CN213670789U - Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment - Google Patents

Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment Download PDF

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Publication number
CN213670789U
CN213670789U CN202022189499.9U CN202022189499U CN213670789U CN 213670789 U CN213670789 U CN 213670789U CN 202022189499 U CN202022189499 U CN 202022189499U CN 213670789 U CN213670789 U CN 213670789U
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wafer
cylinder
fixed mounting
frame
box
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CN202022189499.9U
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Chinese (zh)
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钱诚
童建
吴清
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Wuxi Aelsystem Intelligent Equipment Co ltd
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Wuxi Aelsystem Intelligent Equipment Co ltd
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Abstract

The utility model relates to a sub-frame formula wafer cleaning equipment is with supplementary mechanism that rolls of inside wafer, including box, frame and washing pond, fixed mounting has the washing pond in the middle of the inside of box, and the inside top of wasing the pond is equipped with the cylinder, and the surface rotation of cylinder installs the baffle, and the both ends fixed mounting of cylinder installs the axostylus axostyle, and the axostylus axostyle rotates the inside of installing at the frame, top one side fixed mounting of frame has first motor, and the output of first motor passes through the belt and rotates the connection axostylus axostyle, fixed connection is at the output of pneumatic cylinder in the middle of the top of frame. The utility model discloses utilize the pneumatic cylinder to rise or fall the cylinder, the cylinder that will be equipped with the wafer passes in and out in the washing tank, and the cylinder can be rotated by the motor, can let the inside wafer of cylinder can wash the multiaspect like this, bloies to it by the fan of one side after the cylinder rises, makes it air-dry fast to the effect that the staff of being convenient for used has been reached.

Description

Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment
Technical Field
The utility model relates to a wafer cleaning equipment field, concretely relates to sub-frame type wafer cleaning equipment is with supplementary mechanism that rolls of inside wafer.
Background
The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the shape is circular; various circuit device structures can be fabricated on a silicon wafer to form an IC product with specific electrical functions. The starting material for the wafer is silicon, while the crust surface has an inexhaustible amount of silicon dioxide. The silicon dioxide ore is refined by an electric arc furnace, chloridized by hydrochloric acid and distilled to prepare high-purity polysilicon with the purity as high as 99.999999999 percent.
The surface of the wafer is adhered with a protective layer of a mixture of Al2O3 and glycerin of about 2um, chemical etching and surface cleaning are required before manufacturing, the conventional wafer cleaning is carried out by placing the wafer in a cleaning solution tank for cleaning, and the surface of the wafer is washed by using a cleaning solution which flows in a rotating way, but the wafer placed in the cleaning solution tank is fixed, so that the turnover cleaning is inconvenient for workers, and the cleaning efficiency is reduced.
SUMMERY OF THE UTILITY MODEL
The utility model provides a sub-frame formula wafer cleaning equipment is with supplementary mechanism that rolls of inside wafer has solved above technical problem.
The utility model provides a scheme as follows of above-mentioned technical problem: the utility model provides a sub-rack type wafer cleaning equipment is with supplementary mechanism of rolling of inside wafer, includes box, frame and washing pond, fixed mounting has the washing pond in the middle of the inside of box, and the inside top of washing pond is equipped with the cylinder, and the surface rotation of cylinder installs the baffle, and the both ends fixed mounting of cylinder installs the axostylus axostyle, and the axostylus axostyle rotates the inside of installing at the frame, top one side fixed mounting of frame has first motor, and the output of first motor passes through the belt and rotates the connection axostylus axostyle, fixed connection is at the output of pneumatic cylinder in the middle of the top of.
The utility model has the advantages that:
1. the utility model discloses a set up the cylinder, including making to treat abluent wafer and can placing, reached and provided the effect of placing the washing position, through setting up first motor, make the cylinder rotate, reached and rotated the effect that the wafer placed carries out the turn-over in the help cylinder.
2. The utility model discloses a set up the pneumatic cylinder, make the cylinder of frame internal rotation installation can go up and down, reached and fallen and let the cylinder dip in the cleaning bath and rise to air-dry the region effect of carrying out the air-dry.
On the basis of the technical scheme, the utility model discloses can also do following improvement.
Furthermore, a first fan is installed on one side of the interior of the box body in an embedded mode, and a second fan is installed on the other side of the interior of the box body in an embedded mode.
The beneficial effect of adopting the further scheme is that: the first fan is a fan inlet, the second fan is a fan exhaust fan, and the first fan and the second fan are matched to generate flowing air in the box body, so that the effects of generating the flowing air and air-drying the wafers placed in the roller are achieved.
Further, fixed mounting has the otter board in the middle of the inside of wasing the pond, is equipped with the flabellum in the middle of the inside bottom of wasing the pond, and flabellum fixed mounting is at the output of second motor, and second motor fixed mounting is in the inside bottom of box.
The beneficial effect of adopting the further scheme is that: the screen plate is arranged to separate the fan blades and the roller to prevent damage caused by mutual collision, and through the matching of the fan blades and the second motor, the cleaning liquid in the cleaning tank can rotate, so that the effect that the cleaning liquid is rotated to flow and clean the wafer placed in the roller is achieved.
Further, the inside bottom one side of wasing the pond is connected and is installed the pipeline, and the inside fixed mounting of pipeline has the valve.
The beneficial effect of adopting the further scheme is that: the pipeline is installed to discharge and replace the cleaning liquid in the cleaning pool, and the valve is installed to control the opening and closing of the pipeline.
Furthermore, the outer front surface of the box body is rotatably provided with a box door, and the middle of the box door is embedded with a visual window.
The beneficial effect of adopting the further scheme is that: the installation of the visual window enables a worker to see the condition inside the box body without opening the box door.
Further, baffle and cylinder all adopt fretwork hole structural design.
The beneficial effect of adopting the further scheme is that: after the baffle and the roller which are designed to be hollow structures are immersed in the cleaning pool filled with cleaning liquid, the cleaning liquid can permeate into the roller, and wafers are conveniently placed in the cleaning roller.
The above description is only an overview of the technical solution of the present invention, and in order to make the technical means of the present invention clearer and can be implemented according to the content of the description, the following detailed description is made with reference to the preferred embodiments of the present invention and accompanying drawings. The detailed description of the present invention is given by the following examples and the accompanying drawings.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention without undue limitation to the invention. In the drawings:
fig. 1 is a schematic view of a front view internal structure according to an embodiment of the present invention;
fig. 2 is a schematic view of a front view of an external appearance structure according to an embodiment of the present invention;
fig. 3 is a schematic view of an interior overlooking structure of a box according to an embodiment of the present invention.
In the drawings, the components represented by the respective reference numerals are listed below:
1. a hydraulic cylinder; 2. a box body; 3. a first fan; 4. a first motor; 5. a belt; 6. a frame; 7. a shaft lever; 8. a drum; 9. a second motor; 10. a fan blade; 11. a pipeline; 12. a valve; 13. a screen plate; 14. a baffle plate; 15. a cleaning tank; 16. a second fan; 17. and (4) a box door.
Detailed Description
The principles and features of the present invention are described below in conjunction with the accompanying fig. 1-3, the examples given are intended to illustrate the present invention and are not intended to limit the scope of the invention. The invention is described in more detail in the following paragraphs by way of example with reference to the accompanying drawings. The advantages and features of the present invention will become more fully apparent from the following description and appended claims. It should be noted that the drawings are in simplified form and are not to precise scale, and are provided for convenience and clarity in order to facilitate the description of the embodiments of the present invention.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When a component is referred to as being "connected" to another component, it can be directly connected to the other component or intervening components may also be present. When a component is referred to as being "disposed on" another component, it can be directly on the other component or intervening components may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Referring to fig. 1 to fig. 3, the present invention provides an embodiment: an internal wafer auxiliary rolling mechanism for a split-frame type wafer cleaning device comprises a box body 2, a frame 6 and a cleaning tank 15, wherein the cleaning tank 15 is fixedly installed in the middle of the inside of the box body 2, a roller 8 is arranged at the top end of the inside of the cleaning tank 15, a wafer to be cleaned can be placed by arranging the roller 8, the effect of placing a cleaning position is achieved, a baffle 14 is installed on the surface of the roller 8 in a rotating mode, the baffle 14 and the roller 8 are both designed in a hollow-out structure, after the baffle 14 and the roller 8 which are designed in the hollow-out structure are immersed in the cleaning tank 15 filled with cleaning liquid, the cleaning liquid can permeate into the roller 8, the wafer is conveniently placed inside the cleaning roller 8, shaft levers 7 are fixedly installed at two ends of the roller 8, the shaft levers 7 are rotatably installed inside the frame 6, a first motor 4 is fixedly installed at one side of the top end of the frame 6, this model motor moment of torsion is big, vibrate lowly, be applicable to the utility model discloses, through setting up first motor 4, make cylinder 8 can rotate, reached the effect that the wafer placed in the rotation help cylinder 8 carried out the turn-over, first motor 4's output passes through belt 5 and rotates and connect axostylus axostyle 7, fixed connection is at the output of pneumatic cylinder 1 in the middle of frame 6's the top, and 1 fixed mounting of pneumatic cylinder is on the outside top of box 2, pneumatic cylinder 1 adopts the MOB model, this model pneumatic cylinder 1 power is sufficient, and the size is little, is applicable to the utility model discloses, through setting up pneumatic cylinder 1, make cylinder 8 of 6 internal rotation installations of frame lift, reached and fallen and let cylinder 8 wash in the pond 15 and rise to the air-dry regional effect that carries out the air-dry.
The middle inside of the cleaning pool 15 is fixedly provided with a screen 13, the middle inside bottom end of the cleaning pool 15 is provided with a fan blade 10, the fan blade 10 is fixedly arranged at the output end of a second motor 9, the second motor 9 adopts a 5IK60GU-CF model, the model motor has good waterproof performance and is convenient to install, and is suitable for the utility model, the second motor 9 is fixedly arranged at the bottom inside the box body 2, the installation of the screen 13 separates the fan blade 10 and the roller 8 to prevent the damage caused by mutual contact, the cleaning liquid in the cleaning pool 15 can rotate through the matching of the fan blade 10 and the second motor 9, the effect that the cleaning liquid rotates to flow the wafer placed inside the cleaning roller 8 is achieved, one side of the bottom inside end of the cleaning pool 15 is connected with a pipeline 11, the valve 12 is fixedly arranged inside the pipeline 11, the cleaning liquid in the cleaning pool 15 can be discharged and replaced through the installation of the pipeline 11, and the installation of valve 12 is then control duct 11's opening and closing, and first fan 3 is installed in the embedding of inside one side of box 2, and second fan 16 is installed in the embedding of the inside opposite side of box 2, and first fan 3 is for advancing the fan, and second fan 16 is the extraction fan, and first fan 3 and second fan 16 all adopt the FS15050 model, and this model fan noise is low, and the low price is applicable to the utility model discloses, through the cooperation of first fan 3 and second fan 16, can produce the flowing wind in making box 2, reached and produced the flowing wind and let the wafer of placing in the cylinder 8 carry out air-dried effect, box door 17 is installed in the outside front surface rotation of box 2, and the visual window is installed in the centre embedding of box door 17, and the installation of visual window makes the staff can also see the inside condition of box 2 in the condition of not opening box door 17.
The working principle is as follows: before using the utility model, a worker needs to firstly supply power externally, then rotates to open the box door 17, then rotates the baffle 14 to open, places the wafer to be cleaned inside the roller 8, rotates to close the baffle 14 and the box door 17 after the placement is completed, starts the motor to drive the hydraulic pump, the hydraulic pump outputs power to the hydraulic cylinder 1 through the hydraulic oil pipe, the hydraulic cylinder 1 pushes the frame 6 mounted at the output end to the inside of the cleaning pool 15, the roller 8 rotatably mounted inside the frame 6 also enters the cleaning pool 15, at the moment, the worker opens the switch of the second motor 9, the second motor 9 rotates the fan blade 10 mounted at the output end, the rotating fan blade 10 drives the water in the cleaning pool 15, the wafer placed in the roller 8 can be cleaned by the water which flows rotatably, at the moment, the worker can open the switch of the first motor 4, the output end of the first motor 4 transmits the rotating force to the shaft rod 7 through the belt 5, so that the shaft rod 7 can drive the roller 8 to rotate, the wafer placed in the roller 8 can be turned over, multi-surface cleaning is conducted, the cleaning efficiency is improved, the hydraulic cylinder 1 is controlled by a worker after cleaning to lift the roller 8 immersed in the cleaning pool 15, the worker opens the switches of the first fan 3 and the second fan 16 after lifting, the first fan 3 blows air to the surface of the roller 8, the wafer placed in the cylinder is dried in the air, the second fan 16 extracts the air for drying the wafer out of the box body 2, the cleaning liquid in the cleaning pool 15 needs to be cleaned after being used, the rotating valve 12 discharges the cleaning liquid in the cleaning pool 15 through the pipeline 11, and the cleaning liquid is replaced by new cleaning liquid.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way; the present invention can be smoothly implemented by those skilled in the art according to the drawings and the above description; however, those skilled in the art should understand that changes, modifications and variations made by the above-described technology can be made without departing from the scope of the present invention, and all such changes, modifications and variations are equivalent embodiments of the present invention; meanwhile, any changes, modifications, evolutions, etc. of the above embodiments, which are equivalent to the actual techniques of the present invention, still belong to the protection scope of the technical solution of the present invention.

Claims (6)

1. The utility model provides a sub-frame type wafer cleaning equipment is with supplementary mechanism that rolls of inside wafer, includes box (2), frame (6) and washs pond (15), its characterized in that: fixed mounting has washing pond (15) in the middle of the inside of box (2), and the inside top of washing pond (15) is equipped with cylinder (8), and the surface rotation of cylinder (8) installs baffle (14), and the both ends fixed mounting of cylinder (8) installs axostylus axostyle (7), and axostylus axostyle (7) rotate the inside of installing in frame (6), the top one side fixed mounting of frame (6) has first motor (4), and the output of first motor (4) passes through belt (5) and rotates connection axostylus axostyle (7), fixed connection is at the output of pneumatic cylinder (1) in the middle of the top of frame (6), and pneumatic cylinder (1) fixed mounting is on the outside top of box (2).
2. The internal wafer assisted tumbling mechanism for a split-rack wafer cleaning apparatus as claimed in claim 1, wherein: a first fan (3) is installed on one side of the interior of the box body (2) in an embedded mode, and a second fan (16) is installed on the other side of the interior of the box body (2) in an embedded mode.
3. The internal wafer assisted tumbling mechanism for a split-rack wafer cleaning apparatus as claimed in claim 1, wherein: wash the inside middle fixed mounting in pond (15) have otter board (13), wash the inside bottom middle of pond (15) and be equipped with flabellum (10), flabellum (10) fixed mounting is at the output of second motor (9), and second motor (9) fixed mounting is in the inside bottom of box (2).
4. The internal wafer assisted tumbling mechanism for a split-rack wafer cleaning apparatus as claimed in claim 3, wherein: the inside bottom one side of wasing pond (15) is connected and is installed pipeline (11), and the inside fixed mounting of pipeline (11) has valve (12).
5. The internal wafer assisted tumbling mechanism of claim 4, wherein: the outer front surface of the box body (2) is rotatably provided with a box door (17), and the middle of the box door (17) is embedded with a visual window.
6. The internal wafer assisted tumbling mechanism for a split-rack wafer cleaning apparatus as claimed in claim 1, wherein: the baffle (14) and the roller (8) are designed by adopting a hollow hole structure.
CN202022189499.9U 2020-09-29 2020-09-29 Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment Active CN213670789U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202022189499.9U CN213670789U (en) 2020-09-29 2020-09-29 Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202022189499.9U CN213670789U (en) 2020-09-29 2020-09-29 Auxiliary rolling mechanism for internal wafer of split-frame type wafer cleaning equipment

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CN213670789U true CN213670789U (en) 2021-07-13

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117810136A (en) * 2024-02-23 2024-04-02 中国科学院长春光学精密机械与物理研究所 Wafer etching device and etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117810136A (en) * 2024-02-23 2024-04-02 中国科学院长春光学精密机械与物理研究所 Wafer etching device and etching method
CN117810136B (en) * 2024-02-23 2024-04-30 中国科学院长春光学精密机械与物理研究所 Wafer etching device and etching method

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