CN207608322U - A kind of chlorine dioxide with high purity gas producing equipment - Google Patents
A kind of chlorine dioxide with high purity gas producing equipment Download PDFInfo
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- CN207608322U CN207608322U CN201721665045.6U CN201721665045U CN207608322U CN 207608322 U CN207608322 U CN 207608322U CN 201721665045 U CN201721665045 U CN 201721665045U CN 207608322 U CN207608322 U CN 207608322U
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- OSVXSBDYLRYLIG-UHFFFAOYSA-N dioxidochlorine(.) Chemical compound O=Cl=O OSVXSBDYLRYLIG-UHFFFAOYSA-N 0.000 title claims abstract description 68
- 239000004155 Chlorine dioxide Substances 0.000 title claims abstract description 34
- 235000019398 chlorine dioxide Nutrition 0.000 title claims abstract description 34
- 238000000926 separation method Methods 0.000 claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 35
- 238000000746 purification Methods 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 19
- 238000004659 sterilization and disinfection Methods 0.000 claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 239000007789 gas Substances 0.000 abstract description 44
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 abstract description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 abstract description 3
- 239000002253 acid Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 4
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000645 desinfectant Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- UKLNMMHNWFDKNT-UHFFFAOYSA-M sodium chlorite Chemical compound [Na+].[O-]Cl=O UKLNMMHNWFDKNT-UHFFFAOYSA-M 0.000 description 2
- 229960002218 sodium chlorite Drugs 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 241000700605 Viruses Species 0.000 description 1
- 238000005273 aeration Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910001902 chlorine oxide Inorganic materials 0.000 description 1
- MAYPHUUCLRDEAZ-UHFFFAOYSA-N chlorine peroxide Chemical compound ClOOCl MAYPHUUCLRDEAZ-UHFFFAOYSA-N 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000002538 fungal effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
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- Treating Waste Gases (AREA)
Abstract
一种高纯度二氧化氯气体制取设备，包括原料罐、反应器、分离罐、气体纯化罐和残液处理器，原料罐与反应器连接，反应器与分离罐连接，分离罐的上部与气体纯化罐连接，分离罐的下部与残液处理器连接，气体纯化罐的底部与残液处理器连接，气体纯化罐上设置有消毒气体管，残液处理器连接排液管，反应器、分离罐和残液处理器均与进气管路连接。运行时，压缩空气进入促进反应器内原料的反应，又将分离罐和残液处理器中的二氧化氯高效分离，产生的二氧化氯气体经过纯化后投放到应用场所，处理后的残夜无酸无害的排放。该设备经过内部的气体纯化功能，去除了氯化氢成分，制备量大，出口浓度高、纯度高，消毒效果大幅提高，实现残夜无酸无害的排放。
A high-purity chlorine dioxide gas production equipment, including a raw material tank, a reactor, a separation tank, a gas purification tank and a residual liquid processor, the raw material tank is connected to the reactor, the reactor is connected to the separation tank, and the upper part of the separation tank is connected to the gas The purification tank is connected, the lower part of the separation tank is connected with the raffinate processor, the bottom of the gas purification tank is connected with the raffinate processor, the gas purification tank is provided with a sterile gas pipe, the raffinate processor is connected with the drain pipe, the reactor, the separation Both the tank and the raffinate processor are connected to the air inlet line. During operation, compressed air enters to promote the reaction of raw materials in the reactor, and efficiently separates the chlorine dioxide in the separation tank and the residual liquid processor. The chlorine dioxide gas produced is purified and put into the application site. No acid and no harmful discharge. After the internal gas purification function of the equipment, the hydrogen chloride component is removed, the preparation volume is large, the outlet concentration is high, the purity is high, the disinfection effect is greatly improved, and the residual acid-free and harmless discharge is realized.
Description
技术领域technical field
本实用新型涉及一种用于二氧化氯合成制取、喷洒的设备，属于二氧化氯消毒设备技术领域。The utility model relates to a device used for synthesis, preparation and spraying of chlorine dioxide, which belongs to the technical field of chlorine dioxide disinfection equipment.
背景技术Background technique
众所周知，二氧化氯是一种无毒无害的氧化剂和消毒剂，对细菌、病毒及真菌孢子的杀灭能力均很强。二氧化氯一般是采用盐酸与氯酸钠(或亚氯酸钠)定量注入到反应罐内，反应罐在加热的情况下发生化学反应生成二氧化氯与氯气。一定浓度的氯酸钠水溶液(或者一定浓度的亚氯酸钠水溶液)和一定浓度的盐酸被定量输送到反应罐内，在一定温度下经过曝气反应生成二氧化氯和氯气的气液混合物，制成一定浓度的二氧化氯混合消毒液，再通过水射器吸入投加到消毒水体中或投加到需要消毒的物体中，完成二氧化氯和氯气的协同消毒、氧化等作用。As we all know, chlorine dioxide is a non-toxic and harmless oxidant and disinfectant, which has a strong ability to kill bacteria, viruses and fungal spores. Chlorine dioxide is generally injected quantitatively into the reaction tank by using hydrochloric acid and sodium chlorate (or sodium chlorite), and the reaction tank undergoes a chemical reaction under heating to generate chlorine dioxide and chlorine gas. A certain concentration of sodium chlorate aqueous solution (or a certain concentration of sodium chlorite aqueous solution) and a certain concentration of hydrochloric acid are quantitatively transported into the reaction tank, and a gas-liquid mixture of chlorine dioxide and chlorine gas is generated after aeration reaction at a certain temperature. Make a certain concentration of chlorine dioxide mixed disinfectant, and then inhale it through a water injector and add it to the disinfected water body or to the object that needs to be disinfected to complete the synergistic disinfection and oxidation of chlorine dioxide and chlorine.
现有二氧化氯制取消毒设备直接将制取的二氧化氯混合液用于喷洒消毒，消毒气体纯度较低，且对残液没有处理直接排放。The existing chlorine dioxide production and disinfection equipment directly uses the prepared chlorine dioxide mixed solution for spraying disinfection, the purity of the disinfection gas is low, and the residual liquid is directly discharged without treatment.
实用新型内容Utility model content
本实用新型针对现有二氧化氯合成制取技术存在的问题，提供一种浓度高，纯度高，消毒效果好的高纯度二氧化氯气体制取设备。The utility model aims at the problems existing in the existing chlorine dioxide synthesis preparation technology, and provides a high-purity chlorine dioxide gas production equipment with high concentration, high purity and good disinfection effect.
本实用新型的高纯度二氧化氯气体制取设备，采用以下技术方案：The high-purity chlorine dioxide gas production equipment of the present utility model adopts the following technical solutions:
该设备，一种高纯度二氧化氯气体制取设备，包括原料罐、反应器、分离罐、气体纯化罐和残液处理器，原料罐与反应器连接，反应器与分离罐连接，分离罐的上部与气体纯化罐连接，分离罐的下部与残液处理器连接，气体纯化罐的底部与残液处理器连接，气体纯化罐上设置有消毒气体管，残液处理器连接排液管，反应器、分离罐和残液处理器均与进气管路连接。This equipment, a high-purity chlorine dioxide gas production equipment, includes a raw material tank, a reactor, a separation tank, a gas purification tank and a raffinate processor, the raw material tank is connected to the reactor, the reactor is connected to the separation tank, and the separation tank The upper part is connected to the gas purification tank, the lower part of the separation tank is connected to the residual liquid processor, the bottom of the gas purification tank is connected to the residual liquid processor, the gas purification tank is provided with a disinfection gas pipe, and the residual liquid processor is connected to the drain pipe. The separator, separation tank and raffinate processor are all connected to the inlet pipeline.
所述进气管路上设置有进气阀和压力开关。An intake valve and a pressure switch are arranged on the intake pipeline.
所述进气管路通过气体截流阀与反应器、分离罐和残液处理器连接。The inlet pipeline is connected with the reactor, the separation tank and the raffinate processor through a gas shut-off valve.
气体纯化罐内预加入纯化用原料，吸收二氧化氯气体中的其他成分如氯化氢等。运行时，压缩空气从进气管路进入，既可以促进反应器内原料的反应，又可以将分离罐和残液处理器中的二氧化氯高效分离。反应器内产生的高浓度二氧化氯气液混合体流入分离罐；分离罐内高浓度二氧化氯液体在罐内积聚，当达到分离罐的高液位时自动排放到残液处理器中，分离罐内的高浓度二氧化氯气体通入到气体纯化罐底部，经过气体纯化罐的纯化后，投放到应用场所。经过残液处理器处理后的残夜无酸无害的排放。The raw materials for purification are pre-filled in the gas purification tank to absorb other components in chlorine dioxide gas such as hydrogen chloride. During operation, compressed air enters from the intake pipe, which can not only promote the reaction of raw materials in the reactor, but also efficiently separate the chlorine dioxide in the separation tank and the raffinate processor. The high-concentration chlorine dioxide gas-liquid mixture produced in the reactor flows into the separation tank; the high-concentration chlorine dioxide liquid in the separation tank accumulates in the tank, and when it reaches the high liquid level of the separation tank, it is automatically discharged into the raffinate processor, separated The high-concentration chlorine dioxide gas in the tank is passed into the bottom of the gas purification tank, and after being purified by the gas purification tank, it is put into the application site. The residue treated by the residue processor is acid-free and harmless.
本实用新型增加了消毒气体纯化和残液处理功能，经过内部的气体纯化功能，去除了氯化氢成分，制备量大，出口浓度高、纯度高，消毒效果大幅提高，实现残夜无酸无害的排放。The utility model adds the functions of disinfection gas purification and residual liquid treatment, through the internal gas purification function, the hydrogen chloride component is removed, the preparation volume is large, the outlet concentration is high, the purity is high, the disinfection effect is greatly improved, and the residual night is acid-free and harmless. emission.
附图说明Description of drawings
图1是本实用新型高纯度二氧化氯气体制取设备的结构示意图。Fig. 1 is the structural representation of the utility model high-purity chlorine dioxide gas production equipment.
图2是图1的后视图。Fig. 2 is a rear view of Fig. 1 .
其中：1.排放阀，2.排液计量泵，3.反应器，4.进料计量泵，5.残液处理器，6.原料罐，7.原料输送管路，8.进气阀，9.压力开关，10.机架，11.分离罐，12.气体纯化罐，13.排液阀。Among them: 1. Discharging valve, 2. Liquid discharge metering pump, 3. Reactor, 4. Feed metering pump, 5. Residue processor, 6. Raw material tank, 7. Raw material delivery pipeline, 8. Inlet valve , 9. Pressure switch, 10. Rack, 11. Separation tank, 12. Gas purification tank, 13. Drain valve.
具体实施方式Detailed ways
如图1和图2所示，本实用新型的高纯度二氧化氯气体制取设备包括安装在机架10上的原料罐6、反应器3、分离罐11、气体纯化罐12和残液处理器5。每种原料罐6通过各自的原料输送管路7与反应器3连接，原料输送管路7设置有进料计量泵4。反应器3上设置溢流口，该溢流口与分离罐11的顶部连接，反应器11内产生的高浓度二氧化氯气液混合体，从溢流口流入分离罐11。分离罐11的上部与气体纯化罐12的底部之间通过管路连接，分离罐11的下部通过排放阀1与残液处理器5连接。气体纯化罐12的底部与残液处理器5通过排放管连接，排放管上设置控制阀。气体纯化罐12上设置有消毒气体管。残液处理器5连接排液管，排液管上设置有排液计量泵2和排液阀13。反应器3、分离罐11和残液处理器5均与进气管路连接，进气管路与外部的空气压缩机连接。进气管路上设置有进气阀8和压力开关9。进气管路分别通过一个气体截流阀与反应器3、分离罐11和残液处理器5连接。As shown in Figures 1 and 2, the high-purity chlorine dioxide gas production equipment of the present utility model comprises a raw material tank 6, a reactor 3, a separation tank 11, a gas purification tank 12 and a raffinate processor installed on a frame 10 5. Each raw material tank 6 is connected to the reactor 3 through its own raw material delivery pipeline 7 , and the raw material delivery pipeline 7 is provided with a feed metering pump 4 . An overflow port is arranged on the reactor 3, and the overflow port is connected to the top of the separation tank 11, and the high-concentration chlorine dioxide gas-liquid mixture produced in the reactor 11 flows into the separation tank 11 from the overflow port. The upper part of the separation tank 11 is connected with the bottom of the gas purification tank 12 through a pipeline, and the lower part of the separation tank 11 is connected with the raffinate processor 5 through the discharge valve 1 . The bottom of the gas purification tank 12 is connected to the raffinate processor 5 through a discharge pipe, and a control valve is arranged on the discharge pipe. The gas purification tank 12 is provided with a sterile gas pipe. The residual liquid processor 5 is connected to a liquid discharge pipe, and a liquid discharge metering pump 2 and a liquid discharge valve 13 are arranged on the liquid discharge pipe. The reactor 3, the separation tank 11 and the raffinate processor 5 are all connected to an air inlet pipeline, and the air inlet pipeline is connected to an external air compressor. An intake valve 8 and a pressure switch 9 are arranged on the intake pipeline. The inlet pipeline is respectively connected with the reactor 3, the separation tank 11 and the raffinate processor 5 through a gas shut-off valve.
该设备内置自动控制系统，可根据使用量调节设备产量，可根据应用环境的具体状况实现分时分段控制；内置压力开关9，当进气压力不足或超压时设备自动停机报警。The equipment has a built-in automatic control system, which can adjust the output of the equipment according to the amount of use, and can realize time-sharing and segmental control according to the specific conditions of the application environment; the built-in pressure switch 9, when the intake pressure is insufficient or overpressure, the equipment will automatically stop and alarm.
分离罐11、气体纯化罐12和残液处理器5内均设置置高液位传感器，可实现自动排放。原料罐6内置低液位传感器，缺料自动提示，操作高效安全。The separation tank 11, the gas purification tank 12 and the raffinate processor 5 are all equipped with high liquid level sensors, which can realize automatic discharge. The raw material tank 6 has a built-in low liquid level sensor, which automatically prompts when there is a lack of material, and the operation is efficient and safe.
上述设备的运行过程如下所述。The operation process of the above-mentioned equipment is as follows.
空气压缩机产生的高压气体从进气管路的进气口18进入，分三路分别进入反应器3、分离罐11和残液处理器5。计量泵4定时定量从原料罐6中精准抽取原料，加入到反应器3中，使其产生高浓度二氧化氯气液混合体，并由反应器3的溢流口自动溢流到分离罐11中进一步吹脱。分离罐11内高浓度二氧化氯液体在罐内积聚，当达到分离罐11的高液位时通过排放阀1自动排放到残液处理器5中；分离罐11内吹脱后的高浓度二氧化氯气体通入到气体纯化罐12的底部，气体纯化罐12内预加入纯化用原料，吸收二氧化氯气体中的其他成分如氯化氢等，进行纯化。经过纯化后的二氧化氯气体从气体纯化罐12的顶部出口逸出，通过管路分布到应用空间。可在气体纯化罐12上设置泄压口，当管路受阻或其他原因导致内部压力过大时，可以将压力释放到外部环境中。气体纯化罐12与分离罐11的液位同时控制，当其任意一罐达到高液位时，自动排放到残液处理器5。混合液排入到残液处理器5后，通过通入残液处理器5内的压缩空气使其内混合液经过再次气搅吹脱，使混合液中的二氧化氯充分逸出，提高利用率，吹脱时间可设定，同时残液处理器5上装有液位控制器，当达到预设吹脱时间或高液位时，残液经过排液阀13由排液管无酸无害的排放。The high-pressure gas produced by the air compressor enters from the air inlet 18 of the air inlet pipeline, and enters the reactor 3, the separation tank 11 and the raffinate processor 5 in three ways. The metering pump 4 regularly and quantitatively extracts the raw material from the raw material tank 6, and adds it to the reactor 3, so that it produces a high-concentration chlorine dioxide gas-liquid mixture, which automatically overflows into the separation tank 11 from the overflow port of the reactor 3 further blow off. The high-concentration chlorine dioxide liquid in the separation tank 11 accumulates in the tank, and when it reaches the high liquid level of the separation tank 11, it is automatically discharged into the raffinate processor 5 through the discharge valve 1; Chlorine oxide gas is fed into the bottom of the gas purification tank 12, and the gas purification tank 12 is pre-filled with raw materials for purification to absorb other components in the chlorine dioxide gas, such as hydrogen chloride, for purification. The purified chlorine dioxide gas escapes from the top outlet of the gas purification tank 12 and is distributed to the application space through pipelines. A pressure relief port can be provided on the gas purification tank 12, and when the internal pressure is too high due to pipeline obstruction or other reasons, the pressure can be released to the external environment. The liquid levels of the gas purification tank 12 and the separation tank 11 are controlled simultaneously, and when any tank reaches a high liquid level, it is automatically discharged to the raffinate processor 5 . After the mixed liquid is discharged into the raffinate processor 5, the mixed liquid in the raffinate processor 5 is blown off by the compressed air fed into the raffinate processor 5 again, so that the chlorine dioxide in the mixed liquid is fully released, and the utilization rate is improved. The rate and blow-off time can be set. At the same time, the residual liquid processor 5 is equipped with a liquid level controller. When the preset blow-off time or high liquid level is reached, the residual liquid passes through the drain valve 13 and is acid-free and harmless from the drain pipe. emissions.
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| CN201721665045.6U CN207608322U (en) | 2017-11-29 | 2017-11-29 | A kind of chlorine dioxide with high purity gas producing equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108892105A (en) * | 2018-08-30 | 2018-11-27 | 南京理工大学 | A kind of chlorine dioxide generator and its operation method with gas-liquid separation Yu residual liquid recycling function |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108892105A (en) * | 2018-08-30 | 2018-11-27 | 南京理工大学 | A kind of chlorine dioxide generator and its operation method with gas-liquid separation Yu residual liquid recycling function |
| CN108892105B (en) * | 2018-08-30 | 2023-09-26 | 南京理工大学 | A chlorine dioxide generator with gas-liquid separation and residual liquid reuse functions and its operation method |
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Granted publication date: 20180713 |