CN201644459U - Pipeline cleaning device and pipeline system for tail gas treatment during producing epitaxial wafers - Google Patents
Pipeline cleaning device and pipeline system for tail gas treatment during producing epitaxial wafers Download PDFInfo
- Publication number
- CN201644459U CN201644459U CN2010201501067U CN201020150106U CN201644459U CN 201644459 U CN201644459 U CN 201644459U CN 2010201501067 U CN2010201501067 U CN 2010201501067U CN 201020150106 U CN201020150106 U CN 201020150106U CN 201644459 U CN201644459 U CN 201644459U
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- gland
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- connecting rod
- projection
- sealing ring
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Abstract
The utility model discloses a pipeline cleaning device characterized by comprising a fixing device provided with a through hole; a connecting rod can be arranged in the through hole of the fixing device by axially moving along the through hole, and both ends of the connecting rod are positioned outside the through hole; and one end of the connecting rod is provided with a cleaning blade, and a sealing ring for sealing the through hole is arranged between the connecting rod and the fixing device. When used for a pipeline system for treatment during producing epitaxial wafers, the pipeline cleaning device not only can ensure good sealing performance, but also can ensure that the cleaning blade freely moves. When used for treating tail gas, the pipeline cleaning device can clean pipelines without stopping tail gas treatment during cleaning, thereby saving time and having high efficiency; and the pipeline cleaning device can prevent tail gas leakage from harming the body health of workers.
Description
Technical field
The vent gas treatment pipe-line system that the utility model relates to a kind of line clear device and produces epitaxial wafer.
Background technology
In the epitaxial wafer production process, can produce a large amount of tail gas that need processing, its main component is trichlorosilane, phosphine, borine, nitrogen, hydrogen chloride and hydrogen etc.The method of processing tail gas of the prior art is tail gas to be fed in the water handle.Be illustrated in figure 1 as a kind of vent gas treatment with managing, it comprises appendix 1, the person in charge 2 and water-supply-pipe 3.Be responsible for 2 one ends by end cap 23 sealings, the other end is connected with the treating apparatus (not shown).Be responsible for 2 and be provided with air inlet 21 and water inlet 22.Appendix 1 be responsible for 2 and be communicated with at air inlet 21 places; Water-supply-pipe 3 be responsible for 2 and be communicated with at water inlet 22 places.Tail gas and water enter mixing in the person in charge 2 through air inlet 21 and water inlet 22 respectively, continue after the mixing to flow downward, and enter treatment system.
Water-soluble back of trichlorosilane and water exothermic heat of reaction, liberated heat can evaporate the water between air inlet 21 and the water inlet 22.Chemical reaction takes place in trichlorosilane in water vapour and the tail gas easily, and the easy crystallization of its product is attached to the person in charge's 2 inwalls between air inlet 21 and the water inlet 22.The crystal aggregate amount how after, stop up easily and be responsible for, influence carrying out smoothly of vent gas treatment.As handling tail gas smoothly, must will be attached to the crystal of being responsible for 2 inwalls and remove, after mediation, could continue to use.
Pipe-line system of the prior art when cleaning, need be opened the end cap 23 of being responsible for 2, uses burnisher to stretch into and is responsible for the 2 interior crystals of removing.Owing to mostly be pernicious gas greatly in the tail gas, therefore, must stop tail gas during cleaning and carry, in order to avoid tail gas harm operator is healthy.After cleaning is finished, end cap 23 is installed in is responsible for 2 end again, continue to handle tail gas.
This pipeline has following shortcoming and defect: 1, troublesome poeration.Must open end cap 23 during cleaning, end cap 23 is installed after finishing dealing with again, operation inconvenience.2, efficient is low, influences the processing of tail gas, and then influences carrying out continuously of silicon production technology.Because tail gas is pernicious gas, must stop to carry tail gas during processing, whole vent gas treatment work must suspend, and just can proceed after pending the finishing, and holding time is long, and efficient is low, influences carrying out continuously of vent gas treatment.As can not in time handling tail gas, then the silicon production work also must suspend or need to seek the exhaust gas processing device of replacement.3, dangerous high.Though when cleaning, stop to carry tail gas, appendix and be responsible in the pipeline residual tail gas can distribute unavoidably and influence the healthy of workman.
The utility model content
The purpose of this utility model is in order to overcome deficiency of the prior art, and providing a kind of can not influence the line clear device that vent gas treatment is carried out continuously.
For realizing above purpose, the utility model is achieved through the following technical solutions:
The line clear device is characterized in that, comprises fixture, and fixture is provided with through hole; Connecting rod can be arranged in the through hole of fixture with axial motion along through hole, and the connecting rod two ends are positioned at outside the through hole; Connecting rod one end is equipped with the cleaning lodicule, and being provided with between described connecting rod and the fixture can be with the sealing ring of through hole sealing.
Preferably, described fixture comprises pedestal and hold down gag, and hold down gag and pedestal removably connect, and hold down gag and pedestal are tightly connected.
Preferably, pedestal and hold down gag form first groove of opening towards through hole jointly, and sealing ring is arranged in first groove, and sealing ring contacts with connecting rod.
Preferably, described hold down gag comprises first gland, first gland and pedestal removably connect, the end of pedestal is provided with first counterbore, first gland is provided with first projection that can insert in first counterbore, first groove of opening towards through hole formed on first projection, first gland and first counterbore bottom, and first sealing ring is arranged in first groove, and first sealing ring contacts with connecting rod.
Preferably, also include second gland, described first gland and second gland removably connect, the first gland end is provided with second counterbore, second gland is arranged on second counterbore upper end, and second sealing ring is arranged in second counterbore, and second sealing ring contacts with connecting rod.
Preferably, also comprise positioner, described positioner comprises second projection, and second projection is arranged on first gland, and second projection matches with counterbore sidewall or the 4th groove on the pedestal.
Preferably, second projection and first projection are provided with along the first gland spaced radial, are the 3rd groove between first projection and second projection, and the 3rd sealing ring is arranged in the 3rd groove.
Preferably, described sealing ring is an O type circle.
Preferably, described through-hole wall is provided with five groove of opening towards through hole.
Another purpose of the present utility model provides a kind of vent gas treatment pipe-line system of producing epitaxial wafer, it is characterized in that, comprises the person in charge, appendix and water-supply-pipe, is responsible for to be provided with air inlet, and appendix is communicated with at the air inlet place with the person in charge; The person in charge is provided with water inlet, and water-supply-pipe is communicated with in the water inlet with the person in charge, and the described person in charge's one end is provided with the line clear device, and the line clear device comprises fixture, and fixture is provided with through hole; Connecting rod can be arranged in the through hole of fixture with axial motion along through hole, and the connecting rod two ends are positioned at outside the through hole; Connecting rod one end is equipped with the cleaning lodicule, and being provided with between described connecting rod and the fixture can be with the sealing ring of through hole sealing.
Preferably, described fixture comprises pedestal and hold down gag, and hold down gag and pedestal removably connect, and pedestal and hold down gag junction are provided with first groove of opening towards connecting rod, described sealing ring is arranged in first groove, and sealing ring contacts with connecting rod.
Preferably, described fixture comprises pedestal and hold down gag, and hold down gag and pedestal removably connect, and hold down gag and pedestal are tightly connected.
Preferably, described hold down gag comprises first gland, first gland and pedestal removably connect, the end of pedestal is provided with first counterbore, first gland is provided with first projection that can insert in first counterbore, first groove of opening towards through hole formed on first projection, first gland and first counterbore bottom, and first sealing ring is arranged in first groove, and first sealing ring contacts with connecting rod.
Preferably, also include second gland, described first gland and second gland removably connect, the first gland end is provided with second counterbore, second gland is arranged on second counterbore upper end, and second sealing ring is arranged in second counterbore, and second sealing ring contacts with connecting rod.
Preferably, also comprise positioner, described positioner comprises second projection, and second projection is arranged on first gland, and second projection matches with counterbore sidewall or the 4th groove on the pedestal.
Preferably, second projection and first projection are provided with along the first gland spaced radial, are the 3rd groove between first projection and second projection, and the 3rd sealing ring is arranged in the 3rd groove.
Preferably, described sealing ring is an O type circle.
Preferably, described through-hole wall is provided with five groove of opening towards through hole.
Preferably, air inlet is positioned at the water inlet top.
Line clear device in the utility model both can guarantee good seal performance, and the cleaning lodicule is moved freely.Can be when handling tail gas cleaning channels, need not to stop vent gas treatment during cleaning, both saved time the efficient height; And can prevent that tail gas leakage hazard workman is healthy.
Description of drawings
Fig. 1 is the vent gas treatment pipe-line system cross-sectional schematic of producing epitaxial wafer in the prior art;
Fig. 2 is that the vent gas treatment of the production epitaxial wafer in the utility model is with the axial cross-sectional schematic of pipe-line system;
Fig. 3 for the line clear assembly axis in the utility model to analysing and observe the fractionation schematic diagram, not shown each sealing ring;
Fig. 4 is the axial cross-sectional schematic in line clear device assembling back in the utility model, not shown each sealing ring;
Fig. 5 is that line clear device assembled shaft in the utility model is to cross-sectional schematic;
Fig. 6 is the axial cross-sectional schematic of line clear device user mode in the utility model.
The specific embodiment
Below in conjunction with accompanying drawing the utility model is described in detail:
Fig. 2 is that the vent gas treatment of the production epitaxial wafer in the utility model is with the axial cross-sectional schematic of pipe-line system; As shown in Figure 2, produce the vent gas treatment pipe-line system of epitaxial wafer, comprise the circular person in charge 2, appendix 1 and water-supply-pipe 3.Be responsible for 2 and be provided with air inlet 21 and water inlet 22.Air inlet 21 is positioned at water inlet 22 tops.Appendix 1 be responsible for 2 and be communicated with at air inlet 21 places; Water-supply-pipe 3 be responsible for 2 and be communicated with at water inlet 22 places.
Being responsible for 2 one ends is connected with the treating apparatus (not shown); The other end detachably is equipped with line clear device 10.Line clear device 10 comprises circular fixture 4 and columniform connecting rod 7.Fixture 4 is provided with through hole, and through hole comprises first through hole 411, second through hole 429 and the third through-hole 432 among Fig. 4.Connecting rod 7 one ends are provided with cleaning lodicule 71; The other end is provided with handle 72.The person in charge 2, fixture 4 and connecting rod 7 have axis 8.Connecting rod 7 can be installed in the through hole of fixture 4 along fixture 4 axis 8 with moving axially.Be provided with sealing ring between fixture 4 and the connecting rod 7, sealing ring comprises an O type circle 61 and the 2nd O type circle 62 among Fig. 5.Sealing ring is used for through hole axial seal, and the tail gas that can prevent to be responsible in 2 leaks from the through hole of fixture 4.Fixture 4 is provided with a plurality of first internal thread holes, and (413A, 413B), a plurality of first internal thread holes are provided with around axis 8, use the screw (not shown) to cooperate with first internal thread hole fixture 4 is removably connected with the person in charge 2 to there is shown two.
Fig. 3 for the line clear assembly axis in the utility model to analysing and observe the fractionation schematic diagram, not shown each sealing ring; As shown in Figure 3, fixture 4 comprises that columniform pedestal 41 and columniform first gland, 42, the first glands 42 are divided into three sections of upper, middle and lowers, and its diameter increases successively.Pedestal 41 is provided with the first axial through hole 411.Pedestal 41 upper ends are provided with first counterbore, 412, the first counterbores 412 and are provided with around first through hole 411.First counterbore 412 has sidewall 4121 and bottom 4122.Columniform pedestal 41, columniform first gland 42, first through hole 411 and first counterbore 412 have axis 8.Pedestal 41 is provided with a plurality of first internal thread holes, and (413A, 413B), a plurality of first internal thread holes are provided with around axis 8 to there is shown two.Pedestal 41 is provided with a plurality of second internal thread holes, and (414A, 414B), a plurality of second internal thread holes are provided with around axis 8 to there is shown two.
The inwall 4291 of second through hole 429 be provided with opening towards two the 5th grooves of second through hole 429 (436A, 436B).(436A is 436B) all around second through hole, 429 1 circles for two the 5th grooves.(436A 436B) is used to place lubricating oil to two the 5th grooves, moves up and down in the process at connecting rod (shown in Figure 2), and connecting rod can be stained with lubricating oil, so that connecting rod is mobile more smooth and easy vertically.
Fig. 4 is the axial cross-sectional schematic in line clear device assembling back in the utility model, not shown each sealing ring; As shown in Figure 4, the pedestal 41 and first gland 42 removably connect, and first gland 42, first projection 421 form first groove 51 with pedestal 41.First groove, 51 openings are used to install an O type circle towards first through hole 411.
Fig. 5 is the axial cross-sectional schematic in line clear device assembling back in the utility model; As shown in Figure 5, be provided with an O type circle 61 and the 3rd O type circle 63 between the pedestal 41 and first gland 42.The one O type circle 61 is installed in first groove 51 shown in Figure 4.The 3rd O type circle 63 is installed in the 3rd groove 423 shown in Figure 4.The one O type circle 61 and the 3rd O type circle 63 are used to prevent that with pedestal 41 and the 42 junction radial seals of first gland tail gas is from leaking between the pedestal 41 and first gland 42.The one O type circle 61 contacts around connecting rod (shown in Figure 2) and with connecting rod, and all right axial seal first through hole 411 prevents that tail gas from leaking from first through hole 411.The pedestal 41 and first gland 42 removably connect, and an O type circle 61 is set between the two, when pedestal 41 is connected with first gland 42, can oppress an O type circle 61 distortion; Because first groove, 51 openings are towards first through hole 411, therefore an O type circle 61 distortion backs along pedestal 41 radially extend contact with connecting rod tightr.The pedestal 41 and first gland 42 removably connect, and can regulate the seal degree of an O type circle 61, can regulate the tightness degree that an O type circle 61 contacts with connecting rod.
Be provided with the 2nd O type circle 62, the two O type circles 62 between first gland 42 and the pressing plate 431 and contact, be used for axial seal third through-hole 432 around connecting rod (shown in Figure 2) and with connecting rod.The 2nd O type circle 62 can prevent that tail gas is from leaking between first gland 42 and the pressing plate 431 with radial seal between first gland 42 and the pressing plate 431; Third through-hole 432 axial seals can be prevented that tail gas from leaking from third through-hole 432 again.
The radial and axial double containment that all adopts can guarantee fully that tail gas can not leak.Can realize good sealing effectiveness, can guarantee that again connecting rod moves up and down freely.
Axial cross-sectional schematic when Fig. 2 and Fig. 5 are two kinds of user modes of line clear device, Fig. 2 is not for needing to clean the user mode of being responsible at 2 o'clock; Fig. 5 need clean the user mode of being responsible at 2 o'clock.As shown in Figure 2, do not need cleaning to be responsible at 2 o'clock, upwards spur the handle 72 of connecting rod 7, will clean lodicule 71 and move air inlet 21 tops to, can avoid stopping tail gas.
Need cleaning to be responsible at 2 o'clock, press handle 72 downwards, will clean lodicule 71 and press between air inlet 21 and the water inlet 22, turning handle 72 is so that cleaning lodicule 71 is being responsible for rotation in 2, to wipe off attached to the crystal of being responsible on 2 inwalls, crystal is fallen into the below and is taken away by water.After finishing using, will clean lodicule 71 and be pulled to air inlet 21 tops.
Embodiment in the utility model only is used for the utility model is described, and does not constitute the restriction to the claim scope, and other substituting of being equal in fact that those skilled in that art can expect are all in the utility model protection domain.
Claims (19)
1. the line clear device is characterized in that, comprises fixture, and fixture is provided with through hole; Connecting rod can be arranged in the through hole of fixture with axial motion along through hole, and the connecting rod two ends are positioned at outside the through hole; Connecting rod one end is equipped with the cleaning lodicule, and being provided with between described connecting rod and the fixture can be with the sealing ring of through hole sealing.
2. line clear device according to claim 1 is characterized in that described fixture comprises pedestal and hold down gag, and hold down gag and pedestal removably connect, and hold down gag and pedestal are tightly connected.
3. line clear device according to claim 2 is characterized in that, pedestal and hold down gag form first groove of opening towards through hole jointly, and sealing ring is arranged in first groove, and sealing ring contacts with connecting rod.
4. line clear device according to claim 3, it is characterized in that, described hold down gag comprises first gland, first gland and pedestal removably connect, the end of pedestal is provided with first counterbore, and first gland is provided with first projection that can insert in first counterbore, and first groove of opening towards through hole formed on first projection, first gland and first counterbore bottom, first sealing ring is arranged in first groove, and first sealing ring contacts with connecting rod.
5. line clear device according to claim 4, it is characterized in that, also include second gland, described first gland and second gland removably connect, the first gland end is provided with second counterbore, second gland is arranged on second counterbore upper end, and second sealing ring is arranged in second counterbore, and second sealing ring contacts with connecting rod.
6. according to claim 2 or 4 described line clear devices, it is characterized in that also comprise positioner, described positioner comprises second projection, second projection is arranged on first gland, and second projection matches with counterbore sidewall or the 4th groove on the pedestal.
7. line clear device according to claim 6 is characterized in that, second projection and first projection are provided with along the first gland spaced radial, is the 3rd groove between first projection and second projection, and the 3rd sealing ring is arranged in the 3rd groove.
8. line clear device according to claim 1 is characterized in that, described sealing ring is an O type circle.
9. line clear device according to claim 1 is characterized in that, described through-hole wall is provided with five groove of opening towards through hole.
10. produce the vent gas treatment pipe-line system of epitaxial wafer, it is characterized in that, comprise the person in charge, appendix and water-supply-pipe, be responsible for being provided with air inlet, appendix is communicated with at the air inlet place with the person in charge; The person in charge is provided with water inlet, and water-supply-pipe is communicated with in the water inlet with the person in charge, and the described person in charge's one end is provided with the line clear device, and the line clear device comprises fixture, and fixture is provided with through hole; Connecting rod can be arranged in the through hole of fixture with axial motion along through hole, and the connecting rod two ends are positioned at outside the through hole; Connecting rod one end is equipped with the cleaning lodicule, and being provided with between described connecting rod and the fixture can be with the sealing ring of through hole sealing.
11. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 10, it is characterized in that, described fixture comprises pedestal and hold down gag, hold down gag and pedestal removably connect, pedestal and hold down gag junction are provided with first groove of opening towards connecting rod, described sealing ring is arranged in first groove, and sealing ring contacts with connecting rod.
12. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 11 is characterized in that described fixture comprises pedestal and hold down gag, hold down gag and pedestal removably connect, and hold down gag and pedestal are tightly connected.
13. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 12, it is characterized in that, described hold down gag comprises first gland, first gland and pedestal removably connect, the end of pedestal is provided with first counterbore, and first gland is provided with first projection that can insert in first counterbore, and first groove of opening towards through hole formed on first projection, first gland and first counterbore bottom, first sealing ring is arranged in first groove, and first sealing ring contacts with connecting rod.
14. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 13, it is characterized in that, also include second gland, described first gland and second gland removably connect, the first gland end is provided with second counterbore, second gland is arranged on second counterbore upper end, and second sealing ring is arranged in second counterbore, and second sealing ring contacts with connecting rod.
15. vent gas treatment pipe-line system according to claim 11 or 13 described production epitaxial wafers, it is characterized in that also comprise positioner, described positioner comprises second projection, second projection is arranged on first gland, and second projection matches with counterbore sidewall or the 4th groove on the pedestal.
16. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 15, it is characterized in that, second projection and first projection are provided with along the first gland spaced radial, are the 3rd groove between first projection and second projection, and the 3rd sealing ring is arranged in the 3rd groove.
17. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 10 is characterized in that, described sealing ring is an O type circle.
18. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 10 is characterized in that, described through-hole wall is provided with five groove of opening towards through hole.
19. the vent gas treatment pipe-line system of production epitaxial wafer according to claim 10 is characterized in that, air inlet is positioned at the water inlet top.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201501067U CN201644459U (en) | 2010-04-02 | 2010-04-02 | Pipeline cleaning device and pipeline system for tail gas treatment during producing epitaxial wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2010201501067U CN201644459U (en) | 2010-04-02 | 2010-04-02 | Pipeline cleaning device and pipeline system for tail gas treatment during producing epitaxial wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN201644459U true CN201644459U (en) | 2010-11-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2010201501067U Expired - Lifetime CN201644459U (en) | 2010-04-02 | 2010-04-02 | Pipeline cleaning device and pipeline system for tail gas treatment during producing epitaxial wafers |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN201644459U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104324920A (en) * | 2014-10-31 | 2015-02-04 | 罗斯（无锡）设备有限公司 | Powder charging opening pipeline cleaning device |
| CN106694486A (en) * | 2016-12-29 | 2017-05-24 | 成都天马微电子有限公司 | Pipeline solid removing device, pipeline solid removing method and pipeline system |
| CN108126960A (en) * | 2016-12-01 | 2018-06-08 | 上海新昇半导体科技有限公司 | A kind of exhaust gas processing device of magnetic control removal silicide particle |
-
2010
- 2010-04-02 CN CN2010201501067U patent/CN201644459U/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104324920A (en) * | 2014-10-31 | 2015-02-04 | 罗斯（无锡）设备有限公司 | Powder charging opening pipeline cleaning device |
| CN108126960A (en) * | 2016-12-01 | 2018-06-08 | 上海新昇半导体科技有限公司 | A kind of exhaust gas processing device of magnetic control removal silicide particle |
| CN106694486A (en) * | 2016-12-29 | 2017-05-24 | 成都天马微电子有限公司 | Pipeline solid removing device, pipeline solid removing method and pipeline system |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20101124 |