CN217334032U - Monocrystalline silicon piece degumming pre-cleaning device - Google Patents
Monocrystalline silicon piece degumming pre-cleaning device Download PDFInfo
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- CN217334032U CN217334032U CN202221090905.9U CN202221090905U CN217334032U CN 217334032 U CN217334032 U CN 217334032U CN 202221090905 U CN202221090905 U CN 202221090905U CN 217334032 U CN217334032 U CN 217334032U
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- cleaning
- material frame
- monocrystalline silicon
- cleaning box
- box
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- 238000004140 cleaning Methods 0.000 title claims abstract description 106
- 229910021421 monocrystalline silicon Inorganic materials 0.000 title claims abstract description 43
- 239000000463 material Substances 0.000 claims abstract description 52
- 230000007246 mechanism Effects 0.000 claims abstract description 46
- 230000005540 biological transmission Effects 0.000 claims abstract description 28
- 238000005406 washing Methods 0.000 claims abstract description 23
- 239000002893 slag Substances 0.000 claims abstract description 20
- 235000012431 wafers Nutrition 0.000 claims description 39
- 238000011010 flushing procedure Methods 0.000 claims description 21
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 238000007789 sealing Methods 0.000 claims description 6
- 239000002699 waste material Substances 0.000 claims description 6
- 239000010865 sewage Substances 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- 239000007921 spray Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 239000003818 cinder Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000002146 bilateral effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a monocrystalline silicon piece belt cleaning device in advance that comes unstuck, include: a cleaning tank having an open top surface; the automatic tank cover mechanism is arranged on the top surface of the cleaning tank; the material frame bracket is arranged in the cleaning box; the driving mechanism is arranged on the outer side of the cleaning box and is in transmission connection with the material frame bracket; the washing mechanism is arranged in the washing box and positioned on two sides of the material frame bracket; and the slag removing mechanism is arranged at the bottom in the cleaning box. The utility model discloses a belt cleaning device can realize self-cleaning in advance, has reduced workman's intensity of labour, and the cleaning performance is good, and the cleaning efficiency is high.
Description
Technical Field
The utility model relates to a monocrystalline silicon piece technical field that comes unstuck especially relates to a monocrystalline silicon piece belt cleaning device in advance that comes unstuck.
Background
In the production process of the monocrystalline silicon wafer, the semiconductor wafer is bonded on the material seat, then the monocrystalline silicon wafer is cut into the silicon wafer by the cutting equipment, and the silicon wafer is removed from the material seat by heating degumming treatment to finish degumming of the silicon wafer. Before the monocrystalline silicon piece is degummed, the monocrystalline silicon piece needs to be pre-cleaned, and silicon mud and silicon powder on the monocrystalline silicon piece are washed clean. The manual flushing is not only low in efficiency, but also poor in flushing effect and high in labor intensity of workers.
SUMMERY OF THE UTILITY MODEL
In view of the above defects or shortcomings in the prior art, it is desirable to provide a pre-cleaning device for degumming of monocrystalline silicon wafers, which can realize automatic cleaning, reduce the labor intensity of workers, and has good cleaning effect and high cleaning efficiency.
The utility model provides a pair of monocrystalline silicon piece belt cleaning device in advance that comes unstuck, include:
a cleaning tank having an open top surface;
the automatic tank cover mechanism is arranged on the top surface of the cleaning tank and is used for automatically opening and closing the top surface of the cleaning tank;
the material frame bracket is arranged in the cleaning box and used for supporting a material frame containing monocrystalline silicon wafers;
the driving mechanism is arranged on the outer side of the cleaning box, is in transmission connection with the material frame support and is used for driving the material frame support to move up and down repeatedly;
the washing mechanism is arranged in the cleaning box and positioned on two sides of the material frame bracket;
and the slag removing mechanism is arranged at the bottom in the cleaning box and used for discharging cleaning sewage and cleaning waste slag.
Furthermore, the driving mechanism comprises four guide sleeves which are symmetrical in pairs and are fixedly arranged at two ends of the cleaning box, the guide sleeves are internally sleeved with transmission rods in a sliding manner, the bottom ends of the two transmission rods on the same side are fixedly provided with a first cross beam, the top ends of the two transmission rods are fixedly provided with a second cross beam, connecting rods are symmetrically and fixedly connected with two ends of the second cross beam, the connecting rods extend into the cleaning box and are fixedly connected with the material frame bracket, the outer wall of the cleaning box is provided with a vertical chute corresponding to the connecting rod, the connecting rod is fixedly sleeved with a water baffle attached to the chute, a transmission shaft is arranged below the cleaning box, an eccentric wheel is fixedly sleeved on the transmission shaft and positioned below the first cross beam, a gasket with a smooth surface is fixedly arranged at the bottom of the first cross beam, and a driving motor for driving the first cross beam to rotate is arranged at one end of the transmission shaft.
Further, automatic case lid mechanism including fixed set up in wash the mounting bracket on the top periphery of case, lie in on the mounting bracket wash the outside of case and be provided with and open the station, wash the case and open the bilateral symmetry of station be provided with the slide rail, two be provided with the case lid between the slide rail, the both sides of case lid respectively through the rail wheel with slide rail sliding connection, open the fixed portal frame that is provided with in top of station, be provided with the drive between portal frame and the case lid the gliding actuating cylinder that drives of slide rail is followed to the case lid.
Furthermore, the flushing mechanism comprises a plurality of flushing pipes symmetrically distributed on two sides of the material frame support, a plurality of spray holes are uniformly distributed on one side, close to the material frame support, of each flushing pipe along the length direction of each flushing pipe, one end of each flushing pipe is closed, and the other end of each flushing pipe is connected to the high-pressure water pump through a hose.
Furthermore, a plurality of guide plates which are distributed in a rectangular shape are fixedly arranged on the bottom surface of the material frame support.
Further, scarfing cinder mechanism includes two open collection boxes of top surface, the equipartition has the filtration hole of permeating water on the collection box, the bilateral symmetry of the bottom plate of wasing the incasement is provided with the caulking groove, two collect box separable embedding two respectively in the caulking groove, wash one side of case be provided with the drain pipe that the caulking groove is linked together, be provided with the control valve on the drain pipe, the opposite side of wasing the case corresponds the caulking groove is provided with the scarfing cinder hole, be used for with collect the box and take out from wasing the incasement, detachable installs sealed lid on the scarfing cinder hole.
Furthermore, a connecting rod floating ball liquid level meter is arranged in the cleaning box.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses a wash device in advance and be provided with automatic case lid mechanism, material frame support, actuating mechanism and wash the mechanism. After the semiconductor wafer is cut into monocrystalline silicon wafers, the monocrystalline silicon wafers are placed into a material frame together with a material seat. When the automatic box cover mechanism is pre-cleaned, the automatic box cover mechanism is controlled to be opened, the material frame is lifted through the lifting equipment and placed on the material frame support in the cleaning box, and then the top of the cleaning box is covered by the automatic box cover mechanism. Then the washing mechanisms positioned at the two sides of the material frame support wash the monocrystalline silicon wafers in the material frame, and meanwhile, the driving mechanism drives the material frame support to move up and down repeatedly, so that the washing coverage range is effectively improved, and the cleaning effect is improved. The pre-cleaning device realizes automatic cleaning of monocrystalline silicon wafers, is high in cleaning efficiency, and greatly reduces labor intensity of workers.
It should be understood that what is described in this summary section is not intended to limit key or critical features of embodiments of the invention, nor is it intended to limit the scope of the invention. Other features of the present invention will become apparent from the following description.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments made with reference to the following drawings:
FIG. 1 is a schematic structural diagram of a monocrystalline silicon wafer degumming pre-cleaning device;
FIG. 2 is a schematic view showing an internal structure of the cleaning tank;
fig. 3 is a schematic structural diagram of the driving mechanism.
The reference numbers in the figures: 11. a cleaning tank; 12. an automatic lid closing mechanism; 13. a material frame support; 14. a drive mechanism; 15. a flushing mechanism; 16. a slag removal mechanism; 17. a connecting rod floating ball liquid level meter;
21. a mounting frame; 22. a slide rail; 23. a box cover; 24. a rail wheel; 25. a gantry; 26. a driving cylinder;
31. a guide plate;
41. a guide sleeve; 42. a transmission rod; 43. a first cross member; 44. a second cross member; 45. a connecting rod; 46. a water baffle; 47. a drive shaft; 48. an eccentric wheel; 49. a gasket; 410. a drive motor;
51. a flush tube;
61. a collection box; 62. a drain pipe; 63. and (7) sealing the cover.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the relevant invention and are not limiting of the invention. It should be noted that, for convenience of description, only the portions related to the present invention are shown in the drawings.
It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.
Referring to fig. 1 to 3, an embodiment of the present invention provides a pre-cleaning device for degumming of a monocrystalline silicon wafer, including:
a cleaning tank 11 having an open top surface;
an automatic tank cover mechanism 12 which is arranged on the top surface of the cleaning tank 11 and is used for automatically opening and closing the top surface of the cleaning tank 11;
the material frame bracket 13 is arranged in the cleaning box 11 and used for supporting a material frame containing monocrystalline silicon wafers;
the driving mechanism 14 is arranged on the outer side of the cleaning box 11, is in transmission connection with the material frame support 13 and is used for driving the material frame support 13 to move up and down repeatedly;
the washing mechanism 15 is arranged in the cleaning box 11 and is positioned at two sides of the material frame bracket 13;
and the slag removing mechanism 16 is arranged at the bottom in the cleaning box 11 and is used for discharging cleaning sewage and cleaning and removing waste slag.
In this embodiment, after the semiconductor wafer bonded to the susceptor is cut into single crystal silicon wafers, the single crystal silicon wafers are placed in the frame together with the susceptor. The cleaning tank 11 is supported and installed by a frame body. When the monocrystalline silicon wafers are pre-cleaned, the material frame loaded with the monocrystalline silicon wafers can be placed on the material frame support 13 in the cleaning box 11 by adopting the hoisting equipment through opening and closing the automatic box cover mechanism 12, and the monocrystalline silicon wafers after the pre-cleaning are taken out along with the material frame, so that the automatic taking and placing of the monocrystalline silicon wafers are realized. Provides a foundation for the automatic cleaning of the monocrystalline silicon piece, improves the cleaning efficiency and reduces the labor intensity of workers.
When the washing mechanism 15 washes the monocrystalline silicon wafer in the material frame, the driving mechanism 14 simultaneously drives the material frame support 13 to move up and down repeatedly, so that the washing mechanism 15 can wash all parts of the monocrystalline silicon wafer, the washing coverage range of washing is improved, and the cleaning effect of the monocrystalline silicon wafer is improved.
After the cleaning operation is carried out for a period of time, the cleaning sewage generated in the washing process is discharged through the slag removing mechanism 16, and then the cleaning waste slag is cleaned, so that the washing effect is prevented from being influenced.
In a preferred embodiment, as shown in fig. 1 and 3, the driving mechanism 14 includes four guiding sleeves 41 which are two-by-two symmetrical and fixedly disposed at two ends of the cleaning tank 11, the guiding sleeves 41 are all slidably sleeved and penetrated by the transmission rods 42, the bottom ends of the two transmission rods 42 at the same side are fixedly provided with a first cross beam 43, the top ends of the two transmission rods 42 are fixedly provided with a second cross beam 44, two ends of the second cross beam 44 are symmetrically and fixedly connected with connecting rods 45, the connecting rods 45 extend into the cleaning tank 11 and are fixedly connected with the material frame support 13, the outer wall of the cleaning tank 11 is provided with vertical sliding grooves corresponding to the connecting rods 45, the connecting rods 45 are fixedly sleeved with water baffles 46 attached to the sliding grooves, a transmission shaft 47 is disposed below the cleaning tank 11, an eccentric wheel 48 is fixedly sleeved on the transmission shaft 47 below the first cross beam 43, the bottom of the first cross beam 43 is fixedly provided with a gasket 49 with a smooth surface, and one end of the transmission shaft 47 is provided with a driving motor 410 for driving the transmission shaft to rotate.
In this embodiment, while the monocrystalline silicon wafer is being rinsed, the driving motor 410 drives the eccentric wheel 48 to rotate through the transmission shaft 47, and the eccentric wheel 48 pushes the first beam 43 to move up and down repeatedly through the spacer 49, so as to drive the frame support 13 to move up and down repeatedly through the transmission rod 42, the second beam 44 and the connecting rod 45.
The guide sleeve 41 limits the up-and-down moving track of the transmission rod 42, and ensures that the material frame support 13 can move up and down stably in the vertical direction. The guide sleeve 41 may be directly fixed to the outer wall of the washing tank 11 or may be fixed to a frame body for supporting the washing tank 11.
The water baffle 46 blocks the chute for the connecting rod 45 to move up and down, so that the splashing of the flushing water from the chute to cause the pollution of the surrounding environment is avoided.
In a preferred embodiment, as shown in fig. 1, the automatic box cover mechanism 12 includes a mounting frame 21 fixedly disposed on the top periphery of the cleaning box 11, an opening station is disposed on the mounting frame 21 and located outside the cleaning box 11, slide rails 22 are symmetrically disposed on both sides of the cleaning box 11 and the opening station, a box cover 23 is disposed between the two slide rails 22, two sides of the box cover 23 are slidably connected to the slide rails 22 through rail wheels 24, a portal frame 25 is fixedly disposed above the opening station, and a driving cylinder 26 for driving the box cover 23 to slide along the slide rails 22 is disposed between the portal frame 25 and the box cover 23.
In the present embodiment, the driving cylinder 26 is rotatably connected to the gantry 25, and a piston rod of the driving cylinder 26 is rotatably connected to the box cover 23, so as to compensate the sliding position of the box cover 23. When the box cover 23 is driven to move to the top of the cleaning box 11 through the telescopic driving of the piston rod of the driving cylinder 26, the sealing cover of the cleaning box 11 is automatically finished, and the splashing of the cleaning water to pollute the surrounding environment is avoided; when the box cover 23 moves to the opening station, the cleaning box 11 is automatically opened, so that the material frame loaded with the monocrystalline silicon wafers can be picked and placed.
In a preferred embodiment, as shown in fig. 2, the flushing mechanism 15 includes a plurality of flushing pipes 51 symmetrically distributed on both sides of the material frame support 13, a plurality of spray holes are uniformly distributed on one side of the flushing pipe 51 close to the material frame support 13 along the length direction of the flushing pipe 51, one end of the flushing pipe 51 is closed, and the other end is connected to the high pressure water pump through a hose.
In this embodiment, when the monocrystalline silicon wafer is washed, the high-pressure water pump is started, and high-pressure clean water enters the washing pipe 51 through the hose and is ejected through the nozzle, so that the water pressure is high, and the washing effect is good.
In a preferred embodiment, as shown in fig. 3, a plurality of guide plates 31 are fixedly arranged on the bottom surface of the material frame support 13 and distributed in a rectangular shape, so as to ensure that the material frame loaded with monocrystalline silicon wafers accurately falls on the top surface of the material frame support 13.
In a preferred embodiment, as shown in fig. 1 and 2, the slag removing mechanism 16 comprises two collecting boxes 61 with open top surfaces, filtering and water permeating holes are uniformly distributed on the collecting boxes 61, two symmetric caulking grooves are symmetrically arranged on two sides of a bottom plate in the cleaning box 11, the two collecting boxes 61 are respectively and detachably embedded into the two caulking grooves, one side of the cleaning box 11 is provided with a drain pipe 62 communicated with the caulking grooves, a control valve is arranged on the drain pipe 62, the other side of the cleaning box 11 is provided with a slag removing hole corresponding to the caulking grooves and used for extracting the collecting boxes 61 from the cleaning box, and a sealing cover 63 is detachably arranged on the slag removing hole.
In the present embodiment, the washing sewage falls on the bottom plate in the washing tank 11 and flows into the catch box 61 in the caulking groove. The portion of the collection box 61 close to the drainage pipe 62 covers the inlet of the drainage pipe 62, so that the washing waste water is filtered by the water filtering holes and then discharged through the drainage pipe 62, and the washing waste residue is left in the collection box 61. After the apparatus is operated for a certain period of time, the sealing cover 63 is opened, and the collecting box 61 is drawn out from the washing tank 11 through the slag removing hole. After the collecting box 61 is cleaned up, the collecting box is installed back again through the slag removing hole, the sealing cover 63 is installed on the slag removing hole again, and the cleaning of waste slag is very convenient.
In a preferred embodiment, as shown in fig. 2, a connecting rod float level meter 17 is arranged in the cleaning tank 11 for monitoring the water level in the cleaning tank 11, and when the water level rises to a certain height, the control valve is opened to discharge the cleaning wastewater through a drain pipe 62, so as to avoid the influence of the too high water level on the washing effect of the monocrystalline silicon wafer.
In the description of the present specification, the terms "connect", "mount", "fix", and the like are to be understood in a broad sense, for example, "connect" may be a fixed connection, a detachable connection, or an integral connection; may be directly connected or indirectly connected through an intermediate. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In the description of the present application, the description of the terms "one embodiment," "some embodiments," etc. means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the application. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above description is only a preferred embodiment of the present application and is not intended to limit the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.
Claims (7)
1. A device for degumming and pre-cleaning a monocrystalline silicon wafer is characterized by comprising:
a cleaning tank having an open top surface;
the automatic tank cover mechanism is arranged on the top surface of the cleaning tank and is used for automatically opening and closing the top surface of the cleaning tank;
the material frame bracket is arranged in the cleaning box and used for supporting a material frame containing monocrystalline silicon wafers;
the driving mechanism is arranged on the outer side of the cleaning box, is in transmission connection with the material frame support and is used for driving the material frame support to move up and down repeatedly;
the washing mechanism is arranged in the cleaning box and positioned on two sides of the material frame bracket;
and the slag removing mechanism is arranged at the bottom in the cleaning box and used for discharging cleaning sewage and cleaning waste slag.
2. The degumming pre-cleaning device for monocrystalline silicon wafers according to claim 1, wherein the driving mechanism comprises four guide sleeves which are arranged at two ends of the cleaning box in a pairwise symmetrical manner, the guide sleeves are internally sleeved with transmission rods in a sliding manner, the bottom ends of the two transmission rods at the same side are fixedly provided with a first cross beam, the top ends of the two transmission rods are fixedly provided with a second cross beam, the two ends of the second cross beam are fixedly connected with connecting rods in a symmetrical manner, the connecting rods extend into the cleaning box and are fixedly connected with the material frame bracket, the outer wall of the cleaning box is provided with vertical sliding grooves corresponding to the connecting rods, the connecting rods are fixedly sleeved with water baffles attached to the sliding grooves, a transmission shaft is arranged below the cleaning box, eccentric wheels are fixedly sleeved on the transmission shaft below the first cross beam, and the bottom of the first cross beam is fixedly provided with a gasket with a smooth surface, and one end of the transmission shaft is provided with a driving motor for driving the transmission shaft to rotate.
3. The monocrystalline silicon wafer degumming pre-cleaning device according to claim 1, wherein the automatic tank cover mechanism comprises a mounting frame fixedly arranged on the periphery of the top of the cleaning tank, an opening station is arranged on the mounting frame and positioned outside the cleaning tank, slide rails are symmetrically arranged on two sides of the cleaning tank and the opening station, a tank cover is arranged between the two slide rails, two sides of the tank cover are respectively connected with the slide rails in a sliding manner through rail wheels, a portal frame is fixedly arranged above the opening station, and a driving cylinder for driving the tank cover to slide along the slide rails is arranged between the portal frame and the tank cover.
4. The monocrystalline silicon wafer degumming pre-cleaning device according to claim 1, wherein the flushing mechanism comprises a plurality of flushing pipes symmetrically distributed on two sides of the material frame support, a plurality of spray holes are uniformly distributed on one side of each flushing pipe close to the material frame support along the length direction of the corresponding flushing pipe, one end of each flushing pipe is closed, and the other end of each flushing pipe is connected to a high-pressure water pump through a hose.
5. The device for degumming and pre-cleaning of monocrystalline silicon wafers according to claim 1, wherein a plurality of guide plates which are distributed in a rectangular shape are fixedly arranged on the bottom surface of the material frame support.
6. The pre-cleaning device for degumming of monocrystalline silicon wafers according to claim 1, wherein the slag removing mechanism comprises two collecting boxes with open top surfaces, the collecting boxes are uniformly provided with water permeable filtering holes, two sides of a bottom plate in the cleaning box are symmetrically provided with embedded grooves, the two collecting boxes are respectively and detachably embedded into the two embedded grooves, one side of the cleaning box is provided with a drain pipe communicated with the embedded grooves, the drain pipe is provided with a control valve, the other side of the cleaning box is provided with slag removing holes corresponding to the embedded grooves and used for extracting the collecting boxes from the cleaning box, and sealing covers are detachably mounted on the slag removing holes.
7. The pre-cleaning device for degumming of monocrystalline silicon wafers according to claim 6, wherein a connecting rod floating ball liquid level meter is arranged in the cleaning box.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221090905.9U CN217334032U (en) | 2022-05-09 | 2022-05-09 | Monocrystalline silicon piece degumming pre-cleaning device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221090905.9U CN217334032U (en) | 2022-05-09 | 2022-05-09 | Monocrystalline silicon piece degumming pre-cleaning device |
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| CN217334032U true CN217334032U (en) | 2022-08-30 |
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| CN202221090905.9U Active CN217334032U (en) | 2022-05-09 | 2022-05-09 | Monocrystalline silicon piece degumming pre-cleaning device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119028872A (en) * | 2024-07-29 | 2024-11-26 | 江苏东海半导体股份有限公司 | A preparation device and preparation method of insulated gate bipolar transistor |
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2022
- 2022-05-09 CN CN202221090905.9U patent/CN217334032U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN119028872A (en) * | 2024-07-29 | 2024-11-26 | 江苏东海半导体股份有限公司 | A preparation device and preparation method of insulated gate bipolar transistor |
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