CN203774376U - Silicon-based organic solar cell - Google Patents

Silicon-based organic solar cell Download PDF

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Publication number
CN203774376U
CN203774376U CN201320795074.XU CN201320795074U CN203774376U CN 203774376 U CN203774376 U CN 203774376U CN 201320795074 U CN201320795074 U CN 201320795074U CN 203774376 U CN203774376 U CN 203774376U
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solar cell
layer
transparent conductive
silicon
silica
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贾河顺
姜言森
任现坤
徐振华
马继磊
张春艳
方亮
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LINUO SOLAR POWER CO Ltd
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LINUO SOLAR POWER CO Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

Abstract

The utility model relates to a silicon-based organic solar cell. A buffering layer, an active layer and a transparent conductive thin film layer are sequentially arranged between a silicon substrate and a light receiving surface; front-surface metal electrodes are located on the transparent conductive thin film layer; a backlight surface is covered with a passivation layer; and a back-surface metal electrode passes through the passivation layer so as to be connected with the silicon substrate. According to the silicon-based organic solar cell of the utility model, a conventional crystalline silicon solar cell and an organic thin film solar cell are combined tighter. Compared with the traditional crystalline silicon solar cell, the silicon-based organic solar cell has the advantages of simple preparation process and reduced cost; and compared with the traditional organic solar cell, the silicon-based organic solar cell has the advantage of improved efficiency.

Description

A kind of silica-based organic photovoltaic cell
Technical field
The utility model relates to a kind of silica-based battery, is specifically related to a kind of silica-based organic photovoltaic cell.
Background technology
A kind of technological process of the demand that develops rapidly of solar energy industry is simple, and the industrialization technology that electricity conversion is high reduces cost of electricity-generating, reaches with civil power with valency or lower than the target of civil power electricity price.
Current conventional crystal silicon battery is along with the development of industrialization, and conversion efficiency promotes and cost has had larger progress, but its structure and technical characterstic have limited the further decline of its production cost.Conventional thin film solar cell is because its low production cost, easy to carry, the low light level respond, be the focus of industry research, but its efficiency is lower, and attenuation ratio is more serious always, be not suitable for a large amount of and long-term use, become the principal element of its development of restriction always.
Electrical machinery of Japanese sanyo combines crystal silicon solar battery and advantage hull cell, has abandoned their weakness, has researched and developed HIT battery, and efficiency is always very high, and becomes a main direction of following efficient solar battery development.But HIT solar cell is very high to the stability requirement of equipment and process, the development of the solar cell of the type is also slower.
Organic film solar cell has been obtained very large development, up to now, can, by regulating heterogeneity to obtain the organic film semiconductor material of different band gap, obtain the solar cell that difference is opened pressure.
How in conjunction with the advantage of crystal silicon solar battery and organic film solar cell, prepare cheap, the main points that during the higher solar cell of efficiency, this patent is considered.
Summary of the invention
The purpose of this utility model is exactly a kind of silica-based organic photovoltaic cell providing for the problem of above-mentioned existence, and the utility model is in conjunction with conventional crystal silicon solar battery and thin film solar cell, and with respect to traditional HIT battery, preparation process is simple, cost; With respect to traditional organic photovoltaic cell, efficiency is increased.
A kind of silica-based organic photovoltaic cell technical scheme of the present utility model is, this silica-based organic photovoltaic cell, and the sensitive surface of silicon substrate is followed successively by resilient coating, active layer, transparent conductive film layer, and wherein, front metal electrode is positioned on transparent conductive film layer; Shady face is coated with passivation layer, and back metal electrode is connected with silicon substrate through passivation layer.
The thickness range of resilient coating, active layer, transparent conductive film layer is 1 ~ 5000nm.
Resilient coating is the above pellicular cascade structure of one deck, is ZnO, SiO 2, a kind of in ITO, PEDOT:PSS film.
Active layer is the above pellicular cascade structure of one deck, is donor-receiver polymer or dye sensitization material film.
Active layer is P3HT:PCBM donor-receiver pellicular cascade structure.
Passivation layer is the above pellicular cascade structure of one deck, is SiO 2, SiN xor AlO xfilm.
Transparent conductive film layer be one deck with the laminated construction of upper film, film is ITO, IZO or ZnO film.
Described silica-based organic photovoltaic cell preparation method, processing step is:
(1) crystal silicon substrate making herbs into wool;
(2) resilient coating preparation;
(3) active layer preparation;
(4) transparent conductive film layer preparation;
(5) passivation layer preparation;
(6) back metal electrode preparation;
(7) front metal electrode preparation;
(8) low-temperature sintering.
Front metal electrode, transparent conductive film layer, back metal electrode prepare the method that adopts printing, sputter or ink-jet; The resilient coating of sensitive area, active layer are prepared the method that adopts printing, sputter, ink-jet or spin coating.Metal electrode material can adopt metal, metal alloy, inorganic metal, semiconductor etc.
Low sintering temperature is 200-400 ℃, time 1-10 minute.
The resilient coating of sensitive area, active layer preparation can adopt the method for printing, sputter, ink-jet, spin coating;
In the situation that not affecting solar battery structure, preparation process can be done certain adjustment, for example, after first being prepared by sensitive surface structure, prepares shady face structure again, or sensitive surface is prepared the preparation of then carrying out shady face one step or multistep after a step or multistep;
The beneficial effects of the utility model are: the utility model is in conjunction with conventional crystal silicon solar battery and thin film solar cell, and with respect to traditional HIT battery, preparation process is simple, cost; With respect to traditional organic photovoltaic cell, efficiency is increased.By software silvaco-tcad analog result, show: the efficiency of this structure solar cell can reach 26.2%; And make the solar cell of this structure in laboratory, its open circuit voltage can reach 785mV, estimate that the efficiency of solar cell can reach more than 24%.The main thin film deposition part of this solar cell can be prepared by the method for spin coating, can reduce the vacuum equipment that heterojunction solar cell is used in preparation technology, has reduced equipment cost and technology difficulty.
accompanying drawing explanation:
Fig. 1 is structural representation of the present utility model.
In figure, 1. silicon substrate; 2. resilient coating; 3. active layer; 4. transparent conductive film layer; 5. passivation layer; 6. back metal electrode; 7. front metal electrode.
embodiment:
In order to understand better the utility model, below in conjunction with accompanying drawing, describe the technical solution of the utility model in detail, but the utility model is not limited to this.
Embodiment 1
With reference to Figure of description Fig. 1, its structure is: silicon substrate 1 sensitive surface is followed successively by resilient coating 2, active layer 3, transparent conductive film layer 4, and front metal electrode 7 is positioned on transparent conductive film layer 4; Shady face is coated with passivation layer 5, and back metal electrode 6 is connected with substrate through passivation layer 5, and crystal silicon substrate is p type single crystal silicon;
Main technological steps is:
(1) the traditional alkali formula of crystal silicon substrate 1 use process for etching carries out making herbs into wool;
(2) sensitive surface resilient coating 2 preparations are prepared the SiO of one deck 10nm by the method for PECVD on substrate 1 2film;
(3) prepared by sensitive surface active layer 3, prepares the P3HT:PCBM donor-receiver structure of one deck 40nm by the method for spin coating;
(4) sensitive surface transparent conductive film layer 4 preparation, transparent conductive film layer 4 adopts the method for magnetron sputtering to prepare ito thin film, and its thickness is 10nm;
(5) passivation layer 5 preparations, the method for passivation layer 5 use PECVD is prepared AlO x/ SiN xthe laminated construction of double-layer films, wherein AlO x/ SiN xthickness be respectively 20nm and 80nm;
(6) back metal electrode 6 preparations, back metal electrode 6 adopts silk screen printing Al metal electrode;
(7) front metal electrode prepares 7, and front metal electrode is prepared 7 employing silk screen printing Ag metal electrodes.
(8) low-temperature sintering, its temperature is 350 ℃, 2 minutes time.
In the situation that not affecting solar battery structure, preparation process can be done certain adjustment, for example, after first being prepared by sensitive surface structure, prepares shady face structure again, or sensitive surface is prepared the preparation of then carrying out shady face one step or multistep after a step or multistep.
By software silvaco-tcad analog result, show: the efficiency of this structure solar cell can reach 26.2%; And make the solar cell of this structure in laboratory, its open circuit voltage can reach 785mV, higher than the open circuit voltage of traditional heterojunction solar cell 729mV left and right, more higher than the open circuit voltage about traditional homojunction solar cell 640mV; The efficiency of estimating solar cell can reach more than 24%.The main thin film deposition part of this solar cell can be prepared by the method for spin coating, can reduce the vacuum equipment that heterojunction solar cell is used in preparation technology, has reduced equipment cost and technology difficulty.
Embodiment 2
With reference to Figure of description Fig. 1, its structure is: silicon substrate 1 sensitive surface is followed successively by resilient coating 2, active layer 3, transparent conductive film layer 4, and front metal electrode 7 is positioned on transparent conductive film layer 4; Shady face is coated with passivation layer 5, and back metal electrode 6 is connected with substrate through passivation layer 5, and crystal silicon substrate is p type single crystal silicon;
Main technological steps is:
(1) the traditional alkali formula of crystal silicon substrate 1 use process for etching carries out making herbs into wool;
(2) prepared by sensitive surface resilient coating 2, prepares the PEDOT:PSS film of one deck 50nm by the method for PECVD on substrate 1;
(3) prepared by sensitive surface active layer 3, prepares the P3HT:PCBM donor-receiver structure of one deck 80nm by the method for spin coating;
(4) sensitive surface transparent conductive film layer 4 preparation, transparent conductive film layer 4 adopts the method for magnetron sputtering to prepare ito thin film, and its thickness is 50nm;
(5) passivation layer 5 preparations, the method for passivation layer 5 use PECVD is prepared AlO x/ SiO 2the laminated construction of double-layer films, wherein AlO x/ SiO 2thickness be respectively 50nm and 70nm;
(6) back metal electrode 6 preparations, back metal electrode 6 adopts silk screen printing Al metal electrode;
(7) front metal electrode prepares 7, and front metal electrode is prepared 7 employing silk screen printing Ag metal electrodes.
(8) low-temperature sintering, its temperature is 200 ℃, 5 minutes time.
In the situation that not affecting solar battery structure, preparation process can be done certain adjustment, for example, after first being prepared by sensitive surface structure, prepares shady face structure again, or sensitive surface is prepared the preparation of then carrying out shady face one step or multistep after a step or multistep.
By software silvaco-tcad analog result, show: the efficiency of this structure solar cell can reach 25.4%; And make the solar cell of this structure in laboratory, its open circuit voltage can reach 778mV, higher than the open circuit voltage of traditional heterojunction solar cell 729mV left and right, more higher than the open circuit voltage about traditional homojunction solar cell 640mV; The efficiency of estimating solar cell can reach more than 24%.The main thin film deposition part of this solar cell can be prepared by the method for spin coating, can reduce the vacuum equipment that heterojunction solar cell is used in preparation technology, has reduced equipment cost and technology difficulty.

Claims (7)

1. a silica-based organic photovoltaic cell, is characterized in that, the sensitive surface of silicon substrate is followed successively by resilient coating, active layer, transparent conductive film layer, and wherein, front metal electrode is positioned on transparent conductive film layer; Shady face is coated with passivation layer, and back metal electrode is connected with silicon substrate through passivation layer.
2. a kind of silica-based organic photovoltaic cell according to claim 1, is characterized in that, the thickness range of resilient coating, active layer, transparent conductive film layer is 1 ~ 5000nm.
3. a kind of silica-based organic photovoltaic cell according to claim 1, is characterized in that, resilient coating is the above pellicular cascade structure of one deck, is ZnO, SiO 2, a kind of in ITO, PEDOT:PSS film.
4. a kind of silica-based organic photovoltaic cell according to claim 1, is characterized in that, active layer is the above pellicular cascade structure of one deck, is donor-receiver polymer or dye sensitization material film.
5. a kind of silica-based organic photovoltaic cell according to claim 4, is characterized in that, active layer is P3HT:PCBM donor-receiver pellicular cascade structure.
6. a kind of silica-based organic photovoltaic cell according to claim 1, is characterized in that, passivation layer is the above pellicular cascade structure of one deck, is SiO 2, SiN xor AlO xfilm.
7. a kind of silica-based organic photovoltaic cell according to claim 1, is characterized in that, transparent conductive film layer be one deck with the laminated construction of upper film, film is ITO, IZO or ZnO film.
CN201320795074.XU 2013-12-06 2013-12-06 Silicon-based organic solar cell Active CN203774376U (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103594630A (en) * 2013-12-06 2014-02-19 山东力诺太阳能电力股份有限公司 Silicon-based organic solar cell and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103594630A (en) * 2013-12-06 2014-02-19 山东力诺太阳能电力股份有限公司 Silicon-based organic solar cell and manufacturing method thereof
CN103594630B (en) * 2013-12-06 2016-03-30 山东力诺太阳能电力股份有限公司 A kind of silica-based organic photovoltaic cell and preparation method thereof

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