CN211445534U - Automatic testing machine for resistance of glass etching point - Google Patents

Automatic testing machine for resistance of glass etching point Download PDF

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Publication number
CN211445534U
CN211445534U CN201921757423.2U CN201921757423U CN211445534U CN 211445534 U CN211445534 U CN 211445534U CN 201921757423 U CN201921757423 U CN 201921757423U CN 211445534 U CN211445534 U CN 211445534U
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CN
China
Prior art keywords
probe
adsorption
sliding
glass etching
etching point
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Active
Application number
CN201921757423.2U
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Chinese (zh)
Inventor
林志阳
郑伶俐
王世锐
郑明全
吴泽斌
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Xiamen Teyi Technology Co ltd
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Xiamen Teyi Technology Co ltd
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Priority to CN201921757423.2U priority Critical patent/CN211445534U/en
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Abstract

The utility model provides an automatic tester for the resistance value of a glass etching point, which comprises a supporting platform, an adsorption device and a testing device; the adsorption device and the testing device are arranged on the supporting platform. The utility model provides an automatic testing machine for the resistance value of a glass etching point, which is characterized in that an X-axis test bracket is arranged on a Y-axis slide rail in a sliding manner, so that the X-axis test bracket can conveniently move towards an adsorption device; the first probe mechanism and the second probe mechanism are arranged on the X-axis test support in a sliding mode, so that the first probe mechanism and the second probe mechanism can conveniently move left and right and can be accurately positioned to a position to be tested. Adopt the utility model provides a pair of glass etching point resistance automatic test machine, its beneficial effect lies in can improving efficiency of software testing, saves the cost of labor, and degree of automation is high, the modern design to can improve glass etching point resistance test accuracy.

Description

Automatic testing machine for resistance of glass etching point
Technical Field
The utility model relates to a glass etching point resistance test field, in particular to glass etching point resistance automatic test machine.
Background
At present, the requirement of the display industry for automatic production is higher and higher, the glass substrate is used as an important component of the display, and the production quality and the etching process level directly determine the display effect and the use quality of the display. Therefore, the resistance value test of the glass etching point is an essential procedure in the production process of the display. The existing glass etching point resistance test is mainly completed manually, and because the etching point is unclear, the manual test needs a light source, so that the working efficiency is low, and the labor cost is high.
SUMMERY OF THE UTILITY MODEL
In order to solve the problems mentioned in the background art, the utility model provides an automatic tester for the resistance value of a glass etching point, which comprises a supporting platform, an adsorption device and a testing device; the adsorption device and the testing device are arranged on the supporting platform.
Further, the adsorption device adopts a vacuum adsorption platform; the vacuum adsorption platform is provided with an adsorption plate and a side stop block; the side limit stop block is arranged on the adsorption plate.
Further, the testing device comprises an X-axis testing support and a Y-axis sliding rail; the X-axis test support is arranged on the Y-axis slide rail in a sliding mode.
Further, the X-axis test support comprises a first slide rail, a second slide rail, a first probe mechanism, a second probe mechanism and a sliding assembly; the first sliding rail and the second sliding rail are fixedly arranged on the sliding assembly; the first probe mechanism is arranged on the first sliding rail in a sliding manner; the second probe mechanism is arranged on the second sliding rail in a sliding mode.
Furthermore, the first probe mechanism and the second probe mechanism respectively comprise a base station, a concave probe base, a probe mounting block, a probe mounting column and a small shaft reinforcing rib; the bottom of the base station is fixedly connected with a first sliding block, and the surface of the base station is provided with a first mounting plate; one side of the concave probe base is fixedly connected with a second mounting plate, and the other side of the concave probe base is provided with a fixed shaft; the small shaft reinforcing rib is connected with the first mounting plate and the second mounting plate; and a second sliding block is arranged on the fixed shaft.
Further, the probe mounting block is fixedly connected to the second sliding block; one end of the probe mounting column is connected to the probe mounting block, and the other end of the probe mounting column is provided with a probe.
Further, the supporting platform is connected with a switch device.
The utility model provides an automatic testing machine for the resistance value of a glass etching point, which is characterized in that an X-axis test bracket is arranged on a Y-axis slide rail in a sliding manner, so that the X-axis test bracket can conveniently move towards an adsorption device; the first probe mechanism and the second probe mechanism are arranged on the X-axis test support in a sliding mode, so that the first probe mechanism and the second probe mechanism can conveniently move left and right and can be accurately positioned to a position to be tested. Adopt the utility model provides a pair of glass etching point resistance automatic test machine, its beneficial effect lies in can improving efficiency of software testing, saves the cost of labor, and degree of automation is high, the modern design to can improve glass etching point resistance test accuracy.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive labor.
FIG. 1 is a schematic view of an automatic testing machine for glass etching point resistance according to the present invention;
fig. 2 is a schematic structural diagram of a probe mechanism of the automatic testing machine for glass etching point resistance provided by the present invention.
Reference numerals:
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
In the description of the present invention, it should be noted that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of the description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Fig. 1 is a schematic structural view of an automatic testing machine for resistance of glass etching points provided by the present invention, as shown in fig. 1, the automatic testing machine for resistance of glass etching points comprises a supporting platform 100, an adsorption device 200 and a testing device 300; the adsorption device 200 and the testing device 300 are disposed on the support platform 100.
In specific implementation, as shown in fig. 1, an automatic testing machine for resistance of a glass etching point comprises a supporting platform 100, an adsorption device 200 and a testing device 300; the adsorption device 200 and the testing device 300 are provided on the support platform 100.
Preferably, the adsorption device 200 adopts a vacuum adsorption platform; an adsorption plate 210 and a side stop 220 are arranged on the vacuum adsorption platform; the side stopper 220 is provided on the adsorption plate 210.
In specific implementation, as shown in fig. 1, a vacuum adsorption platform may be adopted as the adsorption apparatus 200 by those skilled in the art; an adsorption plate 210 and a plurality of side stoppers 220 are arranged on the vacuum adsorption platform; the adsorption plate 210 is used for placing a product to be tested; the side stopper 220 is disposed at the edge of the adsorption plate 210, and is used to prevent the product to be tested from sliding off, and ensure normal operation.
Preferably, the test device 300 includes an X-axis test rack 310 and a Y-axis slide 320; the X-axis test rack 310 is slidably disposed on the Y-axis slide rail 320.
In specific implementation, the testing device 300 includes an X-axis testing support 310 and a Y-axis slide rail 320; the Y-axis slide rails 320 are concavely arranged on two sides of the supporting platform; the X-axis test carriage 310 is slidably disposed on the Y-axis slide rail 320.
Preferably, the X-axis test fixture 310 includes a first slide rail 311, a second slide rail 312, a first probe mechanism 313, a second probe mechanism 314, and a slide assembly 315; the first slide rail 311 and the second slide rail 312 are fixedly arranged on the sliding assembly 315; the first probe mechanism 313 is arranged on the first slide rail 311 in a sliding manner; the second probe mechanism 314 is slidably disposed on the second slide rail 312.
In specific implementation, the X-axis test support 310 includes a first slide rail 311, a second slide rail 312, a first probe mechanism 313, a second probe mechanism 314, and a sliding assembly 315; a slide rail heightening block and an auxiliary slide rail mounting plate are arranged at the bottom of the sliding assembly 315 to ensure that the X-axis test bracket 310 can move along the Y-axis slide rail 320, so as to drive the first probe mechanism 313 and the second probe mechanism 314 to move towards the adsorption device 200, and to complete the automatic test by matching positioning; the first slide rail 311 and the second slide rail 312 are fixedly arranged on a reinforcing rib transverse plate of the sliding assembly 315; the first probe mechanism 313 is arranged on the first sliding rail 311 in a sliding manner, and the second probe mechanism 314 is arranged on the second sliding rail 312 in a sliding manner, so that the first probe mechanism 313 and the second probe mechanism 314 can move left and right, and a product to be tested can be accurately positioned.
Preferably, the first probe mechanism 313 and the second probe mechanism 314 each include a base 400, a concave probe base 500, a probe mounting block 600, a probe mounting column 700, and a small shaft stiffener 800; the bottom of the base table 400 is fixedly connected with a first sliding block 410, and the surface of the base table is provided with a first mounting plate 420; one side of the concave probe base 500 is fixedly connected with a second mounting plate 510, and the other side is provided with a fixed shaft 520; the small shaft reinforcing rib 800 is connected with the first mounting plate 420 and the second mounting plate 510; the fixed shaft 520 is provided with a second sliding block 521.
In specific implementation, each of the first probe mechanism 313 and the second probe mechanism 314 includes a base 400, a concave probe base 500, a probe mounting block 600, a probe mounting column 700, and a small-axis stiffener 800; a first slider 410 is fixedly connected to the bottom of the base 400, and can move the first probe mechanism 313 and the second probe mechanism 314 along the first slide rail 311 and the second slide rail 312 respectively; the surface of the base station is provided with a first mounting plate 420; one side of the concave probe base 500 is fixedly connected with a second mounting plate 510, and the other side is provided with a fixed shaft 520; the small shaft reinforcing rib 800 is connected with the first mounting plate 420 and the second mounting plate 510; the fixed shaft 520 is provided with a second slider 521.
Preferably, the probe mounting block 600 is fixedly connected to the second slider 521; one end of the probe mounting post 700 is connected to the probe mounting block 600, and the other end is provided with a probe 710.
In specific implementation, the probe mounting block 600 is fixedly connected to the second slider 521, and the second slider 521 can drive the probe mounting block 600 to move up and down; one end of the probe mounting post 700 is connected to the probe mounting block 600, and the other end is provided with a probe 710.
Preferably, a switch device 110 is connected to the support platform 100.
Although terms such as adsorption means, test means, etc. are used more often herein, the possibility of using other terms is not excluded. These terms are used merely to more conveniently describe and explain the nature of the present invention; they are to be construed in a manner that is inconsistent with the spirit of the invention.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention.

Claims (5)

1. The utility model provides a glass etching point resistance automatic testing machine which characterized in that: comprises a supporting platform (100), an adsorption device (200) and a testing device (300); the adsorption device (200) and the testing device (300) are arranged on the supporting platform (100); the test device (300) comprises an X-axis test bracket (310) and a Y-axis slide rail (320); the X-axis test bracket (310) is arranged on the Y-axis slide rail (320) in a sliding manner; the X-axis test support (310) comprises a first sliding rail (311), a second sliding rail (312), a first probe mechanism (313), a second probe mechanism (314) and a sliding assembly (315); the first sliding rail (311) and the second sliding rail (312) are fixedly arranged on the sliding component (315); the first probe mechanism (313) is arranged on the first sliding rail (311) in a sliding mode; the second probe mechanism (314) is arranged on the second sliding rail (312) in a sliding mode.
2. The automatic testing machine for glass etching point resistance according to claim 1, characterized in that: the adsorption device (200) adopts a vacuum adsorption platform; an adsorption plate (210) and a side stop block (220) are arranged on the vacuum adsorption platform; the side stopper (220) is arranged on the adsorption plate (210).
3. The automatic testing machine for glass etching point resistance according to claim 1, characterized in that: the first probe mechanism (313) and the second probe mechanism (314) respectively comprise a base table (400), a concave probe base (500), a probe mounting block (600), a probe mounting column (700) and a small shaft reinforcing rib (800);
the bottom of the base table (400) is fixedly connected with a first sliding block (410), and the surface of the base table is provided with a first mounting plate (420); one side of the concave probe base (500) is fixedly connected with a second mounting plate (510), and the other side of the concave probe base is provided with a fixed shaft (520); the small shaft reinforcing rib (800) is connected with the first mounting plate (420) and the second mounting plate (510); and a second sliding block (521) is arranged on the fixed shaft (520).
4. The automatic testing machine for glass etching point resistance according to claim 3, characterized in that: the probe mounting block (600) is fixedly connected to the second sliding block (521); one end of the probe mounting column (700) is connected to the probe mounting block (600), and the other end of the probe mounting column is provided with a probe (710).
5. The automatic testing machine for glass etching point resistance according to claim 1, characterized in that: the supporting platform (100) is connected with a switch device (110).
CN201921757423.2U 2019-10-19 2019-10-19 Automatic testing machine for resistance of glass etching point Active CN211445534U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201921757423.2U CN211445534U (en) 2019-10-19 2019-10-19 Automatic testing machine for resistance of glass etching point

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201921757423.2U CN211445534U (en) 2019-10-19 2019-10-19 Automatic testing machine for resistance of glass etching point

Publications (1)

Publication Number Publication Date
CN211445534U true CN211445534U (en) 2020-09-08

Family

ID=72319735

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201921757423.2U Active CN211445534U (en) 2019-10-19 2019-10-19 Automatic testing machine for resistance of glass etching point

Country Status (1)

Country Link
CN (1) CN211445534U (en)

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