CN202936481U - Four-pipeline Kuttiler wet etching novel cover plate - Google Patents

Four-pipeline Kuttiler wet etching novel cover plate Download PDF

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Publication number
CN202936481U
CN202936481U CN 201220660373 CN201220660373U CN202936481U CN 202936481 U CN202936481 U CN 202936481U CN 201220660373 CN201220660373 CN 201220660373 CN 201220660373 U CN201220660373 U CN 201220660373U CN 202936481 U CN202936481 U CN 202936481U
Authority
CN
China
Prior art keywords
air draft
pipeline
solution
wet etching
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 201220660373
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Chinese (zh)
Inventor
许成德
陈冬维
肖培玉
闵祥波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIANGSU SOLARSPACE CO Ltd
Original Assignee
JIANGSU SOLARSPACE CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIANGSU SOLARSPACE CO Ltd filed Critical JIANGSU SOLARSPACE CO Ltd
Priority to CN 201220660373 priority Critical patent/CN202936481U/en
Application granted granted Critical
Publication of CN202936481U publication Critical patent/CN202936481U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

The utility model discloses a four-pipeline Kuttiler wet etching novel cover plate, which comprises an etching slot and four air draft pipelines, wherein the etching slot is internally filled with solution, the four air draft pipelines are mutually staggered, the mouths of all air draft pipelines are on the same plane, and a distance between the mouth of the pipeline toward the solution and the liquid level of the solution is 7-9cm. According to the four-pipeline Kuttiler wet etching novel cover plate, the air draft pipelines are additionally arranged, the distance between the air draft pipelines and the liquid level is shortened, and the problems of overlarge rising value of an etching square resistor and unstable air draft are solved.

Description

Four pipeline Al Kuts are strangled the wet etching blind flange
Technical field
The utility model relates to a kind of cover plate, and particularly four pipeline Al Kuts are strangled the wet etching blind flange.
Background technology
In the prior art, at present there are the RENA company, Suzhou KUTTLER company of German SCHMID company, Germany etc. in wet-method etching equipment manufacturers, wherein KUTTLER wet etching erosion insulation machine is compared same category of device and is had the advantages such as product appearance is good, also send one's regards to topic simultaneously, such as the large shortcoming of 1. etching sheet resistance rising value, 2. the unstable shortcoming of air-flow, 3. profile is not attractive in appearance.The exhausting system pipeline of the insulation of KUTTLER wet etching erosion originally machine has two, most acid gas in etching groove can't be taken away, (if do not taken away, can cause the square resistance rising value excessive to the slice, thin piece surface corrosion in cell body, affect electrical property.) the KUTTLER exhausting is unstable originally, can cause quarter to the slice, thin piece in cell body, affects electrical property.
The utility model content
For above-mentioned the deficiencies in the prior art part, the utility model provides four pipeline Al Kuts to strangle the wet etching blind flange, has effectively solved the problem that above-mentioned prior art exists.
To achieve these goals, the technical solution adopted in the utility model is: four pipeline Al Kuts are strangled the wet etching blind flange, comprise etching bath and air draft pipe, be provided with solution in etching bath, described air draft pipe is four, and position is interlaced, the pipeline opening of each air draft pipe is in same level, and the liquid level of the described pipeline opening towards solution and solution distance is 7-9cm.
As preferably: it is staggered that described each air draft pipe is high-low-position.
As preferably, the liquid level of the described pipeline opening towards solution and solution distance is 8cm.
Compared with prior art, the beneficial effect of this utility model: the distance that the utility model increases air draft pipe and reduces air draft pipe and liquid level can well solve etching square resistance rising value excessive with the exhausting unstable; The utility model is increased to 4 and arranging of staggering by air draft pipe, reduces the height of air draft pipe from liquid level.Exhausting pressure also is reduced in 70 left and right.Can well reduce square resistance (below 8), and improve the homogeneity of square resistance.
The accompanying drawing explanation
Fig. 1 the utility model structural representation.
Embodiment
Below in conjunction with drawings and the specific embodiments, the utility model is described in further detail.
Referring to Fig. 1, four pipeline Al Kuts are strangled the wet etching blind flange, comprise etching bath 2 and air draft pipe 1, in etching bath 2, are provided with solution, described air draft pipe 1 is four, and position is interlaced, in the present embodiment, it is staggered that described each air draft pipe 1 is high-low-position, the pipeline opening of each air draft pipe 1 is in same level, the liquid level distance of the described pipeline opening towards solution and solution is 7-9cm, and in the present embodiment, the liquid level of the described pipeline opening towards solution and solution distance is 8cm.
The utility model is by increasing air draft pipe 1 quantity and air draft pipe 1 being crisscross arranged, and the liquid level distance that reduces air draft pipe 1 and solution, makes new cover plate can reduce the fast resistance rising value in wet etching side (2-8), improves the sheet resistance homogeneity; Acid row exhausting pressure reduces to 1/3 of common process; The efficiency stepping obviously reduces, and the high effective flake ratio increases; The efficiency fluctuation caused due to the sheet resistance inequality obviously improves; In the constant situation of other processing condition, efficiency improves; Monolithic power promotes; The monolithic improved efficiency; Economic and Efficiency Analysis: after transformation, the lifting of cell piece efficiency of conversion, poor efficiency reduce.

Claims (3)

1. a pipeline Al Kut is strangled the wet etching blind flange, comprise etching bath and air draft pipe, be provided with solution in etching bath, it is characterized in that: described air draft pipe is four, and position is interlaced, the pipeline opening of each air draft pipe is in same level, and the liquid level of the described pipeline opening towards solution and solution distance is 7-9cm.
2. four pipeline Al Kuts according to claim 1 are strangled the wet etching blind flange, it is characterized in that: it is staggered that described each air draft pipe is high-low-position.
3. four pipeline Al Kuts according to claim 1 are strangled the wet etching blind flange, it is characterized in that: the liquid level distance of the described pipeline opening towards solution and solution is 8cm.
CN 201220660373 2012-12-05 2012-12-05 Four-pipeline Kuttiler wet etching novel cover plate Expired - Fee Related CN202936481U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 201220660373 CN202936481U (en) 2012-12-05 2012-12-05 Four-pipeline Kuttiler wet etching novel cover plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 201220660373 CN202936481U (en) 2012-12-05 2012-12-05 Four-pipeline Kuttiler wet etching novel cover plate

Publications (1)

Publication Number Publication Date
CN202936481U true CN202936481U (en) 2013-05-15

Family

ID=48320733

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 201220660373 Expired - Fee Related CN202936481U (en) 2012-12-05 2012-12-05 Four-pipeline Kuttiler wet etching novel cover plate

Country Status (1)

Country Link
CN (1) CN202936481U (en)

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Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130515

Termination date: 20161205