CN202212156U - Elevated tank feeding device for liquid crystal photosensitive material production - Google Patents

Elevated tank feeding device for liquid crystal photosensitive material production Download PDF

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Publication number
CN202212156U
CN202212156U CN2011202711090U CN201120271109U CN202212156U CN 202212156 U CN202212156 U CN 202212156U CN 2011202711090 U CN2011202711090 U CN 2011202711090U CN 201120271109 U CN201120271109 U CN 201120271109U CN 202212156 U CN202212156 U CN 202212156U
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CN
China
Prior art keywords
elevated tank
connector
interface
feeding device
photosensitive material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN2011202711090U
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Chinese (zh)
Inventor
马立国
张芳
邱白
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Individual
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Individual
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Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN2011202711090U priority Critical patent/CN202212156U/en
Application granted granted Critical
Publication of CN202212156U publication Critical patent/CN202212156U/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

An elevated tank feeding device for liquid crystal photosensitive material production comprises a feed port, a feed pipe and an exhaust port, wherein the feed port is arranged at the top end of an elevated tank; and the bottom end of the feed pipe is inserted in the feed port of the elevated tank. The elevated tank feeding device is characterized in that the elevated tank feeding device further comprises a three-way joint; the feed port is communicated with a first connector of the three-way joint; a second connector of the three-way joint is coaxial to the first connector; the feed pipe passes through the first connector and the second connector of the three-way joint; the end part of the second connector is sealed; and a third connector of the three-way joint is arranged as the exhaust port. The elevated tank feeding device for liquid crystal photosensitive material production has the beneficial effects that the material loss cannot be caused when the elevated tank is vacuumized and is kept under the negative pressure; the feeding efficiency is improved; and moreover, the structure is simple, and the use effect is ideal.

Description

The head tank feed arrangement is used in LCD photosensitive material production
Technical field
The utility model relates to LCD photosensitive material production and uses head tank, specifically is that the head tank feed arrangement is used in LCD photosensitive material production.
Background technology
At present; LCD photosensitive material production comprises charging aperture, feed pipe, bleeding point with the head tank feed arrangement; As shown in Figure 1, charging aperture 1 is arranged on the top of head tank 2, and insert in the charging aperture 1 feed pipe 3 bottoms; Bleeding point 4 is arranged on the head tank 2, and bleeding point 4 can be positioned at the below of feed pipe 3 bottoms like this.During work, vacuumize the maintenance negative pressure, can the material that flow out feed pipe 3 bottoms partly be siphoned away when vacuumizing, cause loss of material through 4 pairs of head tanks of bleeding point.
The utility model content
In order to overcome the shortcoming that above-mentioned prior art exists, the purpose of the utility model is to provide a kind of LCD photosensitive material production to use the head tank feed arrangement, and it can not cause loss of material when head tank vacuumizes the maintenance negative pressure.
For addressing the above problem; The utility model adopts following technical scheme: the head tank feed arrangement is used in this LCD photosensitive material production; Comprise charging aperture, feed pipe, bleeding point, said charging aperture is arranged on the top of head tank, and the bottom of said feed pipe is inserted in the head tank charging aperture; Also comprise a three-way connection, said charging aperture is communicated with first interface of this three-way connection, and second interface of three-way connection is coaxial with this first interface, and said feed pipe passes first interface, second interface of three-way connection, and the sealing of the second interface end; The 3rd interface of three-way connection is made as bleeding point.
The beneficial effect of the utility model is: it can not cause loss of material when head tank vacuumizes the maintenance negative pressure, charging efficient improves, and simple in structure, and result of use is desirable.
Description of drawings
Below in conjunction with accompanying drawing and embodiment the utility model is done further explanation:
Fig. 1 is the prior art constructions sketch map,
Fig. 2 is the structural representation of the utility model embodiment,
Among the figure: 1 charging aperture, 2 head tanks, 3 feed pipes, 4 bleeding points, 5 three-way connections, 51 first interfaces, 52 second interfaces, 53 the 3rd interfaces.
The specific embodiment
As shown in Figure 2, this LCD photosensitive material production mainly comprises charging aperture 1, feed pipe 3, bleeding point with the head tank feed arrangement, and said charging aperture 1 is arranged on the top of head tank 2, and the bottom of said feed pipe 3 is inserted in the charging aperture 1.
This LCD photosensitive material production also comprises a three-way connection 5 with the head tank feed arrangement; Said charging aperture 1 is communicated with first interface 51 of this three-way connection; Second interface 52 of three-way connection is coaxial with this first interface 51; Said feed pipe 3 passes first interface 51, second interface 52 of three-way connection, and the sealing of second interface, 52 ends; The 3rd interface 53 of three-way connection is made as bleeding point, is connected with vaccum-pumping equipment.
Because the 3rd interface 53 is positioned at the top of feed pipe 3 bottoms, so when vacuumizing the maintenance negative pressure, can not cause material to be siphoned away, thereby solve the problem of loss of material.
All the other technological same prior aries.

Claims (1)

1. the head tank feed arrangement is used in LCD photosensitive material production, comprises charging aperture, feed pipe, bleeding point, and said charging aperture is arranged on the top of head tank, and the bottom of said feed pipe is inserted in the head tank charging aperture; It is characterized in that: also comprise a three-way connection; Said charging aperture is communicated with first interface of this three-way connection; Second interface of three-way connection is coaxial with this first interface, and said feed pipe passes first interface, second interface of three-way connection, and the sealing of the second interface end; The 3rd interface of three-way connection is made as bleeding point.
CN2011202711090U 2011-07-28 2011-07-28 Elevated tank feeding device for liquid crystal photosensitive material production Expired - Fee Related CN202212156U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2011202711090U CN202212156U (en) 2011-07-28 2011-07-28 Elevated tank feeding device for liquid crystal photosensitive material production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011202711090U CN202212156U (en) 2011-07-28 2011-07-28 Elevated tank feeding device for liquid crystal photosensitive material production

Publications (1)

Publication Number Publication Date
CN202212156U true CN202212156U (en) 2012-05-09

Family

ID=46011428

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011202711090U Expired - Fee Related CN202212156U (en) 2011-07-28 2011-07-28 Elevated tank feeding device for liquid crystal photosensitive material production

Country Status (1)

Country Link
CN (1) CN202212156U (en)

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20120509

Termination date: 20140728

EXPY Termination of patent right or utility model