CN203065635U - Bottom enhanced cooling device - Google Patents
Bottom enhanced cooling device Download PDFInfo
- Publication number
- CN203065635U CN203065635U CN 201320011648 CN201320011648U CN203065635U CN 203065635 U CN203065635 U CN 203065635U CN 201320011648 CN201320011648 CN 201320011648 CN 201320011648 U CN201320011648 U CN 201320011648U CN 203065635 U CN203065635 U CN 203065635U
- Authority
- CN
- China
- Prior art keywords
- heat exchange
- cooling device
- graphite
- crucible
- exchange platform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Silicon Compounds (AREA)
Abstract
Description
技术领域 technical field
本实用新型涉及一种冷却装置,具体涉及一种底部增强冷却装置,其用于提高铸锭质量,进而改善电池转换效率,属于晶体硅铸造设备技术领域。 The utility model relates to a cooling device, in particular to a bottom enhanced cooling device, which is used to improve the quality of ingots and further improve the conversion efficiency of batteries, and belongs to the technical field of crystalline silicon casting equipment.
背景技术 Background technique
多晶硅铸锭以其低成本、高产出而广受光伏行业认可。但铸造过程中过多的缺陷和杂质存在,会影响了多晶硅电池的转换效率。因此,控制铸锭过程的热场,减少晶体缺陷和杂质,提高电池转换效率,已成为共同关注的问题。 Polysilicon ingots are widely recognized by the photovoltaic industry for their low cost and high output. However, excessive defects and impurities in the casting process will affect the conversion efficiency of polycrystalline silicon cells. Therefore, controlling the thermal field in the ingot casting process, reducing crystal defects and impurities, and improving battery conversion efficiency have become common concerns.
目前,普遍采用的热场控制方式主要是通过加热器功率调整和打开隔热层来实现的。但随着铸锭越来越趋向于大级别,以及准单晶铸造技术的应用,对热场控制的要求也越来越高。简单地依靠这两者调整,无法满足大硅锭内部的散热要求,更无法控制晶体生长取向,以减少晶体缺陷和杂质的沉积。 At present, the commonly used thermal field control method is mainly realized by adjusting the heater power and opening the heat insulation layer. However, as the ingot tends to be more and more large-scale, and the application of quasi-single crystal casting technology, the requirements for thermal field control are also getting higher and higher. Simply relying on these two adjustments cannot meet the heat dissipation requirements inside the large silicon ingot, let alone control the crystal growth orientation to reduce the deposition of crystal defects and impurities.
因此,为解决上述技术问题,确有必要提供一种底部增强冷却装置,以克服现有技术中的所述缺陷。 Therefore, in order to solve the above technical problems, it is indeed necessary to provide a bottom enhanced cooling device to overcome the above-mentioned defects in the prior art.
实用新型内容 Utility model content
本实用新型的目的在于提供一种结构简单、散热性能好的底部增强冷却装置,其解决了大硅锭内部散热难的问题。 The purpose of the utility model is to provide a bottom enhanced cooling device with simple structure and good heat dissipation performance, which solves the problem of difficult heat dissipation inside a large silicon ingot.
为实现上述目的,本实用新型采取的技术方案为:一种底部增强冷却装置,其包括石英坩埚、石墨坩埚、加热器、热交换台以及石墨立柱;其中,所述石英坩埚收容于石墨坩埚内;所述石墨坩埚置于热交换台上;所述加热器设置于石墨坩埚四周;所述石墨立柱与所述热交换台连接,并能将冷却气体送入热交换台。 In order to achieve the above object, the technical solution adopted by the utility model is: a bottom enhanced cooling device, which includes a quartz crucible, a graphite crucible, a heater, a heat exchange table and a graphite column; wherein, the quartz crucible is accommodated in the graphite crucible The graphite crucible is placed on the heat exchange table; the heater is arranged around the graphite crucible; the graphite column is connected with the heat exchange table, and can send cooling gas into the heat exchange table.
本实用新型的底部增强冷却装置进一步设置为:于所述热交换台的中心设有一中心孔,于所述热交换台的四个角上分别设有一开孔,所述中心孔和四个开孔分别与一石墨立柱连通。 The enhanced cooling device at the bottom of the present utility model is further set as follows: a central hole is provided in the center of the heat exchange platform, and an opening is respectively provided on the four corners of the heat exchange platform, and the central hole and the four openings The holes communicate with a graphite column respectively.
本实用新型的底部增强冷却装置进一步设置为:于所述热交换台上间隔设置有若干口字形槽,所述若干口字形槽相互连通。 The enhanced cooling device at the bottom of the present invention is further configured as follows: a plurality of zigzag grooves are arranged at intervals on the heat exchange platform, and the plurality of zigzag grooves communicate with each other.
本实用新型的底部增强冷却装置进一步设置为:其进一步包括一隔热笼;所述热交换台、石英坩埚、石墨坩埚、加热器均收容于隔热笼内。 The enhanced cooling device at the bottom of the utility model is further configured as follows: it further includes a heat insulation cage; the heat exchange table, quartz crucible, graphite crucible and heater are all accommodated in the heat insulation cage.
本实用新型的底部增强冷却装置还设置为:所述隔热笼收容于一真空炉体内,该真空炉体内通入一送气管。 The enhanced cooling device at the bottom of the present invention is further configured as follows: the heat insulation cage is accommodated in a vacuum furnace body, and an air supply pipe is passed into the vacuum furnace body.
与现有技术相比,本实用新型具有如下有益效果:本实用新型的底部增强冷却装置通过不同的散热冷却作用,控制固液界面形状,并在长晶初期提高过冷度,从而解决大硅锭内部散热难问题,以提高长晶质量。 Compared with the prior art, the utility model has the following beneficial effects: the bottom enhanced cooling device of the utility model controls the shape of the solid-liquid interface through different heat dissipation and cooling effects, and improves the supercooling degree in the initial stage of crystal growth, thereby solving the problem of large silicon Difficult heat dissipation inside the ingot to improve the quality of the crystal growth.
附图说明 Description of drawings
图1是本实用新型的底部增强冷却装置的结构示意图。 Fig. 1 is a structural schematic diagram of a bottom enhanced cooling device of the present invention.
图2是本实用新型的底部增强冷却装置的热交换台的示意图。 Fig. 2 is a schematic diagram of the heat exchange platform of the bottom enhanced cooling device of the present invention.
具体实施方式 Detailed ways
请参阅说明书附图1和附图2所示,本实用新型为一种底部增强冷却装置,其由石英坩埚1、石墨坩埚2、加热器3、热交换台4以及石墨立柱5等几部分组成。
Please refer to the accompanying
其中,所述石英坩埚1内装有硅料6,其收容于石墨坩埚2内并由石墨坩埚2保护。所述石墨坩埚2置于热交换台4上。
Wherein, the
所述加热器3设置于石墨坩埚2四周,其能对硅料6进行加热。
The
所述石墨立柱5与所述热交换台4连接,并能将冷却气体送入热交换台4。
The
进一步的,于所述热交换台4的中心设有一中心孔41,于所述热交换台4的四个角上分别设有一开孔42,所述中心孔41和四个开孔42分别与一石墨立柱5连通,使冷却气体可以进出热交换台4。于所述热交换台4上间隔设置有若干口字形槽43,所述若干口字形槽43相互连通,从而保证冷却气体由中心孔41进入,向四周开孔42流动,最终沿四周开孔42流出热交换台4,或者由开孔42进入热交换台4,气体向中心孔41流动,最终在中心孔41流出。
Further, a
本实用新型的底部增强冷却装置进一步包括一隔热笼7;所述热交换台4、石英坩埚1、石墨坩埚2、加热器3均收容于隔热笼7内。所述隔热笼7收容于一真空炉体8内,该真空炉体8内通入一送气管9。
The enhanced cooling device at the bottom of the utility model further includes a
本实用新型的底部增强冷却装置的冷却方法如下: The cooling method of the bottom enhanced cooling device of the present utility model is as follows:
1),籽晶熔化阶段:加热器3加热会使得加热过程中硅锭侧面温度要高于中心,籽晶四周熔化的会比中间快,为保持一致的熔化速率,将冷却气体从热交换台4的四周开孔42通入,携带部分热量的冷却气体进一步向热交换台4的中心孔41移动,最后由中心孔41流出,形成一个四周冷、中心热的温度梯度,来中和加热器3加热形成的侧面冷、中心热的凸界面;
1) Seed crystal melting stage: heating by
2),熔化结束后,由于硅锭内部的热量无法及时散失,而外壁加热器功率降低,形成侧面冷中心热的凹面,此时,由中心孔41位置充入冷却气体,逐渐向四周开孔42流出,形成反向的冷却作用;此外,由于初始长晶阶段较高的过冷度要求,冷却气体(氩气)的流量上也需要适当加大,即所述步骤2)的冷却气体通入流量大于步骤1)的冷却气体通入流量,以提高形核效率; 2) After melting, since the heat inside the silicon ingot cannot be dissipated in time, the power of the heater on the outer wall is reduced, forming a concave surface with a cold side and a hot center. 42 flows out to form a reverse cooling effect; in addition, due to the higher supercooling requirement in the initial crystal growth stage, the flow rate of the cooling gas (argon) also needs to be appropriately increased, that is, the cooling gas flow in step 2) The inflow rate is greater than the cooling gas inflow rate in step 1), to improve the nucleation efficiency;
3),完成初始形核之后,降低冷却气体流量,维持一个弱冷却作用散热,直至冷却结束。 3) After the initial nucleation is completed, reduce the cooling gas flow rate and maintain a weak cooling effect until the end of cooling.
以上的具体实施方式仅为本创作的较佳实施例,并不用以限制本创作,凡在本创作的精神及原则之内所做的任何修改、等同替换、改进等,均应包含在本创作的保护范围之内。 The specific implementation above is only a preferred embodiment of this creation, and is not intended to limit this creation. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of this creation should be included in this creation. within the scope of protection.
Claims (5)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320011648 CN203065635U (en) | 2013-01-10 | 2013-01-10 | Bottom enhanced cooling device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320011648 CN203065635U (en) | 2013-01-10 | 2013-01-10 | Bottom enhanced cooling device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203065635U true CN203065635U (en) | 2013-07-17 |
Family
ID=48764447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320011648 Expired - Fee Related CN203065635U (en) | 2013-01-10 | 2013-01-10 | Bottom enhanced cooling device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203065635U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103628127A (en) * | 2013-11-26 | 2014-03-12 | 江苏大学 | DSS (directional solidification system) quasi-monocrystal silicon growth furnace and growth method of quasi-monocrystal silicon |
| CN103924293A (en) * | 2013-01-10 | 2014-07-16 | 浙江精功科技股份有限公司 | Bottom-enhanced cooling device and cooling method |
| CN105586635A (en) * | 2016-01-20 | 2016-05-18 | 西安交通大学 | Device and method for rapid solidification of ingot |
-
2013
- 2013-01-10 CN CN 201320011648 patent/CN203065635U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103924293A (en) * | 2013-01-10 | 2014-07-16 | 浙江精功科技股份有限公司 | Bottom-enhanced cooling device and cooling method |
| CN103924293B (en) * | 2013-01-10 | 2016-03-16 | 浙江精功科技股份有限公司 | A kind of bottom strengthens refrigerating unit and method of cooling thereof |
| CN103628127A (en) * | 2013-11-26 | 2014-03-12 | 江苏大学 | DSS (directional solidification system) quasi-monocrystal silicon growth furnace and growth method of quasi-monocrystal silicon |
| CN105586635A (en) * | 2016-01-20 | 2016-05-18 | 西安交通大学 | Device and method for rapid solidification of ingot |
| CN105586635B (en) * | 2016-01-20 | 2018-07-17 | 西安交通大学 | A kind of device and method that ingot casting quickly solidifies |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103924293B (en) | A kind of bottom strengthens refrigerating unit and method of cooling thereof | |
| CN102268728B (en) | Heat exchange platform of improved structure for polycrystalline silicon ingot furnace | |
| CN102234837A (en) | Closed cooling system of gas cooled polysilicon ingot furnace | |
| CN204022995U (en) | A kind of novel ingot furnace thermal field structure | |
| CN102140673A (en) | Polycrystalline silicon ingot furnace heating device with separately controlled top and side | |
| JP2014527013A5 (en) | ||
| CN203065635U (en) | Bottom enhanced cooling device | |
| CN107794568A (en) | A kind of crystal oven for polycrystalline silicon casting ingot process | |
| CN202297866U (en) | Argon gas cooling device of polysilicon ingot furnace | |
| CN103628127A (en) | DSS (directional solidification system) quasi-monocrystal silicon growth furnace and growth method of quasi-monocrystal silicon | |
| CN202202019U (en) | Heat exchange platform for growing silicon crystals in casting process | |
| CN202247004U (en) | Heat exchange platform with improved structure for polycrystalline silicon ingot furnace | |
| CN207376139U (en) | Orient the energy-saving and high efficient polycrystalline silicon ingot or purifying furnace of water-cooling | |
| CN203049077U (en) | Circumference radial-type heat exchange platform for polycrystalline silicon ingot furnace | |
| CN203144557U (en) | Bidirectional enhanced gas cooling device in crystal growth device | |
| CN104389017A (en) | Internal inlet gas gas-cooling device of coagulation enhancing block of polycrystalline silicon ingot furnace and polycrystalline silicon ingot furnace | |
| CN203373447U (en) | There is seed crystal ingot casting crucible backplate device | |
| CN202090106U (en) | Air cooling device for polysilicon ingot furnace | |
| CN104372403B (en) | Heat insulation block for polysilicon ingot casting furnace and polysilicon ingot casting furnace comprising heat insulation block | |
| CN202022993U (en) | Heating device of polysilicon ingot furnace with split-control top | |
| CN204918849U (en) | Polycrystalline ingot furnace | |
| CN104404619A (en) | Polysilicon ingot furnace and coagulation aid block external admission air cooling device thereof | |
| CN205368538U (en) | Quartz crucible suitable for polycrystal casting fritting technology | |
| CN204265888U (en) | The heat insulation of polycrystalline silicon ingot or purifying furnace and comprise the polycrystalline silicon ingot or purifying furnace of this heat insulation | |
| CN202492615U (en) | Ingot furnace with low energy consumption thermal field structure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130717 Termination date: 20190110 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |