CN204625193U - For the chassis assembly of polycrystalline silicon reducing furnace - Google Patents
For the chassis assembly of polycrystalline silicon reducing furnace Download PDFInfo
- Publication number
- CN204625193U CN204625193U CN201520179793.8U CN201520179793U CN204625193U CN 204625193 U CN204625193 U CN 204625193U CN 201520179793 U CN201520179793 U CN 201520179793U CN 204625193 U CN204625193 U CN 204625193U
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- inlet pipe
- chassis body
- chassis
- polycrystalline silicon
- reducing furnace
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Abstract
The utility model discloses a kind of chassis assembly for polycrystalline silicon reducing furnace, the described chassis assembly for polycrystalline silicon reducing furnace comprises: chassis body, is limited with cooling chamber in described chassis body; Multiple electrode, multiple described electrode is located in described chassis body; Multiple central intake pipe, multiple described central intake pipes are located at the center of described chassis body; Multiple outer rings inlet pipe group, multiple described outer rings inlet pipe group is located at the outer peripheral edge place of described chassis body and along the spaced apart setting of circumference of described chassis body, each described outer ring inlet pipe group comprises the multiple outer rings inlet pipe being arranged in annular; Multiple vapor pipe, multiple described inlet pipe to be arranged in described chassis body and to be positioned at the outside of multiple described electrode.Have according to the chassis assembly for polycrystalline silicon reducing furnace of the utility model embodiment that can to improve gas stream in the stove cycle efficiency high with the production efficiency improving polysilicon, and not easily fall the advantages such as rod.
Description
Technical field
The utility model relates to technical field of polysilicon production, in particular to a kind of chassis assembly for polycrystalline silicon reducing furnace.
Background technology
Existing polycrystalline silicon reducing furnace, multiple inlet pipe is uniformly distributed on chassis, so that gas is evenly distributed in reduction furnace.It is generally acknowledged that inlet pipe on chassis is more, distribution is more evenly better.
Utility model content
The utility model proposes a kind of for the chassis assembly to crystal silicon reduction furnace, this chassis assembly being used for polycrystalline silicon reducing furnace can break through traditional design thinking, has and improves gas stream in the stove cycle efficiency to improve the production efficiency of polysilicon, and not easily falls the advantage such as excellent.
For achieving the above object, according to the utility model proposes a kind of chassis assembly for polycrystalline silicon reducing furnace, the described chassis assembly for polycrystalline silicon reducing furnace comprises: chassis body, be limited with cooling chamber in described chassis body, described chassis body is provided with the cooling liquid inlet and cooling liquid outlet that are communicated with described cooling chamber; Multiple electrode, multiple described electrode is located in described chassis body; Multiple central intake pipe, multiple described central intake pipes are located at the center of described chassis body; Multiple outer rings inlet pipe group, multiple described outer rings inlet pipe group is located at the outer peripheral edge place of described chassis body and along the spaced apart setting of circumference of described chassis body, each described outer ring inlet pipe group comprises the multiple outer rings inlet pipe being arranged in annular; Multiple vapor pipe, multiple described inlet pipe to be arranged in described chassis body and to be positioned at the outside of multiple described electrode.
Have according to the chassis assembly for polycrystalline silicon reducing furnace of the present utility model that can to improve gas stream in the stove cycle efficiency high with the production efficiency improving polysilicon, and not easily fall the advantages such as rod.
In addition, following additional technical characteristic can also be had according to the chassis assembly for polycrystalline silicon reducing furnace of the present utility model:
Described central intake pipe is five, and wherein, a described central intake pipe is located at the center of described chassis body, and other four described central intake pipes are along the circumferential spaced set of described chassis body.
Described outer ring inlet pipe group is four, and each described outer ring inlet pipe group comprises three described outer ring inlet pipe.
Three described outer ring inlet pipe in the inlet pipe group of each described outer ring are arranged in annular and along the circumferential spaced set of described annular.
Described vapor pipe is four to eight and along the circumferential spaced set of described chassis body.
Described electrode be 36 to and be distributed on the first to the 5th circle of described chassis body, the described first to the 5th circle for the center of described chassis body for the center of circle and increase successively from the inside to the outside four concentric(al) circless.
Described first lap is distributed with two to described electrode, described second circle is distributed with four to described electrode, described 3rd circle is distributed with eight to described electrode, described 4th circle is distributed with eight to described electrode, described 5th circle is distributed with 14 to described electrode.
The described chassis assembly for polycrystalline silicon reducing furnace also comprises: air inlet endless tube, and described air inlet endless tube is provided with inlet mouth and is arranged on below described chassis body; Multiple air intake branch, multiple described air intake branch is connected on described air inlet endless tube, and multiple described central intake pipe is connected with a described air intake branch, and the multiple described outer ring inlet pipe in the inlet pipe group of each described outer ring is connected with a described air intake branch.
Described chassis body comprises: chassis flange; Upper plate, described upper plate is located in the flange of described chassis; Lower shoe, described lower shoe to be located in the flange of described chassis and to be positioned at below described upper plate, and described lower shoe and described upper plate and described chassis flange limit described cooling chamber; Multiple flow deflector, multiple described flow deflector to be located in described cooling chamber and to limit multiple helical flow path in described cooling chamber, and described cooling liquid inlet is communicated with multiple described helical flow path with described cooling liquid outlet.
Described upper plate is carbon steel and stainless steel clad plate, and described lower shoe is carbon steel sheet.
Accompanying drawing explanation
Fig. 1 is the vertical view of the chassis assembly for polycrystalline silicon reducing furnace according to the utility model embodiment.
Fig. 2 is the side-view of the chassis assembly for polycrystalline silicon reducing furnace according to the utility model embodiment.
Reference numeral: for chassis assembly 10, chassis body 100, electrode 200, central intake pipe 300, outer ring inlet pipe group 400, outer ring inlet pipe 410, vapor pipe 500, air inlet endless tube 600, the air intake branch 700 of polycrystalline silicon reducing furnace.
Embodiment
Be described below in detail embodiment of the present utility model, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has element that is identical or similar functions from start to finish.Be exemplary below by the embodiment be described with reference to the drawings, be intended to for explaining the utility model, and can not be interpreted as restriction of the present utility model.
Below with reference to the accompanying drawings the chassis assembly 10 for polycrystalline silicon reducing furnace according to the utility model embodiment is described.Wherein, above-below direction when following above-below direction all normally uses with polycrystalline silicon reducing furnace is as the criterion.
As depicted in figs. 1 and 2, chassis body 100, multiple electrode 200, multiple central intake pipe 300, multiple outer rings inlet pipe group 400 and multiple vapor pipe 500 is comprised according to the chassis assembly 10 for polycrystalline silicon reducing furnace of the utility model embodiment.
Be limited with cooling chamber in chassis body 100, chassis body 100 is provided with the cooling liquid inlet and cooling liquid outlet that are communicated with described cooling chamber.Multiple electrode 200 is located in chassis body 100, electrode 200 is provided with corresponding silicon core.Two pairs of adjacent electrodes 200 are connected by battery lead plate (not shown), and for being equally spaced between silicon rod, spacing is 200-240 millimeter.Under experimental result shows this layout, around every root silicon rod, thermal field is relatively even, and silicon rod can vertically and grow uniformly, and maximum realization is to heat utilization rate.Multiple central intake pipes 300 are located at the center of chassis body 100.Multiple outer rings inlet pipe group 400 is located at the outer peripheral edge place of chassis body 100 and along the spaced apart setting of circumference of chassis body 100, each outer ring inlet pipe group 400 comprises the multiple outer rings inlet pipe 410 being arranged in annular.Multiple vapor pipe 500 to be arranged in chassis body 100 and in the radial direction of chassis body 100, to be positioned at the outside of multiple electrode 200.
According to the chassis assembly 10 for polycrystalline silicon reducing furnace of the utility model embodiment, by the above-mentioned optimization to structure, greatly can save the area shared by inlet pipe, and then with 24,36 be met to the chassis area of rod requirement is arranged to rod.
Further, applicant entered research and experiment finds, inlet pipe is divided into central intake pipe 300 and outer ring inlet pipe group 400, and each outer ring inlet pipe group 400 comprises multiple multiple outer rings inlet pipe 410 being arranged in annular.When the multiple outer rings inlet pipe 410 in each outer ring inlet pipe group 400 is in stove during air inlet, because outer ring inlet pipe 410 spacing is less, under airflow function, in outer ring inlet pipe group 400, central authorities form low pressure area, pool one air-flow after air-flow is drawn close to centre, the convergence effect of air-flow expands airflow influence district, and easily arrives stove inner top, enhance gas stream in the stove systemic circulation, promote silicon rod growth.And multiple central intake pipe 300 also can pool one air-flow, because reduction furnace middle body end socket height is higher, after air flow energy can being made like this to get at reach top end socket, carry out quadratic distribution, improve airflow circulation efficiency.The convergence effect of charge air flow can be realized thus, while ensureing that air-flow overcomes resistance arrival silicon rod horizontal-associate position, coordinate the multiple vapor pipes 500 be positioned at outside electrode 200, inside and outside two kinds of circulating currents distribution can be formed in stove, thus effectively improve turbulivity and the gas velocity on silicon rod surface, and then improve the sedimentation rate of polysilicon, to enhance productivity.
In addition, the convergence effect of air inlet, can make charge air flow be not easy directly to impact bottom silicon rod, thus avoids silicon rod be out of shape and cause down rod.
Therefore, have according to the chassis assembly 10 for polycrystalline silicon reducing furnace of the utility model embodiment and can improve gas stream in the stove cycle efficiency to improve the production efficiency of polysilicon, and not easily fall rod etc. advantage.The more important thing is, the design of this chassis assembly breaches the equally distributed conventional thinking of polycrystalline silicon reduction furnace base plate inlet pipe, and the effect obtained is better than equally distributed inlet pipe set-up mode on the contrary; And this chassis assembly design saves inlet pipe area occupied greatly, and then with 24,36 are met to the chassis area of rod requirement is arranged to rod, make the chassis producer of current much production 24 to rod need not change production unit and can produce more advanced, production capacity is higher chassis product.
Below with reference to the accompanying drawings the chassis assembly 10 for polycrystalline silicon reducing furnace according to the utility model specific embodiment is described.
In specific embodiments more of the present utility model, as depicted in figs. 1 and 2, chassis body 100, multiple electrode 200, multiple central intake pipe 300, multiple outer rings inlet pipe group 400 and multiple vapor pipe 500 is comprised according to the chassis assembly 10 for polycrystalline silicon reducing furnace of the utility model embodiment.
Wherein, chassis body 100 is provided with multiple electrode holder, multiple electrode 200 is located in multiple electrode holder respectively.
Specifically, as shown in Figure 1, central intake pipe 300 is five, wherein, a central intake pipe 300 is located at the center of chassis body 100, and other four central intake pipes 300 to be arranged and along the circumferential spaced set of chassis body 100 around this central intake pipe 300.
Outer ring inlet pipe group 400 is four and along the circumferential spaced set of chassis body 100, each outer ring inlet pipe group 400 comprises three outer ring inlet pipe 410.Wherein, three outer ring inlet pipe 410 in each outer ring inlet pipe group 400 are arranged in annular and along the circumferential spaced set of described annular.In other words, three outer ring inlet pipe 410 in each outer ring inlet pipe group 400 lay respectively at three summits place of an equilateral triangle.
Alternatively, as shown in Figure 1, vapor pipe 500 is four to eight and along the circumferential spaced set of chassis body 100.
In concrete examples more of the present utility model, as shown in Figure 1, electrode 200 be 36 to and be distributed on the first to the 5th circle of chassis body 100, the described first to the 5th circle for the center of chassis body 100 for the center of circle and increase successively from the inside to the outside four concentric(al) circless.
Particularly, described first lap is distributed with two pairs of electrodes 200, described second circle is distributed with four pairs of electrodes 200, described 3rd circle is distributed with eight pairs of electrodes 200, described 4th circle is distributed with eight pairs of electrodes 200, described 5th circle is distributed with 14 pairs of electrodes 200.
In specific embodiments more of the present utility model, as shown in Figure 2, the chassis assembly 10 for polycrystalline silicon reducing furnace also comprises air inlet endless tube 600 and multiple air intake branch 700.Air inlet endless tube 600 is provided with inlet mouth and is arranged on below chassis body 100.Multiple air intake branch 700 is connected on air inlet endless tube 600, and multiple central intake pipe 300 is connected with an air intake branch 700, and the multiple outer rings inlet pipe 410 in each outer ring inlet pipe group 400 is connected with an air intake branch 700.That is, five central intake pipes 300 share an air intake branch 700, and three the outer ring inlet pipe 410 in each outer ring inlet pipe group 400 share an air intake branch 700.Significantly can reduce the quantity on chassis body 100 lower connection pipe road thus, thus convenient maintenance.
Wherein, central intake pipe 300 and outer ring inlet pipe 410 are the thick-walled tube expanded gradually along gas approach axis, and the top of central intake pipe 300 and outer ring inlet pipe 410 is provided with the thread groove docked with nozzle.
In concrete examples more of the present utility model, chassis body 100 comprises chassis flange, upper plate and lower shoe.Chassis flange and former 24 is companionflange to the bell cover structure of excellent reduction furnace, ensures the stopping property of equipment.Described upper plate is located in the flange of described chassis.Described lower shoe to be located in the flange of described chassis and to be positioned at below described upper plate, and described lower shoe and described upper plate and described chassis flange limit described cooling chamber.Multiple described flow deflector to be located in described cooling chamber and to limit multiple helical flow path in described cooling chamber, and described cooling liquid inlet is communicated with multiple described helical flow path with described cooling liquid outlet.
Multiple described helical flow path is from the rotation direction edge, center of chassis body 100 and shape is identical with length.After cooling fluid enters cooling water cavity from the cooling liquid inlet at inner ring flow deflector edge, evenly by each helical flow path, pressure cooling is carried out to upper plate, central intake pipe 300, outer ring inlet pipe 410, vapor pipe 500 and electrode 200.Flow deflector is provided with suitable radian at the outer ring inlet pipe 410 of process, vapor pipe 500 and electrode 200 place, guarantees to there will not be cooling dead angle, affects cooling performance.Each flow deflector is arranged three to ten communicating apertures, both sides cooling fluid is circulated mutually, avoid producing flow dead.Cooling fluid, after by central authorities to outer ring six helical layer runner, is flowed out by cooling liquid outlet.
Wherein, the mouth of pipe height at cooling liquid outlet place higher than the mouth of pipe height at cooling liquid inlet place, to ensure that the water coolant having certain altitude in cooling water cavity all the time exists.
According to the chassis assembly 10 for polycrystalline silicon reducing furnace of the utility model embodiment, when chassis body 100 is identical to excellent chassis diameter with existing 24, four helical channels are constituted in chassis body 100, reduce the resistance to flow to cooling fluid, enhance cooling performance, meet 36 requirements to excellent chassis of reducing furnace.Carry out modeling analysis by Fluent flow field analysis software to the coefficient of heat transfer of its each position of helical flow path, result shows that the coefficient of heat transfer difference of each position in chassis body 100 is less than 30%.Utilize Ansys Stress Analysis Software, carry out stress distribution to chassis body 100, result shows, because the flow process of cooling fluid is moderate in each helical flow path, to avoid excessive temperature differentials, is conducive to the temperature stress and the distortion that prevent chassis body 100.
Alternatively, described upper plate is carbon steel and stainless steel clad plate, and wherein, stainless steel parts plays corrosion-resistant and high temperature resistant effect, and carbon steel part plays support and heat transfer effect.Described lower shoe is carbon steel sheet, is conducive to high-temperature tail gas, carries out thermal exchange between cooling fluid and air inlet, improves the job stability of chassis body 100.
In description of the present utility model, it will be appreciated that, term " " center ", " longitudinal direction ", " transverse direction ", " length ", " width ", " thickness ", " on ", D score, " front ", " afterwards ", " left side ", " right side ", " vertically ", " level ", " top ", " end " " interior ", " outward ", " clockwise ", orientation or the position relationship of the instruction such as " counterclockwise " are based on orientation shown in the drawings or position relationship, only the utility model and simplified characterization for convenience of description, instead of indicate or imply that the device of indication or element must have specific orientation, with specific azimuth configuration and operation, therefore can not be interpreted as restriction of the present utility model.
In addition, term " first ", " second " only for describing object, and can not be interpreted as instruction or hint relative importance or imply the quantity indicating indicated technical characteristic.Thus, be limited with " first ", the feature of " second " can express or impliedly comprise one or more these features.In description of the present utility model, the implication of " multiple " is at least two, such as two, three etc., unless otherwise expressly limited specifically.
In the utility model, unless otherwise clearly defined and limited, the term such as term " installation ", " being connected ", " connection ", " fixing " should be interpreted broadly, and such as, can be fixedly connected with, also can be removably connect, or integral; Can be mechanical connection, also can be electrical connection; Can be directly be connected, also indirectly can be connected by intermediary, can be the connection of two element internals or the interaction relationship of two elements.For the ordinary skill in the art, the concrete meaning of above-mentioned term in the utility model can be understood as the case may be.
In the utility model, unless otherwise clearly defined and limited, fisrt feature second feature it " on " or D score can comprise the first and second features and directly contact, also can comprise the first and second features and not be directly contact but by the other characterisation contact between them.And, fisrt feature second feature " on ", " top " and " above " comprise fisrt feature directly over second feature and oblique upper, or only represent that fisrt feature level height is higher than second feature.Fisrt feature second feature " under ", " below " and " below " comprise fisrt feature immediately below second feature and tiltedly below, or only represent that fisrt feature level height is less than second feature.
In the description of this specification sheets, specific features, structure, material or feature that the description of reference term " embodiment ", " some embodiments ", " example ", " concrete example " or " some examples " etc. means to describe in conjunction with this embodiment or example are contained at least one embodiment of the present utility model or example.In this manual, to the schematic representation of above-mentioned term not must for be identical embodiment or example.And the specific features of description, structure, material or feature can combine in an appropriate manner in any one or more embodiment or example.In addition, the different embodiment described in this specification sheets or example can carry out engaging and combining by those skilled in the art.
Although illustrate and described embodiment of the present utility model above, be understandable that, above-described embodiment is exemplary, can not be interpreted as restriction of the present utility model, those of ordinary skill in the art can change above-described embodiment, revises, replace and modification in scope of the present utility model.
Claims (10)
1. for a chassis assembly for polycrystalline silicon reducing furnace, it is characterized in that, comprising:
Chassis body, is limited with cooling chamber in described chassis body;
Multiple electrode, multiple described electrode is located in described chassis body;
Multiple central intake pipe, multiple described central intake pipes are located at the center of described chassis body;
Multiple outer rings inlet pipe group, multiple described outer rings inlet pipe group is located at the outer peripheral edge place of described chassis body and along the spaced apart setting of circumference of described chassis body, each described outer ring inlet pipe group comprises the multiple outer rings inlet pipe being arranged in annular;
Multiple vapor pipe, multiple described inlet pipe to be arranged in described chassis body and to be positioned at the outside of multiple described electrode.
2. the chassis assembly for polycrystalline silicon reducing furnace according to claim 1, it is characterized in that, described central intake pipe is five, wherein, a described central intake pipe is located at the center of described chassis body, and other four described central intake pipes are along the circumferential spaced set of described chassis body.
3. the chassis assembly for polycrystalline silicon reducing furnace according to claim 1, is characterized in that, described outer ring inlet pipe group is four, and each described outer ring inlet pipe group comprises three described outer ring inlet pipe.
4. the chassis assembly for polycrystalline silicon reducing furnace according to claim 3, is characterized in that, three described outer ring inlet pipe in the inlet pipe group of each described outer ring are arranged in annular and along the circumferential spaced set of described annular.
5. the chassis assembly for polycrystalline silicon reducing furnace according to claim 1, is characterized in that, described vapor pipe is four to eight and along the circumferential spaced set of described chassis body.
6. the chassis assembly for polycrystalline silicon reducing furnace according to claim 1, it is characterized in that, described electrode be 36 to and be distributed on the first to the 5th circle of described chassis body, the described first to the 5th circle for the center of described chassis body for the center of circle and increase successively from the inside to the outside four concentric(al) circless.
7. the chassis assembly for polycrystalline silicon reducing furnace according to claim 6, it is characterized in that, described first lap is distributed with two to described electrode, described second circle is distributed with four to described electrode, described 3rd circle is distributed with eight to described electrode, described 4th circle is distributed with eight to described electrode, described 5th circle is distributed with 14 to described electrode.
8. the chassis assembly for polycrystalline silicon reducing furnace according to any one of claim 1-7, is characterized in that, also comprise:
Air inlet endless tube, described air inlet endless tube is provided with inlet mouth and is arranged on below described chassis body;
Multiple air intake branch, multiple described air intake branch is connected on described air inlet endless tube, and multiple described central intake pipe is connected with a described air intake branch, and the multiple described outer ring inlet pipe in the inlet pipe group of each described outer ring is connected with a described air intake branch.
9. the chassis assembly for polycrystalline silicon reducing furnace according to claim 1, is characterized in that, described chassis body comprises:
Chassis flange;
Upper plate, described upper plate is located in the flange of described chassis;
Lower shoe, described lower shoe to be located in the flange of described chassis and to be positioned at below described upper plate, and described lower shoe and described upper plate and described chassis flange limit described cooling chamber;
Multiple flow deflector, multiple described flow deflector to be located in described cooling chamber and to limit multiple helical flow path in described cooling chamber, and described cooling liquid inlet is communicated with multiple described helical flow path with described cooling liquid outlet.
10. the chassis assembly of polycrystalline silicon reducing furnace according to claim 9, is characterized in that, described upper plate is carbon steel and stainless steel clad plate, and described lower shoe is carbon steel sheet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520179793.8U CN204625193U (en) | 2015-03-27 | 2015-03-27 | For the chassis assembly of polycrystalline silicon reducing furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201520179793.8U CN204625193U (en) | 2015-03-27 | 2015-03-27 | For the chassis assembly of polycrystalline silicon reducing furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN204625193U true CN204625193U (en) | 2015-09-09 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520179793.8U Withdrawn - After Issue CN204625193U (en) | 2015-03-27 | 2015-03-27 | For the chassis assembly of polycrystalline silicon reducing furnace |
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| Country | Link |
|---|---|
| CN (1) | CN204625193U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104724705A (en) * | 2015-03-27 | 2015-06-24 | 中国恩菲工程技术有限公司 | Chassis assembly for polycrystalline silicon reduction furnace |
| CN104860447A (en) * | 2015-06-03 | 2015-08-26 | 北京朗新明环保科技有限公司南京分公司 | Novel wet-process flue gas desulfurization wastewater treatment system |
| CN107758671A (en) * | 2016-08-15 | 2018-03-06 | 内蒙古盾安光伏科技有限公司 | Reduction furnace and the polysilicon production process using the reduction furnace |
-
2015
- 2015-03-27 CN CN201520179793.8U patent/CN204625193U/en not_active Withdrawn - After Issue
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104724705A (en) * | 2015-03-27 | 2015-06-24 | 中国恩菲工程技术有限公司 | Chassis assembly for polycrystalline silicon reduction furnace |
| CN104724705B (en) * | 2015-03-27 | 2016-10-12 | 中国恩菲工程技术有限公司 | Chassis assembly for polycrystalline silicon reducing furnace |
| CN104860447A (en) * | 2015-06-03 | 2015-08-26 | 北京朗新明环保科技有限公司南京分公司 | Novel wet-process flue gas desulfurization wastewater treatment system |
| CN107758671A (en) * | 2016-08-15 | 2018-03-06 | 内蒙古盾安光伏科技有限公司 | Reduction furnace and the polysilicon production process using the reduction furnace |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20150909 Effective date of abandoning: 20161012 |
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| C25 | Abandonment of patent right or utility model to avoid double patenting |