CN208472182U - A kind of high temperature resistant solar selectively absorbing coating - Google Patents
A kind of high temperature resistant solar selectively absorbing coating Download PDFInfo
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- CN208472182U CN208472182U CN201820862309.5U CN201820862309U CN208472182U CN 208472182 U CN208472182 U CN 208472182U CN 201820862309 U CN201820862309 U CN 201820862309U CN 208472182 U CN208472182 U CN 208472182U
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/30—Auxiliary coatings, e.g. anti-reflective coatings
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/225—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption for spectrally selective absorption
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
- F24S70/00—Details of absorbing elements
- F24S70/20—Details of absorbing elements characterised by absorbing coatings; characterised by surface treatment for increasing absorption
- F24S70/25—Coatings made of metallic material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
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Abstract
The utility model relates to a kind of high temperature resistant solar selectively absorbing coatings, including existing metallic substrates, it is characterised in that: on the metallic substrate, also there is three layers respectively from top to bottom: high infrared reflection layer, absorbed layer and antireflection layer；The high infrared reflection layer is the coating of any metal of Al, Au, Ag, Ti, Cr, Ni；Absorbed layer successively includes high refractive index absorbed layer TiCrN film and low-refraction absorbed layer TiCrNxOy film from bottom to top；Antireflection layer successively includes Cr from bottom to top2O3Film and SiO2Film carries out plated film using magnetron sputtering method.The utility model has the beneficial effects that coating made from 1. the utility model, has the characteristics that absorption efficiency is high, emissivity is low, thermal stability is good；2. the ratio between solar spectrum absorptivity α and emissivity ε (T) height are suitble to 350 DEG C or more of high temperature application；3. manufacture craft is easy.
Description
Technical field
The utility model category solar energy optical-thermal conversion technical field is related to a kind of high temperature resistant solar selectively absorption
Coating.
Background technique
Solar selectively absorbing coating is that have high-absorbility at Visible-to-Near InfaRed wave band (300-2500nm), red
Wave section (2500-20000nm) has the function film of low-launch-rate, is to improve photothermal conversion effect for solar thermal collector
The key of rate.Solar selectively absorbing coating is usually made of composite material, and the usual composite material is using metal as base
At least one absorbed layer is coated in the carrying at bottom, and there are one or more antireflection layers on absorbed layer.
With the continuous development of solar thermal utilization demand and technology, the application range of solar thermal collector is from cryogenic applications
(≤100 DEG C) to medium temperature application (100 DEG C -350 DEG C) and high temperature application (>=350 DEG C) develop, with constantly meet sea water desalination,
The requirement of the high temperatures application field such as solar power generation.The solar selectively that solar thermal collector uses is absorbed and is applied
Layer also requires have high high-temp stability, adapts to the service condition of high temperature environment.
In order to improve the thermal stability of coating for selective absorption under high temperature service condition, Mo-Al2O3/Cu、SS-AlN/SS
Equal material systems have obtained research and development, use double targets or more target metal ceramics co-sputtering technologies, wherein Mo-Al2O3/Cu
The characteristics of system is Mo-Al2O3It is to absorb that absorbed layer, which has the characteristics of more sublayer structures of ingredient gradual change, SS-AlN/SS system,
Layer uses interference membrane structure, improves thermal stability.Though both the above material system thermal stability in high temperature environment has
It is promoted, but thermal efficiency ratio is not still high, while double targets or More target sputtering together process deposition rate are low, the production cycle is long, technique
Complexity, it is at high cost.
Utility model content
Purpose of the utility model is to solve Mo-Al2O3/ Cu, SS-AlN/SS material system thermal efficiency ratio it is not high and
The low problem of process deposition rate provides a kind of high temperature resistant solar selectively absorbing coating.
To achieve the goals above, the technical solution adopted in the utility model is as follows:
A kind of high temperature resistant solar selectively absorbing coating, including existing metallic substrates, it is characterised in that: in metallic substrates
On, also there are three layers respectively from top to bottom: high infrared reflection layer, absorbed layer and antireflection layer；
The high infrared reflection layer is the coating of any metal of Al, Au, Ag, Ti, Cr, Ni, with a thickness of 20-40nm；
The absorbed layer successively includes high refractive index absorbed layer TiCrN film and low-refraction absorbed layer from bottom to top
TiCrNxOy film, wherein TiCrN film with a thickness of 70-100nm, TiCrNxOy film with a thickness of 80-100nm；
The antireflection layer successively includes Cr from bottom to top2O3Film and SiO2Film, wherein Cr2O3Film with a thickness of 10-20nm,
SiO2Film with a thickness of 20-30nm.
Wherein, within the scope of 300-2500nm, the refractive index of the TiCrN film is 2.66-3.53, the TiCrNxOy film
Refractive index is 1.76-2.44；Within the scope of 300-2500nm, the extinction coefficient of the TiCrN film is 0.65-3.57, described
The extinction coefficient of TiCrNxOy film is 0.05-1.34.
As high low-refraction absorbed layer, it is excellent that two kinds of film combinations have entire membrane system for TiCrN film and TiCrNxOy film
Different spectral selection, high temperature (200 DEG C -400 DEG C) emissivity ε < 4%, absorptivity the α > 90% of coating for selective absorption.
TiCrN film and TiCrNxOy film similar thermal expansion coefficient, good thermal stability, can guarantee to apply in the high temperature environment
Layer has good high high-temp stability；
Antireflection layer uses Cr2O3Film and SiO2Film is sequentially overlapped composition, and the refractive index of film is successively successively decreased, and has more
Excellent anti-reflective effect.
The utility model has the beneficial effects that coating made from 1. the utility model, have absorption efficiency is high, emissivity is low,
The good feature of thermal stability；2. the ratio between solar spectrum absorptivity α and emissivity ε (T) height are suitble to 350 DEG C or more of high temperature application；
3. manufacture craft is easy.
Detailed description of the invention
Fig. 1 is a kind of high temperature resistant solar selectively absorbing coating structural schematic diagram；
Fig. 2 is a kind of high temperature resistant solar selectively absorbing coating preparation flow schematic diagram.
Specific embodiment
In conjunction with Fig. 1, a kind of high temperature resistant solar selectively absorbing coating, including existing metallic substrates, in metallic substrates 1
On, high infrared reflection layer 2, absorbed layer 3 and antireflection layer 4 are also distinguished from top to bottom；High infrared reflection layer 2 be Al, Au, Ag, Ti,
The coating of any metal of Cr, Ni, with a thickness of 20-40nm；Absorbed layer 3 is followed successively by high refractive index absorbed layer TiCrN from bottom to top
Film and low-refraction absorbed layer TiCrNxOy film, wherein TiCrN film with a thickness of 70-100nm, TiCrNxOy film with a thickness of
80-100nm；Antireflection layer is followed successively by Cr from bottom to top2O3Film and SiO2Film, wherein Cr2O3Film with a thickness of 10-20nm, SiO2
Film with a thickness of 20-30nm.Wherein, within the scope of 300-2500nm, the refractive index of TiCrN film is 2.66-3.53, TiCrNxOy
Film refractive index is 1.76-2.44；Within the scope of 300-2500nm, the extinction coefficient of TiCrN film is 0.65-3.57, TiCrNxOy
The extinction coefficient of film is 0.05-1.34.
In conjunction with Fig. 2, a kind of high temperature resistant solar selectively absorbing coating, specific implementation step is as follows:
Embodiment 1
(1) copper foil with a thickness of 0.5mm is selected；
(2) cleaning of metal substrate surface: being put into copper foil in supersonic wave cleaning machine, first uses acetone ultrasound 20min, then
With alcohol ultrasound 20min, deionized water ultrasound 20min is finally used, with high pressure N2Drying；
(3) copper foil is taken out, is put into deposition high infrared reflection layer Al film in magnetron sputtering apparatus, preparation technology parameter is such as
Under:
Target is Al target (4N), and pulse dc power sputtering power is 3000w, operating air pressure 2.4mTorr, work gas
Body Ar flow is 200sccm, and copper foil transmission rate is 0.8m/min, and copper foil back and forth movement 10 times under target must be coated with
With a thickness of the copper foil of the high infrared reflection layer of 30nm；
(4) deposit absorbent layer TiCrN film, preparation technology parameter are as follows in magnetron sputtering apparatus:
Target is TiCr alloys target (4N, Ti:Cr(at%)=4:1), pulse dc power sputtering power is 3000w, work
Air pressure is 2.4mTorr, and working gas Ar flow is 200sccm, reaction gas N2Flow is 20sccm, and step (3) is obtained to be applied
The copper foil transmission rate for being covered with high infrared reflection layer is 1.0m/min, and copper foil back and forth movement 25 times under target must be coated with
With a thickness of the copper foil of the high refractive index absorbed layer (TiCrN film) of 70nm；
(5) deposit absorbent layer TiCrNxOy film, preparation technology parameter are as follows in magnetron sputtering apparatus:
Target is TiCr alloys target (4N, Ti:Cr(at%)=4:1), pulse dc power sputtering power is 3000w, work
Air pressure is 2.4mTorr, and working gas Ar flow is 200sccm, reaction gas N2Flow is 15sccm, reaction gas O2Flow is
5sccm, step (4) the copper foil transmission rate obtained coated with high refractive index absorbed layer (TiCrN film) is 1.2m/min, copper
Paillon back and forth movement 20 times under target obtain the copper foil being coated with a thickness of 80nm low-refraction absorbed layer (TiCrNxOy film)；
(6) antireflection layer Cr is deposited in magnetron sputtering apparatus2O3Film, preparation technology parameter are as follows:
Target is Cr target (4N), and pulse dc power sputtering power is 3000w, operating air pressure 2.4mTorr, work gas
Body Ar flow is 200sccm, reaction gas O2Flow is 10sccm, and step (5) is obtained to be coated with low-refraction absorbed layer
The copper foil transmission rate of (TiCrNxOy film) is 0.8m/min, and copper foil back and forth movement 15 times under target are obtained coated with thickness
For the reflecting layer (Cr of 20nm2O3) copper foil；
(7) antireflection layer SiO is deposited in magnetron sputtering apparatus2Film, preparation technology parameter are as follows:
Target is rotation Si target (4N), and radio-frequency power supply sputtering power is 3000w, operating air pressure 6.0mTorr, work gas
Body flow is 200sccm, reaction gas O2Flow is 40sccm, and step (6) is obtained to coat reflecting layer (Cr2O3) copper foil
Transmission rate is 0.9m/min, and copper foil back and forth movement 14 times under target are obtained and are coated with a thickness of the reflecting layer 20nm (SiO2)
Copper foil obtains a kind of high temperature resistant solar selectively absorbing coating.
Embodiment 2
(1) aluminium foil with a thickness of 0.3mm is selected；
(2) cleaning of metal substrate surface: being put into aluminium foil in supersonic wave cleaning machine, first uses acetone ultrasound 20min, then
With alcohol ultrasound 20min, deionized water ultrasound 20min is finally used, with high pressure N2Drying；
(3) aluminium foil is taken out, is put into deposition high infrared reflection layer Ag film in magnetron sputtering apparatus, preparation technology parameter is such as
Under:
Target is Ag target (4N), and pulse dc power sputtering power is 2500w, operating air pressure 2.5mTorr, work gas
Body Ar flow is 180sccm, and aluminium foil transmission rate is 0.8m/min, and aluminium foil back and forth movement 10 times under target must be coated with
With a thickness of the aluminium foil of the high infrared reflection layer of 25nm；
(4) deposit absorbent layer TiCrN film, preparation technology parameter are as follows in magnetron sputtering apparatus:
Target is TiCr alloys target (4N, Ti:Cr(at%)=3:2), pulse dc power sputtering power is 2500w, work
Air pressure is 2.5mTorr, and working gas Ar flow is 200sccm, reaction gas N2Flow is 25sccm, and step (3) is obtained
Obtaining the aluminium foil transmission rate coated with high infrared reflection layer is 1.0m/min, and aluminium foil back and forth movement 30 times under target must apply
It is covered with the aluminium foil of the high refractive index absorbed layer (TiCrN film) with a thickness of 90nm；
(5) deposit absorbent layer TiCrNxOy film, preparation technology parameter are as follows in magnetron sputtering apparatus:
Target is TiCr alloys target (4N, Ti:Cr(at%)=3:2), pulse dc power sputtering power is 2500w, work
Air pressure is 2.5mTorr, and working gas Ar flow is 200sccm, reaction gas N2Flow is 20sccm, reaction gas O2Flow is
10sccm, step (4) the aluminium foil transmission rate obtained coated with high refractive index absorbed layer (TiCrN film) is 0.8m/min,
Aluminium foil back and forth movement 25 times under target obtain the aluminium foil for being coated with the low-refraction absorbed layer (TiCrNxOy film) with a thickness of 90nm
Piece；
(6) antireflection layer Cr is deposited in magnetron sputtering apparatus2O3Film, preparation technology parameter are as follows:
Target is Cr target (4N), and pulse dc power sputtering power is 2500w, operating air pressure 2.5mTorr, work gas
Body Ar flow is 200sccm, reaction gas O2Flow is 10sccm, and step (5) is obtained to be coated with low-refraction absorbed layer
The aluminium foil transmission rate of (TiCrNxOy film) is 1.0m/min, and aluminium foil back and forth movement 15 times under target are obtained coated with thickness
For the reflecting layer (Cr of 15nm2O3) aluminium foil；
(7) antireflection layer SiO is deposited in magnetron sputtering apparatus2Film, preparation technology parameter are as follows:
Target is rotation Si target (4N), and radio-frequency power supply sputtering power is 2500w, operating air pressure 6.0mTorr, work gas
Body flow is 200sccm, reaction gas O2Flow is 30sccm, and step (6) is obtained to coat reflecting layer (Cr2O3) aluminium foil
Transmission rate is 0.5m/min, and aluminium foil back and forth movement 20 times under target obtain the reflecting layer (SiO being coated with a thickness of 30nm2)
Aluminium foil obtain a kind of high temperature resistant solar selectively absorbing coating.
Claims (2)
1. a kind of high temperature resistant solar selectively absorbing coating, including existing metallic substrates, it is characterised in that: in metallic substrates
On, also there are three layers respectively from top to bottom: high infrared reflection layer, absorbed layer and antireflection layer；
The high infrared reflection layer is the coating of any metal of Al, Au, Ag, Ti, Cr, Ni, with a thickness of 20-40nm；
The absorbed layer successively includes high refractive index absorbed layer TiCrN film and low-refraction absorbed layer TiCrNxOy from bottom to top
Film, wherein TiCrN film with a thickness of 70-100nm, TiCrNxOy film with a thickness of 80-100nm；
The antireflection layer successively includes Cr from bottom to top2O3Film and SiO2Film, wherein Cr2O3Film with a thickness of 10-20nm, SiO2
Film with a thickness of 20-30nm.
2. a kind of high temperature resistant solar selectively absorbing coating according to claim 1, it is characterised in that: in 300-2500nm
In range, the refractive index of TiCrN film is 2.66-3.53, and TiCrNxOy film refractive index is 1.76-2.44；In 300-2500nm model
In enclosing, the extinction coefficient of TiCrN film is 0.65-3.57, and the extinction coefficient of TiCrNxOy film is 0.05-1.34.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201820862309.5U CN208472182U (en) | 2018-06-05 | 2018-06-05 | A kind of high temperature resistant solar selectively absorbing coating |
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| CN201820862309.5U CN208472182U (en) | 2018-06-05 | 2018-06-05 | A kind of high temperature resistant solar selectively absorbing coating |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108468033A (en) * | 2018-06-05 | 2018-08-31 | 中建材蚌埠玻璃工业设计研究院有限公司 | A kind of high temperature resistant solar selectively absorbing coating and preparation method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108468033A (en) * | 2018-06-05 | 2018-08-31 | 中建材蚌埠玻璃工业设计研究院有限公司 | A kind of high temperature resistant solar selectively absorbing coating and preparation method thereof |
| CN108468033B (en) * | 2018-06-05 | 2023-08-22 | 中建材玻璃新材料研究院集团有限公司 | High-temperature-resistant solar selective absorption coating and preparation method thereof |
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