CN213079443U - Cleaning system for polycrystalline silicon reduction furnace - Google Patents
Cleaning system for polycrystalline silicon reduction furnace Download PDFInfo
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- CN213079443U CN213079443U CN202021578118.XU CN202021578118U CN213079443U CN 213079443 U CN213079443 U CN 213079443U CN 202021578118 U CN202021578118 U CN 202021578118U CN 213079443 U CN213079443 U CN 213079443U
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- 238000004140 cleaning Methods 0.000 title claims abstract description 106
- 230000009467 reduction Effects 0.000 title claims abstract description 35
- 229910021420 polycrystalline silicon Inorganic materials 0.000 title claims abstract description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 90
- 239000003513 alkali Substances 0.000 claims abstract description 80
- 239000002585 base Substances 0.000 claims abstract description 36
- 238000005507 spraying Methods 0.000 claims abstract description 10
- 239000002351 wastewater Substances 0.000 claims description 27
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 20
- 238000005406 washing Methods 0.000 claims description 18
- 239000002893 slag Substances 0.000 claims description 17
- 238000010438 heat treatment Methods 0.000 claims description 14
- 239000007788 liquid Substances 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- 239000002699 waste material Substances 0.000 claims description 8
- 235000017166 Bambusa arundinacea Nutrition 0.000 claims description 5
- 235000017491 Bambusa tulda Nutrition 0.000 claims description 5
- 241001330002 Bambuseae Species 0.000 claims description 5
- 235000015334 Phyllostachys viridis Nutrition 0.000 claims description 5
- 239000011425 bamboo Substances 0.000 claims description 5
- 238000010612 desalination reaction Methods 0.000 claims description 5
- 238000011084 recovery Methods 0.000 claims description 5
- 230000008676 import Effects 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 28
- 230000008569 process Effects 0.000 abstract description 25
- 239000012498 ultrapure water Substances 0.000 abstract description 16
- 239000012535 impurity Substances 0.000 abstract description 14
- 238000007602 hot air drying Methods 0.000 abstract description 8
- 239000007921 spray Substances 0.000 abstract description 5
- 229920005591 polysilicon Polymers 0.000 abstract description 4
- 238000004064 recycling Methods 0.000 abstract description 4
- 238000001914 filtration Methods 0.000 abstract description 2
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 54
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000011049 filling Methods 0.000 description 3
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- 238000011010 flushing procedure Methods 0.000 description 3
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- 230000009286 beneficial effect Effects 0.000 description 1
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- 238000003889 chemical engineering Methods 0.000 description 1
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- 238000005260 corrosion Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
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- 150000004677 hydrates Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 239000008235 industrial water Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
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- 230000008929 regeneration Effects 0.000 description 1
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Abstract
The utility model discloses a cleaning system for a polysilicon reduction furnace, which comprises two cleaning processes, wherein one cleaning base comprises a desalted water unit, a high-purity water unit and a hot air unit, the cleaning base cancels the spray cleaning of alkali liquor, and avoids the problem of impurity pollution caused in the recycling process of the alkali liquor; the other type of cleaning base comprises a cleaning base connected with a desalted water unit, an alkali liquor unit, a high-purity water unit and a hot air unit, impurity pollution in the alkali liquor circulation process is effectively solved by filtering and exhausting the alkali liquor, and the cleaning efficiency of the existing reduction furnace can be remarkably improved and the equipment loss is reduced by combining the existing process flows of desalted water pretreatment, high-purity water spraying cleaning and hot air drying.
Description
Technical Field
The utility model belongs to the industrial equipment washs field, specific theory is a cleaning system for polycrystalline silicon reduction furnace.
Background
The reduction furnace is main equipment for producing polycrystalline silicon and consists of a furnace barrel and a chassis. In the production process of polycrystalline silicon, in order to meet the purity and cleanliness of the extraction and production of polycrystalline silicon, residues and dirt in a polycrystalline silicon reduction furnace need to be cleaned, and any granular impurities and grease substances are left in the furnace and can affect the product quality.
We have found that the residual substances in the reduction furnace, mainly comprising silicon and the balance including impurities such as silica and hydrates, can be removed by reaction with NaOH. For example: the tension just refers to the cleaning process of the main residues and the cleaning process in the polysilicon reducing furnace in chemical engineering management, 9 months in 2018 and 196-: firstly, spraying alkali liquor by using a high-pressure water gun to clean the inner surface layer of the alkali liquor, secondly, spraying dehydrated salt for cleaning, and thirdly, using hot nitrogen to blow the alkali liquor for drying. Similarly, patent document CN202185421U (an automatic cleaning and drying system for bell jar of polysilicon reduction furnace and hydrogenation furnace, 2012.04.11) also describes a cleaning system capable of spraying all the bell jar, and its operation principle is: the method is characterized in that hot water jet flow generated by a high-pressure water power device is used as power, a hydraulic self-driven three-dimensional tank washer is used as an execution spray head, a 360-degree net-shaped spray surface is formed in a certain working time, hydraulic sweeping of the inner surface of a bell jar is completed, sodium hydroxide solution and the like are used as main cleaning liquid, desalted water is used for pre-washing and rinsing, and high-purity water is used for washing, so that the cleaning process is completed.
Therefore, in the cleaning process of the existing reduction furnace, alkali liquor is needed to be used as a cleaning agent, but in the actual operation process, the alkali liquor is usually derived from circulating alkali liquor in process production, impurities often exist, if a high-pressure spray head is adopted for washing, the blockage of a pipeline or a spray head is easily caused, the later-stage equipment maintenance cost is increased, in addition, a large amount of waste water can be generated in the cleaning process, and the pressure is caused to environment-friendly production. Therefore, in order to effectively clean the polysilicon reduction furnace in the industrial production process, it is urgent to reasonably and optimally clean the existing cleaning process and technology.
SUMMERY OF THE UTILITY MODEL
For solving the influence that current alkali lye washs a section of thick bamboo and brings, the utility model provides a cleaning system for polycrystalline silicon reduction furnace, including two kinds of washing flows, one kind has cancelled alkali lye and has sprayed the washing, has avoided the impurity pollution problem that brings in the alkali lye recycling use, and another kind is to alkali lye filter and exhaust-gas treatment, has effectively solved the impurity pollution in the alkali lye circulation process, combines current desalination pretreatment of water, high-purity water spraying washs and hot-air drying's process flow, can show to improve current reduction furnace cleaning efficiency, reduces the equipment loss.
The utility model discloses a following technical scheme realizes: the utility model provides a cleaning system for polycrystalline silicon reduction furnace, is including the washing base that is connected with desalinized water unit, high pure water unit and hot air unit, and desalinized water unit and high pure water unit connect in parallel and set up, all are equipped with the trip valve, are equipped with the tuber pipe and the sprayer that act on the stove section of thick bamboo on the washing base, and desalinized water unit and high pure water unit all communicate the sprayer, and hot air unit includes the heating furnace, establishes air intlet and hot air exitus on the heating furnace, hot air exitus intercommunication tuber.
An exhaust passage communicated with the outside of the chamber is arranged on the cleaning base, and a waste liquid collecting pipe communicated with a system wastewater pool is arranged at the bottom of the cleaning base.
And a water bath spraying device is arranged on the exhaust passage, and a liquid outlet of the water bath spraying device is communicated with the system wastewater pool.
The utility model provides a cleaning system for polycrystalline silicon reduction furnace, including being connected with the desalinized water unit, the alkali lye unit, the washing base of high pure water unit and hot air cell, the desalinized water unit, parallelly connected the setting of alkali lye unit and high pure water unit, all be equipped with the trip valve, be equipped with the tuber pipe and the sprayer that act on the stove section of thick bamboo on the washing base, the desalinized water unit, alkali lye unit and high pure water unit all communicate the sprayer, hot air cell includes the heating furnace, establish air intlet and hot air exitus on the heating furnace, hot air exitus intercommunication tuber pipe, the alkali lye unit is including the lye groove that communicates in proper order, a filter, air discharge can and heat.
The cleaning base is provided with an exhaust passage communicated with the outside of the chamber, and the bottom of the cleaning base is provided with a waste liquid collecting pipe communicated with the system wastewater tank and an alkali liquor recovery pipe communicated with the alkali liquor tank.
And a settling zone is arranged at the bottom of the lye tank, and a first slag discharge port communicated with a system wastewater pool is arranged on the settling zone.
The filter is provided with a desalted water inlet and a nitrogen inlet, and the bottom of the filter is provided with a slag discharge pipe communicated with a system wastewater pool.
And a one-way exhaust port is arranged at the top of the exhaust tank, and a second slag discharge port communicated with a system wastewater pool is arranged at the bottom of the exhaust tank.
And an exhaust fan is arranged on the exhaust passage.
Compared with the prior art, the utility model, following advantage and beneficial effect have:
(1) the utility model provides an use cleaning system of desalinized water unit, high pure water unit and hot-blast unit as the main function unit, cancelled alkali lye and sprayed the cleaning process, adopt the desalination pretreatment of water back, reuse high pure water through high-pressure injection reduction furnace section of thick bamboo for wash the attachment of its inner surface, reach high-efficient abluent purpose, contained impurity silica flour when having avoided adopting alkali lye circulation to wash improves clean efficiency to the pollution that the washing caused.
(2) The utility model provides an use desalinized water unit, alkali lye unit, high pure water unit and air-heated air unit as the cleaning system of main function unit, on the basis of current alkali lye circulation use, increased the setting of filter and air discharge tank in the alkali lye unit, can detach the magazine silica flour in the circulation alkali lye through filtering on the one hand, on the other hand can also discharge the hydrogen that alkali lye and silica flour reaction produced, avoids causing the damage to equipment and pipeline, prevents the cavitation.
(3) The utility model discloses optimize whole cleaning system, for example: an exhaust tank and an exhaust passage are provided to exhaust hydrogen gas in the apparatus to avoid cavitation; collecting and conveying the cleaning waste liquid to a system waste water tank to avoid environmental pollution; slag discharge channels are arranged on the lye tank, the filter and the exhaust tank to realize the removal of impurity silicon powder in the circulating lye and carry out unified treatment by utilizing a system wastewater tank. The implementation of the optimization measures can not only reduce the maintenance cost of the equipment, but also improve the environmental protection efficiency, and is suitable for industrial production.
Drawings
Fig. 1 is a block flow diagram of the cleaning system of this embodiment 1.
Fig. 2 is a schematic structural diagram of the cleaning system of this embodiment 1.
Fig. 3 is a block flow diagram of the cleaning system of this embodiment 2.
FIG. 4 is a schematic diagram of the structure of the lye unit of the cleaning system described in this example 2.
Fig. 5 is a schematic structural diagram of a desalted water unit, a high purity water unit and a hot air unit of the cleaning system of the embodiment 2.
The system comprises a cleaning base 1, a furnace barrel 2, an air pipe 3, an ejector 4, a heating furnace 5, an air inlet 6, a hot air outlet 7, an exhaust passage 8, a system wastewater tank 9, a waste liquid collecting pipe 10, a water bath spraying device 11, a lye tank 12, a filter 13, an exhaust tank 14, a heat exchanger 15, a lye inlet 16, a lye recovery pipe 17, a settling zone 18, a first slag discharge port 19, a desalted water inlet 20, a nitrogen inlet 21, a slag discharge pipe 22, a one-way exhaust port 23, a second slag discharge port 24 and an alkali liquid circulating pump 25.
Detailed Description
The present invention will be described in further detail with reference to examples, but the present invention is not limited thereto.
Example 1:
the embodiment provides a cleaning system for a polycrystalline silicon reduction furnace.
As shown in the structures of figures 1 and 2, the cleaning system mainly comprises a cleaning base 1, and a desalted water unit, a high-purity water unit and a hot air unit which are arranged in parallel, wherein the cleaning base 1 is used for placing a furnace barrel 2 of a reduction furnace, an air pipe 3 and an ejector 4 are arranged on the cleaning base 1, the desalted water unit is used for providing desalted water for the ejector 4 to pre-clean the furnace body, and the pre-cleaning aims to directly wash away loose parts of reactants attached to the inner wall of the reduction furnace, directly react with the desalted water on the other hand, and corrode confined attachments so as to be directly treated by a next-stage cleaning process. The high purity water unit is used to provide a high pressure water stream to the injector 4 for furnace body flushing. The hot air unit is used for providing hot air for the air pipe 3 to dry the furnace body. In the cleaning process, desalted water pre-cleaning, high-purity water cleaning and hot air drying are sequentially carried out, so that each functional unit is provided with a stop valve for realizing replacement among the functional units.
In this embodiment, the hot air unit includes a heating furnace 5, the heating furnace 5 adopts a hot air conditioner, and is provided with an air inlet 6 and a hot air outlet 7, and the hot air outlet 7 is communicated with the air duct 3. In addition, in order to save water resources and prevent wastewater pollution, a waste liquid collecting pipe 10 communicated with a system waste water tank 9 is arranged at the bottom of the cleaning base 1. It is known that during the cleaning process of the reduction furnace, since the deposits in the reduction furnace also contain substances which react with water, the reaction generates hydrogen, which is a flammable and explosive gas, and the hydrogen must be discharged to prevent accidents. Therefore, the cleaning base 1 is provided with an exhaust passage 8 communicating with the outside of the chamber, and the exhaust passage 8 is provided with a water bath shower device 11 for showering with industrial water, and a drain port of the water bath shower device 11 communicates with a system wastewater tank 9 for treatment together with wastewater.
As shown in fig. 2, the specific cleaning process flow of this embodiment is as follows:
(1) pre-washing with desalted water:
opening a desalted water inlet 20 stop valve → standing for 30s, exhausting a pipeline → inching a high-pressure pump to exhaust air → opening a high-pressure pump outlet stop valve → opening a blowdown stop valve for cleaning the base 1 → starting the high-pressure pump → pre-cleaning for 10-20 min → stopping the pump → closing the desalted water inlet 20 stop valve.
(2) High-purity water cleaning:
opening a high-purity water inlet cut-off valve → starting a high-pressure pump → cleaning for 30-50 min → stopping the pump → closing a pure water inlet cut-off valve, a pure water outlet cut-off valve and a pollution discharge cut-off valve.
(3) And (3) hot air drying:
hot water regulating valve TIC controls air supply temperature to 70-85 ℃ → starting fan air supply to 4500-5000 Nm3H → drying for 25-40 min → air blower → closing the hot water adjusting valve.
Example 2:
the embodiment provides a cleaning system for a polycrystalline silicon reduction furnace.
As shown in the structures of figures 3 to 5, the cleaning system mainly comprises a cleaning base 1, a hot air unit, a desalted water unit, an alkali liquor unit and a high-purity water unit which are arranged in parallel, wherein the cleaning base 1 is used for placing a furnace barrel 2 of a reduction furnace, an air pipe 3 and an ejector 4 are arranged on the cleaning base 1, the desalted water unit is used for providing desalted water for the ejector 4 to pre-clean the furnace body, and the pre-cleaning aims to directly wash away loose reactants attached to the inner wall of the reduction furnace, directly react with the desalted water on the other hand, and corrode the confined reactants so as to facilitate the treatment of the next-stage alkaline cleaning process. The alkali liquor unit is used for supplying alkali liquor to the injector 4 for furnace body cleaning, and the alkali liquor is used for corroding sediments tightly attached to the surface of the inner wall so as to be cleaned up. The high purity water unit is used to provide a high pressure water stream to the injector 4 for furnace body flushing. The hot air unit is used for providing hot air for the air pipe 3 to dry the furnace body. In the cleaning process, desalted water pre-cleaning, alkali liquor cleaning, high-purity water cleaning and hot air drying are sequentially carried out, so that each functional unit is provided with a stop valve for realizing replacement among the functional units.
In this embodiment, the hot air unit includes a heating furnace 5, the heating furnace 5 adopts a hot air conditioner, and is provided with an air inlet 6 and a hot air outlet 7, and the hot air outlet 7 is communicated with the air duct 3. In addition, in order to save water resources and prevent waste water pollution, a waste liquid collecting pipe 10 communicated with a system waste water tank 9 is arranged at the bottom of the cleaning base 1, and it is known that in the cleaning process of the reducing furnace, because the attachment of the reducing furnace also contains substances which react with water, the reaction can generate hydrogen which is flammable and explosive gas, and the hydrogen must be discharged in order to prevent accidents. Therefore, the cleaning base 1 is provided with an exhaust passage 8 communicating with the outside of the chamber.
Although alkali liquor is also adopted to clean the furnace body in the prior art, if the cleaning alkali liquor generated after the alkali liquor cleaning is directly sent to the system wastewater tank 9, the cleaning cost can be increased, the treatment difficulty of the system wastewater tank 9 can be increased, and the environmental protection pressure is caused. If the cleaning alkali liquor is recovered and cleaned, but impurities such as silicon slag, silicon powder and the like are mixed in the cleaning alkali liquor, in order to avoid pipeline blockage and cavitation corrosion of equipment caused by hydrogen produced by reaction, the cleaning alkali liquor which is recycled needs to be treated. In this embodiment, the bottom of the cleaning base 1 is provided with an alkali liquor recycling pipe 17 communicated with the alkali liquor tank 12 for recycling the cleaning alkali liquor.
The treatment method of the circulating alkali liquor in this embodiment is to adopt an alkali liquor tank 12, a filter 13, an exhaust tank 14 and a heat exchanger 15 which are sequentially communicated, wherein an alkali liquor inlet 16 is arranged on the alkali liquor tank 12 and is used for supplementing flake alkali and circulating alkali liquor into the alkali liquor tank 12, a settling zone 18 is arranged at the bottom of the alkali liquor tank 12, and a first slag discharge port 19 communicated with a system wastewater tank 9 is arranged on the settling zone 18 and is used for discharging silicon slag impurities settled in the alkali liquor tank 12. The alkali liquor in the alkali liquor tank 12 is sent to a filter 13 through an alkali liquor circulating pump 25, the filter 13 adopts a metal sintered filter element filter 13, silicon slag impurities in the alkali liquor are filtered, and the silicon slag impurities are sent to a system wastewater tank 9 through a slag discharge pipe 22 at the bottom of the filter 13. The filter 13 is provided with a desalted water inlet 20 and a nitrogen inlet 21 for regenerating the filter 13. The alkali liquor filtered by the filter 13 is sent to the exhaust tank 14, the top of the exhaust tank 14 is provided with a one-way exhaust port 23, the bottom of the exhaust tank 14 is provided with a second slag discharge port 24 communicated with the system wastewater pool 9, and the alkali liquor is heated by the heat exchanger 15 and then sent to the ejector 4 after being exhausted by the exhaust tank 14.
In practical use, when the differential pressure Δ P between the inlet and the outlet of the filter 13 is greater than or equal to 30Kpa, the filter 13 needs to be regenerated, as shown in fig. 4, the regeneration steps are as follows:
closing an inlet and outlet stop valve of the filter 13 → closing a drain valve at the bottom of the filter 13 → opening the drain valve for 5min, in order to ensure that all the alkali liquor is discharged, filling nitrogen into the filter 13 to maintain positive pressure → closing a drain valve → pushing the nitrogen stop valve back to press the filter 13 to 0.4MPa (G), opening the drain valve to blow off the filtered matters on the outer surface of the filter element by using air flow → closing the nitrogen valve after 10s, closing the drain valve → opening a desalted water inlet 20 stop valve and a filter 13 outlet valve, filling water into the filter 13 → filling for 2min, closing a desalted water inlet 20 stop valve and a filter 13 outlet valve → opening the nitrogen valve to press to 0.4MPa (G), opening the drain valve, cleaning the impurities in the filter element again by using the flushing force of the air flow and the water flow → closing the nitrogen valve after 10s → 5 min.
As shown in fig. 4 and 5, the specific cleaning process flow of this embodiment is as follows:
(1) pre-washing with desalted water:
opening a desalted water inlet 20 stop valve → standing for 30s, exhausting a pipeline → inching a pure water high-pressure pump to exhaust → opening an outlet pure water stop valve → opening a pollution discharge stop valve of a cleaning base 1 → starting the pure water high-pressure pump → pre-cleaning for 10-20 min → stopping the pump → closing the pure water inlet and outlet stop valves and the pollution discharge stop valve.
(2) Washing with 10% alkali liquor:
the method comprises the steps of alkali liquor booster pump exhaust → alkali liquor circulating pump 25 bypass self-circulation → open filter 13 inlet and outlet cut-off valves, equipment and pipeline exhaust, 3-5 min exhaust → inching alkali liquor circulating pump 25 exhaust → open alkali liquor cut-off valve open → cleaning base 1 alkali liquor recovery cut-off valve open → plate heat exchange water regulating valve TIC control alkali liquor temperature 50-70 ℃ → starting alkali liquor circulating pump 25 → alkali washing 15-20 min → pump stop → closing alkali liquor outlet cut-off valve, hot water regulating valve and alkali liquor recovery cut-off valve.
(3) High-purity water cleaning:
opening a high-purity water inlet cut-off valve → opening a pure water high-pressure pump outlet cut-off valve → opening a cleaning base 1 blowdown cut-off valve → starting a high-pressure pump → cleaning for 30-50 min → stopping the pump → closing a pure water inlet cut-off valve, a pure water outlet cut-off valve and a blowdown cut-off valve.
(4) And (3) hot air drying:
hot water regulating valve TIC controls air supply temperature to 70-85 ℃ → starting fan air supply to 4500-5000 Nm3H → 4500-5000 Nm of air supply by starting exhaust fan3H → drying for 25-40 min → air blower → closing the hot water adjusting valve.
In the actual production process, the embodiment can also realize the automatic cleaning and control of the polycrystalline silicon reduction furnace, relevant data is set according to the cleaning process flow, and a PLC control system can be adopted to automatically clean the polycrystalline silicon reduction furnace through the detection and control of instruments, valves and various pumps.
In the above embodiments 1 and 2, in order to ensure that the pressure in the furnace in the hot air drying process is normal, an exhaust fan should be additionally arranged on the exhaust passage, the power of the exhaust fan is equivalent to the power of the fan used by the heating furnace, and the exhaust fan is started in the hot air drying link for discharging a large amount of hot air in the furnace, so that the hot air is prevented from entering the furnace barrel to be cleaned to form positive pressure, and the indoor cleaning grade is influenced.
The above is only the preferred embodiment of the present invention, not to the limitation of the present invention in any form, all the technical matters of the present invention all fall into the protection scope of the present invention to any simple modification and equivalent change of the above embodiments.
Claims (9)
1. A cleaning system for a polycrystalline silicon reduction furnace is characterized in that: including being connected with the desalination water unit, high pure water unit and hot air unit's washing base (1), desalination water unit and high pure water unit parallel arrangement all are equipped with the trip valve, are equipped with tuber pipe (3) and sprayer (4) that act on stove section of thick bamboo (2) on washing base (1), desalination water unit and high pure water unit all communicate sprayer (4), hot air unit includes heating furnace (5), establish air intlet (6) and hot air exitus (7) on heating furnace (5), hot air exitus (7) intercommunication tuber pipe (3).
2. The cleaning system for the polycrystalline silicon reduction furnace according to claim 1, wherein: an exhaust passage (8) communicated with the outside of the chamber is arranged on the cleaning base (1), and a waste liquid collecting pipe (10) communicated with a system waste water pool (9) is arranged at the bottom of the cleaning base (1).
3. The cleaning system for the polycrystalline silicon reduction furnace according to claim 2, wherein: and a water bath spraying device (11) is arranged on the exhaust passage (8), and a liquid outlet of the water bath spraying device (11) is communicated with the system wastewater pool (9).
4. A cleaning system for a polycrystalline silicon reduction furnace is characterized in that: including being connected with the desalinized water unit, the alkali lye unit, washing base (1) of high pure water unit and hot-blast unit, the desalinized water unit, alkali lye unit and the parallelly connected setting of high pure water unit, all be equipped with the trip valve, be equipped with tuber pipe (3) and sprayer (4) that act on boiler barrel (2) on washing base (1), the desalinized water unit, alkali lye unit and high pure water unit all communicate sprayer (4), hot-blast unit includes heating furnace (5), establish air intlet (6) and hot air exitus (7) on heating furnace (5), hot air exitus (7) intercommunication tuber pipe (3), the alkali lye unit is including alkali lye groove (12) that communicate in proper order, filter (13), exhaust can (14) and heat exchanger (15), establish alkali lye import (16) on alkali lye groove (12), heat exchanger (15) intercommunication sprayer.
5. The cleaning system for the polycrystalline silicon reduction furnace according to claim 4, wherein: an exhaust passage (8) communicated with the outside of the chamber is arranged on the cleaning base (1), and a waste liquid collecting pipe (10) communicated with a system wastewater pool (9) and an alkali liquor recovery pipe (17) communicated with an alkali liquor tank (12) are arranged at the bottom of the cleaning base (1).
6. The cleaning system for the polycrystalline silicon reduction furnace according to claim 5, wherein: and a settling zone (18) is arranged at the bottom of the lye tank (12), and a first slag discharge port (19) communicated with the system wastewater tank (9) is arranged on the settling zone (18).
7. The cleaning system for the polycrystalline silicon reduction furnace according to claim 5, wherein: the filter (13) is provided with a desalted water inlet (20) and a nitrogen inlet (21), and the bottom of the filter (13) is provided with a slag discharge pipe (22) communicated with a system wastewater pool (9).
8. The cleaning system for the polycrystalline silicon reduction furnace according to claim 5, wherein: and a one-way exhaust port (23) is arranged at the top of the exhaust tank (14), and a second slag discharge port (24) communicated with a system wastewater pool (9) is arranged at the bottom of the exhaust tank (14).
9. The cleaning system for the polycrystalline silicon reduction furnace according to claim 5, wherein: an exhaust fan is arranged on the exhaust passage (8).
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| CN116793100A (en) * | 2023-06-30 | 2023-09-22 | 甘肃酒钢集团宏兴钢铁股份有限公司 | Cover type annealing furnace inner cover cleaning and drying device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116793100A (en) * | 2023-06-30 | 2023-09-22 | 甘肃酒钢集团宏兴钢铁股份有限公司 | Cover type annealing furnace inner cover cleaning and drying device |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| EE01 | Entry into force of recordation of patent licensing contract | ||
| EE01 | Entry into force of recordation of patent licensing contract |
Assignee: Sichuan Yongxiang Energy Technology Co.,Ltd. Assignor: SICHUAN YONGXIANG NEW ENERGY Co.,Ltd. Contract record no.: X2023510000014 Denomination of utility model: A cleaning system for polycrystalline silicon reduction furnaces Granted publication date: 20210430 License type: Common License Record date: 20230816 |