CN205703774U - 一种具有清洁装置的碳化硅抛光机 - Google Patents
一种具有清洁装置的碳化硅抛光机 Download PDFInfo
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- CN205703774U CN205703774U CN201620383539.4U CN201620383539U CN205703774U CN 205703774 U CN205703774 U CN 205703774U CN 201620383539 U CN201620383539 U CN 201620383539U CN 205703774 U CN205703774 U CN 205703774U
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- 229910010271 silicon carbide Inorganic materials 0.000 title claims abstract description 21
- 238000004140 cleaning Methods 0.000 title claims abstract description 17
- 238000005498 polishing Methods 0.000 claims abstract description 24
- 239000002699 waste material Substances 0.000 claims abstract description 22
- 239000007788 liquid Substances 0.000 claims abstract description 19
- 238000003860 storage Methods 0.000 claims abstract description 10
- 239000012530 fluid Substances 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound 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Abstract
一种具有清洁装置的碳化硅抛光机，包括底座，所述底座的上侧面设有固定板以及由电机带动进行旋转的第一抛光平台和第二抛光平台，所述第一抛光平台的一侧设有垂直安装于底座的打磨装置，所述打磨装置包括位于第一抛光平台正上方的打磨棒；所述的固定板上设置有储液仓、储水箱和抛光装置。本实用新型通过在固定板上设有分流的储水箱，可清洗第一抛光平台和第二抛光平台，将打磨后的粉尘和抛光后的废液冲到底座周围的废液收集槽内，保证工作环境的清洁，防止产生污垢，影响抛光质量。
Description
技术领域
[0001]本实用新型涉及一种碳化硅抛光机，具体涉及一种具有清洁装置的碳化硅抛光机。
背景技术
[0002]在加工碳化硅的工序中需要对碳化硅的表面进行抛光处理，目前的抛光技术为单一面的加工，当加工一面完毕之后再对另一面进行抛光处理，加工工序繁琐，工作效率低下，不利于生产，而且加工一般不具备化学抛光机，这样使得抛光不彻底，而且进行打磨和抛光后产生的粉尘和废液附着于抛光平台形成污垢，对此我们提出一种具有清洁装置和收集废液装置的碳化硅抛光机。
发明内容
[0003]针对上述问题，本实用新型提出一种具有清洁装置的碳化硅抛光机，在对碳化硅打磨和抛光后使用喷头进行清洗，将抛光平台和底座上的粉尘和废液冲到废液收集槽内，并通过导管排出，本实用新型能够保证抛光平台的清洁，避免因粉尘或废液导致抛光质量不佳，提高抛光的精度。
[0004]为解决上述问题，本实用新型的技术方案为:一种具有清洁装置的碳化硅抛光机，包括底座，所述底座的上侧面设有固定板以及由电机带动进行旋转的第一抛光平台和第二抛光平台，所述第一抛光平台的一侧设有垂直安装于底座的打磨装置，所述打磨装置包括位于第一抛光平台正上方的打磨棒;所述的固定板上设置有储液仓、储水箱和抛光装置，所述的抛光装置包括位于第二抛光平台正上方的抛光片，所述的储液仓、储水箱底端分别连通抛光液输送管一端、导水管一端，抛光液输送管另一端连接有位于第二抛光平台正上方的第一喷头，导水管另一端连接有位于第一抛光平台正上方的第二喷头和位于第二抛光平台正上方的第三喷头;所述的底座周围设有废液收集槽。
[0005]工作时，把需要加工的碳化硅放在第一抛光平台上进行初步加工，启动电机和打磨装置，转动第一抛光平台利用打磨棒进行打磨，对碳化硅上一些较大的棱角进行磨平，之后再把初步加工过的碳化硅放在第二抛光平台上，通过喷头在碳化硅上喷洒抛光液，再启动电机和抛光装置，转动第二抛光平台利用抛光片进行抛光，对碳化硅进行最后的精抛光工作。打磨、抛光完成后利用第二喷头和第三喷头对第一抛光平台和第二抛光平台进行冲洗，防止打磨和抛光后产生的粉尘和废液附着于抛光平台形成污垢，喷洒出来的抛光液以及清洗抛光平台后的水，回流进废液收集槽内，这样不仅可以对于碳化硅进行精准完善的抛光，而且还便于清洁，经济实用。
[0006]所述底座为中空结构，且底座的内部设有与第一抛光平台和第二抛光平台位置对应的转动轴，所述的转动轴下端连接电机，上端贯穿底座并且与第一抛光平台和第二抛光平台连接。电机通过转动轴带动第一抛光平台和第二抛光平台转动。
[0007]所述的废液收集槽底部设有用于排出废液的导管。可将收集的废液及时通过导管排出，防止时间长溢出到地面。
[0008]优选的，所述底座通过轴承与转动轴连接。摩擦阻力小，减小转动轴与底座之间的摩擦损伤，提高机械效率，便于安装拆卸，维修方便。有益效果:本实用新型通过在固定板上设有分流的储水箱，可清洗第一抛光平台和第二抛光平台，将打磨后的粉尘和抛光后的废液冲到底座周围的废液收集槽内，保证工作环境的清洁，防止产生污垢，影响抛光质量。
附图说明
[0009]图1为本实用新型结构不意图；
[0010]图2为电机与第二抛光平台连接示意图；
[0011]其中，I底座，2第一抛光平台，3第二抛光平台，4第一喷头，5打磨装置，6抛光装置，7导水管，8第三喷头，9抛光片、10打磨棒、11电机、12固定板、13储水箱、14抛光液输送管、15储液仓、16转动轴、17废液收集槽、18导管、19第二喷头。
具体实施方式
[0012]根据图1-2对本实用新型做如下描述。一种具有清洁装置的碳化硅抛光机，包括底座I，所述底座I的上侧面设有固定板12以及由电机11带动进行旋转的第一抛光平台2和第二抛光平台3，所述第一抛光平台2的一侧设有垂直安装于底座I的打磨装置5，所述打磨装置5包括位于第一抛光平台2正上方的打磨棒10;所述的固定板12上设置有储液仓15、储水箱13和抛光装置6，所述的抛光装置6包括位于第二抛光平台3正上方的抛光片9，所述的储液仓15、储水箱13底端分别连通抛光液输送管14 一端、导水管7—端，抛光液输送管14另一端连接有位于第二抛光平台3正上方的第一喷头4，导水管7另一端连接有位于第一抛光平台2正上方的第二喷头19和位于第二抛光平台3正上方的第三喷头8;所述的底座I周围设有废液收集槽17 ο所述的废液收集槽17底部设有用于排出废液的导管18。所述底座I为中空结构，且底座I内部设有与第一抛光平台2和第二抛光平台3位置对应的转动轴16，所述的转动轴16下端连接电机11，上端贯穿底座I并且与第一抛光平台2和第二抛光平台3连接。所述底座I通过轴承与转动轴16连接。
Claims (4)
1.一种具有清洁装置的碳化硅抛光机，包括底座(I)，其特征在于:所述底座(I)的上侧面设有固定板(12)以及由电机(11)带动进行旋转的第一抛光平台(2)和第二抛光平台(3)，所述第一抛光平台(2)的一侧设有垂直安装于底座(I)的打磨装置(5)，所述打磨装置(5)包括位于第一抛光平台(2)正上方的打磨棒(10);所述的固定板(12)上设置有储液仓(15)、储水箱(13)和抛光装置(6)，所述的抛光装置(6)包括位于第二抛光平台(3)正上方的抛光片(9)，所述的储液仓(15)、储水箱(13)底端分别连通抛光液输送管(14) 一端、导水管(7) —端，抛光液输送管(14)另一端连接有位于第二抛光平台(3)正上方的第一喷头(4)，导水管(7)另一端连接有位于第一抛光平台(2)正上方的第二喷头(19)和位于第二抛光平台(3)正上方的第三喷头(8);所述的底座(I)周围设有废液收集槽(17)。
2.根据权利要求1所述的具有清洁装置的碳化硅抛光机，其特征在于:所述底座(I)为中空结构，且底座(I)内部设有与第一抛光平台(2)和第二抛光平台(3)位置对应的转动轴(16)，所述的转动轴(16)下端连接电机(11)，上端贯穿底座(I)并且与第一抛光平台(2)和第二抛光平台(3)连接。
3.根据权利要求1所述的具有清洁装置的碳化硅抛光机，其特征在于:所述的废液收集槽(17)底部设有用于排出废液的导管(18)。
4.根据权利要求1中所述的具有清洁装置的碳化硅抛光机，其特征在于:所述底座(I)通过轴承与转动轴(16)连接。
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Address after: No.99, Tianyue South Road, Huaiyin District, Jinan City, Shandong Province Patentee after: Shandong Tianyue advanced technology Co., Ltd Address before: Room 1106-6-01, AB Block, Century Fortune Center, West Side of Xinyu Road, Jinan High-tech Zone, Shandong Province Patentee before: Shandong Tianyue Advanced Materials Technology Co.,Ltd. |