CN206337307U - A kind of large-scale DLC film vacuum coater - Google Patents
A kind of large-scale DLC film vacuum coater Download PDFInfo
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- CN206337307U CN206337307U CN201621474910.4U CN201621474910U CN206337307U CN 206337307 U CN206337307 U CN 206337307U CN 201621474910 U CN201621474910 U CN 201621474910U CN 206337307 U CN206337307 U CN 206337307U
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- bend pipe
- pipe connector
- magnetic filter
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- plated film
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Abstract
The utility model discloses a kind of large-scale DLC film vacuum coater, including plated film cavity, pivoted frame is provided with plated film cavity；Around the circumference of plated film cavity, it is sequentially provided with the second bend pipe connector, the first bend pipe connector, the 3rd bend pipe connector, the 4th bend pipe connector, the 6th bend pipe connector and the 5th bend pipe connector, a station for being used to install vavuum pump is differed between 3rd bend pipe connector and the 4th bend pipe connector, first to the 6th bend pipe connector correspondence is connected by the first to the 6th magnetic filter and wind magnet exciting coil on corresponding vacuum arc deposition source, the first to the 6th magnetic filter；The sense of current of the sense of current of magnet exciting coil different from magnet exciting coil on the 3rd magnetic filter, the 5th magnetic filter and the 6th magnetic filter on first magnetic filter, the second magnetic filter and the 4th magnetic filter.
Description
Technical field
The utility model designs a kind of large-scale DLC film vacuum coater of field of vacuum coating.
Background technology
Filtering cathode vacuum arc deposited filming equipment is the plasma for producing vacuum arc deposition source, by excitation
Coil and negative bias voltage etc. are attracted to base material, and form a kind of filming equipment of film on substrate surface.Wherein, vacuum electric
Arc coating source, by vacuum arc discharge evaporation cathode graphite target, thus produces the plasma containing cathode target material.Filtering
Cathodic vacuum arc filming equipment has that ionization level is high, ion energy is high, depositing temperature is low, sedimentation rate is high, film and base material knot
The series of advantages such as get togather, be the fine selection of depositing diamond-like film therefore.
In film deposition process, the electric discharge of cathode surface electric arc spot is violent, while high-density plasma is produced
Produce substantial amounts of macroscopical bulky grain.Wherein, macroscopical bulky grain refers to that diameter is about several microns to tens microns of bulky grain.No
During by Magnetic filter, macroscopical bulky grain cooperates with deposition with plasma in substrate surface, usually increases roughness of film
Plus, influence the acquisition of high-quality thin film.
At present, reducing the consedimental method of macroscopical bulky grain association is：Using the magnetic filter with additional magnet exciting coil,
Macroscopical bulky grain is filtered out to a certain extent in transmitting procedure, it is to avoid it deposits to substrate surface, its mechanism is outside
Plus under magnetic fields, macroscopical bulky grain is due to being neutral particle, on the tube wall that Magnetic filter pipe is direct splashing under effect of inertia
It is filtered, and the small charged particle of quality passes through magnetic filter and reaches substrate surface then under magnetic fields, so that
Obtain high-quality film.
The quantity in the vacuum arc deposition source in current filtering cathode vacuum arc deposited filming equipment is one to three.Cause
This is used for the small volume for installing the plated film cavity of base material, and the coating film area for base material is small, and the batch for base material is low, above-mentioned
Defect has had a strong impact on the efficiency and quality of plated film.
The reason for causing above-mentioned limitation be：There is magnetic interference, shadow between magnet exciting coil on each magnetic filter
The filtering for macroscopical bulky grain is rung.
Utility model content
The purpose of this utility model is that there is provided a kind of large-scale DLC film vacuum in order to overcome the deficiencies in the prior art
Coating apparatus, it can eliminate interference of the magnetic field on each magnetic filter between magnet exciting coil to plated film so that filtering cathode
On vacuum arc deposition filming equipment vacuum arc deposition source can installation number increase to six, make the batch of base material significantly
Improve, improve the efficiency and quality of plated film.
Realizing a kind of technical scheme of above-mentioned purpose is：A kind of large-scale DLC film vacuum coater, including plating
Pivoted frame is provided with membrane cavity body, the plated film cavity；
Around the circumference of the plated film cavity, the second bend pipe connector, the first bend pipe connector, the 3rd bend pipe are sequentially provided with
Connector, the 4th bend pipe connector, the 6th bend pipe connector and the 5th bend pipe connector, the 3rd bend pipe connector and described
A station for being used to install vavuum pump is differed between 4th bend pipe connector；
Described first to the 6th bend pipe connector correspondence connects corresponding vacuum electric by the first to the 6th magnetic filter
Magnet exciting coil is wound on arc coating source, the described first to the 6th magnetic filter；
Magnet exciting coil on first magnetic filter, second magnetic filter and the 4th magnetic filter
The sense of current is different from excitation on the 3rd magnetic filter, the 5th magnetic filter and the 6th magnetic filter
The sense of current of coil；
The level height of the first bend pipe connector and the 6th bend pipe connector, the 3rd bend pipe connector and
The level height of the 4th bend pipe connector, and the second bend pipe connector and the 5th bend pipe connector level
Highly, it is different.
Further, four pairs of controlled sputtering sources of the plated film cavity correspondence.
Further, four pairs of controlled sputtering sources of correspondence in the plated film cavity.
Further, a diameter of 1.2m of the pivoted frame, the pivoted frame can plated film height be 900mm.
Further, the level height of the first bend pipe connector and the 6th bend pipe connector is less than the described 3rd
The level height of bend pipe connector and the 4th bend pipe connector, the 3rd bend pipe connector and the 4th bend pipe connection
The level height of mouth is less than the level height of the second bend pipe connector and the 5th bend pipe connector, the first magnetic mistake
The sense of current of magnet exciting coil is clockwise, institute on filter bend pipe, second magnetic filter and the 4th magnetic filter
State the 3rd magnetic filter, the sense of current of magnet exciting coil is on the 5th magnetic filter and the 6th magnetic filter
Counterclockwise.
Further, ion etching equipment is provided with the plated film cavity.
Further, six vacuum arc deposition sources are graphite target using target.
Further, the controlled sputtering source is silicon source, silicon source, titanium source, chromium source, any combination of carbon source.
Employ a kind of technical scheme of large-scale DLC film vacuum coater of the present utility model, including plated film
Pivoted frame is provided with cavity, the plated film cavity；Around the circumference of the plated film cavity, the second bend pipe connector, are sequentially provided with
One bend pipe connector, the 3rd bend pipe connector, the 4th bend pipe connector, the 6th bend pipe connector and the 5th bend pipe connector, institute
State and a station for being used to install vavuum pump is differed between the 3rd bend pipe connector and the 4th bend pipe connector；Described first
Corresponding vacuum arc deposition source, described first are connected by the first to the 6th magnetic filter to the 6th bend pipe connector correspondence
Magnet exciting coil is wound on to the 6th magnetic filter；First magnetic filter, second magnetic filter and described
The sense of current of magnet exciting coil is different from the 3rd magnetic filter, the 5th magnetic filter on 4th magnetic filter
With the sense of current of magnet exciting coil on the 6th magnetic filter；The first bend pipe connector and the 6th bend pipe connection
Mouthful level height, the level height of the 3rd bend pipe connector and the 4th bend pipe connector, and described second curved
The level height of tube connection ports and the 5th bend pipe connector, is different.It has the technical effect that：Eliminate each Magnetic filter curved
Interference of the magnetic field to plated film on pipe between magnet exciting coil so that vacuum arc on filtering cathode vacuum arc deposited filming equipment
Coating source can installation number increase to six, greatly improve the batch of base material, improve the efficiency and quality of plated film.
Brief description of the drawings
Fig. 1 is a kind of structural representation of large-scale DLC film vacuum coater of the present utility model.
Fig. 2 is that the structure of magnetic filter in a kind of large-scale DLC film vacuum coater of the present utility model is shown
It is intended to.
Embodiment
Referring to Fig. 1, utility model people of the present utility model to the technical solution of the utility model in order to be able to preferably entering
Row understands, is described in detail below by specifically embodiment, and with reference to accompanying drawing：
Referring to Fig. 1, a kind of large-scale DLC film vacuum coater of the present utility model, including plated film cavity 1,
Pivoted frame is provided with plated film cavity 1, around the circumference of plated film cavity 1, the second bend pipe connector 12, the connection of the first bend pipe is sequentially provided with
The 11, the 3rd bend pipe connector 13 of mouth, the 4th bend pipe connector 14, the 6th bend pipe connector 16 and the 5th bend pipe connector 15.
On the circumference of plated film cavity 1, a station, station peace are differed between the 3rd bend pipe connector 13 and the 4th bend pipe connector 14
Fill vavuum pump.
First bend pipe connector 11 connects the first vacuum arc deposition source 31, the second bend pipe by the first magnetic filter 21
Connector 12 connects the second vacuum arc deposition source 32 by the second magnetic filter 22, and the 3rd bend pipe connector 13 passes through the 3rd
Magnetic filter 23 connects the 3rd vacuum arc deposition source 33, and the 4th bend pipe connector 14 is connected by the 4th magnetic filter 24
4th vacuum arc deposition source 34, the 5th bend pipe connector 15 connects the 5th vacuum arc deposition by the 5th magnetic filter 25
Source 35, the 6th bend pipe connector 16 connects the 6th vacuum arc deposition source 36 by the 6th magnetic filter 26, so that first
Vacuum arc deposition source 31, the second vacuum arc deposition source 32, the 3rd vacuum arc deposition source 33, the 4th vacuum arc deposition source
34th, the 5th vacuum arc deposition source 35 connects plated film cavity 1 with the 6th vacuum arc deposition source 36.
First magnetic filter 21, the second magnetic filter 22, the 3rd magnetic filter 23, the 4th magnetic filter 24,
Magnet exciting coil is equipped with 5th magnetic filter 25 and the 6th magnetic filter 26, in the first magnetic filter 21,
Two magnetic filters 22, the 3rd magnetic filter 23, the 4th magnetic filter 24, the 5th magnetic filter 25 and the 6th Magnetic filter
Magnetic field is generated in bend pipe 26.
The electric current side of magnet exciting coil on first magnetic filter 21, the second magnetic filter 22 and the 4th magnetic filter 24
The electric current side of magnet exciting coil on different from the 3rd magnetic filter 23, the 5th magnetic filter 25 and the 6th magnetic filter 26
To；Therefore in the first magnetic filter 21, the second magnetic filter 22 and the 4th magnetic filter 24 magnetic field magnetic direction phase
The magnetic direction in magnetic field instead in the 3rd magnetic filter 23, the 5th magnetic filter 25 and the 6th magnetic filter 26.
The first situation, the first vacuum arc deposition source 31, the second vacuum arc deposition source 32 and the 4th vacuum arc plating
Film source 34, i.e. the A ends of the first magnetic filter 21, the second magnetic filter 22 and the 4th magnetic filter 24 are the N poles in magnetic field；
First bend pipe connector 11, the second bend pipe connector 12 and the 4th bend pipe connector 14, i.e. the first magnetic filter 21, the second magnetic
The B ends for filtering the magnetic filter 24 of bend pipe 22 and the 4th are the S poles in magnetic field；First magnetic filter 21, the second magnetic filter
22 and the 4th the sense of current of magnet exciting coil on magnetic filter 24 be counterclockwise.
3rd vacuum arc deposition source 33, the 5th vacuum arc deposition source 35 and the 6th vacuum arc deposition source 36, i.e.,
The A ends of three magnetic filters 23, the 5th magnetic filter 25 and the 6th magnetic filter 26 are the S poles in magnetic field；3rd bend pipe connects
Interface 13, the 5th bend pipe connector 15 and the 6th bend pipe connector 16, i.e. the 3rd magnetic filter 23, the 5th magnetic filter 25
B ends with the 6th magnetic filter 26 are the N poles in magnetic field；3rd magnetic filter 23, the 5th magnetic filter 25 and the 6th magnetic
The sense of current of magnet exciting coil is clockwise on filtering bend pipe 26.
Second of situation：First vacuum arc deposition source 31, the second vacuum arc deposition source 32 and the 4th vacuum arc plating
Film source 34, i.e. the A ends of the first magnetic filter 21, the second magnetic filter 22 and the 4th magnetic filter 24 are the S poles in magnetic field；
First bend pipe connector 11, the second bend pipe connector 12 and the 4th bend pipe connector 14, i.e. the first magnetic filter 21, the second magnetic
The B ends for filtering the magnetic filter 24 of bend pipe 22 and the 4th are the N poles in magnetic field；First magnetic filter 21, the second magnetic filter
22 and the 4th the sense of current of magnet exciting coil on magnetic filter 24 be clockwise.
3rd vacuum arc deposition source 33, the 5th vacuum arc deposition source 35 and the 6th vacuum arc deposition source 36, i.e.,
The A ends of three magnetic filters 23, the 5th magnetic filter 25 and the 6th magnetic filter 26 are the N poles in magnetic field；3rd bend pipe connects
Interface 13, the 5th bend pipe connector 15 and the 6th bend pipe connector 16, i.e. the 3rd magnetic filter 23, the 5th magnetic filter 25
B ends with the 6th magnetic filter 26 are the S poles in magnetic field；3rd magnetic filter 23, the 5th magnetic filter 25 and the 6th magnetic
The sense of current of magnet exciting coil is counterclockwise on filtering bend pipe 26.
First bend pipe connector 11 and the 6th bend pipe connector 16 are contour, are first group of bend pipe connector, may be contained within plating
The bottom of the outer circle wall of membrane cavity body 1.3rd bend pipe connector 13 and the 4th bend pipe connector 14 are contour, are second group of bend pipe connection
Mouthful, the middle part of the outer circle wall of plated film cavity 1 is respectively positioned on, the second bend pipe connector 12 and the 5th bend pipe connector 15 are contour, is the
Three groups of bend pipe connectors, are respectively positioned on the top of the outer circle wall of plated film cavity 1.
Above-mentioned design, eliminates the interference between the magnet exciting coil of magnetic filter, therefore one kind of the present utility model
On large-scale DLC film vacuum coater, magnetic filter, and vacuum arc deposition corresponding with magnetic filter
The quantity of source and bend pipe connector can accordingly increase, from one to three current magnetic filter, and and magnetic filter
Corresponding vacuum arc deposition source and bend pipe connector, increase to the even more magnetic filters of the six roots of sensation, and and Magnetic filter
The corresponding vacuum arc deposition source of bend pipe and bend pipe connector.The diameter of pivoted frame increases to from 750mm in plated film cavity 1 simultaneously
1.2m, pivoted frame can the height of plated film increase to 900mm from original 300mm.Therefore the batch lifting of plated film cavity 1, can be with
Carry out that in greater area of deposition film, plated film cavity 1 more controlled sputtering sources can be loaded, from one to two current increase
To four pairs.Correspondingly, with the increase of vacuum arc deposition source and controlled sputtering source quantity, also to carry out process modification from now on,
The plated film of the increasingly complex film of composition is carried out, the plated film for especially carrying out DLC film in various substrate surfaces is provided
May.
First vacuum arc deposition source 31, the second vacuum arc deposition source 32, the 3rd vacuum arc deposition source 33, the 4th is true
Graphite target can be installed in empty arc coating deposition source 34, the 5th vacuum arc deposition source 35 and the 6th vacuum arc deposition source 36,
To prepare the DLC film of high-quality.
The controlled sputtering source can be any combination of silicon source, silicon source, titanium source, chromium source, carbon source etc., so that substrate surface
The bottom of deposition is SiC layer, AlTi layers, AlTiN layers, Si layers or SiN layer, Cr layers, CrN layers, Ti layers etc..
In addition the ion etching equipment that ion etching is carried out to base material is additionally provided with plated film cavity 1, bottom is being carried out to base material
Before layer plated film, ion etching, the adhesion between enhancing DLC film and base material are carried out to base material.
Those of ordinary skill in the art is it should be appreciated that the embodiment of the above is intended merely to illustrate that this practicality is new
Type, and be not used as limiting of the present utility model, as long as in spirit of the present utility model, to the above
The change of embodiment, modification will all fall in Claims scope of the present utility model.
Claims (7)
1. pivoted frame is provided with a kind of large-scale DLC film vacuum coater, including plated film cavity, the plated film cavity；Its
It is characterised by：
Around the circumference of the plated film cavity, the second bend pipe connector, the first bend pipe connector, the connection of the 3rd bend pipe are sequentially provided with
Mouth, the 4th bend pipe connector, the 6th bend pipe connector and the 5th bend pipe connector, the 3rd bend pipe connector and the described 4th
A station for being used to install vavuum pump is differed between bend pipe connector；
Described first to the 6th bend pipe connector correspondence connects corresponding vacuum arc plating by the first to the 6th magnetic filter
Magnet exciting coil is wound on film source, the described first to the 6th magnetic filter；
The electric current of magnet exciting coil on first magnetic filter, second magnetic filter and the 4th magnetic filter
Direction is different from magnet exciting coil on the 3rd magnetic filter, the 5th magnetic filter and the 6th magnetic filter
The sense of current；
The level height of the first bend pipe connector and the 6th bend pipe connector, the 3rd bend pipe connector and described
The level height of 4th bend pipe connector, and the level of the second bend pipe connector and the 5th bend pipe connector are high
Degree, is different.
2. a kind of large-scale DLC film vacuum coater according to claim 1, it is characterised in that：The plated film
Cavity four pairs of controlled sputtering sources of correspondence.
3. a kind of large-scale DLC film vacuum coater according to claim 1, it is characterised in that：The pivoted frame
A diameter of 1.2m, the pivoted frame can plated film height be 900mm.
4. a kind of large-scale DLC film vacuum coater according to claim 1, it is characterised in that：Described first
The level height of bend pipe connector and the 6th bend pipe connector is less than the 3rd bend pipe connector and the 4th bend pipe
The level height of connector, the level height of the 3rd bend pipe connector and the 4th bend pipe connector is less than described second
The level height of bend pipe connector and the 5th bend pipe connector, first magnetic filter, second Magnetic filter are curved
The sense of current of magnet exciting coil is clockwise, the 3rd magnetic filter, described the on pipe and the 4th magnetic filter
The sense of current of magnet exciting coil is counterclockwise on five magnetic filters and the 6th magnetic filter.
5. a kind of large-scale DLC film vacuum coater according to claim 1, it is characterised in that：The plated film
Ion etching equipment is provided with cavity.
6. a kind of large-scale DLC film vacuum coater according to claim 1, it is characterised in that：Described in six
Vacuum arc deposition source is graphite target using target.
7. a kind of large-scale DLC film vacuum coater according to claim 2, it is characterised in that：The magnetic control
Sputtering source is silicon source, silicon source, titanium source, chromium source, any combination of carbon source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621474910.4U CN206337307U (en) | 2016-12-30 | 2016-12-30 | A kind of large-scale DLC film vacuum coater |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621474910.4U CN206337307U (en) | 2016-12-30 | 2016-12-30 | A kind of large-scale DLC film vacuum coater |
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| Publication Number | Publication Date |
|---|---|
| CN206337307U true CN206337307U (en) | 2017-07-18 |
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ID=59304263
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| Application Number | Title | Priority Date | Filing Date |
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| CN201621474910.4U Active CN206337307U (en) | 2016-12-30 | 2016-12-30 | A kind of large-scale DLC film vacuum coater |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111663106A (en) * | 2020-07-07 | 2020-09-15 | 北京师范大学 | Device for preparing high-shielding matrix coating |
| CN111690899A (en) * | 2019-03-15 | 2020-09-22 | 纳峰真空镀膜（上海）有限公司 | Improved cathode arc source apparatus |
-
2016
- 2016-12-30 CN CN201621474910.4U patent/CN206337307U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111690899A (en) * | 2019-03-15 | 2020-09-22 | 纳峰真空镀膜（上海）有限公司 | Improved cathode arc source apparatus |
| CN111690899B (en) * | 2019-03-15 | 2023-11-17 | 纳峰真空镀膜（上海）有限公司 | Improved cathode arc source apparatus |
| US11926890B2 (en) | 2019-03-15 | 2024-03-12 | Nanofilm Technologies International Limited | Cathode arc source |
| CN111663106A (en) * | 2020-07-07 | 2020-09-15 | 北京师范大学 | Device for preparing high-shielding matrix coating |
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