hole and the upper end face of the ring body and the distance between the center line of the inner hole and the lower end face of the ring body is 6mm.
Example 3
The embodiment provides an annular element, which comprises an annular element and a fixed element arranged on the outer surface of the annular element and made of tantalum, wherein an inner hole is formed in the fixed element, and the distance between the center line of the inner hole and the upper end surface of the annular element is smaller than the distance between the center line of the inner hole and the lower end surface of the annular element;
the outer diameter of the ring body is 390mm, the width is 52mm, and the thickness is 3.5mm; the outer diameter of the fixing part of the ring body is 22mm, and the inner diameter of the fixing part of the ring body is 10mm; the distance between the center line of the inner hole and the upper end face of the ring body is 24mm, the distance between the center line of the inner hole and the lower end face of the ring body is 26mm, and the difference between the distance between the center line of the inner hole and the upper end face of the ring body and the distance between the center line of the inner hole and the lower end face of the ring body is 2mm.
Example 4
This embodiment provides an annular piece, the distance control of the central line of hole and ring body lower extreme face is 24mm, and the difference of the distance of the central line of corresponding hole and ring body upper end face and the distance of hole and ring body lower extreme face is 1mm, and all the rest is the same with embodiment 1.
Example 5
This embodiment provides an annular piece, the distance of the central line of hole and ring body lower extreme face is controlled to be 30mm, and then the difference between the distance of the central line of corresponding hole and ring body upper end face and the distance of hole and ring body lower extreme face is 7mm, and the rest all is the same with embodiment 1.
2. Comparative example
Comparative example 1
This comparative example provides a ring body in which the distance between the center line 5 of the inner hole 4 and the lower end face 2 of the ring body was controlled to be 23mm as shown in fig. 5, and the rest was the same as in example 1.
Comparative example 2
This comparative example provides an annular member in which the distance between the center line of the inner hole in the ring body and the lower end face of the ring body was controlled to 20mm, and the rest was the same as in example 1.
3. Test and results
The method for testing the service life of the annular piece comprises the following steps: the annular piece is applied to the sputtering film formation of the tantalum target, the model of sputtering Equipment is ENDURA 5500 PVD Equipment, and the service life of the annular piece is recorded.
The test results of the above examples and comparative examples are shown in table 1.
TABLE 1
From table 1, the following points can be seen:
(1) The utility model provides an annular element, the annular element includes ring body and the mounting of ring body surface, is provided with the hole in the mounting, and the distance of the central line of hole and ring body up end is less than the distance of the central line of hole and ring body lower extreme face, is applied to sputtering and filmforms, long service life, specifically speaking, the service life of annular element is more than or equal to 567 kW.h in embodiments 1-5;
(2) With reference to embodiment 1 and embodiments 4 to 5, the difference between the distance between the center line of the inner hole and the upper end face of the ring body and the distance between the center line of the inner hole and the lower end face of the ring body in embodiment 1 is 4mm, and the difference between the distance between the center line of the inner hole and the upper end face of the ring body and the distance between the center line of the inner hole and the lower end face of the ring body in embodiments 4 to 5 is 1mm and 7mm, respectively, the service life of the ring member in embodiment 1 is 921kW · h, and the service lives of the ring members in embodiments 4 to 5 are 567kW · h and 600kW · h, respectively, which shows that the present invention can control the difference between the distance between the center line of the inner hole and the upper end face of the ring body and the distance between the center line of the inner hole and the lower end face of the ring body within a certain range, and can prolong the service life of the ring member;
(3) With reference to example 1 and comparative examples 1-2, the distance between the center line of the inner hole and the upper end surface of the ring body in example 1 is smaller than the distance between the center line of the inner hole and the lower end surface of the ring body, and compared with the distance between the center line of the inner hole and the upper end surface of the ring body in comparative example 1 being equal to the distance between the center line of the inner hole and the lower end surface of the ring body, the distance between the center line of the inner hole and the upper end surface of the ring body in comparative example 2 is greater than the distance between the center line of the inner hole and the lower end surface of the ring body, the service life of the ring body in example 1 is 921kW · h, and the service lives of the ring bodies in comparative examples 1-2 are 229kW · h and 375kW · h, respectively.
The utility model provides a ring unit, the ring unit includes the mounting of ring body and ring body surface, the inside hole that is provided with of mounting, and the distance of the central line of hole and ring body up end is less than the central line of hole and the distance of terminal surface under the ring body, is applied to the sputtering and becomes the membrane, and life is greater than or equal to 567 kW.h.
The applicant states that the present invention is described by the above embodiments, but the present invention is not limited to the above detailed structural features, i.e. the present invention can be implemented only by relying on the above detailed structural features. It should be clear to those skilled in the art that any modifications to the present invention, to the equivalent replacement of selected parts and the addition of auxiliary parts, the selection of specific modes, etc., all fall within the scope of protection and disclosure of the present invention.
Claims (9)
1. The annular element is characterized by comprising an annular body and a fixing element on the outer surface of the annular body;
an inner hole is formed in the fixing piece;
the distance between the central line of the inner hole and the upper end face of the ring body is smaller than the distance between the central line of the inner hole and the lower end face of the ring body.
2. The ring member as claimed in claim 1, wherein the outer diameter of the ring body is 380 to 390mm.
3. The ring element as claimed in claim 1, wherein the width of the ring element is 48-52 mm.
4. The ring element as claimed in claim 1, wherein the thickness of the ring body is 2.5-3.5 mm.
5. The endless member according to claim 1, wherein the outer diameter of the fixing member is 18 to 22mm.
6. The annular member of claim 1, wherein the inner diameter of the inner bore is 8 to 10mm.
7. The ring-shaped member as claimed in claim 1, wherein the distance between the center line of the inner hole and the upper end surface of the ring body is 22 to 24mm.
8. The annular member as claimed in claim 1, wherein the distance between the center line of the inner hole and the lower end surface of the annular member is 26 to 28mm.
9. The annular member as claimed in claim 1, wherein a distance between a center line of the inner hole and an upper end surface of the annular member is different from a distance between a center line of the inner hole and a lower end surface of the annular member by 2 to 6mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120535365.XU CN218203021U (en) | 2021-03-15 | 2021-03-15 | Annular part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120535365.XU CN218203021U (en) | 2021-03-15 | 2021-03-15 | Annular part |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218203021U true CN218203021U (en) | 2023-01-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120535365.XU Active CN218203021U (en) | 2021-03-15 | 2021-03-15 | Annular part |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218203021U (en) |
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2021
- 2021-03-15 CN CN202120535365.XU patent/CN218203021U/en active Active
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