CN214672522U - Silicon wafer cleaning equipment - Google Patents
Silicon wafer cleaning equipment Download PDFInfo
- Publication number
- CN214672522U CN214672522U CN202120452325.9U CN202120452325U CN214672522U CN 214672522 U CN214672522 U CN 214672522U CN 202120452325 U CN202120452325 U CN 202120452325U CN 214672522 U CN214672522 U CN 214672522U
- Authority
- CN
- China
- Prior art keywords
- body shell
- machine body
- roller
- rotating shaft
- silicon wafer
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 50
- 239000010703 silicon Substances 0.000 title claims abstract description 50
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 239000007921 spray Substances 0.000 claims description 11
- 244000309464 bull Species 0.000 claims description 9
- 238000007599 discharging Methods 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 abstract description 13
- 238000005406 washing Methods 0.000 abstract description 6
- 230000003749 cleanliness Effects 0.000 abstract description 5
- 239000002245 particle Substances 0.000 abstract description 5
- 238000011109 contamination Methods 0.000 abstract description 4
- 235000012431 wafers Nutrition 0.000 description 19
- 239000010408 film Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 239000012459 cleaning agent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Images
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The utility model discloses a silicon chip cleaning equipment, including engine body shell, still include feed mechanism, feeding mechanism, conveying tray and a plurality of washing and change the roller, the washing change the roller set up in the engine body shell, feed mechanism with feeding mechanism set up in the engine body shell both sides, feed mechanism with feeding mechanism respectively with engine body shell's pan feeding mouth and discharge gate set up relatively, the pan feeding mouth with be provided with on the discharge gate respectively conveying tray, engine body shell's top is provided with the top cap, be provided with a plurality of shower heads in the top cap, the shower head is located respectively the washing changes the roller both sides. The utility model adopts the above structure a silicon chip cleaning equipment cleans the silicon chip surface through the physical mode, can directly get rid of the impurity contamination of film form and particle form to the part gets rid of atomic state or ionic state's impurity, strengthens the surface cleanliness of silicon chip, and then improves product quality.
Description
Technical Field
The utility model belongs to the technical field of the silicon chip belt cleaning device technique and specifically relates to a silicon chip cleaning equipment is related to.
Background
In the production of semiconductor devices, silicon wafers are strictly cleaned, and the devices are also failed due to trace pollution. The cleaning is intended to remove surface contaminating impurities, including organic and inorganic substances. Some of these impurities exist in an atomic state or an ionic state, and some exist in a thin film form or a particle form on the surface of the silicon wafer. The cleanliness of the surface of the silicon wafer is a key factor influencing the qualified rate of the silicon wafer. Generally, a layer of antireflection film with good performance is coated on the surface of the silicon, harmful impurity ions enter a silicon dioxide layer, the insulating property is reduced, and the insulating property is better after cleaning; in the plasma edge corrosion, if oil stains, water vapor, dust and other impurities exist, the quality of the device is affected, and the quality is greatly improved after cleaning.
SUMMERY OF THE UTILITY MODEL
The utility model aims at providing a silicon chip cleaning equipment cleans the silicon chip surface through the physical mode, can directly get rid of the impurity contamination of film form and particle form to the part gets rid of atomic state or ionic state's impurity, strengthens the surface cleanliness of silicon chip, and then improves product quality.
For realizing the above-mentioned purpose, the utility model provides a silicon chip cleaning equipment, including engine body shell, still include feed mechanism, feeding mechanism, conveying tray and a plurality of washing and change the roller, wash and change the roller set up in the engine body shell, feed mechanism with feeding mechanism set up in the engine body shell both sides, feed mechanism with feeding mechanism respectively with engine body shell's pan feeding mouth and discharge gate set up relatively, the pan feeding mouth with be provided with on the discharge gate respectively conveying tray, engine body shell's top is provided with the top cap, be provided with a plurality of shower heads in the top cap, the shower head is located respectively wash and change the roller both sides.
Preferably, the feeding mechanism with the extracting mechanism all includes driving motor, bull stick, lift cylinder and vacuum chuck, the bull stick is fixed in on driving motor's the output shaft, the lift cylinder is fixed the side of bull stick, be fixed with the connecting rod on the slider of lift cylinder, the end of connecting rod is fixed with vacuum chuck, vacuum chuck is connected with sucking disc controller through the breather pipe, sucking disc controller fixes the driving motor side.
Preferably, the cleaning rollers are provided with two groups, each group of cleaning rollers comprises a driving roller and a driven roller, the driving roller rotates around a first rotating shaft, one end of the first rotating shaft is rotatably connected with the side wall of the machine body shell through a bearing, the other end of the first rotating shaft extends out of the machine body shell and is connected with an output shaft of a rotating motor, a driving gear is arranged at the other end of the first rotating shaft, the driven roller rotates around a second rotating shaft, one end of the second rotating shaft is rotatably connected with the side wall of the machine body shell through a bearing, the other end of the second rotating shaft extends out of the machine body shell, a driven gear is arranged at the other end of the second rotating shaft and is meshed with the driving gear, the driving roller is positioned above or below the driven roller, and the surfaces of the driving roller and the driven roller are covered with a cleaning layer, the two groups of cleaning rotating rollers are arranged in the machine body shell side by side.
Preferably, the pan feeding mouth with the both sides of discharge gate all are provided with the slide rail, one of them open on the lateral wall of slide rail has the spout, the conveying tray set up in between the slide rail, be provided with the glide block on the four corners of conveying tray respectively, the glide block respectively with both sides slide rail sliding connection keeps away from one of them of engine body shell the back of glide block is provided with the horizontal pole, the horizontal pole passes the spout stretches out the slide rail back, the engine body shell top is fixed with the conveying cylinder, the conveying cylinder is connected with the right angle connecting rod, the one end of right angle connecting rod with the piston rod of conveying cylinder is connected, the other end of right angle connecting rod is located the back of slide rail and with the horizontal pole is connected.
Preferably, the bottom surface of the machine body shell is in a frustum pyramid shape protruding downwards, and a plurality of water outlets are formed in the bottom surface of the machine body shell.
Preferably, the spray header is communicated with a water pipe, and the water pipe penetrates through the top cover and extends into the machine body shell.
Therefore, the utility model adopts the above structure a silicon chip cleaning equipment, transport the silicon chip through feed mechanism, convey the silicon chip to wasing between the commentaries on classics roller through the conveying tray, spray clean medicament through the shower head simultaneously, the silicon chip is from wasing to change and pass through between the roller, send out engine body shell via the conveying tray again and take away the silicon chip outward and through extracting mechanism, can directly get rid of the impurity contamination of film form and particle form, and the impurity of atomic state or ionic state is got rid of to the part, strengthen the surface cleanliness of silicon chip, and then improve product quality.
The technical solution of the present invention is further described in detail by the accompanying drawings and examples.
Drawings
FIG. 1 is a schematic top view of a silicon wafer cleaning apparatus according to an embodiment of the present invention;
fig. 2 is a schematic side view of an embodiment of a silicon wafer cleaning apparatus of the present invention.
Reference numerals
1. A body housing; 11. a top cover; 12. a water outlet; 13. a feeding port; 14. a discharge port; 15. a shower head; 2. cleaning the roller; 21. a driving gear; 22. a driven gear; 23. a first rotating shaft; 24. a second rotating shaft; 25. rotating the motor; 3. a feeding mechanism; 31. a drive motor; 32. a rotating rod; 33. a lifting cylinder; 34. a vacuum chuck; 35. a sucker controller; 36. a slider; 37. a connecting rod; 4. a material taking mechanism; 5. a transfer tray; 51. a slide rail; 52. a chute; 53. a sliding block; 54. a transfer cylinder; 55. a right angle linkage.
Detailed Description
The technical solution of the present invention is further explained by the accompanying drawings and examples.
Unless defined otherwise, technical or scientific terms used herein shall have the ordinary meaning as understood by those of ordinary skill in the art to which the invention belongs. The use of "first," "second," and similar terms in the description herein do not denote any order, quantity, or importance, but rather the terms are used to distinguish one element from another. The word "comprising" or "comprises", and the like, means that the element or item listed before the word covers the element or item listed after the word and its equivalents, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "upper", "lower", "left", "right", and the like are used merely to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationships may also be changed accordingly.
Examples
The utility model provides a silicon chip cleaning equipment, includes engine body shell 1, still includes feed mechanism 3, feeding mechanism 4, conveying tray 5 and a plurality of washing roller 2. The top of engine body shell 1 is provided with top cap 11, and top cap 11 and engine body shell 1 accessible screw fixation or modes such as buckle are fixed, are convenient for take off top cap 11 and change washing roller 2. A plurality of spray headers 15 are arranged in the top cover 11, and the spray headers 15 are respectively positioned at two sides of the cleaning roller 2. The spray header 15 is communicated with a water pipe, and the water pipe penetrates through the top cover 11 and extends into the machine body shell 1. The spray header 15 is connected with a water source from the outside, and can spray water or other cleaning agents to the cleaning roller 2, so that direct spraying to the silicon wafer is avoided, and static electricity is prevented from being generated on the surface of the silicon wafer. The bottom surface of the machine body shell 1 is in a frustum pyramid shape protruding downwards, a plurality of water outlets 12 are formed in the bottom surface of the machine body shell 1, and wastewater is collected towards the bottom of the machine body shell 1 and is discharged from the water outlets 12.
The cleaning rotary roller 2 is arranged in the machine body shell 1, the cleaning rotary roller 2 is provided with two groups, and the two groups of cleaning rotary rollers 2 are arranged in the machine body shell 1 side by side. Every group washs and changes roller 2 and all includes drive roll and driven voller, and the drive roll is rotatory around first pivot 23, and the one end of first pivot 23 is passed through the bearing and is connected with the lateral wall rotation of engine body shell 1, and the other end of first pivot 23 stretches out outside engine body shell 1 and is connected with the output shaft that rotates motor 25, is provided with driving gear 21 on the other end of first pivot 23. The driven roller rotates around the second rotating shaft 24, one end of the second rotating shaft 24 is rotatably connected with the side wall of the machine body shell 1 through a bearing, the other end of the second rotating shaft 24 extends out of the machine body shell 1, the driven gear 22 is arranged at the other end of the second rotating shaft 24, the driven gear 22 is meshed with the driving gear 21 and is connected with the driving roller, and the driving roller is located above or below the driven roller. When the rotating motor 25 is started, the driving gear 21 drives the driven gear 22 to rotate, so as to respectively drive the driving roller and the driven roller to rotate, the rotating directions of the driving roller and the driven roller are opposite, the first group of cleaning rotating rollers 2 conveys the silicon wafer from the conveying tray 5 to the second group of cleaning rotating rollers 2, and then the silicon wafer is conveyed to the conveying tray 5 at the discharge port 14. The surfaces of the driving roller and the driven roller are covered with cleaning layers, so that the physical cleaning of the silicon wafer is completed during transportation, and the film residues and granular impurities on the surface of the silicon wafer can be removed.
The feeding port 13 and the discharging port 14 are respectively provided with a conveying tray 5, two sides of the feeding port 13 and the discharging port 14 are respectively provided with a sliding rail 51, a sliding groove 52 is formed in the side wall of one sliding rail 51, the conveying tray 5 is arranged between the sliding rails 51, four corners of the conveying tray 5 are respectively provided with a sliding block 53, the sliding blocks 53 are respectively in sliding connection with the sliding rails 51 on the two sides, the back face of one sliding block 53 far away from the engine body shell 1 is provided with a cross rod, the cross rod penetrates through the sliding groove 52 and extends out of the back face of the sliding rail 51, the top end of the engine body shell 1 is fixedly provided with a conveying cylinder 54, the conveying cylinder 54 is connected with a right-angle connecting rod 55, one end of the right-angle connecting rod 55 is connected with a piston rod of the conveying cylinder 54, and the other end of the right-angle connecting rod 55 is located on the back face of the sliding rail 51 and connected with the cross rod. When the conveying cylinder 54 is started, the right-angle connecting rod 55 is driven to move forward or backward, and the right-angle connecting rod 55 drives the sliding block 53 and the conveying tray 5 to move forward or backward, so that the silicon wafer is conveyed to the front of the cleaning rotating roller 2 and the cleaned silicon wafer is conveyed out.
Therefore, the utility model adopts the above structure a silicon chip cleaning equipment, transport the silicon chip through feed mechanism 3, convey the silicon chip to wasing to change and wash between the roller 2 through conveying tray 5, spray clean medicament through shower head 15 simultaneously, the silicon chip is from wasing to change and pass through between the roller 2, send out engine body shell 1 via conveying tray 5 again and take away the silicon chip through extracting mechanism 4 outward, can directly get rid of the impurity contamination of film form and particle form, and the impurity of atomic state or ionic state is got rid of to the part, strengthen the surface cleanliness of silicon chip, and then improve product quality.
Finally, it should be noted that: the above embodiments are only for illustrating the technical solutions of the present invention and not for limiting the same, and although the present invention is described in detail with reference to the preferred embodiments, those skilled in the art should understand that: the technical solution of the present invention can still be modified or replaced by other equivalent means, and the modified technical solution can not be separated from the spirit and scope of the technical solution of the present invention.
Claims (6)
1. The silicon wafer cleaning equipment comprises a machine body shell and is characterized in that: the cleaning roller is arranged in the machine body shell, the feeding mechanism and the material taking mechanism are arranged on two sides of the machine body shell, the feeding mechanism and the material taking mechanism are respectively arranged opposite to a feeding port and a discharging port of the machine body shell, the feeding port and the discharging port are respectively provided with the conveying tray, the top end of the machine body shell is provided with a top cover, a plurality of spray heads are arranged in the top cover, and the spray heads are respectively positioned on two sides of the cleaning roller.
2. The silicon wafer cleaning apparatus according to claim 1, wherein: the feeding mechanism with the feeding mechanism all includes driving motor, bull stick, lift cylinder and vacuum chuck, the bull stick is fixed in on driving motor's the output shaft, the lift cylinder is fixed the side of bull stick, be fixed with the connecting rod on the slider of lift cylinder, the end of connecting rod is fixed with vacuum chuck, vacuum chuck is connected with sucking disc controller through the breather pipe, sucking disc controller fixes the driving motor side.
3. The silicon wafer cleaning apparatus according to claim 1, wherein: the cleaning rotating rollers are provided with two groups, each group of cleaning rotating rollers comprises a driving roller and a driven roller, the driving roller rotates around a first rotating shaft, one end of the first rotating shaft is rotatably connected with the side wall of the machine body shell through a bearing, the other end of the first rotating shaft extends out of the machine body shell and is connected with an output shaft of a rotating motor, a driving gear is arranged at the other end of the first rotating shaft, the driven roller rotates around a second rotating shaft, one end of the second rotating shaft is rotatably connected with the side wall of the machine body shell through a bearing, the other end of the second rotating shaft extends out of the machine body shell, a driven gear is arranged at the other end of the second rotating shaft and is meshed with the driving gear, the driving roller is positioned above or below the driven roller, and the surfaces of the driving roller and the driven roller are covered with a cleaning layer, the two groups of cleaning rotating rollers are arranged in the machine body shell side by side.
4. The silicon wafer cleaning apparatus according to claim 1, wherein: the pan feeding mouth with the both sides of discharge gate all are provided with the slide rail, one of them open on the lateral wall of slide rail has the spout, the conveying tray set up in between the slide rail, be provided with the sliding block on the four corners of conveying tray respectively, the sliding block respectively with both sides slide rail sliding connection keeps away from one of them of engine body shell the back of sliding block is provided with the horizontal pole, the horizontal pole passes the spout stretches out the slide rail back, the engine body shell top is fixed with the conveying cylinder, the conveying cylinder is connected with the right angle connecting rod, the one end of right angle connecting rod with the piston rod of conveying cylinder is connected, the other end of right angle connecting rod is located the back of slide rail and with the horizontal pole is connected.
5. The silicon wafer cleaning apparatus according to claim 1, wherein: the bottom surface of the machine body shell is in a frustum pyramid shape protruding downwards, and a plurality of water outlets are formed in the bottom surface of the machine body shell.
6. The silicon wafer cleaning apparatus according to claim 1, wherein: the spray header is communicated with a water pipe, and the water pipe penetrates through the top cover and extends into the machine body shell.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120452325.9U CN214672522U (en) | 2021-03-02 | 2021-03-02 | Silicon wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120452325.9U CN214672522U (en) | 2021-03-02 | 2021-03-02 | Silicon wafer cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN214672522U true CN214672522U (en) | 2021-11-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120452325.9U Active CN214672522U (en) | 2021-03-02 | 2021-03-02 | Silicon wafer cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN214672522U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115458419A (en) * | 2022-09-26 | 2022-12-09 | 杭州沃镭智能科技股份有限公司 | A kind of IGBT power module automatic glue filling line and method thereof |
-
2021
- 2021-03-02 CN CN202120452325.9U patent/CN214672522U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115458419A (en) * | 2022-09-26 | 2022-12-09 | 杭州沃镭智能科技股份有限公司 | A kind of IGBT power module automatic glue filling line and method thereof |
| CN115458419B (en) * | 2022-09-26 | 2024-12-31 | 杭州沃镭智能科技股份有限公司 | Automatic glue filling line for IGBT power module and method thereof |
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