CN203284238U - 微涡旋高效澄清反应器 - Google Patents
微涡旋高效澄清反应器 Download PDFInfo
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- CN203284238U CN203284238U CN2012207109340U CN201220710934U CN203284238U CN 203284238 U CN203284238 U CN 203284238U CN 2012207109340 U CN2012207109340 U CN 2012207109340U CN 201220710934 U CN201220710934 U CN 201220710934U CN 203284238 U CN203284238 U CN 203284238U
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CN2012207109340U CN203284238U (zh) | 2012-12-21 | 2012-12-21 | 微涡旋高效澄清反应器 |
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CN2012207109340U CN203284238U (zh) | 2012-12-21 | 2012-12-21 | 微涡旋高效澄清反应器 |
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CN203284238U true CN203284238U (zh) | 2013-11-13 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103723856A (zh) * | 2013-12-13 | 2014-04-16 | 北京清大膜科膜技术有限公司 | 一种抄造废水闭路循环的方法与装置 |
CN103880131A (zh) * | 2012-12-21 | 2014-06-25 | 北京清大国华环保科技有限公司 | 一种微涡旋高效澄清反应器的方法与装置 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103880131A (zh) * | 2012-12-21 | 2014-06-25 | 北京清大国华环保科技有限公司 | 一种微涡旋高效澄清反应器的方法与装置 |
CN103723856A (zh) * | 2013-12-13 | 2014-04-16 | 北京清大膜科膜技术有限公司 | 一种抄造废水闭路循环的方法与装置 |
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Legal Events
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee | ||
CB03 | Change of inventor or designer information |
Inventor after: Chen Futai Inventor after: Fu Qiang Inventor after: Hao Fujin Inventor before: Chen Futai Inventor before: Ma Jingnan Inventor before: Fu Qiang Inventor before: Hao Fujin |
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COR | Change of bibliographic data | ||
CP01 | Change in the name or title of a patent holder |
Address after: 100085 C building, Ka Wah building, No. 9, 3rd Street, Beijing, Haidian District, C404 Patentee after: GO HIGHER ENVIRONMENT CO.,LTD. Address before: 100085 C building, Ka Wah building, No. 9, 3rd Street, Beijing, Haidian District, C404 Patentee before: BEIJING GOHIGHER ENVIRONMENTAL TECHNOLOGY CO.,LTD. |
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C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160316 Address after: 102200, No. 2, building 7, 2237 Chuangxin Road, Changping District science and Technology Park, Beijing Patentee after: BEIJING QINGDA GUOHUA FILM TECHNOLOGY CO.,LTD. Address before: 100085 C building, Ka Wah building, No. 9, 3rd Street, Beijing, Haidian District, C404 Patentee before: GO HIGHER ENVIRONMENT CO.,LTD. |
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CX01 | Expiry of patent term |
Granted publication date: 20131113 |
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CX01 | Expiry of patent term |