CN218108653U - Degumming machine for monocrystalline silicon wafers - Google Patents

Degumming machine for monocrystalline silicon wafers Download PDF

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CN218108653U
CN218108653U CN202222340782.6U CN202222340782U CN218108653U CN 218108653 U CN218108653 U CN 218108653U CN 202222340782 U CN202222340782 U CN 202222340782U CN 218108653 U CN218108653 U CN 218108653U
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degumming
frame
single crystal
mounting
silicon wafers
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曹志勇
杭智华
姜志刚
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Gangduoduo E Commerce Co ltd
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Yangzhou Weiye Creative Technology Ltd
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Abstract

本实用新型公开了单晶硅片脱胶技术领域的一种用于单晶硅片的脱胶机,包括清洗箱,清洗箱右侧壁设有安装板,安装板顶部开设有安装槽,安装槽内设有移动机构,安装板顶部滑动连接设有安装架,安装架内顶部设有液压杆,液压杆底部设有安装杆,安装杆底部设有脱胶框,脱胶框内设有三组放置板,脱胶框内设有压紧机构,本实用在移动机构的作用下能够带动安装架前后移动,从而能够带动脱胶框在清洗箱内前后移动,解决了现有的单晶硅片大多都是静置水洗脱胶,脱胶效果差,清洗后的硅片表面存在脱胶不彻底的问题,提高单晶硅片的成品率,有利于单晶硅片的生产。

Figure 202222340782

The utility model discloses a degumming machine for monocrystalline silicon wafers in the technical field of degumming single crystal silicon wafers. There is a moving mechanism, the top of the mounting plate is slidingly connected with a mounting frame, the top of the mounting frame is equipped with a hydraulic rod, the bottom of the hydraulic rod is provided with a mounting rod, the bottom of the mounting rod is provided with a degumming frame, and there are three sets of placement plates in the degumming frame. There is a pressing mechanism in the frame. Under the action of the moving mechanism, the utility model can drive the mounting frame to move back and forth, thereby driving the degumming frame to move back and forth in the cleaning box, which solves the problem that most of the existing single crystal silicon wafers are washed statically Degumming, the degumming effect is poor, and the surface of the silicon wafer after cleaning has the problem of incomplete degumming, which improves the yield of single crystal silicon wafers and is beneficial to the production of single crystal silicon wafers.

Figure 202222340782

Description

一种用于单晶硅片的脱胶机A degumming machine for monocrystalline silicon wafers

技术领域technical field

本实用新型涉及单晶硅片脱胶技术领域,具体为一种用于单晶硅片的脱胶机。The utility model relates to the technical field of degumming single crystal silicon wafers, in particular to a degumming machine for single crystal silicon wafers.

背景技术Background technique

单晶硅片:硅的单晶体,是一种具有基本完整的点阵结构的晶体。不同的方向具有不同的性质,是一种良好的半导材料,用于制造半导体器件、太阳能电池等;用高纯度的多晶硅在单晶炉内拉制而成,单晶硅片的清洗就是对切割后的单晶硅片进行清洗,在对单晶硅胶脱胶的时候大多都是采用水洗的方式。Single crystal silicon wafer: A single crystal of silicon, a crystal with a substantially complete lattice structure. Different directions have different properties. It is a good semiconducting material, used to manufacture semiconductor devices, solar cells, etc.; it is made of high-purity polysilicon drawn in a single crystal furnace, and the cleaning of single crystal silicon wafers is to The monocrystalline silicon wafers after cutting are cleaned, and most of them are washed with water when the monocrystalline silica gel is degummed.

现有的脱胶机在进行清洗脱胶的时候单晶硅片大多都是静置水洗,脱胶效果差,清洗后的硅片表面存在脱胶不彻底的现象,降低了单晶硅片的成品率,不利于单晶硅片的生产,因此,需要一种用于单晶硅片的脱胶机。When the existing degumming machine is cleaning and degumming, most of the monocrystalline silicon wafers are washed standing still, and the degumming effect is poor. It is beneficial to the production of monocrystalline silicon wafers, therefore, a degumming machine for monocrystalline silicon wafers is needed.

实用新型内容Utility model content

本实用新型的目的在于提供一种用于单晶硅片的脱胶机,以解决上述背景技术中提出的问题。The purpose of this utility model is to provide a degumming machine for single crystal silicon wafers, so as to solve the problems raised in the above-mentioned background technology.

为实现上述目的,本实用新型提供如下技术方案:一种用于单晶硅片的脱胶机,包括清洗箱,所述清洗箱右侧壁设有安装板,所述安装板顶部开设有安装槽,所述安装槽内设有移动机构,所述安装板顶部滑动连接设有安装架,所述安装架内顶部设有液压杆,所述液压杆底部设有安装杆,所述安装杆底部设有脱胶框,所述脱胶框内设有三组放置板,所述脱胶框内设有压紧机构。In order to achieve the above purpose, the utility model provides the following technical solutions: a degumming machine for monocrystalline silicon wafers, including a cleaning box, the right side wall of the cleaning box is provided with a mounting plate, and the top of the mounting plate is provided with a mounting groove , a moving mechanism is provided in the installation groove, a mounting frame is provided for sliding connection at the top of the mounting plate, a hydraulic rod is provided at the top of the mounting frame, a mounting rod is provided at the bottom of the hydraulic rod, and a mounting rod is provided at the bottom of the mounting rod. There is a degumming frame, and three sets of placement plates are arranged in the degumming frame, and a pressing mechanism is arranged in the degumming frame.

进一步的,所述移动机构包括安装槽内后侧壁通过轴承连接设有的丝杆,所述丝杆外壁套接设有滑块,所述滑块顶部与安装架底部相连接,所述丝杆一端贯穿安装槽内前侧壁与外部设有的从动齿轮相连接,所述安装板右侧壁设有电机,所述电机输出端连接设有与从动齿轮相啮合的主动齿轮。Further, the moving mechanism includes a screw rod connected to the rear side wall of the installation groove through a bearing, the outer wall of the screw rod is sleeved with a slider, the top of the slider is connected to the bottom of the mounting frame, the wire One end of the rod penetrates through the inner front side wall of the installation groove and is connected with the driven gear provided outside. The right side wall of the installation plate is provided with a motor, and the output end of the motor is connected with a driving gear meshed with the driven gear.

进一步的,所述安装槽内底部开设有限位槽,所述滑块底部设有与限位槽相匹配的限位块。Further, a limit slot is provided at the inner bottom of the installation groove, and a limit block matching the limit slot is provided at the bottom of the slider.

进一步的,所述压紧机构包括脱胶框内左右两侧均设有的滑杆,两组所述滑杆一端均贯穿脱胶框内顶部与外部设有的连接板相连接,两组所述滑杆外壁均套接设有弹簧,所述弹簧一端与连接板底部相连接,所述弹簧另一端与脱胶框顶部相连接,两组所述滑杆相对侧壁均设有三组压紧块,两组所述滑杆底部均设有活动杆,两组所述活动杆一端均贯穿脱胶框内底部与外部设有的滑动板相连接,所述脱胶框底部通过轴承连接设有螺纹杆,所述螺纹杆一端贯穿滑动板顶部与外部设有的转动板相连接。Further, the pressing mechanism includes sliding rods provided on the left and right sides of the degumming frame, one end of the two groups of sliding rods runs through the top of the degumming frame to connect with the connecting plate provided on the outside, and the two groups of sliding rods The outer walls of the rods are all socketed with springs, one end of the springs is connected to the bottom of the connecting plate, the other end of the springs is connected to the top of the degumming frame, and the opposite side walls of the two sets of sliding rods are provided with three sets of pressing blocks, two The bottom of the slide bar in one group is provided with a movable rod, and one end of the movable rod in the two groups runs through the inner bottom of the degumming frame and is connected with the sliding plate provided on the outside, and the bottom of the degumming frame is connected with a threaded rod through a bearing. One end of the threaded rod runs through the top of the sliding plate and is connected with the rotating plate provided outside.

进一步的,三组所述放置板在所述脱胶框内竖直方向上呈线性阵列分布,三组所述放置板顶部左右两侧均开设有与滑杆相匹配的通孔。Further, the three sets of placing plates are distributed in a linear array in the vertical direction in the degumming frame, and the left and right sides of the top of the three sets of placing plates are provided with through holes matching the slide bars.

进一步的,三组所述压紧块分别位于三组所述放置板上方,所述压紧块底部均设有防滑层。Further, the three sets of pressing blocks are respectively located above the three sets of placing plates, and the bottoms of the pressing blocks are provided with anti-slip layers.

与现有技术相比,本实用新型的有益效果是:本实用将单晶硅片放置在放置板表面,然后在压紧机构的作用下对单晶硅片进行压紧固定,解决了传统的单晶硅片大多都是放置在脱胶框内进行清洗,不具有对单晶硅片进行压紧的功能,容易导致单晶硅片掉落,造成单晶硅片损坏的问题,在移动机构的作用下能够带动安装架前后移动,从而能够带动脱胶框在清洗箱内前后移动,解决了现有的单晶硅片大多都是静置水洗脱胶,脱胶效果差,清洗后的硅片表面存在脱胶不彻底的问题,提高单晶硅片的成品率,有利于单晶硅片的生产。Compared with the prior art, the beneficial effect of the utility model is that the utility model places the monocrystalline silicon wafer on the surface of the placement plate, and then compresses and fixes the monocrystalline silicon wafer under the action of the pressing mechanism, which solves the problem of traditional Most of the single crystal silicon wafers are placed in the degumming frame for cleaning, which does not have the function of pressing the single crystal silicon wafers, which may easily cause the single crystal silicon wafers to fall and cause damage to the single crystal silicon wafers. Under the action, it can drive the mounting frame to move back and forth, thereby driving the degumming frame to move back and forth in the cleaning box, which solves the problem that most of the existing monocrystalline silicon wafers are washed and degummed by standing water, the degumming effect is poor, and there is degumming on the surface of the silicon wafer after cleaning Incomplete problems, improving the yield of monocrystalline silicon wafers is conducive to the production of monocrystalline silicon wafers.

附图说明Description of drawings

图1为本实用新型结构示意图;Fig. 1 is a structural representation of the utility model;

图2为本实用新型脱胶框内部结构主视图。Fig. 2 is a front view of the internal structure of the degumming frame of the present invention.

图中:1、清洗箱;2、移动机构;20、主动齿轮;21、电机;22、从动齿轮;23、丝杆;24、滑块;3、安装板;4、安装槽;5、安装架;6、脱胶框;7、放置板;8、安装杆;9、液压杆;10、压紧机构;100、连接板;101、弹簧;102、压紧块;103、滑杆;104、活动杆;105、螺纹杆;106、滑动板;107、转动板。In the figure: 1, cleaning box; 2, moving mechanism; 20, driving gear; 21, motor; 22, driven gear; 23, screw rod; 24, slider; 3, mounting plate; 4, mounting groove; 5, Mounting frame; 6, degumming frame; 7, placing plate; 8, mounting rod; 9, hydraulic rod; 10, pressing mechanism; 100, connecting plate; 101, spring; 102, pressing block; 103, slide bar; 104 , movable rod; 105, threaded rod; 106, slide plate; 107, rotating plate.

具体实施方式detailed description

下面将结合本实用新型实施例中的附图,对本实用新型实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本实用新型一部分实施例,而不是全部的实施例。基于本实用新型中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本实用新型保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. example. Based on the embodiments of the present utility model, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the scope of protection of the present utility model.

实施例1:Example 1:

请参阅图1-2,本实用新型提供一种技术方案:一种用于单晶硅片的脱胶机,包括清洗箱1,清洗箱1右侧壁设有安装板3,安装板3顶部开设有安装槽4,安装槽4内设有移动机构2,安装板3顶部滑动连接设有安装架5,安装架5呈L形状设置,安装架5内顶部设有液压杆9,液压杆9底部设有安装杆8,安装杆8底部设有脱胶框6,脱胶框6呈矩形状设置,脱胶框6内设有三组放置板7,脱胶框6内设有压紧机构10。Please refer to Figure 1-2, the utility model provides a technical solution: a degumming machine for monocrystalline silicon wafers, including a cleaning box 1, the right side wall of the cleaning box 1 is provided with a mounting plate 3, and the top of the mounting plate 3 is opened There is a mounting groove 4, a moving mechanism 2 is arranged in the mounting groove 4, a mounting frame 5 is provided for sliding connection on the top of the mounting plate 3, the mounting frame 5 is arranged in an L shape, a hydraulic rod 9 is arranged on the top of the mounting frame 5, and a hydraulic rod 9 is arranged at the bottom Be provided with mounting bar 8, be provided with degumming frame 6 at the bottom of mounting bar 8, degumming frame 6 is arranged in rectangular shape, be provided with three groups of placement plates 7 in degumming frame 6, be provided with pressing mechanism 10 in degumming frame 6.

请参阅图1,移动机构2包括安装槽4内后侧壁通过轴承连接设有的丝杆23,丝杆23外壁套接设有滑块24,安装槽4内底部开设有限位槽,滑块24底部设有与限位槽相匹配的限位块,在限位槽和限位块的作用下使得滑块24在丝杆23外壁移动更加稳定滑块24顶部与安装架5底部相连接,丝杆23一端贯穿安装槽4内前侧壁与外部设有的从动齿轮22相连接,安装板3右侧壁设有电机21,电机21输出端连接设有与从动齿轮22相啮合的主动齿轮20。Referring to Fig. 1, the moving mechanism 2 includes a screw 23 connected to the rear side wall of the installation groove 4 by bearings, the outer wall of the screw rod 23 is sleeved with a slider 24, and the bottom of the installation groove 4 is provided with a limit groove, and the slider The bottom of 24 is provided with a limit block matched with the limit groove, and under the action of the limit groove and the limit block, the slide block 24 moves more stably on the outer wall of the screw rod 23, and the top of the slide block 24 is connected with the bottom of the mounting frame 5, One end of the screw mandrel 23 runs through the inner front side wall of the mounting groove 4 and is connected with the driven gear 22 provided on the outside. Drive gear 20.

请参阅图2,压紧机构10包括脱胶框6内左右两侧均设有的滑杆103,两组滑杆103一端均贯穿脱胶框6内顶部与外部设有的连接板100相连接,两组滑杆103外壁均套接设有弹簧101,弹簧101一端与连接板100底部相连接,弹簧101另一端与脱胶框6顶部相连接,两组滑杆103相对侧壁均设有三组压紧块102,三组放置板7在脱胶框6内竖直方向上呈线性阵列分布,三组放置板7顶部左右两侧均开设有与滑杆103相匹配的通孔,三组压紧块102分别位于三组放置板7上方,压紧块102底部均设有防滑层,在防滑层的作用下能够提高压紧块102对单晶硅片压紧的稳定性,两组滑杆103底部均设有活动杆104,两组活动杆104一端均贯穿脱胶框6内底部与外部设有的滑动板106相连接,脱胶框6底部通过轴承连接设有螺纹杆105,螺纹杆105一端贯穿滑动板106顶部与外部设有的转动板107相连接。Please refer to Fig. 2, the pressing mechanism 10 comprises the slide bars 103 that are provided on the left and right sides in the degumming frame 6, and one end of two groups of slide bars 103 all runs through the top of the degumming frame 6 and is connected with the connecting plate 100 provided on the outside. The outer walls of the sets of slide bars 103 are all socketed with springs 101, one end of the springs 101 is connected to the bottom of the connecting plate 100, the other end of the springs 101 is connected to the top of the degumming frame 6, and the opposite side walls of the two sets of slide bars 103 are provided with three sets of pressing Block 102, three groups of placing plates 7 are distributed in a linear array in the vertical direction in the degumming frame 6, and the left and right sides of the top of the three groups of placing plates 7 are provided with through holes matching the slide bars 103, and the three groups of pressing blocks 102 Located above the three groups of placing plates 7 respectively, the bottoms of the pressing blocks 102 are provided with anti-skid layers, which can improve the stability of the pressing blocks 102 for pressing single crystal silicon wafers under the effect of the anti-slip layers. There are movable rods 104, one end of two groups of movable rods 104 runs through the inner bottom of the degumming frame 6 and is connected with the sliding plate 106 provided on the outside, the bottom of the degumming frame 6 is connected with a threaded rod 105 through a bearing, and one end of the threaded rod 105 runs through the sliding plate 106 tops are connected with the rotating plate 107 that is provided with outside.

工作原理:工作人员将单晶硅片放置在放置板7上,然后工作人员转动转动板107带动螺纹杆105进行转动,从而滑动板106在螺纹杆105外壁向下移动,滑动板106带动活动杆104向下移动,活动杆104带动滑杆103向下移动,从而连接板100对弹簧101进行挤压,滑杆103向下移动的时候会带动压紧块102对单晶硅片进行压紧,解决了传统的单晶硅片大多都是放置在脱胶框6内进行清洗,不具有对单晶硅片进行压紧的功能,容易导致单晶硅片掉落,造成单晶硅片损坏的问题(因为单晶硅片为扁平状,放入到清洗箱1内的时候水流容易带动单晶硅片移动),然后在液压杆9的作用下带动安装杆8向下移动,安装杆8带动脱胶框6进入到清洗箱1内进行清洗,在电机21的作用下带动主动齿轮20进行转动,主动齿轮20带动从动齿轮22进行转动,从动齿轮22带动丝杆23进行转动,从而滑块24在丝杆23外壁进行前后移动,滑块24带动安装架5前后移动,安装架5带动脱胶框6前后移动,从而能够带动单晶硅片前后移动,解决了现有的单晶硅片大多都是静置水洗脱胶,脱胶效果差,清洗后的硅片表面存在脱胶不彻底的问题,提高单晶硅片的成品率,有利于单晶硅片的生产。Working principle: the worker places the monocrystalline silicon wafer on the placement plate 7, and then the worker rotates the rotating plate 107 to drive the threaded rod 105 to rotate, so that the sliding plate 106 moves downward on the outer wall of the threaded rod 105, and the sliding plate 106 drives the movable rod 104 moves downward, and the movable rod 104 drives the sliding rod 103 to move downward, so that the connecting plate 100 squeezes the spring 101, and when the sliding rod 103 moves downward, it will drive the pressing block 102 to compress the monocrystalline silicon wafer. It solves the problem that most of the traditional single crystal silicon wafers are placed in the degumming frame 6 for cleaning, which does not have the function of pressing the single crystal silicon wafers, which may easily cause the single crystal silicon wafers to fall and cause damage to the single crystal silicon wafers (Because the monocrystalline silicon wafer is flat, the water flow easily drives the monocrystalline silicon wafer to move when it is put into the cleaning box 1), and then the installation rod 8 is driven to move downward under the action of the hydraulic rod 9, and the installation rod 8 drives the degumming The frame 6 enters the cleaning box 1 for cleaning, drives the driving gear 20 to rotate under the action of the motor 21, the driving gear 20 drives the driven gear 22 to rotate, and the driven gear 22 drives the screw mandrel 23 to rotate, so that the slider 24 The outer wall of the screw rod 23 moves back and forth, the slider 24 drives the installation frame 5 to move back and forth, and the installation frame 5 drives the degumming frame 6 to move back and forth, thereby driving the monocrystalline silicon wafer to move back and forth, which solves the problem that most of the existing single crystal silicon wafers It is standing water washing degumming, the degumming effect is poor, and there is a problem of incomplete degumming on the surface of the cleaned silicon wafer, which improves the yield of single crystal silicon wafers and is beneficial to the production of single crystal silicon wafers.

尽管已经示出和描述了本实用新型的实施例,对于本领域的普通技术人员而言,可以理解在不脱离本实用新型的原理和精神的情况下可以对这些实施例进行多种变化、修改、替换和变型,本实用新型的范围由所附权利要求及其等同物限定。Although the embodiments of the present invention have been shown and described, those skilled in the art can understand that various changes and modifications can be made to these embodiments without departing from the principle and spirit of the present invention , replacements and modifications, the scope of the present utility model is defined by the appended claims and their equivalents.

Claims (6)

1. The utility model provides a degumming machine for monocrystalline silicon piece, is including wasing case (1), its characterized in that: wash case (1) right side wall and be equipped with mounting panel (3), mounting groove (4) have been seted up at mounting panel (3) top, be equipped with moving mechanism (2) in mounting groove (4), mounting panel (3) top sliding connection is equipped with mounting bracket (5), the top is equipped with hydraulic stem (9) in mounting bracket (5), hydraulic stem (9) bottom is equipped with installation pole (8), installation pole (8) bottom is equipped with and takes off gluey frame (6), it places board (7) to be equipped with three groups in gluey frame (6) to take off, it is equipped with hold-down mechanism (10) in gluey frame (6) to take off.
2. A degumming machine for single crystal silicon wafers according to claim 1, characterized in that: moving mechanism (2) are including mounting groove (4) interior back lateral wall lead screw (23) that are equipped with through the bearing connection, lead screw (23) outer wall cup joints and is equipped with slider (24), slider (24) top is connected with mounting bracket (5) bottom, lead screw (23) one end is run through in mounting groove (4) preceding lateral wall and is connected with driven gear (22) that the outside was equipped with, mounting panel (3) right side wall is equipped with motor (21), motor (21) output is connected and is equipped with driving gear (20) with driven gear (22) engaged with.
3. A degumming machine for a single crystal silicon wafer according to claim 2, characterized in that: the bottom has seted up the spacing groove in mounting groove (4), slider (24) bottom is equipped with the stopper with spacing groove assorted.
4. The debonding machine for a monocrystalline silicon wafer according to claim 1, characterized in that: the pressing mechanism (10) comprises sliding rods (103) arranged on the left side and the right side in the degumming frame (6), one ends of the sliding rods (103) penetrate through the degumming frame (6) and are connected with a connecting plate (100) arranged outside, springs (101) are sleeved on the outer walls of the sliding rods (103), one ends of the springs (101) are connected with the bottom of the connecting plate (100), the other ends of the springs (101) are connected with the top of the degumming frame (6), the opposite side walls of the two groups of sliding rods (103) are provided with three groups of pressing blocks (102), the bottoms of the sliding rods (103) are provided with movable rods (104), one ends of the movable rods (104) penetrate through the inner bottom of the degumming frame (6) and are connected with sliding plates (106) arranged outside, the bottom of the degumming frame (6) is provided with a threaded rod (105) through a bearing connection, and one end of the threaded rod (105) penetrates through the top of the sliding plate (106) and is connected with a rotating plate (107) arranged outside.
5. The debonding machine for a single crystal silicon wafer according to claim 4, characterized in that: the three groups of placing plates (7) are distributed in a linear array in the vertical direction in the degumming frame (6), and through holes matched with the sliding rods (103) are formed in the left side and the right side of the top of each placing plate (7).
6. The debonding machine for a single crystal silicon wafer according to claim 4, characterized in that: the three groups of the pressing blocks (102) are respectively positioned above the three groups of the placing plates (7), and anti-skid layers are arranged at the bottoms of the pressing blocks (102).
CN202222340782.6U 2022-09-02 2022-09-02 Degumming machine for monocrystalline silicon wafers Active CN218108653U (en)

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Application Number Priority Date Filing Date Title
CN202222340782.6U CN218108653U (en) 2022-09-02 2022-09-02 Degumming machine for monocrystalline silicon wafers

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Application Number Priority Date Filing Date Title
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117259319A (en) * 2023-11-23 2023-12-22 苏州晨晖智能设备有限公司 An automatic degumming equipment for single crystal silicon wafer production

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117259319A (en) * 2023-11-23 2023-12-22 苏州晨晖智能设备有限公司 An automatic degumming equipment for single crystal silicon wafer production
CN117259319B (en) * 2023-11-23 2024-01-26 苏州晨晖智能设备有限公司 An automatic degumming equipment for single crystal silicon wafer production

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