CN201762112U - Silicon core mounting device of reducing furnace - Google Patents
Silicon core mounting device of reducing furnace Download PDFInfo
- Publication number
- CN201762112U CN201762112U CN2010205141997U CN201020514199U CN201762112U CN 201762112 U CN201762112 U CN 201762112U CN 2010205141997 U CN2010205141997 U CN 2010205141997U CN 201020514199 U CN201020514199 U CN 201020514199U CN 201762112 U CN201762112 U CN 201762112U
- Authority
- CN
- China
- Prior art keywords
- silicon core
- silicon
- support circle
- supporting
- adjustment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Silicon Compounds (AREA)
Abstract
The utility model provides a silicon core mounting device of reducing furnace, which comprises two inner supporting rings, two middle supporting rings, two outer supporting rings, connecting ribs and silicon core adjustment clamps. The inner supporting rings, the middle supporting rings and the outer supporting rings respectively have a size which is same with that of an inner ring, a middle ring and an outer ring of the reducing furnace chassis. The two inner supporting rings are connected with each other through more than two connecting ribs with same length, and so are the two middle supporting rings and the two outer supporting rings. The silicon core adjustment clamps are provided on an inner upper supporting ring, a middle upper supporting ring and an outer upper supporting ring. The number and arrangement of the silicon core adjustment clamps are same with those of graphite chucks on the reducing furnace chassis, so when the device is applied for equipping the silicon cores, one silicon adjustment clap is right above each graphite chuck. One graphite chuck and one silicon core adjustment clamp which is equipped correspondingly with the graphite chuck are used for inserting one silicon core and fixing the silicon core. The verticality of the silicon core to the reducing furnace chassis is ensured.
Description
Technical field
The utility model relates to technical field of polysilicon production, relates to a kind of reduction furnace silicon core erecting device in particular.
Background technology
Polysilicon is the direct material of manufacture order crystal silicon, is the electronics and information infrastructure material of semiconducter device such as contemporary artificial intelligence, control automatically, information processing, opto-electronic conversion.The method of producing polysilicon in the world mainly contains improvement Siemens Method, silane thermal decomposition process, fluidized bed process, metallurgy method etc., and wherein most widely used is the improvement Siemens Method.The typical process flow of improvement Siemens Method is that industrial silica fume and hydrogenchloride (HCl) gas reaction are generated trichlorosilane (SiHCl
3), through the vaporization of rectification and purification post-heating, with hydrogen (H
2) mix the back by a certain percentage and feed bell-jar Siemens reactor (reduction furnace), the silicon wicking surface reaction red-hot in energising generates silicon and deposition, finally grows into the silicon rod that diameter is 120～180mm.
Referring to Fig. 1 and Fig. 2, Fig. 1 is the synoptic diagram of reduction furnace, and Fig. 2 is the synoptic diagram on 18 groups of silicon core reduction furnace chassis.
Reduction furnace comprises reduction furnace chassis 20 and reduction furnace bell jar 21.Reduction furnace usually adopts 18 or 24 groups of silicon cores, reduction furnace chassis 20 be interior, in, outer three circles distribute, in 18 groups of silicon core reduction furnaces, in, the outer ring is respectively 3 pairs, 6 pairs, 9 pairs, in 24 groups of silicon core reduction furnaces, in, the outer ring then is respectively 4 pairs, 8 pairs, 12 pairs.Reduction furnace chassis 20 is provided with a plurality of graphite chuck 8, and the quantity of graphite chuck 8 is identical with silicon core quantity.Figure 2 shows that the chassis of 18 groups of silicon core reduction furnaces.
In this technology, form " ∏ " shape with the vertical silicon core in chassis and the one silicon core (crossbeam) parallel for two with the chassis, be called one group of silicon core, can constitute independent current circuit.Can place many group silicon cores in the reduction furnace.The silicon core must closely be connected with the graphite chuck on Siemens reactor (reduction furnace) chassis, to obtain the excellent contact face, could guarantee that electric current can evenly pass through.Simultaneously, guarantee the verticality of two vertical silicon cores, prevent to cause silicon core group to skew in the blow-on stage air turbulence of supplying gas for the reduction furnace chassis, and the depositional phase along with increasing of silicon core diameter is thick, centre-of gravity shift causes down rod, causes financial loss and causes damage to equipment.
Present domestic improvement Siemens process polycrystalline silicon manufacturer adopts artificial visually examine's mode that the silicon core is installed, and the verticality that the dependence experience is installed the silicon core is judged and adjusted.Every group of silicon core is installed to be needed 3 people to cooperate simultaneously just to finish at least, promptly a people inserts vertical silicon core graphite chuck on the reduction furnace chassis and is responsible for helping the silicon core, another people adjusts the verticality of silicon core according to the range estimation commander, the third party is responsible for the graphite chuck of clamping silicon core is tightened, make graphite chuck and silicon core keep well contacting, guarantee the vertical of silicon core and chassis as possible.This vision that relies on the people fully and experience etc. have the factor of strong subjectivity and carry out the mode that the silicon core is installed, and the verticality of silicon core can not be guaranteed, and cause down excellently easily, cause unnecessary financial loss to enterprise.
The utility model content
In view of this, the utility model provides a kind of reduction furnace silicon core erecting device, uses this device and makes the silicon core can be strictly perpendicular to the reduction furnace chassis.
For achieving the above object, the utility model provides following technical scheme:
A kind of reduction furnace silicon core erecting device comprises two interior supporting cups, two middle supporting cups, two outer supporting cups, dowel, and the silicon core is adjusted anchor clamps;
Two described in, domestic and abroad supporting cup respectively with the reduction furnace chassis interior, in, the outer ring big or small identical, two described interior, domestic and abroad supporting cups and the parallel placement in reduction furnace chassis, two described between the supporting cups, two continuous by the identical described dowels of two above length respectively between the supporting cup, between two described outer supporting cups in described, the length of described dowel is slightly less than the length of silicon core;
Two described interior supporting cups are respectively interior upper support circle and interior lower support circle, and two described middle supporting cups are respectively middle upper support circle and middle lower support circle, and two described outer supporting cups are respectively outer upper support circle and outer lower support circle;
Described silicon core adjust anchor clamps be arranged on described in the upper support circle, described on the upper support circle, described outer upper support circle, the quantity of graphite chuck is identical on the quantity of described silicon core adjustment anchor clamps and the reduction furnace chassis; Described silicon core is adjusted the distribution of anchor clamps corresponding to the distribution of described graphite chuck on the reduction furnace chassis, when making that using described device installs the silicon core, all have silicon core to adjust anchor clamps directly over each graphite chuck, graphite chuck and with the silicon core adjustment anchor clamps of the corresponding setting of described graphite chuck in order to insert a silicon core and the silicon core fixed.
Wherein, described silicon core adjustment anchor clamps comprise snap ring, adjust the top; Described snap ring is a ring texture, is fixedly connected on interior upper support circle or middle upper support circle or the outer upper support circle; Described adjustment top is connected by a screw mechanism with described snap ring sidewall, described screw mechanism can make described adjustment top flexible along the disc radius of described snap ring, also can fix described adjustment top, each silicon core is adjusted anchor clamps and is had adjustment top more than two.
Wherein, described adjustment comes directly towards and comprises arc-like sheet and support bar; Described support bar passes the sidewall of described snap ring, and described support bar is connected by described screw mechanism with the sidewall of snap ring; The radian of described arc-like sheet cooperates the radian of silicon wicking surface, and the one side of described arc-like sheet is fitted with the silicon wicking surface, and another side is fixedlyed connected with described support bar.
Wherein, scribble on described arc-like sheet and the face that the silicon core contacts and have the contaminated inner lining material of the silicon of preventing core.
Preferably, this device also comprises 3 above adjustment racks and silicon core squareness measurement utensil;
The two ends of at least one described adjustment rack respectively with two described in supporting cups for being slidingly connected, the two ends of at least one described adjustment rack respectively with two described in supporting cups for being slidingly connected, the two ends of at least one described adjustment rack respectively with two described outer supporting cups for being slidingly connected, described adjustment rack strictness perpendicular in described, the face at domestic and abroad supporting cup place, respectively two described in, cylinder slip between the domestic and abroad supporting cup; Fixedly connectedly on each described adjustment rack be no less than two described silicon core squareness measurement utensils, be used to measure the distance of silicon core and described adjustment rack.
Wherein, described silicon core squareness measurement utensil comprises graduated scale, dial indicator, measuring junction, graduated scale bracing frame; One end of described graduated scale is fixedlyed connected with described graduated scale bracing frame, the other end is connected with described measuring junction, described graduated scale can stretch, can promote measuring junction during stretching, extension and arrive silicon core position, measure the distance of silicon core and adjustment rack, described dial indicator is arranged on an end of graduated scale bracing frame, in order to identify the data value that graduated scale obtains when measuring.
Wherein, the measuring junction of described silicon core squareness measurement utensil is one to bend to arcual flap, in order to the radian of applying silicon wicking surface.
Wherein, the one side that described measuring junction contacts with the silicon core scribbles has the contaminated inner lining material of the silicon of preventing core, and another side is connected with described graduated scale.
Wherein, described inner lining material is urethane or tetrafluoroethylene or polypropylene.
Wherein, the number of described adjustment rack that is connected in described outer supporting cup is more than the number of the described adjustment rack of supporting cup in being connected in, be connected in described in supporting cup adjustment rack number more than be connected in described in the number of described adjustment rack of supporting cup.
Via above-mentioned technical scheme as can be known, compared with prior art, the utility model discloses a kind of reduction furnace silicon core erecting device, this device constitutes basic support frame by six supporting cups and several dowels, and adjusts anchor clamps at the silicon core corresponding with the graphite chuck on being positioned at the reduction furnace chassis of setting on the supporting cup.When using described device the silicon core being installed, all there is a silicon core to adjust anchor clamps directly over each graphite chuck, graphite chuck and adjust anchor clamps in order to insert a silicon core and the silicon core is fixed with the silicon core of the corresponding setting of described graphite chuck, thereby guarantee that the silicon core that inserts wherein can be accurately perpendicular to the reduction furnace chassis, has objectivity, avoid the influence of people's subjective factor such as the collimation error, experience, make the silicon core stricter perpendicular to the reduction furnace chassis.
Description of drawings
In order to be illustrated more clearly in the utility model embodiment or technical scheme of the prior art, to do to introduce simply to the accompanying drawing of required use in embodiment or the description of the Prior Art below, apparently, accompanying drawing in describing below only is embodiment of the present utility model, for those of ordinary skills, under the prerequisite of not paying creative work, can also obtain other accompanying drawing according to the accompanying drawing that provides.
Fig. 1 is the synoptic diagram of reduction furnace;
Fig. 2 is the synoptic diagram on 18 groups of silicon core reduction furnace chassis;
Fig. 3 is the synoptic diagram of reduction furnace silicon core erecting device;
Fig. 4 is the layout that the silicon core of reduction furnace silicon core erecting device is adjusted anchor clamps;
Fig. 5 adjusts the synoptic diagram of anchor clamps for the silicon core;
Fig. 6 is the synoptic diagram of silicon core squareness measurement utensil;
Fig. 7 is for installing the synoptic diagram of inner ring silicon core.
Embodiment
Below in conjunction with the accompanying drawing among the utility model embodiment, the technical scheme among the utility model embodiment is clearly and completely described, obviously, described embodiment only is the utility model part embodiment, rather than whole embodiment.Based on the embodiment in the utility model, those of ordinary skills are not making the every other embodiment that is obtained under the creative work prerequisite, all belong to the scope of the utility model protection.
The utility model embodiment discloses a kind of reduction furnace silicon core erecting device.
Present embodiment serves as that detailed description is done to the technical solution of the utility model in the basis with the reduction furnace of 18 groups of silicon cores, unintelligiblely only can be applied in the reduction furnace of 18 groups of silicon cores for the technical solution of the utility model.Because reduction furnace is a horizontal positioned mostly in actual production, it is horizontal positioned that following embodiment gives tacit consent to reduction furnace.
Referring to Fig. 3 and Fig. 4, Fig. 3 is the synoptic diagram of reduction furnace silicon core erecting device, and Fig. 4 is the layout that the silicon core of reduction furnace silicon core erecting device is adjusted anchor clamps.Reduction furnace silicon core erecting device comprises: interior coil apparatus, middle coil apparatus, peripheral equipment.
Peripheral equipment comprises outer upper support circle 10, outer lower support circle 2, and dowel 9, the silicon core is adjusted anchor clamps 1, adjustment rack 7 and silicon core squareness measurement utensil 6.
Outer upper support circle 10 and outer lower support circle 2 all are rigid circle shape structure, and size is identical with the outer ring on reduction furnace chassis.On respectively fixedly connected circle of upper support outside 10 in the two ends of dowel 9 and the outer lower support circle 2.Outer upper support circle 10 and outer lower support circle 2 be horizontal positioned all.Dowel 9 and outer upper support circle 10 and outer lower support circle 2 constitute cylindrical-shaped structure, are the basic frameworks of peripheral equipment, play the effect of carrying and support miscellaneous part.The plane at dowel 9 and outer upper support circle 10 places and the plane at outer lower support circle 2 places are all strict vertical, and promptly dowel 9 is vertical with horizontal plane.The bar number of the dowel 9 of peripheral equipment is fixing, outside guaranteeing to support and fix upper support circle 10 with outside under the prerequisite of lower support circle 2, can be by the bar number of those skilled in the art's concrete decision dowel 9 in actually operating.
Referring to Fig. 5, Fig. 5 adjusts the synoptic diagram of anchor clamps 1 for the silicon core.The silicon core is adjusted anchor clamps 1 and is comprised snap ring 13, adjusts top 15 and urethane liner 14 compositions.Each silicon core is adjusted anchor clamps 1 and is had three and adjust top 15, adjusts top 15 and is made up of arc-like sheet and support bar, and urethane liner 14 is coated on the arc-like sheet.Urethane is anti-pollution material, can prevent the contaminating impurity silicon core on the arc-like sheet.The arc that scribbles urethane liner 14 on the arc-like sheet can be fitted with the surface of silicon core 5.The support bar of adjusting top 15 passes the sidewall of snap ring 13, is connected by screw mechanism with snap ring 13.It is flexible by a small margin along the disc radial direction of snap ring 13 that this screw mechanism can realize adjusting top 15, and can screw with the fixing top 15 of adjusting after adjusting the suitable position of top 15 arrival.
The technical program is at the reduction furnace of 18 groups of silicon cores, peripheral equipment is provided with 18 silicon cores and adjusts anchor clamps 1, the silicon core is adjusted on the anchor clamps 1 fixedly connected circle of upper support outside 10, concrete mode of connection is adjusted the snap ring 13 of anchor clamps 1 for the silicon core the position of adjustment top 15 below of sidewall is welded on the outer upper support circle 10, and 18 silicon core adjustment anchor clamps 1 uniform distribution on the upper support circle 10 outside.The silicon core is adjusted anchor clamps 1 and is mainly used in the verticality of adjusting silicon core 5, and silicon core 5 inserts the hollow space that the silicon core is adjusted the snap ring 13 of anchor clamps 1 during operation, adjusts between the top 15 at three.
The length of adjustment rack 7 is similar to dowel 9, and the two ends of adjustment rack 7 also connect outer upper support circle 10 and outer lower support circle 2 respectively, and adjustment rack 7 is strict vertical with horizontal plane, and promptly adjustment rack 7 is parallel with dowel 9.Different with dowel 9 is, adjustment rack 7 is to be slidingly connected with outer upper support circle 10 and outer lower support circle 2, makes the adjustment rack 7 interior slip of virtual cylinder formed of upper support circle 10 and outer lower support circle 2 outside.
Referring to Fig. 6, Fig. 6 is the synoptic diagram of silicon core squareness measurement utensil.Silicon core squareness measurement utensil 6 comprises graduated scale 16, dial indicator 17, liner urethane measuring junction 18, graduated scale bracing frame 19.Liner urethane measuring junction 18 is an arc sheet structure, and one side scribbles urethane, and urethane plays anti-pollution equally, and the radian that scribbles the one side of urethane can be fitted the surface of itself and silicon core 5; Another side is not coated with urethane, fixedlys connected with an end of graduated scale 16.Graduated scale 16 places in the graduated scale bracing frame 19, and graduated scale 16 and graduated scale bracing frame 19 are for being slidingly connected, and graduated scale 16 can stretch.End near liner urethane 18 on the graduated scale bracing frame 19 is provided with dial indicator 17, in order to identify the distance that graduated scale 16 stretches out.
The graduated scale bracing frame 19 of silicon core squareness measurement utensil 6 is welded on the adjustment rack 7, Figure 1 shows that to be provided with 6,3 silicon cores of 3 silicon core squareness measurement utensils squareness measurement utensil 6 uniform distribution on adjustment rack 7 on the adjustment rack 7 of peripheral equipment.Can be in actually operating by the number of those skilled in the art according to the silicon core squareness measurement utensil 6 on the practical situation decision adjustment rack 7.
Silicon core squareness measurement utensil 6 is used to measure the distance of silicon core 5 and adjustment rack 7, if the unanimity as a result that 3 silicon core squareness measurement utensils 6 are measured, illustrate that silicon core 5 this moment is parallel with adjustment rack 7, because adjustment rack 7 strictnesses are perpendicular to horizontal plane, so silicon core 5 also is vertical.When the measured distance of 3 silicon core squareness measurement utensils 6 is inconsistent, illustrate that then the silicon core is not parallel with adjustment rack 75 this moments, also just be not orthogonal to horizontal plane.
The measurement of the verticality of silicon core 5 prerequisite accurately is: adjustment rack 7 strictnesses are perpendicular to horizontal plane, and the accuracy of silicon core squareness measurement utensil 6 is higher.Because adjustment rack 7 and outer upper support circle 10 and outer lower support circle 2 be for being slidingly connected, adjustment rack 7 is slip between upper support circle 10 and the outer lower support circle 2 outside, so can measure the silicon core 5 of any one position on the peripheral equipment.
The size of middle upper support circle 11 and middle lower support circle 4 is identical with the centre circle on reduction furnace chassis, and girth is all less than outer upper support circle 10 and outer lower support circle 2.The annexation of middle upper support circle 11 and middle lower support circle 4 and dowel 9 is with the annexation of outer upper support circle 10 and the outer lower support circle 2 and the dowel 9 of peripheral equipment.Bar number the lacking of the dowel 9 of middle coil apparatus than peripheral equipment.
The number that the silicon core of middle coil apparatus is adjusted anchor clamps 1 is 12, also is to be welded on the middle upper support circle 11 by snap ring 13.
Middle coil apparatus also is provided with adjustment rack 7 and squareness measurement utensil 6.The annexation of adjustment rack 7 and squareness measurement utensil 6 and middle upper support circle 11 and middle lower support circle 4 is with reference to peripheral equipment.
Interior coil apparatus comprises interior upper support circle 12, interior lower support circle 3, and dowel 9, the silicon core is adjusted anchor clamps 1, adjustment rack 7, silicon core squareness measurement utensil 6 (having omitted the adjustment rack 7 and the squareness measurement utensil 6 of middle coil apparatus among Fig. 3 in order to know the display graphics lines).
The structure setting of interior coil apparatus is similar to peripheral equipment and middle coil apparatus, and the annexation of each parts of interior coil apparatus is with reference to peripheral equipment.Difference is, the size of interior upper support circle 12 and interior lower support circle 3 is identical with the inner ring on reduction furnace chassis, girth is all less than the middle upper support circle 11 and the middle lower support circle 4 of middle coil apparatus, and the number that the silicon core of interior coil apparatus is adjusted anchor clamps 1 is 6, the bar number of dowel 9 than in coil apparatus lack.
Clearly can increase the quantity of adjustment rack 7 and silicon core squareness measurement utensil 6 according to demand of practical production, for example, can 3 adjustment racks 7 be set, 3 silicon core squareness measurement utensils 6 are set respectively on 3 adjustment racks 7 at interior coil apparatus.Centre circle is provided with 6 adjustment racks 7, and the outer ring is provided with 9 adjustment racks, and is equipped with corresponding silicon core squareness measurement utensil 6.
The inner lining material that wherein has anti-pollution is not limited only to urethane, can also be the material that tetrafluoroethylene polypropylene etc. can play anti-pollution.
Referring to Fig. 2, Fig. 3 and Fig. 7, Fig. 7 is for installing the synoptic diagram of inner ring silicon core.
The layout of graphite chuck 8 on reduction furnace chassis 20 is identical with the layout that silicon core shown in Figure 2 is adjusted anchor clamps 1, it is according to the number of the graphite chuck on the reduction furnace chassis 20 8 and layout decision that the silicon core is adjusted anchor clamps 1, all has corresponding with it silicon core to adjust anchor clamps 1 directly over each graphite chuck 8.In order to show the shape on reduction furnace chassis 20, only shown the part graphite chuck 8 of inner ring position among Fig. 7.
When silicon core 5 is installed, interior coil apparatus is placed inner ring position corresponding on the reduction furnace chassis 20, silicon core 5 is vertically inserted the silicon core that is installed on the interior upper support circle adjust in the anchor clamps 1, inject again in the vertical hole of graphite chuck 8 downwards then.This moment, graphite chuck 8 should be in non-tight condition, so that silicon core 5 inserts.Utilize three silicon core squareness measurement utensils 6 on the adjustment rack 7 to measure the distance of silicon cores 5 and adjustment rack 7, if three take off data is identical or difference is small, then tighten graphite chuck 8.
If three take off data differences are more obvious, then according to the data results of measuring, judge the vergence direction of silicon core 5, then adjustment top 15 corresponding with this direction or that close on is adjusted, this moment, urethane liner 14 contacted with silicon core 5, more can prevent contaminating impurity silicon core 5 than the adjustment manually of prior art.Measure again after the adjustment,, then continue to adjust top 15, until the take off data unanimity of three silicon core squareness measurement utensils 6 if the data results that records is still inconsistent.If inconsistent, then continue to adjust.
After the take off data unanimity, screw and adjust top 15, prevent that promptly silicon core 5 rocks before graphite chuck 8 is tightened, tighten graphite chuck 8 then, after graphite chuck 8 is tightened, unscrew and adjust top 15, finish the installation of a silicon core 5 this moment.
All the other silicon cores 5 of inner ring position can be installed with reference to aforesaid method, only need adjustment rack 7 is moved to the position close with the silicon core that is about to install 5, so that measure.
After the silicon core 5 of inner ring position all fixes, interior coil apparatus is vertically taken out from bottom to up, will have the careful top of inserting vertical silicon core 5 of silicon core crossbeam of aperture, form " ∏ " shape.After the silicon core crossbeam of inner ring was all inserted well, the silicon core 5 of inner ring position installed.
Middle coil apparatus is positioned over centre circle position corresponding on the reduction furnace chassis 20, the silicon core 5 of centre circle position is installed with reference to above-mentioned installation method then.After the silicon core 5 of centre circle position installs, peripheral equipment is placed into position, outer ring corresponding on the reduction furnace domain 20, same then installation method with reference to inner ring position silicon core 5, after position, outer ring silicon core 5 all fixed, take out peripheral equipment, insert silicon core crossbeam, so far all silicon core 5 installs.
Reduction furnace bell jar 21 is transferred on the reduction furnace chassis 20, just can carry out the concrete reaction process of siemens's improved method.
Existing artificial visually examine's mounting means only relies on vision and experience that the verticality of silicon core is adjusted, has certain blindness, and the device that application the utility model provides can be adjusted silicon core verticality targetedly according to take off data, more objective, more effective, also more accurate, thus effectively prevent to cause silicon core group to skew in the blow-on stage air turbulence of supplying gas, and the depositional phase along with increasing of silicon core diameter is thick, centre-of gravity shift causes down excellent.
The installation of every group of silicon core of existing manual type needs 5 minutes approximately, needs three personal synergics just can finish.And the operating space is limit, and every stove can only hold about 6 people simultaneously the silicon core is installed, and then every stove is installed required time and is about 45 minutes to 60 minutes, adds that the silicon core checks about 10 minutes clock times, and every stove silicon core adds up to the settling time to need 55 minutes and 70 minutes approximately.Because it is to carry out in the open environment in workshop that the silicon core is installed, exposure can cause the silicon core by the contaminating impurities such as minuteness particle in the environment so for a long time, has reduced production efficiency, also influences end product quality.And the device that application the utility model provides can be finished the installation of one group of silicon core by a people, therefore can organize the installation of silicon core more and carry out simultaneously.So improved installation effectiveness, thereby reduced the time that silicon core 5 exposes in air, reduced silicon core 5 contaminated probabilities.
The utility model provides a kind of reduction furnace silicon core erecting device, the foregoing description is that example is described in detail technical scheme with the reduction furnace of 18 groups of silicon cores only, and the acquiescence reduction furnace is a horizontal positioned, if the situation of the non-horizontal positioned of reduction furnace occurs, then each supporting cup all is parallel to 20 placements of reduction furnace chassis.Clearly the technical program can be applicable to use siemens's improved method to produce in the reduction furnace of any model of polysilicon, and the device that provides based on the utility model is conceived substantially and the quantity of each parts done change or other do not have creationary change all should belong to protection domain of the present utility model.
To the above-mentioned explanation of the disclosed embodiments, make this area professional and technical personnel can realize or use the utility model.Multiple modification to these embodiment will be conspicuous concerning those skilled in the art, and defined herein General Principle can realize under the situation that does not break away from spirit or scope of the present utility model in other embodiments.Therefore, the utility model will can not be restricted to these embodiment shown in this article, but will meet and principle disclosed herein and features of novelty the wideest corresponding to scope.
Claims (10)
1. a reduction furnace silicon core erecting device is characterized in that, comprises two interior supporting cups, two middle supporting cups, two outer supporting cups, dowel, and the silicon core is adjusted anchor clamps;
Two described in, domestic and abroad supporting cup respectively with the reduction furnace chassis interior, in, the outer ring big or small identical, two described interior, domestic and abroad supporting cups and the parallel placement in reduction furnace chassis, two described between the supporting cups, two continuous by the identical described dowels of two above length respectively between the supporting cup, between two described outer supporting cups in described, the length of described dowel is slightly less than the length of silicon core;
Two described interior supporting cups are respectively interior upper support circle and interior lower support circle, and two described middle supporting cups are respectively middle upper support circle and middle lower support circle, and two described outer supporting cups are respectively outer upper support circle and outer lower support circle;
Described silicon core adjust anchor clamps be arranged on described in the upper support circle, described on the upper support circle, described outer upper support circle, the quantity of graphite chuck is identical on the quantity of described silicon core adjustment anchor clamps and the reduction furnace chassis; Described silicon core is adjusted the distribution of anchor clamps corresponding to the distribution of described graphite chuck on the reduction furnace chassis, when making that using described device installs the silicon core, all have silicon core to adjust anchor clamps directly over each graphite chuck, graphite chuck and with the silicon core adjustment anchor clamps of the corresponding setting of described graphite chuck in order to insert a silicon core and the silicon core fixed.
2. device according to claim 1 is characterized in that, described silicon core is adjusted anchor clamps and comprised snap ring, adjusts the top;
Described snap ring is a ring texture, is fixedly connected on interior upper support circle or middle upper support circle or the outer upper support circle;
Described adjustment top is connected by a screw mechanism with described snap ring sidewall, described screw mechanism can make described adjustment top flexible along the disc radius of described snap ring, also can fix described adjustment top, each silicon core is adjusted anchor clamps and is had adjustment top more than two.
3. device according to claim 2 is characterized in that, described adjustment top comprises arc-like sheet and support bar;
Described support bar passes the sidewall of described snap ring, and described support bar is connected by described screw mechanism with the sidewall of snap ring;
The radian of described arc-like sheet cooperates the radian of silicon wicking surface, and the one side of described arc-like sheet can be fitted with the silicon wicking surface, and another side is fixedlyed connected with described support bar.
4. device according to claim 3 is characterized in that, scribbles on described arc-like sheet and the face that the silicon core contacts to have the contaminated inner lining material of the silicon of preventing core.
5. device according to claim 1 is characterized in that, also comprises 3 above adjustment racks and silicon core squareness measurement utensil;
The two ends of at least one described adjustment rack respectively with two described in supporting cups for being slidingly connected, the two ends of at least one described adjustment rack respectively with two described in supporting cups for being slidingly connected, the two ends of at least one described adjustment rack respectively with two described outer supporting cups for being slidingly connected, described adjustment rack strictness perpendicular in described, the face at domestic and abroad supporting cup place, respectively two described in, cylinder slip between the domestic and abroad supporting cup;
Fixedly connectedly on each described adjustment rack be no less than two described silicon core squareness measurement utensils, be used to measure the distance of silicon core and described adjustment rack.
6. device according to claim 5 is characterized in that, described silicon core squareness measurement utensil comprises graduated scale, dial indicator, measuring junction, graduated scale bracing frame;
One end of described graduated scale is fixedlyed connected with described graduated scale bracing frame, the other end is connected with described measuring junction, described graduated scale can stretch, can promote measuring junction during stretching, extension and arrive silicon core position, measure the distance of silicon core and adjustment rack, described dial indicator is arranged on an end of graduated scale bracing frame, in order to identify the data value that graduated scale obtains when measuring.
7. device according to claim 6 is characterized in that, the measuring junction of described silicon core squareness measurement utensil is one to bend to arcual flap, in order to the radian of applying silicon wicking surface.
8. device according to claim 7 is characterized in that, the one side that described measuring junction contacts with the silicon core scribbles has the contaminated inner lining material of the silicon of preventing core, and another side is connected with described graduated scale.
9. according to claim 4 or 8 described devices, it is characterized in that described inner lining material is urethane or tetrafluoroethylene or polypropylene.
10. device according to claim 5, it is characterized in that, the number of described adjustment rack that is connected in described outer supporting cup is more than the number of the described adjustment rack of supporting cup in being connected in, be connected in described in supporting cup adjustment rack number more than be connected in described in the number of described adjustment rack of supporting cup.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205141997U CN201762112U (en) | 2010-08-30 | 2010-08-30 | Silicon core mounting device of reducing furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010205141997U CN201762112U (en) | 2010-08-30 | 2010-08-30 | Silicon core mounting device of reducing furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201762112U true CN201762112U (en) | 2011-03-16 |
Family
ID=43714722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010205141997U Expired - Fee Related CN201762112U (en) | 2010-08-30 | 2010-08-30 | Silicon core mounting device of reducing furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201762112U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104024158A (en) * | 2012-07-17 | 2014-09-03 | 瑞科硅公司 | Reactor system and method of polycrystalline silicon production therewith |
| CN105384172A (en) * | 2015-12-29 | 2016-03-09 | 哈尔滨工业大学 | Graphite chuck for improving Siemens Method polycrystalline silicon reduction furnace and use method of graphite chuck |
| CN109399640A (en) * | 2018-12-25 | 2019-03-01 | 亚洲硅业（青海）有限公司 | Polycrystalline silicon reducing furnace silicon core mounting device and installation method |
| CN114851205A (en) * | 2022-06-01 | 2022-08-05 | 苏州闪驰数控系统集成有限公司 | System workstation based on robot is automatic to be installed silicon core and subassembly on stove dish |
-
2010
- 2010-08-30 CN CN2010205141997U patent/CN201762112U/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104024158A (en) * | 2012-07-17 | 2014-09-03 | 瑞科硅公司 | Reactor system and method of polycrystalline silicon production therewith |
| CN104024158B (en) * | 2012-07-17 | 2018-12-04 | 陕西有色天宏瑞科硅材料有限责任公司 | Reactor assembly and the method for producing polysilicon with it |
| CN105384172A (en) * | 2015-12-29 | 2016-03-09 | 哈尔滨工业大学 | Graphite chuck for improving Siemens Method polycrystalline silicon reduction furnace and use method of graphite chuck |
| CN105384172B (en) * | 2015-12-29 | 2017-09-22 | 哈尔滨工业大学 | A kind of improved Siemens polycrystalline silicon reducing furnace graphite chuck and its application method |
| CN109399640A (en) * | 2018-12-25 | 2019-03-01 | 亚洲硅业（青海）有限公司 | Polycrystalline silicon reducing furnace silicon core mounting device and installation method |
| CN114851205A (en) * | 2022-06-01 | 2022-08-05 | 苏州闪驰数控系统集成有限公司 | System workstation based on robot is automatic to be installed silicon core and subassembly on stove dish |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN201762112U (en) | Silicon core mounting device of reducing furnace | |
| US9437429B2 (en) | Polycrystalline silicon manufacturing apparatus and polycrystalline silicon manufacturing method | |
| JP4891861B2 (en) | Method and apparatus for producing high purity polycrystalline silicon having reduced dopant content | |
| US9263256B2 (en) | Method of forming seed layer, method of forming silicon film, and film forming apparatus | |
| JP5445508B2 (en) | Eccentricity evaluation method and epitaxial wafer manufacturing method | |
| US20120269712A1 (en) | System and method for manufacturing polycrystal silicon | |
| JP2011068553A (en) | Method and apparatus for producing polycrystalline silicon and polycrystalline silicon | |
| US10974216B2 (en) | Device and method for the removal of polycrystalline silicon rods from a reactor | |
| JP6165984B2 (en) | Method for producing polycrystalline silicon | |
| CN202247005U (en) | Temperature measuring device for polysilicon ingot casting furnace | |
| TWI828763B (en) | Assembly for supporting an electrical flange in a glass manufacturing apparatus | |
| CN102267073B (en) | Double-headed bridge type crystalline material grinding machine | |
| EP1702894A1 (en) | Float bath and float manufacturing process | |
| JP2007107030A (en) | Electrode short-circuit prevention method and short-circuit prevention plate | |
| US9534290B2 (en) | Apparatus for deposition of polycrystalline silicon comprising uniformly spaced filament rods and gas inlet orifices, and process for deposition of polycrystalline silicon using same | |
| WO2018218863A1 (en) | Cable extension method | |
| JP5859626B2 (en) | Polycrystalline silicon manufacturing apparatus and polycrystalline silicon manufacturing method | |
| CN108793722A (en) | The deposition method and device of optical fiber prefabricating porous body | |
| JP2005072118A (en) | Epitaxial growth device | |
| CN106238414A (en) | A bracket for cleaning Source | |
| CN101492237B (en) | Mounting placing stand for photoelectric glass overflow well | |
| CN205821515U (en) | Film stove led by the sapphire of precise weighing | |
| CN205635849U (en) | Top cap dismantled of epitaxial furnace reacting chamber | |
| US10266961B2 (en) | Silica glass crucible and method for producing monocrystalline silicon using same | |
| JP5453967B2 (en) | Epitaxial wafer and method for manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110316 Termination date: 20160830 |