CN203672332U - Laser interference paraboloid symmetry measuring device - Google Patents

Laser interference paraboloid symmetry measuring device Download PDF

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Publication number
CN203672332U
CN203672332U CN201320569558.2U CN201320569558U CN203672332U CN 203672332 U CN203672332 U CN 203672332U CN 201320569558 U CN201320569558 U CN 201320569558U CN 203672332 U CN203672332 U CN 203672332U
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CN
China
Prior art keywords
mirror unit
screen
grating
laser
interference
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn - After Issue
Application number
CN201320569558.2U
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Chinese (zh)
Inventor
薛黎明
刘伯昂
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Rayspower Energy Group Co Ltd
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Rayspower Energy Group Co Ltd
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Filing date
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Application filed by Rayspower Energy Group Co Ltd filed Critical Rayspower Energy Group Co Ltd
Priority to CN201320569558.2U priority Critical patent/CN203672332U/en
Application granted granted Critical
Publication of CN203672332U publication Critical patent/CN203672332U/en
Withdrawn - After Issue legal-status Critical Current
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Abstract

The utility model discloses a laser interference paraboloid symmetry measuring device comprising a test carrying part and a detection part, wherein the test carrying part comprises a standard reflector unit and an intercepting screen used for receiving interference patterns, the detection part comprises an optical grating screen and a laser columnar light source fixed onto the optical grating screen, the laser columnar light source is arranged on a middle symmetry plane of the optical grating screen, a reflector unit to be measured and the standard reflector unit are symmetrically installed about the middle symmetry plane, a plurality of pairs of optical gratings which are parallel to one another and can be independently opened and be independently closed are arranged on the optical grating screen, one pair of optical gratings which are mutually symmetrical correspond to the same curvature fragments on the reflector unit to be measured and the standard reflector unit respectively, and a number of pairs of optical gratings which are mutually symmetrical correspond to different curvature fragments on mirror surfaces respectively in sequence. Due to the fact that a groove type parabolic reflector is employed and the principle of light reflection, light diffraction and light interference of two-slit interference is adopted, the purpose that errors of a curved surface are detected segment by segment through symmetric reflection is achieved.

Description

Laser interference parabola symmetrical measurement device
Technical field
The utility model relates to a kind of curved surface of reflector measurement mechanism, especially a kind of laser interference parabola symmetrical measurement device.
Background technology
As the solar electrical energy generation industry of the important component part of new forms of energy industry, condensing thermal power generation is the project with very large potentiality and economic technology competitive edge, and following development prospect is wide.The condenser mirror assembly of its device is use amount maximum in the equipment needed thereby of construction power house, in large-scale mirror assembly production run, how to make the online speed detecting and the speed manufacturing a finished product match, in not affecting production output, effectively improve the certified products sorting rate of whole system, become the key of problem.General curved surface inspection normally the generaI investigation of whole curved surface to be pointwise detect by the scanning of face, although when every one side is used not necessarily very long accumulative total to add up be mutually exactly temporal waste.
Utility model content
For prior art exist problem, the purpose of this utility model be to provide a kind of simple in structure, can utilize mirror unit symmetry to the unit laser interference parabola symmetrical measurement device that curved surface carries out manufacturing accuracy measurement piecemeal.
For achieving the above object, the utility model laser interference parabola symmetrical measurement device, comprise test equipped section and test section, wherein, test equipped section comprises standard reflection mirror unit and for receiving the intercepting screen of interference pattern, test section comprises grating screen and the laser column light source being fixed thereon, and laser column light source is arranged on the middle plane of symmetry of grating screen, and mirror unit to be measured and standard reflection mirror unit are also installed so that the middle plane of symmetry is symmetrical; Taking the middle plane of symmetry as symmetrical, on grating screen, be provided with some to the grating that is parallel to each other and can independently opens and closes, a pair of symmetrical grating corresponds respectively to curvature fragment identical on mirror unit to be measured, standard reflection mirror unit, some to symmetrical grating respectively successively corresponding to the different curvature fragment on minute surface; Each curvature fragment reflected light forms interference fringe or picture after seeing through grating on intercepting screen, judges according to the position of striped symmetry or picture, determines mirror unit to be measured and the standard reflection mirror unit Machining of Curved Surface error in same curvature fragment.
Further, described standard reflection mirror unit, mirror unit to be measured are all fixedly mounted on and on mirror support, form paraboloidal two the symmetrical reflection lobes of cylindricality.
Further, described grating screen is parallel to each other and is equipped on carrying platform with intercepting screen, and carrying platform can do three dimensions adjustment location.
Further, the setting of described laser column light source center overlaps with the focal axis of described standard reflection mirror unit, mirror unit to be measured, and its luminescent spectrum can be preset adjusting.
Further, described grating screen is set to extinction face towards the one side of described standard reflection mirror unit, the center line of described grating be arranged on described in the middle of in the plane of symmetry, area is greater than and covers catoptron opening.
Further, the raster density on emission spectrum, the described grating screen of described laser column light source and slit width, described grating screen are pressed the corresponding settings of principle condition such as two-slit interference, single slit diffraction and pinhole imaging system with the distance between described intercepting screen.
Further, described intercepting screen arranges several laser frequency spectrum power sensing unit towards a side of described grating screen, and the corresponding scale mark of arranging along the focal axis direction of groove type paraboloid that arranges.
Further, described measurement mechanism is arranged in darkroom and works.
Light reflection, diffraction and the principle of interference of the utility model application groove type paraboloid catoptron, two-slit interference, laser cylindrical wave produces parallel beam by two semi-symmetric mirror unit reflections, then by producing striped by slit being interfered and shielding to go up in intercepting on grating screen, distribute to judge the mirror unit to be measured difference of curved surface and standard piecemeal according to the symmetry of this provision and power, reflect to reach by symmetry the object that detects piecemeal wrap-around error.
Brief description of the drawings
Fig. 1 is the utility model cross-sectional view.
Embodiment
Below, with reference to accompanying drawing, the utility model is more fully illustrated, shown in the drawings of exemplary embodiment of the present utility model.But the utility model can be presented as multiple multi-form, and should not be construed as the exemplary embodiment that is confined to narrate here.But, these embodiment are provided, thereby make the utility model comprehensively with complete, and scope of the present utility model is fully conveyed to those of ordinary skill in the art.
For ease of explanation, here can use such as " on ", the space relative terms such as D score " left side " " right side ", the relation for element shown in key diagram or feature with respect to another element or feature.It should be understood that except the orientation shown in figure, spatial terminology is intended to comprise the different azimuth of device in using or operating.For example, if the device in figure is squeezed, be stated as the element that is positioned at other elements or feature D score will be positioned at other elements or feature " on ".Therefore, exemplary term D score can comprise upper and lower orientation both.Device can otherwise be located (90-degree rotation or be positioned at other orientation), and the relative explanation in space used here can correspondingly be explained.
As shown in Figure 1, the utility model laser interference parabola symmetrical measurement device, comprise test equipped section and test section, wherein, test equipped section comprises for the mirror support 2 of fixing mirror unit 4 to be measured, intercepts screen 9 and standard reflection mirror unit 8, while test in darkroom, standard reflection mirror unit 8 and mirror unit to be measured 4 are installed on respectively and on mirror support 2, form paraboloidal two the symmetrical reflection lobes of cylindricality.Test section comprises grating screen 7 and the laser column light source 3 being fixed thereon, and grating screen 7 is parallel to each other and is equipped on carrying platform 10 with the intercepting screen 9 that receives interference pattern, and carrying platform 10 can do three dimensions adjustment location.The center of laser column light source 3 overlaps with slot type catoptron focal axis, and its luminescent spectrum is set to default adjustable.
On grating screen 7 taking its center line as symmetrical, be provided with some to the grating 6 being parallel to each other and can independently open and close.A pair of symmetrical grating 6 corresponds respectively to curvature fragment identical on mirror unit 4 to be measured, standard reflection mirror unit 8.Some to symmetrical grating 6 respectively successively corresponding to the different curvature fragment on minute surface.Mirror unit 4 to be measured is also installed with the middle plane of symmetry 1 symmetry with standard reflection mirror unit 8.
In the time measuring, a pair of symmetrical grating 6 is opened simultaneously or closes simultaneously, thereby measure the Machining of Curved Surface situation of same curvature fragment on mirror unit 4 to be measured, standard reflection mirror unit 8, to obtain this curvature fragment Machining of Curved Surface error on mirror unit 4 to be measured.
Grating screen 7 is set to extinction face towards the one side of standard reflection mirror unit 8, and in the middle of the center line of grating screen 7 is arranged in the plane of symmetry 1, area is greater than and covers slot type catoptron opening.
Intercept screen 9, towards a side of grating screen 7, several laser frequency spectrum power sensing unit (not shown) are set, and the corresponding scale mark (not shown) of arranging along the focal axis direction of groove type paraboloid that arranges.
Principle of work of the present utility model and implementation process explanation: as shown in Figure 1, the utility model device is arranged at ground, darkroom 11.
The first step, standard reflection mirror unit 8 and mirror unit to be measured 4 are installed on respectively to mirror support 2 and form paraboloidal two the symmetrical reflection lobes of cylindricality, by adjusting carrying platform 10, make grating screen 7 and intercept the screen 9 middle planes of symmetry 1 perpendicular to two symmetrical reflection lobes;
Second step, opening laser column light source 3 adjusts luminous frequency spectrum and controls the successively opening and closing of grating 6 on grating screen 7, light (arrow 5) is reflected, through forming striped or imaging after grating screen 7 on intercepting screen 9 through standard reflection mirror unit 8 and mirror unit to be measured 4;
The 3rd step, observe the interference fringe or the picture that intercept on screen 9, position according to striped symmetry or picture judges, determine mirror unit 4 to be measured and the Machining of Curved Surface error of standard reflection mirror unit 8 in same curvature fragment, and detect successively the different curvature fragment on minute surface, detect by contrast successively, obtain the overall Machining of Curved Surface error of mirror unit 4 to be measured.

Claims (8)

1. laser interference parabola symmetrical measurement device, it is characterized in that, this measurement mechanism comprises test equipped section and test section, wherein, test equipped section comprises standard reflection mirror unit and for receiving the intercepting screen of interference pattern, test section comprises grating screen and the laser column light source being fixed thereon, and laser column light source is arranged on the middle plane of symmetry of grating screen, and mirror unit to be measured and standard reflection mirror unit are also installed so that the middle plane of symmetry is symmetrical; Taking the middle plane of symmetry as symmetrical, on grating screen, be provided with some to the grating that is parallel to each other and can independently opens and closes, a pair of symmetrical grating corresponds respectively to curvature fragment identical on mirror unit to be measured, standard reflection mirror unit, some to symmetrical grating respectively successively corresponding to the different curvature fragment on minute surface; Each curvature fragment reflected light forms interference fringe or picture after seeing through grating on intercepting screen, judges according to the position of striped symmetry or picture, determines mirror unit to be measured and the standard reflection mirror unit Machining of Curved Surface error in same curvature fragment.
2. laser interference parabola symmetrical measurement device as claimed in claim 1, is characterized in that, described standard reflection mirror unit, mirror unit to be measured are all fixedly mounted on and on mirror support, form paraboloidal two the symmetrical reflection lobes of cylindricality.
3. laser interference parabola symmetrical measurement device as claimed in claim 1, is characterized in that, described grating screen is parallel to each other and is equipped on carrying platform with intercepting screen, and carrying platform can do three dimensions adjustment location.
4. laser interference parabola symmetrical measurement device as claimed in claim 1, is characterized in that, the setting of described laser column light source center overlaps with the focal axis of described standard reflection mirror unit, mirror unit to be measured, and its luminescent spectrum can be preset adjusting.
5. laser interference parabola symmetrical measurement device as claimed in claim 1, it is characterized in that, described grating screen is set to extinction face towards the one side of described standard reflection mirror unit, the center line of described grating be arranged on described in the middle of in the plane of symmetry, area is greater than and covers catoptron opening.
6. laser interference parabola symmetrical measurement device as claimed in claim 1, it is characterized in that, the raster density on emission spectrum, the described grating screen of described laser column light source and slit width, described grating screen are pressed two-slit interference, single slit diffraction and the corresponding setting of pinhole imaging system principle condition with the distance between described intercepting screen.
7. laser interference parabola symmetrical measurement device as claimed in claim 1, it is characterized in that, described intercepting screen arranges several laser frequency spectrum power sensing unit towards a side of described grating screen, and the corresponding scale mark of arranging along the focal axis direction of groove type paraboloid that arranges.
8. laser interference parabola symmetrical measurement device as claimed in claim 1, is characterized in that, described measurement mechanism is arranged in darkroom works.
CN201320569558.2U 2013-09-13 2013-09-13 Laser interference paraboloid symmetry measuring device Withdrawn - After Issue CN203672332U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201320569558.2U CN203672332U (en) 2013-09-13 2013-09-13 Laser interference paraboloid symmetry measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201320569558.2U CN203672332U (en) 2013-09-13 2013-09-13 Laser interference paraboloid symmetry measuring device

Publications (1)

Publication Number Publication Date
CN203672332U true CN203672332U (en) 2014-06-25

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103499307A (en) * 2013-09-13 2014-01-08 中海阳能源集团股份有限公司 Paraboloid symmetry measuring device through laser interference
CN104730868A (en) * 2015-03-25 2015-06-24 中国科学院上海光学精密机械研究所 Large-diameter diffraction grating exposure device and manufacture method of large-diameter diffraction grating

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103499307A (en) * 2013-09-13 2014-01-08 中海阳能源集团股份有限公司 Paraboloid symmetry measuring device through laser interference
CN103499307B (en) * 2013-09-13 2016-04-06 中海阳能源集团股份有限公司 Laser interference parabola symmetrical measurement device
CN104730868A (en) * 2015-03-25 2015-06-24 中国科学院上海光学精密机械研究所 Large-diameter diffraction grating exposure device and manufacture method of large-diameter diffraction grating
CN104730868B (en) * 2015-03-25 2017-03-15 中国科学院上海光学精密机械研究所 Heavy caliber diffraction grating exposure device and the preparation method of heavy caliber diffraction grating

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C14 Grant of patent or utility model
AV01 Patent right actively abandoned

Granted publication date: 20140625

Effective date of abandoning: 20160406

C25 Abandonment of patent right or utility model to avoid double patenting