CN203894714U - Touch device - Google Patents

Abstract

A touch device comprises at least one sensing unit; the sensing unit comprises a base plate, multiple touch electrode structures and at least one dummy electrode group; the touch electrode structures are arranged on the same surface of the base plate at intervals and are electrically insulating to each other; the dummy electrode group is arranged on the base plate, positioned between the adjacent touch electrode structures, sunken to form a groove of which the top face penetrates through the base plate, and comprises multiple dummy electrode structures defined by the groove; the groove extends between the adjacent touch electrode structures and is provided with at least one bending.

Description

Contactor control device

Technical field

The utility model relates to a kind of contactor control device, particularly relates to a kind of contactor control device of manufacturing by radium-shine etching technique.

Background technology

Touch technology has been widely used in various electronic equipments, and for example TaiWan, China I430160 patent, proposes a kind of touch-screen panel and manufacture method thereof.This touch-screen panel comprises the structures such as touch-control electrode, insulation system, conducting wire, be independent making respectively, and manufacturing process separately all comprises the processing procedures such as plated film, photoetching, etching in structure described in manufacturing process.

Yet, the method for making that this kind adopts plated film, photoetching, etching technique to carry out, fabrication steps is too complicated, is unfavorable for the lifting of speed of production and the reduction of cost.

Summary of the invention

The purpose of this utility model is to provide a kind of contactor control device of making and have premium properties with easy process technique.

The utility model contactor control device, comprises at least one sensing unit, and this sensing unit comprises a substrate, a plurality of touch electrode structure and at least one dummy electrode group.Described touch electrode structure is arranged at spaced reciprocally on the same surface of this substrate and is electrically insulated each other.Described dummy electrode group is arranged on this substrate and between adjacent described touch electrode structure, it is recessed to form a chase that is through to this substrate by its end face, and comprising a plurality of dummy electrode structures that define of being separated by its chase, this chase extends and forms at least one bending between adjacent touch electrode structure.

Preferably, the extension of the chase of this dummy electrode group is shaped as the linear of segmentation, and the angle of the bending of this chase is acute angle.

Preferably, the extension distribution shape of the chase of this dummy electrode group is zigzag, and this chase forms a plurality of bendings.

Preferably, the bending of the chase of this dummy electrode group difference position is in the position of contiguous described touch electrode structure.

Preferably, the chase of this dummy electrode group is divided into interconnective one first ditch portion and one second ditch portion, and the bending position of this first ditch portion is in the position of contiguous described touch electrode structure, and the bending position of this second ditch portion is between described touch electrode structure.More preferably, the first ditch portion of this chase and the second ditch portion are interlaced and be cross network.

Preferably, the bending of the chase of this dummy electrode group is curved.

Preferably, the chase of this dummy electrode group forms a plurality of bendings, and the bending of this chase lays respectively at the position of contiguous described touch electrode structure.

Preferably, the extension distribution shape of the chase of this dummy electrode group is spiral fashion.

Preferably, the radius of the arc of this chase bending is between 50 microns to 250 microns.

Preferably, the width of this chase is between 15 microns to 40 microns.

Preferably, those touch electrode structures are defined by a groove respectively.

The beneficial effects of the utility model are: contactor control device of the present utility model is to make with radium-shine etching mode, and by chase, is divided into a plurality of regions in dummy electrode group, has good device performance.

Accompanying drawing explanation

Fig. 1 is a schematic diagram, and the preferred embodiment of the utility model contactor control device is described;

Fig. 2 is a schematic top plan view, and the first preferred embodiment of the utility model contactor control device is described;

Fig. 3 is the schematic side view along the III-III direction of Fig. 2;

Fig. 4 is a process flow diagram, and the manufacture method of the utility model contactor control device is described;

Fig. 5 is a schematic top plan view, and the manufacturing process of the contactor control device of the first embodiment is described;

Fig. 6 is the schematic side view along the VI-VI direction of Fig. 5;

Fig. 7 is a schematic top plan view, and the manufacturing process of continuity Fig. 5 is described;

Fig. 8 is the schematic side view along the VIII-VIII direction of Fig. 7;

Fig. 9 is a schematic top plan view, and the manufacturing process of continuity Fig. 7 is described;

Figure 10 is a schematic top plan view, and the second preferred embodiment of the utility model contactor control device is described;

Figure 11 is the schematic side view along the XI-XI direction of Figure 10;

Figure 12 is a schematic top plan view, and the manufacturing process of the contactor control device of the second embodiment is described;

Figure 13 is the schematic side view along the XIII-XIII direction of Figure 12;

Figure 14 is a schematic top plan view, and the manufacturing process of continuity Figure 12 is described;

Figure 15 is the schematic side view along the XV-XV direction of Figure 14; And

Figure 16 is a schematic top plan view, and the manufacturing process of continuity Figure 14 is described.

Embodiment

Below in conjunction with drawings and Examples, the utility model is elaborated.

Consulting Fig. 1 to Fig. 3, is the first preferred embodiment of the utility model contactor control device 1.Herein, contactor control device 1 is to take double-deck touch electrode structure to describe as example, therefore the sensing unit 2 and that contactor control device 1 comprises two spaces is located in the adhesion layer 3 between described sensing unit 2, and described sensing unit 2 can provide respectively the touch-control sensing signal of corresponding different directions (for example directions X and Y-direction).Yet in different embodiments, contactor control device 1 also can adopt individual layer touch electrode structure, now 1 needs of contactor control device arrange single sensing unit 2.

Sensing unit 2 comprises a substrate 21, a plurality of (this sentence two for example) touch electrode structure 22 and at least one (this sentences one for example, but also can coordinate touch electrode structure 22 and be adjusted into a plurality of) dummy electrode group 23.Substrate 21 has electrical insulating property and light transmission, its material can be ethylene terephthalate, polyethersulfone, polyacrylate, PEN, polyphenylene sulfide, polyene propyl group, polycarbonate, polyethylene terephthalate, glass etc., and can be made by hard material or flexible materials.

Touch electrode structure 22 is arranged at spaced reciprocally on this same surface of substrate 21 and is electrically insulated each other, for generation of touch-control sensing signal, it can pass through tin indium oxide (indium tinoxide, ITO), indium zinc oxide (indium zinc oxide, IZO), cadmium tin (cadmium tin oxide, CTO), aluminum zinc oxide (aluminum zinc oxide, AZO), tin indium oxide zinc (indium tin zinc oxide, ITZO), zinc paste (zinc oxide), cadmium oxide (cadmium oxide, CdO), hafnia (hafnium oxide, HfO), indium oxide gallium zinc (indium gallium zinc oxide, InGaZnO), indium oxide gallium zinc-magnesium (indium gallium zinc magnesium oxide, InGaZnMgO), indium oxide gallium magnesium (indium gallium magnesium oxide, InGaMgO) or indium oxide gallium aluminium (indium gallium aluminum oxide, InGaAlO), nano-silver thread, CNT, the electrically conducting transparent materials such as Graphene are made.Wherein, the planform of those touch electrode structures 22 be wait thus respectively space also the groove 221 of each self-forming close-shaped (being herein rectangle) defined.It should be noted that in other embodiments, the shape of groove 221 can be made corresponding change according to the requirement of the planform of touch electrode structure 22.In addition, groove 221 can form by modes such as chemical etching, radium-shine etching, mechanical etchings, and in particular process mode, is not limited.

Dummy electrode group 23 (dummy electrode) is arranged on substrate 21 and between described touch electrode structure 22, it can see through the material making that is same or different from touch electrode structure 22, and comprises a plurality of shapes, the different dummy electrode structure 230 of size.The effect of dummy electrode structure 230 is mainly electricity aspect and optics aspect, is specially:

1, electricity aspect

By the setting of dummy electrode structure 230, when the touch-control facts occurs, can increase the induced electricity capacitance that touch electrode structure 22 produces, thereby increase whole touch control capacitance value variable quantity, and then make the touching signals easily not shown in the figures by rear end IC() identification, has improved the degree of accuracy of touch detection.Therefore,, during actual production is used, dummy electrode structure 230 need to accomplish that certain dimensions just can reach the effect of corresponding increase touch control capacitance value variable quantity.

Yet, if the dimensions of dummy electrode structure 230 is excessive, easily causing again undesired signal, the maloperation problem producing while causing touch control operation, therefore must set suitable specification for its size on the implementation.

2, optics aspect

By the setting of dummy electrode structure 230, eliminated interval between the touch electrode structure 22 of adjacent setting owing to there not being corresponding material, and cause two between the difference of light refraction to external world.Therefore,, during actual production is used, dummy electrode structure 230 need to be accomplished that certain dimensions just can reach and be slowed down the vision obvious degree of touch electrode structure 22 in user's eye.

Yet if the dimensions of dummy electrode group 23 is excessive, itself and adjacent touch electrode structure 22 easily cause again short circuit problem.

To sum up, in the present embodiment, by dummy electrode group 23 being divided into the dummy electrode structure 230 of a plurality of zoness of different, to meet the requirement of its electricity aspect and optics aspect.Be specially, dummy electrode group 23 places are recessed to form one and are through to the chase 231 (namely in Fig. 2, Fig. 5, Fig. 7, Fig. 9 thicker black line place) of substrate 21 by its end face, chase 231 mainly extends and forms at least one (this sentences a plurality of is example) bending between adjacent touch electrode structure 22, dummy electrode group 23 is divided into a plurality of different regions, and separate, define size, the different dummy electrode structure 230 of shape.

In the present embodiment, according to the character of making the radium-shine etch process in sensing unit 2 processes, the basic extension of the chase 231 of this dummy electrode group 23 is shaped as the linear (piecewise line) of segmentation, that is to say that chase 231 can divide into the different straight line line segment of a plurality of bearing of trends by its turning point, and each straight line line segment can intersect each other or be non-intersect, to define multiple extension shape.And in the present embodiment, in order to define the dummy electrode structure 230 of appropriate size specification, basic extended nature is that the rectilinear chase 231 of segmentation is to define its shape by two overlapping staggered zigzag ditch portions.Because zigzag fashion is consisted of many segmentation straight lines, so within it is included in the rectilinear practical range of segmentation.

Consult Fig. 2, Fig. 7, Fig. 9, specifically, in the present embodiment, the chase 231 of dummy electrode group 23 is divided into interconnective one first ditch portion 232 and one second ditch portion 233, the extension distribution shape of the first ditch portion 232, the second ditch portion 233 is zigzag, and both each self-formings are a plurality of is acute angle-shaped bending.Wherein, the acute angle of the first ditch portion 232 bending position is in the position of contiguous described touch electrode structure 22, and position is between described touch electrode structure 22 in the bending of the second ditch portion 233, and wherein the first ditch portion 232 and the second ditch portion 233 form cross network.Aforementioned so-called vicinity comprises near touch electrode structure 22 or partly extends among touch electrode structure 22.Accordingly, dummy electrode group 23 is divided into a plurality of regions and is defined after the dummy electrode structure 230 of appropriate size specification by the first ditch portion 232, the second ditch portion 233 of above-mentioned chase 231, can allow dummy electrode structure 230 present good electrology characteristic and optical characteristics.Especially, when the first ditch portion 232 and the second ditch portion 233 interlaced and while being cross network, dummy electrode group 23 will be divided into a plurality of varying in size, different region, can destroy the consistance of refractive direction or the reflection direction of extraneous light, thereby make contact panel obtain a good visual effect.But in different embodiments, the first ditch portion 232 and the second ditch portion 233 can be configured to non-intersect, the pattern form that can carry out equally dummy electrode structure 230 defines.In addition, in the present embodiment, the bending of the first ditch portion 232 is for partly extending among touch electrode structure 22, and this implements the consistance that aspect can be destroyed touch electrode structure 22 edges, and promotes the optical effect that dummy electrode structure 230 provides.But in different embodiments, chase 231 also can not extend among touch electrode structure 22, and with aforementioned content, is not limited.

Below consult Fig. 4 to Fig. 9, the manufacture method of the contactor control device 1 of the present embodiment is described.

Step S01: this step wants first to make on substrate 21 structure 4.In the present embodiment, this structure 4 is monolayer constructions will, uses transparent conductive material as the aforementioned to make, and can process by various coating technique.But in different embodiments, structure 4 can be layer structure, and comprise the structures such as transparency conducting layer, opaque conductive layer, insulation course, can be by the radium-shine etching and processing of carrying out once.

Step S02: consult Fig. 4, Fig. 5, Fig. 6, this step is by radium-shine etching technique, and structure 4 is imposed to radium-shine etching, makes structure 4 be recessed to form the groove 221 of a plurality of (this sentences two for example) space.Described groove 221 is through to substrate 21 by the end face of structure 4 respectively, and forms respectively one close-shaped (being rectangle) herein, first on structure 4, defines two for generation of the touch electrode structure 22 of touch-control sensing signal.

Step S03: consult Fig. 4, Fig. 7, Fig. 8, Fig. 9, this step is by radium-shine etching technique, main structure 4 between touch electrode structure 22 carries out radium-shine etching, and makes this structure 4 be recessed to form at least one chase 231.The present embodiment dummy electrode group 23 is divided into behind polylith region by chase 231, forms a plurality of dummy electrode structures 230.The manufacturing process of this step to chase 231, be by radium-shine according to a predefined paths continuously etching form.

As Fig. 7, it is the manufacturing process signal of the first ditch portion 232 of chase 231.In the present embodiment, the first ditch portion 232 of chase 231 is from the starting point P1 of touch electrode structure 22 top sides, the corresponding left side, by radium-shine, along A1 direction towards lower right, carry out etching, and in inflection point P2, transfer A2 direction to and towards a left side, be etched to inflection point P3, sequentially according to A3 direction, A4 direction, A5 direction, A6 direction, carry out etching again, and sequentially at inflection point P4, P5, P6 place, change radium-shine etched direct of travel with the P7 that reaches home, and make the first ditch portion 232 form zigzag, extend.Specify, about the orientation of upper and lower, left and right, describe is to coordinate graphic explanation herein, does not represent the direction of actual process.In addition, according to different needs, radium-shine etched travel path, direct of travel, starting point, turning point can correspondingly be adjusted, and with description herein, are not limited.

According to above-mentioned path setting mode, the radium-shine etching course of this step can not interrupted continuously, therefore can save the required time of processing procedure.In addition, in order to reach preferably processing procedure effect, the present embodiment is to adopt radium-shine between 200 microsecond to 1000 microseconds of wavelength 1064 nanometers and burst length to carry out etching, and the width of the chase after etching 231 is controlled between 15 microns to 40 microns, and will the etch depth of structure 4 be controlled between 200 microns to 1000 microns.And according to the material of structure 4, thickness difference, radium-shine energy can correspondence be set, for example, when the material of structure 4 is Nano Silver, radium-shine better etching energy is between 5 watts to 10 watts; When the material of structure 4 is silver slurry, radium-shine better etching energy is between 8 watts to 13 watts.About the setting of above-mentioned process parameter, be mainly consideration whole processing speed and end properties, yield.For example, if the width of chase 231 is less than 15 microns, the structure 4 of chase 231 both sides easily forms short circuit, and affects the performance of contactor control device 1.And the control of etch depth,, between reaction during fabrication and in finished product integrality, if the radium-shine single etch degree of depth is less than 200 microns, existing together to need to impose repeatedly etch processes, just can complete the making of chase 231, and causes the increase of manufacturing time; But if the radium-shine single etch degree of depth is greater than 1000 microns, likely cause etch depth control to be difficult for, radium-shine, when structure 4 is carried out to etching, produce the risk of wounded substrate 21.In addition, according to the characteristic of radium-shine process technology, while marching to each bending place due to radium-shine bundle, its gait of march must slow down, so can produce longer etching period in bending place.Therefore, the present embodiment sees through the radium-shine etching energy of moderate control and the burst length of the radium-shine pulse of single-shot, can avoid radium-shine bending place because etching period is long or energy is excessively strong, and injure the substrate 21 under structure 4.About the damage of substrate 21, assert standard, due to radium-shine, can allow substrate 21 surfaces produce micro-bubbles while being etched to substrate 21, so the present embodiment is whether to produce bubble or assert that by the size of bubble whether substrate 21 is impaired with substrate 21.For example, when the size of bubble is less than 30 microns, because the bubble of this size is difficult for being discovered by naked eyes, therefore can be judged to be in qualified processing criterion.Yet the criterion of defining is only the explanation of the present embodiment, not as limit herein.

On the other hand, as Fig. 9, complete after the manufacturing process of above-mentioned the first ditch portion 232, aforementioned laser etching program can also continue and carry out, and carries out the making of the second ditch portion 233.Herein, the terminal P7 of the first ditch portion 232 after completing usingd as starting point in the second ditch portion 233, radium-shine successively transferring to toward A7 direction marches to inflection point P8 towards upper right side, and subsequently along A8, A9, A10 direction, sequentially at inflection point P9, P10, advance, and finally at terminal P11 place, stop, and complete the making of the second ditch portion 233, and be a plurality of less regions by 23 cuttings of dummy electrode group.Wherein, the radium-shine etched process parameter of the second ditch portion 233 is identical with the first ditch portion 232, and can reach best making quality.

Be noted that in the present embodiment, because there are part position in the first ditch portion 232 and the second ditch portion 233, intersect, so in step S03, the structure 4 of intersection can be subject to radium-shine etch processes twice.For fear of twice radium-shine etch processes in the first ditch portion 232, the second ditch portion 233 intersections, injure the substrate 21 at this place, the present embodiment sees through the control of suitable radium-shine energy, radium-shine burst length, radium-shine gait of march, structure 4 can be eliminated after twice radium-shine etching completely being subject to, and the state of beneath substrate 21 meet aforesaid impaired criterion.

Therefore, the making step of comprehensive aforementioned S01, S02, S03, the utility model carries out etching by radium-shine to structure 4, the figure that can complete easily touch electrode structure 22 and dummy electrode group 23 defines, production method compared to general use photoetching, etch process, making step be can reduce, processing procedure time and cost saved.In addition, the present embodiment also, by radium-shine etched route setting and process parameter are set, radium-shine etched course can be carried out continuously, and can avoid substrate 21 to cause unnecessary damage, therefore has good processing procedure effect.

What specify is, although the production method of the present embodiment is the radium-shine etching program (step S02) that first carries out touch electrode structure 22, carry out again the radium-shine etching program (step S03) of dummy electrode group 23, but because radium-shine etched path in said process is all to carry out according to a predefined paths, do not certainly exist the precedence relationship in execution.Therefore, after step S01, also can first perform step the structure that S03 carries out dummy electrode structure 230 to dummy electrode group 23 and define, perform step again subsequently S02 and define touch electrode structure 22.And on the other hand, though the present embodiment proposes the advance shape definition of program and chase 231 of concrete detailed radium-shine etching, above-mentioned technology is implemented can be according to need and corresponding adjustment, the content not proposing with the present embodiment is not limited.

Consulting Figure 10, Figure 11, Figure 14, Figure 16, is the second embodiment of the utility model contactor control device 1.Herein, although the chase 231 of dummy electrode group 23 is also mainly bending extension between touch electrode structure 22, it extends shape and is different from the first embodiment.

Concise and to the point, in the present embodiment, the bending place of the chase 231 of dummy electrode group 23 is to present arc, different with the acute angle of the first embodiment.And furthermore, the bending of the arc of above-mentioned chase 231 can be rendered as the spiral helicine formal style arc bending as the first ditch portion 232 in Figure 14, or presents the arc bending as the irregular property of the second ditch portion 233 in Figure 16.

Below consult Fig. 4 and correlative type, the method for making of the contactor control device 1 of the present embodiment is described.

Step S01, S02: consult Fig. 4, Figure 12, Figure 13, similar the first embodiment of these steps, seldom repeats at this.

Step S03: consult Fig. 4, Figure 14, Figure 15, Figure 16, this step is on structure 4, to produce the dummy electrode structure 230 of being divided into a plurality of regions by chase 231.

First, consulting 14, when the present embodiment is made the first ditch portion 232, is that the starting point R1 by touch electrode structure 22 top sides of left starts, toward B1 direction, towards inflection point R2, with arc curve path, advance, subsequently, can be according to B2-B12 direction, sequentially by inflection point R3-R12, finally march to terminal R13, and according to predetermined path, allow the extension of the first ditch portion 232 distribute to present spiral-shaped, and its bending place is respectively adjacent to define the groove 221 of described touch electrode structure 22.In this process, owing to all advancing in arc mode in the radium-shine bending place that navigates on, the advance direct mode of bending of acute angle of more aforementioned the first embodiment of mode of this kind, can maintain radium-shine gait of march faster, and reduce the required time of processing procedure.And preferably, the better radius size of above-mentioned bending place is between 50 microns to 250 microns, if radius is less than 50 microns, this bending place can form the bending shape of similar acute angle, make radium-shine passing through need reducing speed herein, and also may cause etching period long because of after slowing down gait of march, and injure beneath substrate 21.

Then, consult Figure 16, after completing the making of above-mentioned the first ditch portion 232, the present embodiment also carries out the making of the second ditch portion 233 of chase 231 continuously.Herein, the second ditch portion 233 is from the starting point R13 of touch electrode structure 22 bottom sides of left, along B13 direction, toward upper right side bending, march to inflection point R14, subsequently again by R14 sequentially along B14, B15 direction, after passing through inflection point R15, the most finally terminal R16 stops, and completes the making of the second ditch portion 233 of irregular shape.In the manufacturing process of the second ditch portion 233, radium-shine while marching to each inflection point, be still the mode keeping with arc and bend and advance, therefore can keep certain pace, effectively control the processing procedure time and avoid substrate 21 to produce damage.

Be similar to aforementioned the first embodiment, the step S02 of the present embodiment, the execution sequence of S03 can optionally be exchanged, and the extension shape of chase 231 can optionally be set as the spiral fashion of the first ditch portion 232 or as the irregular buckling curve of the second ditch portion 233, as long as remain on the setting means advancing in arc mode in turning point.

Comprehensive aforementioned two embodiment, contactor control device 1 of the present utility model is to make with radium-shine etching mode, and by chase 231, is cut into a plurality of regions in dummy electrode group 23, has good device performance.In addition, manufacture method of the present utility model adopts radium-shine etching technique, compared to using general photoetching, etch process technology, can effectively save fabrication steps, processing procedure time and cost.Furthermore, manufacture method of the present utility model sees through the suitable setting to radium-shine etching conduct path, process parameter, can further promote the usefulness of making contactor control device 1 or various device by radium-shine etching.Therefore contactor control device 1 of the present utility model and preparation method thereof, can reach the purpose of this utility model really.

Only as described above, it is only preferred embodiment of the present utility model, can not limit the scope that the utility model is implemented with this, all simple equivalences of doing according to the utility model claim and patent specification content change and modify, and all still belong in the scope that the utility model patent contains.

Claims (12)

1. a contactor control device, is characterized in that, this contactor control device comprises: at least one sensing unit, this sensing unit comprises

One substrate, has electrical insulating property and light transmission;

A plurality of touch electrode structures, are arranged at spaced reciprocally on the same surface of this substrate and are electrically insulated each other; And

At least one dummy electrode group, be arranged on this substrate and between adjacent described touch electrode structure, this dummy electrode group forms one and by its end face, is through to the chase of this substrate and comprises a plurality of dummy electrode structures that define of being separated by this chase, and this chase extends and form at least one bending between those adjacent touch electrode structures.

2. contactor control device according to claim 1, it is characterized in that: the extension of the chase of this dummy electrode group is shaped as the linear of segmentation, and the angle of the bending place of this chase is acute angle.

3. contactor control device according to claim 1, is characterized in that: the extension distribution shape of the chase of this dummy electrode group is zigzag, and this chase forms a plurality of bendings.

4. contactor control device according to claim 3, is characterized in that: the bending of the chase of this dummy electrode group is a position at contiguous described touch electrode structure respectively.

5. contactor control device according to claim 3, it is characterized in that: the chase of this dummy electrode group is divided into interconnective one first ditch portion and one second ditch portion, the bending position of this first ditch portion is in the position of contiguous described touch electrode structure, and the bending position of this second ditch portion is between described touch electrode structure.

6. contactor control device according to claim 5, is characterized in that: the first ditch portion of this chase and the second ditch portion are interlaced and be cross network.

7. contactor control device according to claim 1, is characterized in that: the bending of the chase of this dummy electrode group is curved.

8. contactor control device according to claim 7, is characterized in that: the chase of this dummy electrode group forms a plurality of bendings, and the bending of this chase lays respectively at the position of contiguous described touch electrode structure.

9. contactor control device according to claim 7, is characterized in that: the extension distribution shape of the chase of this dummy electrode group is spiral fashion.

10. contactor control device according to claim 7, is characterized in that: the radius of the arc bending of this chase is between 50 microns to 250 microns.

11. contactor control devices according to claim 1, is characterized in that: the width of this chase is between 15 microns to 40 microns.

12. contactor control devices according to claim 1, is characterized in that: those touch electrode structures are defined by a groove respectively.