CN216639701U - Electrochemical polishing solution circulating filter device - Google Patents
Electrochemical polishing solution circulating filter device Download PDFInfo
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- CN216639701U CN216639701U CN202123404305.3U CN202123404305U CN216639701U CN 216639701 U CN216639701 U CN 216639701U CN 202123404305 U CN202123404305 U CN 202123404305U CN 216639701 U CN216639701 U CN 216639701U
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Abstract
The utility model discloses an electrochemical polishing solution circulating and filtering device, which comprises a filtering tank, wherein the filtering tank comprises an unfiltered polishing solution tank and a filtered polishing solution tank which are connected with each other, one end of the unfiltered polishing solution tank is provided with a liquid inlet port, the liquid inlet port is connected with a polishing solution storage tank, one end of the filtered polishing solution tank is provided with a liquid outlet port, the liquid outlet port is connected with the polishing tank, and the polishing solution storage tank is also connected with the polishing tank; the filtering mechanism is connected between the unfiltered polishing solution tank and the filtered polishing solution tank; the circulating mechanism is arranged between the liquid outlet port and the polishing groove; the filter tank, the filter mechanism, the circulating mechanism, the polishing solution storage tank and the polishing tank form circulating connection. The polishing solution voltage can be stably controlled, various parameters in polishing production processes such as the polishing voltage and the like are stabilized, metal salts in the polishing solution can be removed, pits on the surface of the base band are removed, the roughness value is reduced, and the performance of the base band is improved.
Description
Technical Field
The utility model belongs to the technical field of electrochemical polishing in a Hastelloy base band of a second-generation high-temperature superconducting strip, and particularly relates to an electrochemical polishing solution circulating and filtering device used in the polishing process of an electrochemical polishing solution.
Background
In the electrochemical polishing process, a polished metal workpiece is used as an anode, an insoluble metal plate is used as a cathode, the two electrodes are simultaneously immersed into an electrolytic tank, polishing solution is introduced into the electrolytic tank, and direct current is applied to the electrolytic tank to generate selective anode dissolution, so that the effect of increasing the surface brightness of the workpiece is achieved. Electrochemical polishing can remove oxide and stress layers on the surface very effectively. Compared with the traditional mechanical polishing, the electrochemical polishing has the advantages of high production efficiency, low cost, good uniformity and the like.
Electrochemical polishing basic principle of hastelloy base band: the hastelloy base band to be polished is placed in an anode, an inert electrode is used as a cathode, and under the conditions of a certain temperature, a certain current and a certain voltage, an oxidation-reduction reaction process (strong acid electrolyte solution with a certain concentration, namely polishing solution) is carried out in strong acid electrolyte solution. The main factors influencing the stability of the Hastelloy base band polishing production process are as follows: polishing current, polishing speed, polishing solution flow rate, polishing voltage, polishing temperature, polishing solution characteristics and the like. Therefore, the surface roughness, consistency, flatness and other characteristics of the polished Hastelloy base band can be slightly changed along with the surface roughness, consistency, flatness and the like. Therefore, the process parameters such as polishing voltage, polishing temperature, polishing solution characteristics and the like are controlled efficiently, and the stability of the alloy baseband polishing process is important.
In the using and storing process of the electrochemical polishing solution, the content of main components in the polishing solution is reduced due to the absorption of concentrated sulfuric acid or concentrated phosphoric acid on moisture in air; meanwhile, as the polishing process is continuously carried out, the concentration of generated metal ions in the polishing solution is increased sharply in the polishing process, some metal salt particles can be separated out from the polishing solution after a period of time, and the further use of the chemical polishing solution can be influenced to a certain extent, so that the defects on the surface of the superconducting baseband can be caused, and the performance of the superconducting baseband can be further influenced.
The method for efficiently controlling metal salt particles in polishing solution to stabilize the polishing voltage, the characteristics of the polishing solution and other process parameters so as to solve the problem of surface defects of the superconducting alloy baseband polishing, such as pits on the surface of the baseband, is still blank in the field at present.
SUMMERY OF THE UTILITY MODEL
In view of the above technical problems, the present invention aims to: provides an electrochemical polishing solution circulating filter device, removes metal salts in the polishing solution, removes pits on the surface of a base band, reduces the roughness value and improves the performance of the base band.
The technical scheme of the utility model is as follows:
the utility model aims to provide an electrochemical polishing solution circulating and filtering device, which comprises:
the polishing device comprises a filtering tank, a polishing solution storage tank and a polishing solution storage tank, wherein the filtering tank comprises an unfiltered polishing solution tank and a filtered polishing solution tank which are connected, one end of the unfiltered polishing solution tank is provided with a liquid inlet port, the liquid inlet port is connected with the polishing solution storage tank, one end of the filtered polishing solution tank is provided with a liquid outlet port, the liquid outlet port is connected with the polishing tank, and the polishing solution storage tank is also connected with the polishing tank;
the filtering mechanism is connected between the unfiltered polishing solution tank and the filtered polishing solution tank;
the circulating mechanism is arranged between the liquid outlet port and the polishing groove;
the filter tank, the filter mechanism, the circulating mechanism, the polishing solution storage tank and the polishing tank form circulating connection.
Compared with the prior art, the utility model has the advantages that:
the electrochemical polishing solution circulating and filtering device comprises a filtering tank, a filtering mechanism and a circulating mechanism, wherein the filtering device, the polishing tank and a polishing solution storage tank form a circulating system, the filtered polishing solution is used for polishing a base band, the used polishing solution is circularly filtered by the filtering mechanism and then reused after the polishing treatment is finished, the voltage of the polishing solution can be stably controlled, various parameters in the polishing production process such as the polishing voltage and the like are further stabilized, metal salts in the polishing solution are removed, pocks on the surface of the base band are removed, the roughness value is reduced, the performance of the base band is improved, and the preparation and use cost of the polishing solution can be greatly saved. The filtering device is simple in structure and high in practicability.
Drawings
The utility model is further described with reference to the following figures and examples:
FIG. 1 is a schematic structural diagram of an electrochemical polishing solution circulation filtering apparatus (omitting a polishing solution storage tank and a polishing tank) according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a non-woven fabric filter mesh bag of the electrochemical polishing solution circulation filtering device according to the embodiment of the utility model.
Wherein: 1. an unfiltered polishing fluid bath; 2. filtering the polishing solution tank; 3. a filtering mechanism; 31. a connecting plate; 32. a connecting member; 4. a liquid inlet conduit; 5. a liquid outlet conduit; 6. a separator.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail with reference to the accompanying drawings in conjunction with the following detailed description. It should be understood that the description is intended to be exemplary only, and is not intended to limit the scope of the present invention. Moreover, in the following description, descriptions of well-known structures and techniques are omitted so as to not unnecessarily obscure the concepts of the present invention.
Example (b):
referring to fig. 1 to 2, the electrochemical polishing solution circulation filtering apparatus of the present embodiment includes a filter tank, a filtering mechanism 3, and a circulation mechanism (not shown). The filter tank comprises an unfiltered polishing liquid tank 1 and a filtered polishing liquid tank 2 which are connected, one end of the unfiltered polishing liquid tank 1 is provided with a liquid inlet port (not shown), the liquid inlet port is connected with a polishing liquid storage tank (not shown), one end of the filtered polishing liquid tank 2 is provided with a liquid outlet port (not shown), the liquid outlet port is connected with a polishing tank (not shown), the polishing liquid storage tank and the polishing tank are also connected, and the polishing tank is a tank body which is used for receiving polishing liquid of the filtered polishing liquid tank after being filtered by the filter device and used for polishing a strip. The filtering mechanism 3 is connected between the unfiltered polishing solution tank 1 and the filtered polishing solution tank 2. The circulating mechanism is arranged between the liquid outlet port and the polishing groove. The filter tank, the filter mechanism 3, the circulating mechanism, the polishing solution storage tank and the polishing tank form circulating connection. That is, when a strip to be polished, such as a hastelloy base band, a stainless base band or a nickel-tungsten base band, needs to be polished, polishing liquid (mainly phosphoric acid, sulfuric acid and some additives) is stored in a polishing liquid storage tank, a circulation mechanism is opened, a valve is opened, the polishing liquid in the polishing liquid storage tank is pumped into an unfiltered polishing liquid tank 1 by the circulation mechanism, the polishing liquid is filtered by a filter mechanism 3 and then enters a filtered polishing liquid tank 2, the filtered polishing liquid is pumped into a polishing tank through a liquid outlet port, the circulation mechanism is closed, the strip to be polished is placed into the polishing tank for polishing, after the polishing treatment is finished, the circulation mechanism is opened again, the polishing liquid used in the polishing tank flows back into the polishing liquid storage tank, and then the strip can be filtered and used again when used again.
As shown in FIG. 1, the tank 1 for unfiltered polishing liquid and the tank 2 for filtered polishing liquid are vertically arranged and separated by a horizontal partition 6, four through holes (not shown) are formed in the partition 6, a filter mechanism 3 is installed in each through hole, and the four filter mechanisms 3 are arranged in parallel. It should be noted that the number of through holes and filter means 3 may also be other numbers, such as one, two, three, five, etc. The purpose of arranging the setting from top to bottom can more conveniently filter, utilizes the action of gravity for the polishing solution in the unfiltered polishing solution tank falls into to filtering polishing solution tank 2 after passing through filtering mechanism 3 under the action of gravity. As an alternative embodiment, the arrangement between the unfiltered polishing fluid tank 1 and the filtered polishing fluid tank 2 may also be in other ways, such as a left-right arrangement. It is also possible for the partition 6 not to be a horizontal partition, such as a vertical partition or an inclined partition.
The filtering mechanism 3 can be selected from a non-woven fabric filtering mesh bag which is conventional in the prior art, such as a polypropylene industrial liquid filtering mesh bag, and the mesh number can be 1250-2500 meshes, namely the precision can be 5-10 um. The non-woven fabric filter mesh bag is provided with a connecting plate 31 at one end connected with the partition board 6, the connecting plate 31 is provided with a plurality of connecting holes, the connecting plate 31 is arranged in the connecting holes in a penetrating way through a connecting piece 32 and fixed at the through holes of the partition board 6, and correspondingly, the partition board 6 at the through holes is also provided with corresponding connecting holes (not shown). As shown in fig. 2, the connecting plate 31 is a circular connecting plate with a hollow center, the connecting plate 31 is provided with a plurality of connecting holes along the circumferential direction, the connecting members 32 are screws, and correspondingly, the connecting holes on the partition plate 6 are threaded holes.
The circulation mechanism is a conventional circulation pump in the prior art. The specific construction and operation are not described or limited in detail herein.
The polishing solution storage tank is connected with the liquid inlet port of the unfiltered polishing solution tank 1 through a liquid inlet conduit 4. The polishing groove is connected with the liquid outlet port of the filtering polishing liquid groove 2 through a liquid outlet conduit 5. The polishing tank and the slurry storage tank are connected by a connecting pipe (not shown). Valves (not shown) are arranged on the liquid inlet conduit 4, the liquid outlet conduit 5 and the connecting conduit. The communication or closing of the grooves is controlled by valves.
For the polishing liquid storage tank and/or the polishing tank, a U-shaped tank is selected. I.e. open topped trough.
It should be noted that the filter tank can resist corrosion of the polishing solution, specifically, acid-base corrosion resistance. The polishing tank can be arranged above the polishing solution storage tank and the filtering device, and specifically comprises the polishing tank, the filtering device and the polishing solution storage tank from top to bottom. After the polishing treatment is finished, a valve between the polishing tank and the polishing solution storage tank is opened, and the polishing solution in the polishing tank directly falls back into the polishing solution storage tank under the action of gravity.
According to the electrochemical polishing solution circulating and filtering device provided by the embodiment of the utility model, the filtering tank, the filtering mechanism 3 and the circulating mechanism are arranged, the filtering device, the polishing tank and the polishing solution storage tank form a circulating system, the filtered polishing solution is used for polishing the base band, the used polishing solution is circulated and filtered by the filtering mechanism and then reused after the polishing treatment is finished, the voltage of the polishing solution can be stably controlled, various parameters in the polishing production process such as the polishing voltage and the like are further stabilized, metal salts in the polishing solution can be removed, pocks on the surface of the base band are removed, the roughness value is reduced, the performance of the base band is improved, and the configuration and use cost of the polishing solution can be greatly saved. The filtering device is simple in structure and high in practicability.
It is noted that those skilled in the art will recognize that embodiments of the present invention are not described in detail herein.
In summary, the method and the device provided by the embodiment of the utility model can perform a temperature impact experiment based on the high-temperature superconducting armor tape, and the experiment can analyze the influence of temperature impact under different conditions on the superconducting performance of the high-temperature superconducting armor tape, verify the sealing performance of the high-temperature superconducting armor tape coating, and have a certain reference value for improving the coating process of the high-temperature superconducting armor tape.
The directions given in the present embodiment are merely for convenience of describing positional relationships between the respective members and the relationship of fitting with each other. The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the utility model may occur to those skilled in the art without departing from the principle of the utility model, and are considered to be within the scope of the utility model.
Claims (10)
1. An electrochemical polishing solution circulating and filtering device is characterized by comprising:
the polishing device comprises a filtering tank, a polishing solution storage tank and a polishing solution storage tank, wherein the filtering tank comprises an unfiltered polishing solution tank and a filtered polishing solution tank which are connected, one end of the unfiltered polishing solution tank is provided with a liquid inlet port, the liquid inlet port is connected with the polishing solution storage tank, one end of the filtered polishing solution tank is provided with a liquid outlet port, the liquid outlet port is connected with the polishing tank, and the polishing solution storage tank is also connected with the polishing tank;
the filtering mechanism is connected between the unfiltered polishing solution tank and the filtered polishing solution tank;
the circulating mechanism is arranged between the liquid outlet port and the polishing groove;
the filter tank, the filter mechanism, the circulating mechanism, the polishing solution storage tank and the polishing tank form circulating connection.
2. The apparatus as claimed in claim 1, wherein the unfiltered polishing solution tank and the filtered polishing solution tank are arranged in an up-down manner.
3. The circulating and filtering device for electrochemical polishing solution according to claim 1 or 2, wherein a partition is provided between the unfiltered polishing solution tank and the filtered polishing solution tank, a through hole is provided on the partition, and the filtering mechanism is provided at the through hole.
4. The device as claimed in claim 3, wherein the filter mechanism is a non-woven fabric filter mesh bag.
5. The device as claimed in claim 4, wherein the non-woven fabric filter mesh bag has a connection plate at one end connected to the partition plate, the connection plate has a plurality of connection holes, and the connection plate is fixed at the through hole of the partition plate by a connection member passing through the connection holes.
6. The circulating filter device for electrochemical polishing solution according to claim 4 or 5, wherein the number of the filter mechanisms is four, and the filter mechanisms are distributed at intervals along the length direction of the separator.
7. The device as claimed in claim 4, wherein the non-woven fabric filter mesh bag is a polypropylene industrial liquid non-woven fabric filter mesh bag.
8. The circulating and filtering device for electrochemical polishing solution according to claim 4 or 7, wherein the mesh number of the non-woven fabric filter mesh bag is 1250-2500 meshes.
9. The apparatus as claimed in claim 1, wherein the circulation mechanism is a circulation pump.
10. The device for circulating and filtering electrochemical polishing solution as claimed in claim 1, wherein the polishing solution storage tank is connected with the liquid inlet port of the unfiltered polishing solution tank through a liquid inlet conduit;
the polishing groove is connected with the liquid outlet port of the filtering polishing liquid groove through a liquid outlet conduit;
the polishing groove is connected with the polishing solution storage groove through a connecting conduit;
valves are arranged on the liquid inlet conduit, the liquid outlet conduit and the connecting conduit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123404305.3U CN216639701U (en) | 2021-12-31 | 2021-12-31 | Electrochemical polishing solution circulating filter device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123404305.3U CN216639701U (en) | 2021-12-31 | 2021-12-31 | Electrochemical polishing solution circulating filter device |
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| Publication Number | Publication Date |
|---|---|
| CN216639701U true CN216639701U (en) | 2022-05-31 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202123404305.3U Active CN216639701U (en) | 2021-12-31 | 2021-12-31 | Electrochemical polishing solution circulating filter device |
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| CN (1) | CN216639701U (en) |
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2021
- 2021-12-31 CN CN202123404305.3U patent/CN216639701U/en active Active
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