CN211425386U - Semiconductor ingot end face verticality measuring device - Google Patents
Semiconductor ingot end face verticality measuring device Download PDFInfo
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- CN211425386U CN211425386U CN202020351189.XU CN202020351189U CN211425386U CN 211425386 U CN211425386 U CN 211425386U CN 202020351189 U CN202020351189 U CN 202020351189U CN 211425386 U CN211425386 U CN 211425386U
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 11
- 239000013078 crystal Substances 0.000 claims abstract description 19
- 238000005259 measurement Methods 0.000 abstract description 14
- 238000000034 method Methods 0.000 abstract description 7
- 238000005520 cutting process Methods 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
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Abstract
The utility model provides a semiconductor ingot terminal surface straightness measuring device that hangs down, including rotatory placement mechanism of ingot, measuring mechanism, this scheme is provided with rotatory placement mechanism of ingot simultaneously, measuring mechanism, when the ingot is fixed, realize through measuring mechanism its section vertical direction and horizontal direction distance and the straightness's of hanging down accurate measurement, after this process measurement is accomplished, the rethread rotatory placement mechanism of ingot realizes the free rotation of ingot on the gap between rotatory gyro wheel of ingot and the rotatory driven gyro wheel of ingot, rotates the ingot to different positions, the repetition is carried out distance and the straightness measurement that hangs down to its section again. Through above mode, realize showing and reducing the measurement deviation to the accurate measurement of crystal ingot section different positions, equidirectional distance and straightness that hangs down, do not need the manual work to carry the crystal ingot among the whole measurement process, effectively avoid because of badly such as crystal ingot collision that manual handling arouses, reduce operating personnel intensity of labour by a wide margin.
Description
Technical Field
The utility model relates to a technical field is measured to the ingot, especially relates to a semiconductor ingot terminal surface straightness measuring device that hangs down.
Background
After the ingot is pulled, the ingot needs to be cut off and sampled, wherein the cutting is to meet the requirements of equipment used in slicing and processing, the sampling is to confirm whether each physical parameter in the crystal pulling process meets the specification requirements, but the cutting process often has processing abnormality, which causes the deviation between the crystal orientation of the section and the theoretical crystal orientation of the ingot, and causes the poor problems in the subsequent processes, even the processing cannot be performed. At present, whether a cross section has deviation is generally judged by using a square, data of the cross section cannot be quantized, the performance of equipment cannot be effectively controlled by using the conventional measuring mode, and SPC data have deviation; meanwhile, manual measurement requires personnel to move the crystal ingot, so that the crystal ingot is easy to collide, and the defect of the crystal ingot is caused.
Disclosure of Invention
In view of the above, it is necessary to provide a verticality measuring apparatus for an end surface of a semiconductor ingot.
The utility model provides a semiconductor ingot terminal surface straightness measuring device that hangs down, includes rotatory placement mechanism of ingot, measuring mechanism, rotatory placement mechanism of ingot is the level setting, measuring mechanism sets up in rotatory placement mechanism of ingot one side, rotatory placement mechanism of ingot includes place the platform, supporting seat, first fixed plate, second fixed plate, third fixed plate, fourth fixed plate, ingot rotation gyro wheel, ingot rotation driven gyro wheel, belt pulley, the supporting seat sets up in place the platform bottom, first fixed plate, second fixed plate set up in the both sides of place the platform length direction upper surface relatively, third fixed plate, fourth fixed plate set up in the both sides of place the platform length direction upper surface relatively, third fixed plate and first fixed plate set up on place the platform upper surface adjacently, the rotatory gyro wheel of ingot sets up in first fixed plate, second fixed plate along place the platform length direction, Between the second fixed plate, the rotatory driven gyro wheel of ingot sets up between third fixed plate, fourth fixed plate along place the platform length direction, form the space that sets up the ingot between rotatory gyro wheel of ingot and the rotatory driven gyro wheel of ingot, the belt pulley sets up in the rotatory gyro wheel of ingot one side, measuring mechanism includes fixed baseplate, electric jar, horizontal support arm, distance sensor, fixed baseplate sets up in place the platform width direction one side, the electric jar sets up on fixed baseplate, horizontal support arm one end and electric jar output fixed connection, the horizontal support arm other end extends to ingot one side, the spout has been seted up to horizontal support arm upper surface, distance sensor sets up in the spout of horizontal support arm.
Preferably, the length of the horizontal support arm is not less than the width of the placing platform.
The scheme is simultaneously provided with the ingot rotating and placing mechanism and the measuring mechanism, when the ingot is fixed, the accurate measurement of the distance between the vertical direction and the horizontal direction of the section of the ingot and the verticality is realized through the measuring mechanism, after the process measurement is completed, the free rotation of the ingot on a gap between the ingot rotating roller and the ingot rotating driven roller is realized through the ingot rotating and placing mechanism, the ingot is rotated to different positions, and the distance and the verticality measurement are repeatedly carried out on the section of the ingot. Through above mode, realize showing and reducing the measurement deviation to the accurate measurement of crystal ingot section different positions, equidirectional distance and straightness that hangs down, do not need the manual work to carry the crystal ingot among the whole measurement process, effectively avoid because of badly such as crystal ingot collision that manual handling arouses, reduce operating personnel intensity of labour by a wide margin.
Drawings
FIG. 1 is a schematic axial view of a semiconductor ingot end face verticality measuring apparatus.
In the figure: the device comprises a placing platform 11, a supporting seat 12, a first fixing plate 13, a second fixing plate 14, a third fixing plate 15, a fourth fixing plate 16, a crystal ingot rotating roller 17, a crystal ingot rotating driven roller 18, a belt pulley 19, a fixing base 21, an electric cylinder 22, a horizontal support arm 23 and a distance sensor 24; an ingot 100.
Detailed Description
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
Referring to fig. 1, the utility model provides a semiconductor ingot terminal surface straightness measuring device that hangs down, including rotatory placement mechanism of ingot, measuring mechanism, rotatory placement mechanism of ingot is the level setting, measuring mechanism sets up in rotatory placement mechanism one side of ingot, rotatory placement mechanism of ingot includes place the platform 11, supporting seat 12, first fixed plate 13, second fixed plate 14, third fixed plate 15, fourth fixed plate 16, rotatory gyro wheel 17 of ingot, rotatory driven gyro wheel 18 of ingot, belt pulley 19, place the platform 11 is the rectangle rigid plate body, supporting seat 12 sets up in place the platform 11 bottom, supporting seat 12 is the rigid rod body, and preferred, its quantity is provided with 4, first fixed plate 13, second fixed plate 14 set up in place the platform 11 length direction upper surface's both sides relatively, third fixed plate 15, The fourth fixing plates 16 are oppositely arranged at two sides of the upper surface of the placing platform 11 in the length direction, the third fixing plates 15 and the first fixing plates 13 are adjacently arranged on the upper surface of the placing platform 11, the first fixing plates 13, the second fixing plates 14, the third fixing plates 15 and the fourth fixing plates 16 are rigid rectangular plate bodies, through holes for arranging ingot rotating rollers 17 and ingot rotating driven rollers 18 are arranged at the central positions of the plate bodies, the ingot rotating rollers 17 are arranged between the first fixing plates 13 and the second fixing plates 14 along the length direction of the placing platform 11, the ingot rotating driven rollers 18 are arranged between the third fixing plates 15 and the fourth fixing plates 16 along the length direction of the placing platform 11, gaps for arranging the ingots 100 are formed between the ingot rotating rollers 17 and the ingot rotating driven rollers 18, the belt pulleys 19 are arranged at one side of the ingot rotating rollers 17, and the measuring mechanism comprises a fixing base 21 and a fixing base, The device comprises an electric cylinder 22, a horizontal support arm 23 and a distance sensor 24, wherein the fixed base 21 is arranged on one side of the placing platform 11 in the width direction, the fixed base 21 is a rigid rectangular or square base, the electric cylinder 22 is arranged on the fixed base 21, the output end of the electric cylinder extends vertically along the length direction of the fixed base, one end of the horizontal support arm 23 is fixedly connected with the output end of the electric cylinder 22 through an annular sleeve, the other end of the horizontal support arm 23 extends to one side of a crystal ingot 100, a sliding groove is formed in the upper surface of the horizontal support arm 23, the distance sensor 24 is arranged in the sliding groove of the horizontal support arm 23, and the distance sensor 24 is connected with external monitoring equipment to display the measuring.
Specifically, the semiconductor ingot 100 is placed in a gap between an ingot rotating roller 17 and an ingot rotating driven roller 18, the ingot rotating roller 17 freely rotates under external force between a first fixing plate 13 and a second fixing plate 14, the ingot rotating driven roller 18 freely rotates under external force between a third fixing plate 15 and a fourth fixing plate 16, a belt pulley 19 is arranged on one side of the ingot rotating roller 17, the belt pulley 19 is further connected with an output end of an external motor to drive the ingot rotating roller 17 to rotate, so that the ingot rotating driven roller 18 is driven to synchronously rotate, and the ingot 100 on the gap between the ingot rotating roller 17 and the ingot rotating driven roller 18 freely rotates, and the rotation axis of the ingot 100 is not deviated all the time.
Specifically, the position of the fixed base 21 is kept unchanged in the measurement process, the horizontal support arm 23 and the distance sensor 24 which are arranged on the output end of the electric cylinder 22 are driven to synchronously move up and down in the vertical direction in a power-applying telescopic mode through the output end of the electric cylinder 22, the distance sensor 24 is arranged opposite to the section of the crystal ingot 100 so as to measure the real-time distance and the verticality in the vertical direction of the section of the crystal ingot 100, and meanwhile, when the output end of the electric cylinder 22 is fixed, the distance sensor 24 also moves left and right along a sliding chute on the upper surface of the horizontal support arm 23 so as to measure the real-time distance and the vertical.
Further, the length of the horizontal arm 23 is not less than the width of the placing platform 11, so as to ensure that the distance sensors 24 arranged in the grooves on the upper surface of the horizontal arm 23 can completely measure the distances of different positions and different directions of the cross section of the crystal ingot 100.
The embodiment of the utility model provides a module or unit in the device can merge, divide and delete according to actual need.
While the invention has been described with reference to a preferred embodiment, it will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention.
Claims (2)
1. A semiconductor ingot end face verticality measuring device is characterized in that: the ingot rotary placing mechanism is horizontally arranged, the measuring mechanism is arranged on one side of the ingot rotary placing mechanism, the ingot rotary placing mechanism comprises a placing platform, a supporting seat, a first fixing plate, a second fixing plate, a third fixing plate, a fourth fixing plate, an ingot rotary roller, an ingot rotary driven roller and a belt pulley, the supporting seat is arranged at the bottom of the placing platform, the first fixing plate and the second fixing plate are oppositely arranged on two sides of the upper surface of the placing platform in the length direction, the third fixing plate and the fourth fixing plate are oppositely arranged on two sides of the upper surface of the placing platform in the length direction, the third fixing plate and the first fixing plate are adjacently arranged on the upper surface of the placing platform, and the ingot rotary roller is arranged between the first fixing plate and the second fixing plate in the length direction of the placing platform, the measuring mechanism comprises a fixed base, an electric cylinder, a horizontal support arm and a distance sensor, the fixed base is arranged on one side of the width direction of the placing platform, the electric cylinder is arranged on the fixed base, one end of the horizontal support arm is fixedly connected with the output end of the electric cylinder, the other end of the horizontal support arm extends to one side of the crystal ingot, a sliding chute is formed in the upper surface of the horizontal support arm, and the distance sensor is arranged in the sliding chute of the horizontal support arm.
2. The semiconductor ingot end face verticality measuring apparatus of claim 1, wherein: the length of the horizontal support arm is not less than the width of the placing platform.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020351189.XU CN211425386U (en) | 2020-03-19 | 2020-03-19 | Semiconductor ingot end face verticality measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202020351189.XU CN211425386U (en) | 2020-03-19 | 2020-03-19 | Semiconductor ingot end face verticality measuring device |
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| Publication Number | Publication Date |
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| CN211425386U true CN211425386U (en) | 2020-09-04 |
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| CN202020351189.XU Active CN211425386U (en) | 2020-03-19 | 2020-03-19 | Semiconductor ingot end face verticality measuring device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113588661A (en) * | 2021-07-28 | 2021-11-02 | 福建北电新材料科技有限公司 | Detection device |
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2020
- 2020-03-19 CN CN202020351189.XU patent/CN211425386U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113588661A (en) * | 2021-07-28 | 2021-11-02 | 福建北电新材料科技有限公司 | Detection device |
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Address after: No.28 Guangming West Road, Xixia District, Yinchuan City, Ningxia Hui Autonomous Region Patentee after: Ningxia Zhongxin wafer semiconductor technology Co., Ltd Address before: No.28 Guangming West Road, Xixia District, Yinchuan City, Ningxia Hui Autonomous Region Patentee before: NINGXIA YINHE SEMICONDUCTOR TECHNOLOGY Co.,Ltd. |