CN208844179U - A kind of vacuum magnetic-control sputtering novel planar cathode - Google Patents
A kind of vacuum magnetic-control sputtering novel planar cathode Download PDFInfo
- Publication number
- CN208844179U CN208844179U CN201821403230.2U CN201821403230U CN208844179U CN 208844179 U CN208844179 U CN 208844179U CN 201821403230 U CN201821403230 U CN 201821403230U CN 208844179 U CN208844179 U CN 208844179U
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- Prior art keywords
- magnetic
- control sputtering
- heat
- novel planar
- cathode
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- Expired - Fee Related
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 20
- 238000001816 cooling Methods 0.000 claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 28
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000002826 coolant Substances 0.000 claims abstract description 27
- 229910052802 copper Inorganic materials 0.000 claims abstract description 27
- 239000010949 copper Substances 0.000 claims abstract description 27
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000009434 installation Methods 0.000 claims abstract description 19
- 210000000481 breast Anatomy 0.000 claims abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 239000006096 absorbing agent Substances 0.000 claims description 11
- 238000003466 welding Methods 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 3
- 229910052742 iron Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 10
- 238000010521 absorption reaction Methods 0.000 abstract description 4
- 238000000605 extraction Methods 0.000 abstract description 4
- 238000010276 construction Methods 0.000 abstract description 3
- 230000017525 heat dissipation Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 210000005069 ears Anatomy 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
The utility model discloses a kind of vacuum magnetic-control sputtering novel planar cathodes, including cathode shield, the bosom of the cathode shield is equipped with protection pedestal, the lower surface of the cathode shield is connected with copper backboard by bolted connection, fixed magnet and magnetic board are uniformly connected between the upper surface and protection pedestal of copper backboard, the coolant liquid in coolant liquid accommodating box can be drawn into cooling line by suction pump, it can be radiated to the inside of target and cathode shield by cooling line, it can be radiated to the coolant liquid after heat absorption by heat-dissipating pipe, and it can be by the inside of gas extraction to condenser by aspiration pump, the size of magnetic board magnetic force can be adjusted by rheostat, this vacuum magnetic-control sputtering is simple with novel planar cathode construction, it is easy to operate, not only make easier for installation to device, and make Cooling effect is more preferable, and can be more convenient to the big minor adjustment of magnetic force.
Description
Technical field
The utility model relates to H plane sputtering target technical field, specially a kind of vacuum magnetic-control sputtering novel planar
Cathode.
Background technique
Vacuum coating technology has been widely used in many fields such as microelectronics, aerospace, machine-building, food packaging.
Magnetron sputtering plating has the characteristics that low temperature, high speed, can long-time mass production, but existing planar cathode structure is multiple
It is miscellaneous, and inconvenience is installed, and bad to device radiation effect, it is inconvenient for use, and magnetic force size cannot be adjusted, it is
People bring many inconvenience.
Utility model content
The technical problems to be solved in the utility model is to overcome existing defect, provides a kind of vacuum magnetic-control sputtering with novel
Planar cathode, structure is simple, easy to operate, not only makes easier for installation to device, and makes cooling effect more preferable, and
And can be more convenient to the big minor adjustment of magnetic force, it can effectively solve the problems in background technique.
To achieve the above object, the utility model provides the following technical solutions: a kind of vacuum magnetic-control sputtering novel planar
Cathode, including cathode shield, the bosom of the cathode shield are equipped with protection pedestal, and the lower surface of the cathode shield is connected by bolt
The mode connect is connected with copper backboard, is uniformly connected with fixed magnet and magnetic board between the upper surface and protection pedestal of copper backboard,
The inside of copper backboard is equipped with cooling line, and the lower surface of the copper backboard is equipped with groove, and the inside of the groove is equipped with target, described
The upper surface of pedestal is protected to be equipped with coolant liquid accommodating box and rheostat, rheostatic output end is electrically connected the input terminal of magnetic board,
The upper surface of the cathode shield is equipped with upper end connecting plate, and the upper surface of upper end connecting plate is equipped with aspiration pump and condenser, the pumping
The gas outlet of air pump is connected by the air inlet of conduit and condenser, the gas outlet of condenser by conduit and connected with outer casing into
Port connection, the inside of connected with outer casing are equipped with heat-dissipating pipe, and the water inlet of heat-dissipating pipe is by conduit and cooling line, and the one of cathode shield
Suction pump has been bolted in side, and the water inlet of suction pump is connect by conduit with the side lower end of coolant liquid accommodating box, cold
But the upper end water inlet of liquid accommodating box is connected by the water outlet of conduit and heat-dissipating pipe, and the water outlet of the suction pump passes through conduit
It is connect with the water inlet of cooling line, the upper surface of the upper end connecting plate is equipped with PLC controller, the input terminal of PLC controller
It is electrically connected the output end of external power supply, output end electrical connection suction pump, condenser and the rheostatic input terminal of PLC controller.
As a kind of optimal technical scheme of the utility model, the target connects with copper backboard by bolted connection
It connects, and the lower surface of target is lower than the lower surface of copper backboard.
As a kind of optimal technical scheme of the utility model, connect by welding among the side of the cathode shield
It is connected to installation otic placode, installation otic placode is equipped with fixed bolt hole, and the inside of fixed bolt hole is equipped with internal screw thread.
As a kind of optimal technical scheme of the utility model, the connected with outer casing is pyramidal structure, and connected with outer casing
Lower end and upper end connecting plate upper surface between be equipped with support column.
As a kind of optimal technical scheme of the utility model, the helical structure of the heat-dissipating pipe, and heat-dissipating pipe and company
It connects and is bonded to each other on the inside of shell, and the outside of heat-dissipating pipe is connected with heat sink by welding.
As a kind of optimal technical scheme of the utility model, the number of the fixed magnet is no less than three, and electricity
The number of magnetic sheet is no less than two, and fixed magnet and magnetic board are spaced apart.
As a kind of optimal technical scheme of the utility model, the upper surface uniform welding of the copper backboard has absorber plate,
Absorber plate is located at the inside of cathode shield.
As a kind of optimal technical scheme of the utility model, the protection pedestal by bolted connection with cathode
Cover connection, protects and is equipped with sealing ring between the side of pedestal and the inside of cathode shield.
As a kind of optimal technical scheme of the utility model, the cooling line is located at the centre of copper backboard, and cold
But pipeline is S type structure.
As a kind of optimal technical scheme of the utility model, the number of the installation otic placode is four, four mounting ears
Plate is located at the quadrangle of cathode shield.
Compared with prior art, the utility model has the beneficial effects that
1, it is provided with suction pump on the utility model, can be extracted the coolant liquid in coolant liquid accommodating box by suction pump
Into cooling line, can be radiated to the inside of target and cathode shield by cooling line, so that heat dissipation is more convenient, and
Auxiliary heat dissipation can be carried out to the inside of cathode shield by absorber plate, so that heat dissipation effect is more preferable.
2, it is provided with heat-dissipating pipe on the utility model, can be radiated to the coolant liquid after heat absorption by heat-dissipating pipe, and
And then the inside of gas extraction to condenser can be entered by condenser gas after cooling by connection by aspiration pump
Interior of shell cools down heat-dissipating pipe with this, so that the cooling effect to coolant liquid is more preferable.
3, it is provided with rheostat on the utility model, the size of magnetic board magnetic force can be adjusted by rheostat,
So that the adjusting to magnetic force is more convenient, provide people with convenience, and be spaced apart by magnetic board and fixed magnet, come so that
Magnetic force is more uniform, so that the effect that device generates is more preferable, provides a convenient.
4, it is provided with installation otic placode on the utility model, device can be installed by installing otic placode, so as to dress
To set easier for installation, this vacuum magnetic-control sputtering is simple with novel planar cathode construction, and it is easy to operate, not only to pacify device
It fills more convenient, and makes cooling effect more preferable, and can be more convenient to the big minor adjustment of magnetic force.
Detailed description of the invention
FIG. 1 is a schematic structural view of the utility model;
Fig. 2 is the utility model side structure schematic diagram;
Fig. 3 is the utility model section structural schematic diagram.
In figure: 1 aspiration pump, 2 connected with outer casing, 3 heat-dissipating pipes, 4 copper backboards, 5 installation otic placodes, 6 cathode shields, 7 condensers, on 8
Connecting plate, 9 magnetic boards, 10 targets, 11 cooling lines, 12 fixed magnets, 13 absorber plates, 14 protection pedestals, 15 coolant liquids are held to contain
Put case, 16 suction pumps, 17 PLC controllers, 18 rheostats.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
Fig. 1-3 is please referred to, the utility model provides a kind of technical solution: a kind of vacuum magnetic-control sputtering novel planar yin
Pole, including cathode shield 6, the bosom of cathode shield 6 are equipped with protection pedestal 14, what the lower surface of cathode shield 6 was bolted
Mode is connected with copper backboard 4, is uniformly connected with fixed magnet 12 and magnetic board between the upper surface and protection pedestal 14 of copper backboard 4
9, the inside of copper backboard 4 is equipped with cooling line 11, and the lower surface of copper backboard 4 is equipped with groove, and the inside of the groove is equipped with target 10,
The upper surface of pedestal 14 is protected to be equipped with coolant liquid accommodating box 15 and rheostat 18, the output end of rheostat 18 is electrically connected magnetic board 9
Input terminal, the size of 9 magnetic force of magnetic board can be adjusted by rheostat 18, so that the adjusting to magnetic force is more square
Just, the upper surface of cathode shield 6 is equipped with upper end connecting plate 8, and the upper surface of upper end connecting plate 8 is equipped with aspiration pump 1 and condenser 7, takes out
The gas outlet of air pump 1 is connect by conduit with the air inlet of condenser 7, and the gas outlet of condenser 7 passes through conduit and connected with outer casing 2
Air inlet connection, the inside of connected with outer casing 2 is equipped with heat-dissipating pipe 3, can be carried out to the coolant liquid after heat absorption by heat-dissipating pipe 3 scattered
Heat, for the water inlet of heat-dissipating pipe 3 by conduit and cooling line 11, suction pump 16 has been bolted in the side of cathode shield 6, is taken out
The water inlet of water pump 16 is connect by conduit with the side lower end of coolant liquid accommodating box 15, the upper end water inlet of coolant liquid accommodating box 15
Mouth is connect by conduit with the water outlet of heat-dissipating pipe 3, and the water outlet of suction pump 16 passes through the water inlet of conduit and cooling line 11
Coolant liquid in coolant liquid accommodating box 15, can be drawn into cooling line 11 by suction pump 16, pass through cooling tube by connection
Road 11 can radiate to the inside of target 10 and cathode shield 6, so that heat dissipation is more convenient, it can be by gas by aspiration pump 1
Body is drawn into the inside of condenser 7, is then entered inside connected with outer casing 2 by the gas after cooling of condenser 7, with this to scattered
Heat pipe 3 is cooled down, and the upper surface of upper end connecting plate 8 is equipped with PLC controller 17, and the input terminal electrical connection of PLC controller 17 is outer
The output end of portion's power supply, the output end of PLC controller 17 are electrically connected the input terminal of suction pump 16, condenser 7 and rheostat 18, target
Material 10 is connect with copper backboard 4 by bolted connection, and the lower surface of target 10 is lower than the lower surface of copper backboard 4, yin
Installation otic placode 5 is connected among the side of pole cover 6 by welding, installation otic placode 5 is equipped with fixed bolt hole, fixed spiral shell
The inside of keyhole is equipped with internal screw thread, and the number of installation otic placode 5 is four, and four installation otic placodes 5 are located at the four of cathode shield 6
Angle can install device by installing otic placode 5, so that easier for installation to device, connected with outer casing 2 is taper knot
Structure, and support column is equipped between the lower end of connected with outer casing 2 and the upper surface of upper end connecting plate 8, it can be to even by support column
It connects shell 2 to be supported, so that supporting connected with outer casing 2 stronger, the helical structure of heat-dissipating pipe 3, and heat-dissipating pipe 3 and company
The inside for connecing shell 2 is bonded to each other, and the outside of heat-dissipating pipe 3 is connected with heat sink by welding, passes through heat sink
So that 3 heat dissipation effect of heat-dissipating pipe is more preferable, the number of fixed magnet 12 is no less than three, and the number of magnetic board 9 is no less than two
It is a, and fixed magnet 12 and magnetic board 9 are spaced apart, pass through being spaced apart so that generating for fixed magnet 12 and magnetic board 9
Magnetic force it is more uniform, the upper surface uniform welding of copper backboard 4 has absorber plate 13, and absorber plate 13 is located at the inside of cathode shield 6, lead to
Cross absorber plate 13 make it is more convenient to 6 internal heat dissipating of cathode shield, protection pedestal 14 by bolted connection with cathode shield 6
Connection protects and is equipped with sealing ring between the side of pedestal 14 and the inside of cathode shield 6, makes to protect 14 He of pedestal by sealing ring
Cathode shield 6 connects even closer, and cooling line 11 is located at the centre of copper backboard 4, and cooling line 11 is S type structure, reality
Empty magnetron sputtering is simple with novel planar cathode construction, easy to operate, not only makes easier for installation to device, and makes
Cooling effect is more preferable, and can be more convenient to the big minor adjustment of magnetic force.
When in use: device being installed by installing otic placode 5 first, by suction pump 16 by coolant liquid accommodating box 15
In coolant liquid be drawn into cooling line 11, radiated by inside of the cooling line 11 to target 10 and cathode shield 6, and
Auxiliary heat dissipation can be carried out to the inside of cathode shield 6 by absorber plate 13, the coolant liquid after heat absorption imported into the interior of heat-dissipating pipe 3
Portion, then pass through aspiration pump 1 for gas extraction to the inside of condenser 7, company is then entered by the gas after cooling of condenser 7
It connects inside shell 2, heat-dissipating pipe 3 is cooled down with this, coolant liquid enters inside coolant liquid accommodating box 15 after cooling, passes through change
Resistance device 18 can be adjusted the size of 9 magnetic force of magnetic board.
Coolant liquid in coolant liquid accommodating box 15 can be drawn into cooling line 11 by suction pump 16 by the utility model
It is interior, it can be radiated to the inside of target 10 and cathode shield 6 by cooling line 11, so that heat dissipation is more convenient, and be passed through
Absorber plate 13 can carry out auxiliary heat dissipation to the inside of cathode shield 6, so that heat dissipation effect is more preferable, it can be to suction by heat-dissipating pipe 3
Coolant liquid after heat radiates, and can be by gas extraction to the inside of condenser 7, then by cold by aspiration pump 1
The gas after cooling of condenser 7 enters inside connected with outer casing 2, is cooled down with this to heat-dissipating pipe 3, can be right by rheostat 18
The size of 9 magnetic force of magnetic board is adjusted, so that the adjusting to magnetic force is more convenient, this vacuum magnetic-control sputtering novel planar yin
Pole structure is simple, easy to operate, not only makes easier for installation to device, and makes cooling effect more preferable, and can be with
It is more convenient to the big minor adjustment of magnetic force.
While there has been shown and described that the embodiments of the present invention, for the ordinary skill in the art,
It is understood that these embodiments can be carried out with a variety of variations in the case where not departing from the principles of the present invention and spirit, repaired
Change, replacement and variant, the scope of the utility model is defined by the appended claims and the equivalents thereof.
Claims (10)
1. a kind of vacuum magnetic-control sputtering novel planar cathode, including cathode shield (6), it is characterised in that: the cathode shield (6)
Bosom is equipped with protection pedestal (14), and the lower surface of the cathode shield (6) is connected with copper backboard by bolted connection
(4), fixed magnet (12) and magnetic board (9), copper back are uniformly connected between the upper surface of copper backboard (4) and protection pedestal (14)
The inside of plate (4) is equipped with cooling line (11), and the lower surface of the copper backboard (4) is equipped with groove, and the inside of the groove is equipped with target
The upper surface of material (10), protection pedestal (14) is equipped with coolant liquid accommodating box (15) and rheostat (18), rheostat (18)
Output end is electrically connected the input terminal of magnetic board (9), and the upper surface of the cathode shield (6) is equipped with upper end connecting plate (8), upper end connection
The upper surface of plate (8) is equipped with aspiration pump (1) and condenser (7), and the gas outlet of the aspiration pump (1) passes through conduit and condenser
(7) air inlet connection, the gas outlet of condenser (7) are connect by conduit with the air inlet of connected with outer casing (2), connected with outer casing
(2) inside is equipped with heat-dissipating pipe (3), and the water inlet of heat-dissipating pipe (3) is by conduit and cooling line (11), and the one of cathode shield (6)
Side has been bolted suction pump (16), and the water inlet of suction pump (16) passes through the side of conduit and coolant liquid accommodating box (15)
The upper end water inlet of lower end connection, coolant liquid accommodating box (15) is connect by conduit with the water outlet of heat-dissipating pipe (3), described to draw water
The water outlet of pump (16) is connect by conduit with the water inlet of cooling line (11), and the upper surface of the upper end connecting plate (8) is set
Have PLC controller (17), the output end of the input terminal of PLC controller (17) electrical connection external power supply, PLC controller (17) it is defeated
Outlet is electrically connected the input terminal of suction pump (16), condenser (7) and rheostat (18).
2. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the target
(10) it is connect by bolted connection with copper backboard (4), and the lower surface of target (10) is lower than the following table of copper backboard (4)
Face.
3. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the cathode shield
(6) installation otic placode (5) is connected among side by welding, installation otic placode (5) is equipped with fixed bolt hole, fixed
The inside of bolt hole is equipped with internal screw thread.
4. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: outside the connection
Shell (2) is pyramidal structure, and support column is equipped between the lower end of connected with outer casing (2) and the upper surface of upper end connecting plate (8).
5. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the heat-dissipating pipe
(3) helical structure, and be bonded to each other on the inside of heat-dissipating pipe (3) and connected with outer casing (2), and the outside of heat-dissipating pipe (3) is logical
The mode for crossing welding is connected with heat sink.
6. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the fixed magnetic
The number of iron (12) is no less than three, and the number of magnetic board (9) is no less than two, and fixed magnet (12) and magnetic board
(9) it is spaced apart.
7. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the copper backboard
(4) upper surface uniform welding has absorber plate (13), and absorber plate (13) is located at the inside of cathode shield (6).
8. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the protection base
Seat (14) connect with cathode shield (6) by bolted connection, protect side and cathode shield (6) of pedestal (14) inside it
Between be equipped with sealing ring.
9. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 1, it is characterised in that: the cooling tube
Road (11) is located at the centre of copper backboard (4), and cooling line (11) is S type structure.
10. a kind of vacuum magnetic-control sputtering novel planar cathode according to claim 3, it is characterised in that: the installation
The number of otic placode (5) is four, and four installations otic placode (5) are located at the quadrangle of cathode shield (6).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201821403230.2U CN208844179U (en) | 2018-08-29 | 2018-08-29 | A kind of vacuum magnetic-control sputtering novel planar cathode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN201821403230.2U CN208844179U (en) | 2018-08-29 | 2018-08-29 | A kind of vacuum magnetic-control sputtering novel planar cathode |
Publications (1)
Publication Number | Publication Date |
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CN208844179U true CN208844179U (en) | 2019-05-10 |
Family
ID=66356468
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Application Number | Title | Priority Date | Filing Date |
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CN201821403230.2U Expired - Fee Related CN208844179U (en) | 2018-08-29 | 2018-08-29 | A kind of vacuum magnetic-control sputtering novel planar cathode |
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Country | Link |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113667947A (en) * | 2021-07-23 | 2021-11-19 | 镇江市德利克真空设备科技有限公司 | Be applied to negative pole platform's intelligent temperature control device |
-
2018
- 2018-08-29 CN CN201821403230.2U patent/CN208844179U/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113667947A (en) * | 2021-07-23 | 2021-11-19 | 镇江市德利克真空设备科技有限公司 | Be applied to negative pole platform's intelligent temperature control device |
CN113667947B (en) * | 2021-07-23 | 2023-04-21 | 镇江市德利克真空设备科技有限公司 | Be applied to intelligent temperature control device of negative pole platform |
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GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190510 |