CN210848741U

CN210848741U - Medium gas air flue structure and plasma torch

Info

Publication number: CN210848741U
Application number: CN201921043589.8U
Authority: CN
Inventors: 方易剑
Original assignee: ENN Science and Technology Development Co Ltd
Current assignee: ENN Science and Technology Development Co Ltd
Priority date: 2019-07-05
Filing date: 2019-07-05
Publication date: 2020-06-26
Anticipated expiration: 2029-07-05

Abstract

The utility model provides a medium gas air flue structure and plasma torch, this air flue structure includes: a mounting portion to be assembled with a cathode region part and an anode region part of the plasma torch, respectively; the plasma torch comprises a medium gas conveying structure arranged on an installation part, wherein a gas buffer chamber is arranged in the medium gas conveying structure, a gas inlet of the gas buffer chamber is communicated with a medium gas inlet channel of the installation part, and a gas outlet of the gas buffer chamber is communicated with a cathode and anode arc striking area of the plasma torch so as to stabilize the pressure of medium gas entering the gas buffer chamber. The utility model discloses in, through set up gaseous surge chamber in medium gas transport structure to the medium gas that gets into gaseous surge chamber cushions, makes it form even heliciform air current and flows to the cathode and anode arc starting region of plasma torch when stabilizing medium gas pressure.

Description

Medium gas air flue structure and plasma torch

Technical Field

The utility model relates to a plasma torch technical field particularly, relates to a medium gas channel structure and plasma torch.

Background

With the rapid development of the industry, plasma torches are used more and more widely in various industries, such as: welding, cutting, solid waste treatment and the like. It is then increasingly important to design and manufacture a stable and good plasma torch.

The stability of the flow of the dielectric gas is an important factor affecting the performance of the plasma torch. The medium gas of the plasma torch on the market at present has the following common modes: a. axial air intake: in the air inlet mode, the air advances along a certain direction, but the air flow and the air pressure are difficult to stabilize, so that the quality of arc flame is influenced; b. tangential air intake: according to the gas inlet mode, when the medium gas enters the arc chamber, the medium gas rotates along the wall of the arc chamber, the gas overflows to the arc flame after the arc chamber is filled with the medium gas, the gas flows in the arc chamber in an undetermined direction, and the overflow is generated after the gas amount is increased. These approaches have in common: the medium gas directly flows into the medium gas chamber of the plasma torch after passing through the valve from the gas storage device and contacts with the discharge arc to generate plasma. The disadvantage of this feature is that the gas pressure is not stable, resulting in unstable gas flow field and hence unstable plasma torch flame.

SUMMERY OF THE UTILITY MODEL

In view of this, the utility model provides a medium gas air flue structure and plasma torch aims at solving among the prior art because the unstable problem of plasma torch flame that leads to of medium gas through the medium air chamber of gas storage device direct entering plasma torch.

In one aspect, the utility model provides a medium gas channel structure, include: a mounting portion to be assembled with a cathode region part and an anode region part of the plasma torch, respectively; the plasma torch gas conveying device comprises a medium gas conveying structure arranged on an installation part, wherein a gas buffering chamber is arranged in the medium gas conveying structure, a gas inlet of the gas buffering chamber is communicated with a medium gas inlet channel of the installation part, a gas outlet of the gas buffering chamber is communicated with a cathode and anode arc starting area of a plasma torch, and the gas outlet of the gas buffering chamber is used for stably entering the pressure of medium gas of the gas buffering chamber.

Furthermore, in the above medium gas channel structure, the end surface of the medium gas conveying structure far from the mounting portion is provided with a plurality of spiral gas outlets, and each spiral gas outlet is communicated with the gas buffer chamber, so that the medium gas in the gas buffer chamber flows to the cathode and anode arc striking area of the plasma torch in a spiral shape.

Further, in the medium gas channel structure, the spiral air outlet holes are uniformly distributed on the end surface of the medium gas conveying structure far away from the mounting part.

Further, in the above medium gas channel structure, the medium gas conveying structure is a cylindrical structure, and an annular cavity is provided in a side wall thereof to form the gas buffer chamber.

Further, in the medium gas passage structure, an annular protrusion is arranged at an end portion, close to the mounting portion, of the annular cavity, a plurality of notches are formed in the annular protrusion, each notch forms a gas inlet of the gas buffer chamber, and the gas inlets of the gas buffer chambers are communicated with the medium gas inlet passage in the mounting portion and used for guiding medium gas in the medium gas inlet passage into the gas buffer chambers.

Further, in the medium gas passage structure, the notches are uniformly distributed along the circumferential direction of the annular protrusion.

Further, in the above-mentioned medium gas air passage structure, the installation part is a flange structure, and the medium gas conveying structure is sleeved in an inner hole of the flange structure.

Further, in the above medium gas channel structure, the mounting portion is provided with a plurality of medium gas inlet channels along a circumferential direction, each of the medium gas inlet channels extends along a radial direction of the mounting portion, and each of the medium gas inlet channels is provided in one-to-one correspondence with the gas inlet of the gas buffer chamber.

Further, in the above-mentioned medium gas passage structure, the mounting portion is provided with a plurality of medium gas inlet pipes along a circumferential direction, inlets of the medium gas inlet pipes are communicated with the medium gas storage device, and outlets of the medium gas inlet pipes are communicated with the medium gas inlet passages, respectively.

Compared with the prior art, the beneficial effects of the utility model reside in that, the utility model provides a medium gas air flue structure is through setting up gaseous surge chamber in medium gas transport structure to cushion the medium gas that gets into gaseous surge chamber, make it form even heliciform air current and flow to the negative and positive pole arcing region of plasma torch when stabilizing medium gas pressure, solved prior art, because the medium gas pressure is unstable and the uncertain harmful effects that produce to plasma torch of medium gas flow direction.

The utility model also provides a plasma torch, include: a cathode region component, an anode region component and any one of the medium gas channel structures; a medium air chamber is formed between the cathode area component and the anode area component, and the medium air channel structure is inserted in the medium air chamber; the gas inlet of the gas buffer chamber in the medium gas channel structure is communicated with an external medium gas storage device, and the gas outlet of the gas buffer chamber is communicated with the medium gas chamber and used for stabilizing the pressure of the medium gas entering the gas buffer chamber.

The medium gas channel structure has the functions of stabilizing the pressure of the medium gas and enabling the medium gas to form uniform gas flow, so the plasma torch with the medium gas channel structure also has corresponding technical effects.

Drawings

Various other advantages and benefits will become apparent to those of ordinary skill in the art upon reading the following detailed description of the preferred embodiments. The drawings are only for purposes of illustrating the preferred embodiments and are not to be construed as limiting the invention. Also, like reference numerals are used to refer to like parts throughout the drawings. In the drawings:

fig. 1 is a schematic three-dimensional structure diagram of a medium gas passage structure provided in an embodiment of the present invention;

FIG. 2 is a schematic cross-sectional view A-A of the media gas passage of FIG. 1;

fig. 3 is a cross-sectional view of a medium gas channel structure provided in an embodiment of the present invention;

fig. 4 is a schematic view illustrating a gas flow direction in a gas buffer chamber of a medium gas passage structure according to an embodiment of the present invention;

fig. 5 is an assembly view of a medium gas channel structure in a plasma torch according to an embodiment of the present invention.

Detailed Description

Exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

Referring to fig. 1 and 5, the medium gas passage structure according to the embodiment of the present invention includes: the device comprises a mounting part 1 and a medium gas conveying structure 2 arranged on the mounting part 1; wherein, the mounting part 1 is respectively assembled with a cathode region component and an anode region component of the plasma torch; the medium gas conveying structure 2 is provided with a gas buffer chamber 21, a gas inlet of the gas buffer chamber 21 is communicated with the medium gas inlet channel 11 of the mounting part 1, and a gas outlet of the gas buffer chamber is communicated with a cathode and anode arc starting area d of the plasma torch so as to stabilize the pressure of the medium gas entering the gas buffer chamber 21.

Specifically, the mounting portion 1 may be an annular disk-shaped structure, on the surface of which a plurality of mounting holes 13 are formed along the circumferential direction, and an annular seating groove 14 is formed at a position away from the mounting holes 13 so as to be assembled with a cathode region part and an anode region part of the plasma torch, so that the medium gas transporting structure 2 is mounted between the anode region part and the cathode region part of the plasma torch, and thus the gas flowing out of the medium gas transporting structure 2 flows to a cathode-anode arcing region d between the cathode region part and the anode region part.

The medium gas conveying structure 2 may be a cylinder structure, and a hollow part of the cylinder structure is used for matching with the cathode region component. The medium gas conveying structure 2 is installed in the hollow area of the annular installation part along the axis, and the axis of the medium gas conveying structure 2 and the axis of the installation part 1 can be collinear. An annular cavity a is provided in the side wall of the medium gas-conveying structure 2, forming a gas buffer chamber 21.

The gas inlet of the gas buffer chamber 21 may communicate with the medium gas inlet passage 11 of the mounting part 1 to store the medium gas delivered from the medium gas inlet passage 11, and the gas outlet of the gas buffer chamber 21 communicates with the cathode and anode arc striking region of the plasma torch to flow toward the cathode and anode arc striking region of the plasma torch in a spiral shape after buffering the pressure of the medium gas.

In this embodiment, the mounting portion 1 and the dielectric gas transport structure 2 are made of insulating materials, so as to separate the cathode region and the anode region of the plasma torch and prevent the cathode region and the anode region from being directly conducted, thereby playing an insulating role.

It can be clearly seen from the above that, in the medium gas channel structure provided in this embodiment, the gas buffer chamber is disposed in the medium gas conveying structure to buffer the medium gas entering the gas buffer chamber, so that the medium gas forms a uniform spiral gas flow and flows to the cathode and anode arc striking region of the plasma torch while stabilizing the pressure of the medium gas, thereby solving the problem of adverse effects on the plasma torch flame due to unstable medium gas pressure and uncertain medium gas flow direction in the prior art.

With reference to fig. 1 and 2, a plurality of spiral gas outlets 211 are formed in an end surface of the medium gas conveying structure 2 away from the mounting portion 1, and each spiral gas outlet 211 is communicated with the gas buffer chamber 21, so that the medium gas spirally flows to the cathode and anode arc striking region d of the plasma torch.

Specifically, a plurality of spiral air outlets 211 are formed in the top (the upper end as shown in fig. 2) of the medium gas conveying structure 2, and the aperture of each spiral air outlet 211 can be determined according to actual needs, which is not limited in this embodiment. The spiral gas outlet 211 in this embodiment is a gas outlet of the gas buffer chamber 21.

Preferably, the spiral air outlet holes 211 are uniformly distributed on the end surface of the medium air conveying structure 2 far away from the mounting part 1. Due to the arrangement, after the gas buffer chamber is filled with the medium gas, the medium gas is discharged through each spiral gas outlet 211 to form a plurality of stable and uniform spiral gas flows, and the spiral gas flows overflow to the cathode and anode arc striking area of the plasma torch through a preset path, so that stable plasma torch flame can be generated in the cathode and anode arc striking area of the plasma torch, and finally, the torch flame precision of the plasma torch is easier to control.

Referring to fig. 2, in each of the above embodiments, an annular protrusion 212 is disposed at an end of the annular cavity a close to the mounting portion 1, a plurality of notches are disposed on the annular protrusion 212, each notch forms an air inlet of the air buffer chamber, and the air inlet of each air buffer chamber is communicated with the medium air inlet channel 11 on the mounting portion 1, so as to guide the medium air in the medium air inlet channel 11 into the air buffer chamber 21.

Specifically, the annular cavity a is provided with an annular protrusion 212 at the end part away from the spiral gas outlet hole 211, and the cross-sectional thickness of the annular protrusion 212 and the cross-sectional thickness of the annular cavity a can be kept consistent, so as to better seal the medium gas in the gas buffer chamber 21. One or more notches are formed in the annular projection 212 to form an inlet port of the gas buffer chamber 21 so as to communicate with the medium gas inlet passage 11.

Preferably, the gap is a plurality of gaps, and each gap is uniformly distributed along the circumferential direction of the annular protrusion 212. This arrangement facilitates uniform and rapid entry of the medium gas into the gas buffer chamber 21.

With reference to fig. 1 to 3, the mounting portion 1 is a flange structure, and the medium gas conveying structure 2 is sleeved in an inner hole of the flange structure. The medium gas-conveying structure 2 may be formed integrally with the mounting portion 1.

In each of the above embodiments, referring to fig. 2 and fig. 3, the mounting portion 1 is provided with a plurality of medium air inlet passages 11 along the circumferential direction, each medium air inlet passage 11 extends along the radial direction of the mounting portion 1, and each medium air inlet passage 11 is respectively arranged in one-to-one correspondence with the air inlet of the air buffer chamber. The aperture of the gas inlet of the gas buffer chamber may be slightly larger than the aperture of the medium gas inlet channel 11, that is, the size of the notch on the annular protrusion 212 may be larger than the size of the medium gas inlet channel 11. As can be seen from fig. 3, the area a is the area where the dielectric gas transport structure 2 is mated with the cathode region part, and the area b is the area where the dielectric gas transport structure 2 is mated with the anode region part.

In the above embodiment, a plurality of medium gas inlet pipes 12 are circumferentially arranged on the mounting portion 1, an inlet of each medium gas inlet pipe 12 is communicated with a medium gas storage device, and an outlet of each medium gas inlet pipe 12 is communicated with each medium gas inlet channel 11.

In practice, a pair of medium gas inlet pipes 12 communicated with the medium gas inlet channel 11 may be symmetrically arranged along the radial direction of the flange structure to simultaneously convey the medium gas into the medium gas conveying structure from different directions.

Referring to fig. 4, it shows the flowing direction of the medium gas in the embodiment of the present invention, it can be seen that the medium gas enters the medium gas inlet channel 11 of the installation part 1 from the external gas storage device, and enters the gas buffer chamber 21 after flowing out from the medium gas inlet channel 11, after the medium gas is filled in the gas buffer chamber, the gas pressure in the gas buffer chamber 21 tends to be stable, at this moment, the medium gas forms a stable spiral gas flow to the cathode and anode arcing region of the plasma torch under the guiding effect of the spiral gas outlet hole 211.

To sum up, in the utility model, the gas buffer chamber is arranged in the medium gas conveying structure to buffer the medium gas entering the gas buffer chamber so as to stabilize the pressure of the medium gas; and a spiral outlet is further arranged on the medium conveying structure, so that the medium gas forms uniform spiral gas flow and flows to a cathode and anode arc striking area of the plasma torch, and torch flames generated by the plasma torch are more stable and controllable.

Referring to fig. 5, the present invention also provides a plasma torch comprising: the cathode area component, the anode area component and the medium air channel structure are arranged in the cathode area component, wherein a medium air chamber c is formed between the cathode area component and the anode area component, and the medium air channel structure is inserted into the medium air chamber c; the gas inlet of the gas buffer chamber 21 in the medium gas channel structure is communicated with an external medium gas storage device, and the gas outlet of the gas buffer chamber 21 is communicated with the medium gas chamber c, so as to stabilize the pressure of the medium gas entering the gas buffer chamber 21 and enable the medium gas to overflow to the cathode and anode arcing region d through the medium gas chamber c in a spiral shape.

Specifically, the cathode region member may include: a cathode head 3 and a cathode cooling water part 4, wherein the cathode head 3 is connected with the cathode of the power supply; the cathode cooling water part 4 is connected with the cathode head 3, the cathode cooling water part 4 consists of a cathode cold water diversion plate 42 and a cathode cold water cylinder 41 which are communicated, and the cathode cold water diversion plate 42 is provided with a cooling water inlet and outlet channel for cooling and radiating the cathode head 3; the anode region part may include: an anode head 5 and an anode cooling water part 6, wherein the anode head 5 is connected with the anode of the power supply; the anode cooling water part 6 is connected with the anode head 5, the anode cooling water part 6 is composed of an anode cold water diversion plate 61 and an anode cold water cylinder 62 which are communicated, and a cooling water inlet and outlet channel is arranged in the anode cold water diversion plate 61 and used for cooling and radiating the anode head 5. A cathode-anode arc striking area d, which is a torch generation area of the plasma torch, is formed between the cathode head 2 and the anode head 5. The medium gas channel structure is arranged between the cathode cold water cylinder 41 and the anode cold water diversion plate 61 through the installation part 1, and the installation part 1 is connected with the cathode cooling water part 4 and the anode cooling water part 6 through the installation holes 13 on the installation part. In order to ensure the sealing property, a sealing strip is embedded in the annular groove 14 on the installation part 1 so as to realize the sealing between the installation part 1 and the anode cold water diversion plate 61; on the side of the mounting part 1 opposite to the annular groove 14, a groove for mounting a sealing strip is formed on the cathode cold water cylinder 41, so that the mounting part 1 and the cathode cold water cylinder 41 are sealed.

For the specific implementation of the medium gas channel structure, reference may be made to the above embodiments, which are not described herein again.

To sum up, owing to the pressure of medium gas can be stabilized to the gas surge chamber with medium gas air passage structure, simultaneously, can also make medium gas form even heliciform air current and flow to the cathode and anode arc striking region of plasma torch for the torch flame that plasma torch produced is more stable controllable, so the utility model provides a plasma torch also has above-mentioned technological effect.

It will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims and their equivalents, the present invention is also intended to include such modifications and variations.

Claims

1. A media air passage structure, comprising:

a mounting portion to be assembled with a cathode region part and an anode region part of the plasma torch, respectively;

the plasma torch gas conveying device comprises a medium gas conveying structure arranged on an installation part, wherein a gas buffering chamber is arranged in the medium gas conveying structure, a gas inlet of the gas buffering chamber is communicated with a medium gas inlet channel of the installation part, a gas outlet of the gas buffering chamber is communicated with a cathode and anode arc starting area of a plasma torch, and the gas outlet of the gas buffering chamber is used for stably entering the pressure of medium gas of the gas buffering chamber.

2. The medium gas flue structure according to claim 1, wherein a plurality of spiral gas outlets are formed in an end surface of the medium gas conveying structure away from the mounting portion, and each spiral gas outlet is communicated with the gas buffer chamber so that the medium gas in the gas buffer chamber flows towards an arc striking region of a cathode and an anode of the plasma torch in a spiral shape.

3. The medium gas channel structure according to claim 2, wherein each of the spiral gas outlet holes is uniformly distributed on an end surface of the medium gas conveying structure away from the mounting portion.

4. The medium gas channel structure according to any one of claims 1 to 3, wherein the medium gas delivery structure is a cylindrical structure having an annular cavity provided in a side wall thereof, forming the gas buffer chamber.

5. The medium gas channel structure according to claim 4, wherein an annular protrusion is disposed at an end of the annular cavity close to the mounting portion, a plurality of notches are disposed on the annular protrusion, each notch forms a gas inlet of the gas buffer chamber, and the gas inlet of each gas buffer chamber is communicated with the medium gas inlet channel on the mounting portion, so as to guide the medium gas in the medium gas inlet channel into the gas buffer chamber.

6. The medium gas passage structure according to claim 5, wherein each of said notches is uniformly distributed along a circumferential direction of said annular protrusion.

7. The medium gas passage structure according to claim 5, wherein the mounting portion is a flange structure, and the medium gas conveying structure is sleeved in an inner hole of the flange structure.

8. The medium gas channel structure according to claim 7, wherein the mounting portion is provided with a plurality of medium gas inlet passages in a circumferential direction, each of the medium gas inlet passages extends in a radial direction of the mounting portion, and each of the medium gas inlet passages is provided in one-to-one correspondence with the gas inlet of the gas buffer chamber.

9. The medium gas passage structure according to claim 8, wherein the mounting portion is provided with a plurality of medium gas inlet pipes along a circumferential direction, an inlet of each medium gas inlet pipe is communicated with the medium gas storage device, and an outlet of each medium gas inlet pipe is communicated with each medium gas inlet channel.

10. A plasma torch, comprising: a cathode region member, an anode region member and the medium gas passage structure according to any one of claims 1 to 9; wherein,

a medium air chamber is formed between the cathode area component and the anode area component, and the medium air channel structure is inserted in the medium air chamber;

the gas inlet of the gas buffer chamber in the medium gas channel structure is communicated with an external medium gas storage device, and the gas outlet of the gas buffer chamber is communicated with the medium gas chamber and used for stabilizing the pressure of the medium gas entering the gas buffer chamber.