CN202855722U - Wet etching machine - Google Patents
Wet etching machine Download PDFInfo
- Publication number
- CN202855722U CN202855722U CN 201220393330 CN201220393330U CN202855722U CN 202855722 U CN202855722 U CN 202855722U CN 201220393330 CN201220393330 CN 201220393330 CN 201220393330 U CN201220393330 U CN 201220393330U CN 202855722 U CN202855722 U CN 202855722U
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- China
- Prior art keywords
- wet etching
- utility
- etching machine
- cell body
- model
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Abstract
The present utility model discloses a wet etching machine which has good using effects. The machine comprises a groove body, and transmission rollers arranged inside the groove, wherein axes of the transmission rollers are parallel, the diameter of a roller arranged on the middle part of the groove is smallest, and the diameter of the rollers increases gradually from the middle part to the two sides. The machine is suitable for wet etching of solar energy cell sheets.
Description
Technical field
The utility model relates to a kind of solar battery sheet manufacturing equipment, relates in particular to a kind of wet etching machine for the wet etching operation.
Background technology
The wet etching operation is arranged in the polysilicon solar cell manufacturing one, and the main purpose of this operation is to remove around the silicon chip and the PN junction of bottom.What general silicon chip erosion adopted is the form of roller transmission " Overwater-floating ", and each live roller diameter of conventional design is identical, has guaranteed the stability of transmission.But cause overflowing liquid owing to react aborning can blow at the silicon chip afterbody when bubble that produces discharges, make the etching effect on edge, silicon chip front and back produce very big-difference, if not adjusting, the liquid that overflows not damage positive PN junction, if reduce the liquid level of solution, silicon chip forward position disengaging liquid level causes carving obstructed, can not guarantee the effect of etching.
The utility model content
The technical problems to be solved in the utility model provides the good wet etching machine of a kind of result of use.
In order to solve the problems of the technologies described above, the utility model is achieved through the following technical solutions:
The utility model comprises cell body, is located at the live roller that axis is parallel to each other in the cell body, and the described roller diameter of being located in the middle of being positioned in the cell body is minimum, and is increased successively to both sides by the centre.
Because the roller in the utility model adopts diameter to increase successively design to both sides by the centre, can make the silicon chip front and back along meeting successively contact etching liquid during work, and can not guarantee etching effect in the dark liquid level maintenance long time, can not cause casual liquid simultaneously.
Description of drawings
Accompanying drawing is structural representation of the present utility model.
Embodiment
Below in conjunction with the drawings and the specific embodiments the utility model is described in further detail:
As shown in drawings: the utility model comprises cell body 1, is located at the live roller 2,3,5,6,7 that cell body 1 interior axis is parallel to each other, and roller 5 diameters of being located in the middle of being positioned in the cell body 1 are minimum, and is increased successively to both sides by the centre.
Claims (1)
1. a wet etching machine comprises cell body, is located at the live roller that axis is parallel to each other in the cell body, it is characterized in that the described roller diameter of being located in the middle of being positioned in the cell body is minimum, and is increased successively to both sides by the centre.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220393330 CN202855722U (en) | 2012-08-08 | 2012-08-08 | Wet etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201220393330 CN202855722U (en) | 2012-08-08 | 2012-08-08 | Wet etching machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN202855722U true CN202855722U (en) | 2013-04-03 |
Family
ID=47986890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201220393330 Expired - Fee Related CN202855722U (en) | 2012-08-08 | 2012-08-08 | Wet etching machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN202855722U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109801865A (en) * | 2019-02-01 | 2019-05-24 | 尚德太阳能电力有限公司 | Room temperature etching device and correlation method for cell piece |
-
2012
- 2012-08-08 CN CN 201220393330 patent/CN202855722U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109801865A (en) * | 2019-02-01 | 2019-05-24 | 尚德太阳能电力有限公司 | Room temperature etching device and correlation method for cell piece |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130403 Termination date: 20140808 |
|
| EXPY | Termination of patent right or utility model |