CN204298457U - A kind of gaseous phase deposition equipment spray head cleaning device - Google Patents
A kind of gaseous phase deposition equipment spray head cleaning device Download PDFInfo
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- CN204298457U CN204298457U CN201420720023.5U CN201420720023U CN204298457U CN 204298457 U CN204298457 U CN 204298457U CN 201420720023 U CN201420720023 U CN 201420720023U CN 204298457 U CN204298457 U CN 204298457U
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Abstract
The utility model discloses a kind of gaseous phase deposition equipment spray head cleaning device, comprise the cleaning member be removable installed on rotary-tray, and the radius of turn of cleaning member is more than or equal to spray head radius; By cleaning member is fixed on the rotary-tray of equipment, by driving rotary-tray moving and rotating after often growing a stove, realizes the automated cleaning to spray head, save manpower, scrub evenly.So the power source of rotary-tray is from of equipment itself, there are good adaptability and reappearance.Setting the fixing distance of the relative spray head of cleaning member, after fixing rotating speed, cleaning dynamics at every turn, rotating speed is identical, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.In addition, bristle adopts height to be spaced, and by adjustment cleaning member height, bristle can be penetrated in spray head aperture clean, and what can effectively realize spray head surface and hole is clean.
Description
Technical field
The utility model belongs to gaseous phase deposition equipment technical field, is specifically related to a kind of gaseous phase deposition equipment spray head cleaning device.
Background technology
MOCVD (Metal-Organic Chemical Vapor Deposition metallo-organic compound chemical gaseous phase deposition) is a kind of Novel air phase epitaxy growing technology grown up on the basis of vapor phase epitaxial growth.
MOCVD be one by specific raw material by a series of strict control, be transferred to heat growth district, in this vitellarium, element compounds after raw material thermal decomposition forms the crystalline material with certain optical, electrical performance.General MOCVD device comprises heating system, cooling system, gas transport system, exhaust treatment system and control system.Adopt coupling spray head (Closed Coupled Showerhead, the upper cover employing aperture of CVD system CCS) transports in gaseous starting materials to reative cell and reacts, because the aperture of Showerhead (spray head) is very little, and the distance of reaction platform is very near in distance reative cell, a large amount of pre-reaction can be there is unavoidably in gaseous starting materials material, this reactant can cover rapidly the orifice surface of showerhead, often grow a stove, all need and manually scrub clean showerhead surface, this operation not only waste of manpower, also can because of different employee, different time is firmly different, or the uniformity of brush is good not, badly influence the production of next stove, it is the key factor causing board instability.
The clean level of Showerhead brush, directly has influence on of heap of stone crystalline condition and the temperature control system of epitaxy technique, if less after process window blocking, is then difficult to grow stable handicraft product.Also the showerhead situation of the different clean level of coupling is difficult to by the adjustment of technological parameter.
In addition, the artificial clean surface generally only scrubbing spray head, still can residual fraction material in the hole of spray head, and service time one is long, and small aperture still can be more and more less, and it is a lot of that this will cause technological parameter to drift about, and cannot stablize the industrial production of MOCVD.
Therefore, in view of above problem, be necessary the cleaning device proposing a kind of spray head, after often growing a stove, automated cleaning realized to spray head, save manpower, scrub evenly, thoroughly clean, and guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
Utility model content
In view of this, the utility model provides a kind of gaseous phase deposition equipment spray head cleaning device, by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automated cleaning to spray head, save manpower, scrub evenly, thoroughly clean, and clean dynamics, rotating speed are identical at every turn, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
According to a kind of gaseous phase deposition equipment spray head cleaning device that the purpose of this utility model proposes, for cleaning the cover layer on spray head surface, described gaseous phase deposition equipment comprises heating system, reative cell, be arranged at the rotary-tray in described reative cell, the spray head of gaseous starting materials is carried in described reative cell, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the radius of turn of cleaning member is more than or equal to the radius of described spray head;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drives rotary-tray to move up and down the elevating mechanism making cleaning member and spray head surface contact.
Preferably, the described cleaning member bristle that comprises connection bracket, be fixedly installed on the brush in described connection bracket and be positioned on described brush.
Preferably, described bristle adopts height bristle spaced arrangement to arrange.
Preferably, described connection bracket and the machine-shaping of brush one.
Preferably, described connection bracket is loop configuration, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
Preferably, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
Preferably, described spoke is linear structure or shaped form structure or broken line type structure.
Compared with prior art, disclosed in the utility model, the advantage of gaseous phase deposition equipment spray head cleaning device is: by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automated cleaning to spray head, save manpower, scrub evenly, thoroughly clean.
Rotary-tray is the part of gaseous phase deposition equipment, so the power source of rotary-tray is from of equipment itself, has good adaptability and reappearance.
Setting the fixing distance of the relative spray head of cleaning member, after fixing rotating speed, each clean dynamics, rotating speed are all identical, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
In addition, bristle adopts height to be spaced, and by the height of adjustment cleaning member, bristle can be penetrated in spray head aperture clean, and what can effectively realize spray head surface and hole is clean, clean more thorough.
Accompanying drawing explanation
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only embodiments more of the present utility model, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the structure diagram of gaseous phase deposition equipment.
Fig. 2 to Fig. 5 is the schematic diagram of 4 kinds of structures of cleaning member.
The title of the numeral in figure or the corresponding component representated by letter:
1, heating system 2, reative cell 3, rotary-tray 4, spray head 5, cleaning member 6, rotating shaft 51, connection bracket 52, brush
Detailed description of the invention
When employing coupling spray head transports and reacts in gaseous starting materials to reative cell, because the aperture of spray head is very little, and the distance of reaction platform is very near in distance reative cell, a large amount of pre-reaction can be there is unavoidably in gaseous starting materials material, this reactant can cover rapidly the orifice surface of spray head, often grow a stove, all need and manually scrub cleaning spray head surface, this operation not only waste of manpower, also can because of different employee, different time is firmly different, or the uniformity of brush is good not, badly influence the production of next stove, it is the key factor increasing board instability.The clean level that spray head is clean, directly has influence on of heap of stone crystalline condition and the temperature control system of epitaxy technique, if process window is less, is difficult to grow stable handicraft product.Also the spray head situation of the different clean level of coupling is difficult to by the adjustment of technological parameter.
The utility model is for deficiency of the prior art, provide a kind of gaseous phase deposition equipment spray head cleaning device, by being fixed on the rotary-tray of equipment by cleaning member, by driving rotary-tray moving and rotating after often growing a stove, realize the automated cleaning to spray head, save manpower, scrub evenly, thoroughly clean, and clean dynamics, rotating speed are identical at every turn, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
According to a kind of gaseous phase deposition equipment spray head cleaning device that the purpose of this utility model proposes, for cleaning the cover layer on spray head surface, described gaseous phase deposition equipment comprises heating system, reative cell, be arranged at the rotary-tray in described reative cell, the spray head of gaseous starting materials is carried in described reative cell, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the radius of turn of cleaning member is more than or equal to the radius of described spray head;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drive rotary-tray to move up and down the elevating mechanism making cleaning member and spray head surface contact, time clean, elevating mechanism driven rotary pallet moves and contacts with spray head, rear drive rotary-tray drives cleaning member cleaning spray head.
Preferably, the described cleaning member bristle that comprises connection bracket, be fixedly installed on the brush in described connection bracket and be positioned on described brush.
Preferably, described bristle adopts height bristle spaced arrangement to arrange.
Preferably, described connection bracket and brush all adopt resistant to elevated temperatures polytetrafluoroethylene (PTFE) material.
Preferably, described connection bracket and the machine-shaping of brush one.
Preferably, described connection bracket is loop configuration, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
Preferably, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
Preferably, described spoke is linear structure or shaped form structure or broken line type structure.
To be clearly and completely described the technical solution of the utility model by detailed description of the invention below.Obviously, described embodiment is only the utility model part embodiment, instead of whole embodiments.Based on the embodiment in the utility model, those of ordinary skill in the art are not making the every other embodiment obtained under creative work prerequisite, all belong to the scope of the utility model protection.
Refer to Fig. 1, a kind of gaseous phase deposition equipment spray head cleaning device, for cleaning the cover layer on spray head surface, gaseous phase deposition equipment comprises heating system 1, reative cell 2, be arranged at the rotary-tray 3 in reative cell 2, carry the spray head 4 of gaseous starting materials in reative cell 2, cleaning device comprises the cleaning member 5 be removable installed on rotary-tray 3, cleaning member 5 is with rotary-tray 3 synchronous axial system, and the radius of turn of cleaning member 5 is more than or equal to the radius of spray head 4.After each stove has grown, manipulator or conveying mechanism can be adopted to be transferred on rotary-tray by cleaning member, afterwards cleaning member to be removably fixed on rotary-tray.Wherein, cleaning member can connect and fix with rotary-tray.By ensureing that the radius of turn of cleaning member guarantees that the whole plane of spray head is all thoroughly cleaned.
Cleaning device also comprises the rotating mechanism driving rotary-tray 3 to operate, and drives rotary-tray 3 to move up and down the elevating mechanism making cleaning member and spray head surface contact.Rotating mechanism and elevating mechanism are the intrinsic mechanism of gaseous phase deposition equipment, and the running power resources of rotating mechanism, in equipment itself, have good adaptability and reappearance.Drive the running of rotary-tray to realize the clean automation of spray head by rotating mechanism, save human cost, increase work efficiency.
And during rotating mechanism driving rotary-tray running, the position of its rotating speed and the relative spray head of cleaning member all can be unified to fix, ensure that spray head cleans dynamics, rotating speed is consistent at every turn, thus guarantee that each clean clean level is basically identical, guarantee the stability of technique.
Refer to Fig. 2 to Fig. 5, wherein, the bristle (not shown) that cleaning member comprises connection bracket 51, is fixedly installed on the brush 52 in connection bracket 51 and is positioned on brush.Connection bracket is used for brush and rotary-tray to be connected and fixed.Connection bracket can be loop configuration or multistage arcuate structure etc., and concrete shape does not limit.
In the present embodiment, connection bracket adopts loop configuration, can realize being connected with the stable of rotary-tray on the one hand, realizes fixing brush on the other hand, improves the overall construction intensity of brush.
Connection bracket 51 and rotary-tray 3 connect and fix, connection bracket 51 with rotary-tray 3 is respectively arranged with the mutual bayonet socket (not shown) that mates and buckle (not shown).Except employing snap fit is fixing, also can adopt and be threaded, concrete connected mode does not limit.
Brush is for starting point is multiple spokes of radial distribution with connection bracket 51 center.Wherein spoke can be linear structure or shaped form structure or broken line type structure etc., and effectively can ensure the clean radius of brush, concrete structure shape does not limit.
Wherein, brush and connection bracket all can adopt resistant to elevated temperatures polytetrafluoroethylmaterial material to make, and ensure can not produce the problems such as high temperature deformation damage when cleaning spray head.
Bristle adopts height bristle spaced arrangement to arrange, can the cover layer material of effective cleaning spray head surface.In addition, be in the bristle of higher position when contacting with spray head, bristle part can stretch in the aperture of spray head, realizes cleaning spray head hole, and cleaning efficiency is higher and thorough.
The utility model discloses a kind of gaseous phase deposition equipment spray head cleaning device, comprise the cleaning member be removable installed on rotary-tray, cleaning member is with rotary-tray synchronous axial system, and the radius of turn of cleaning member is more than or equal to spray head radius; By cleaning member is fixed on the rotary-tray of equipment, by driving rotary-tray moving and rotating after often growing a stove, realizes the automated cleaning to spray head, save manpower, scrub evenly, thoroughly clean.
Rotary-tray is the part of gaseous phase deposition equipment, so the power source of rotary-tray is from of equipment itself, has good adaptability and reappearance.
Setting the fixing distance of the relative spray head of cleaning member, after fixing rotating speed, cleaning dynamics at every turn, rotating speed is identical, guarantee that each clean-up performance is consistent, thus ensure the stability of technique.
In addition, bristle adopts height to be spaced, and by adjustment cleaning member height, bristle can be penetrated in spray head aperture clean, and what can effectively realize spray head surface and hole is clean.
To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the utility model.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein when not departing from spirit or scope of the present utility model, can realize in other embodiments.Therefore, the utility model can not be restricted to these embodiments shown in this article, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (7)
1. a gaseous phase deposition equipment spray head cleaning device, for cleaning the cover layer on spray head surface, described gaseous phase deposition equipment comprises heating system, reative cell, be arranged at the rotary-tray in described reative cell, the spray head of gaseous starting materials is carried in described reative cell, it is characterized in that, described cleaning device comprises the cleaning member be removable installed on described rotary-tray, described cleaning member is with rotary-tray synchronous axial system, and the radius of turn of cleaning member is more than or equal to the radius of described spray head;
Described cleaning device also comprises the rotating mechanism driving rotary-tray running, and drives rotary-tray to move up and down the elevating mechanism making cleaning member and spray head surface contact.
2. gaseous phase deposition equipment spray head cleaning device as claimed in claim 1, is characterized in that, the bristle that described cleaning member comprises connection bracket, is fixedly installed on the brush in described connection bracket and is positioned on described brush.
3. gaseous phase deposition equipment spray head cleaning device as claimed in claim 2, is characterized in that, described bristle adopts height bristle spaced arrangement to arrange.
4. gaseous phase deposition equipment spray head cleaning device as claimed in claim 2, is characterized in that, described connection bracket and the machine-shaping of brush one.
5. gaseous phase deposition equipment spray head cleaning device as claimed in claim 2, it is characterized in that, described connection bracket is loop configuration, and described connection bracket and described rotary-tray connect and fix, described connection bracket with described rotary-tray is respectively arranged with the bayonet socket and buckle that mutually mate.
6. gaseous phase deposition equipment spray head cleaning device as claimed in claim 2, is characterized in that, described brush is for starting point is multiple spokes of radial distribution with described connection bracket center.
7. gaseous phase deposition equipment spray head cleaning device as claimed in claim 6, is characterized in that, described spoke is linear structure or shaped form structure or broken line type structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420720023.5U CN204298457U (en) | 2014-11-25 | 2014-11-25 | A kind of gaseous phase deposition equipment spray head cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201420720023.5U CN204298457U (en) | 2014-11-25 | 2014-11-25 | A kind of gaseous phase deposition equipment spray head cleaning device |
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| CN204298457U true CN204298457U (en) | 2015-04-29 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104328387A (en) * | 2014-11-25 | 2015-02-04 | 聚灿光电科技(苏州)有限公司 | Device for cleaning sprinkler head of vapor deposition device |
| CN105624639A (en) * | 2016-02-16 | 2016-06-01 | 山东浪潮华光光电子股份有限公司 | Brushing method for reaction chamber upper cover of metal organic matter chemical vapor deposition system |
| CN108514978A (en) * | 2018-03-29 | 2018-09-11 | 宁波高新区神台德机械设备有限公司 | Pre- dedusting automatic paint spraying apparatus |
| CN112410755A (en) * | 2020-11-18 | 2021-02-26 | 马鞍山杰生半导体有限公司 | Cleaning device for MOCVD (metal organic chemical vapor deposition) deposits |
| CN112853310A (en) * | 2021-01-08 | 2021-05-28 | 西南科技大学 | Metal organic chemical vapor deposition equipment |
-
2014
- 2014-11-25 CN CN201420720023.5U patent/CN204298457U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104328387A (en) * | 2014-11-25 | 2015-02-04 | 聚灿光电科技(苏州)有限公司 | Device for cleaning sprinkler head of vapor deposition device |
| CN105624639A (en) * | 2016-02-16 | 2016-06-01 | 山东浪潮华光光电子股份有限公司 | Brushing method for reaction chamber upper cover of metal organic matter chemical vapor deposition system |
| CN108514978A (en) * | 2018-03-29 | 2018-09-11 | 宁波高新区神台德机械设备有限公司 | Pre- dedusting automatic paint spraying apparatus |
| CN112410755A (en) * | 2020-11-18 | 2021-02-26 | 马鞍山杰生半导体有限公司 | Cleaning device for MOCVD (metal organic chemical vapor deposition) deposits |
| CN112410755B (en) * | 2020-11-18 | 2022-11-22 | 马鞍山杰生半导体有限公司 | Cleaning device for MOCVD deposit |
| CN112853310A (en) * | 2021-01-08 | 2021-05-28 | 西南科技大学 | Metal organic chemical vapor deposition equipment |
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