CN1773671A - 基板处理装置以及基板处理方法 - Google Patents
基板处理装置以及基板处理方法 Download PDFInfo
- Publication number
- CN1773671A CN1773671A CN200510120441.6A CN200510120441A CN1773671A CN 1773671 A CN1773671 A CN 1773671A CN 200510120441 A CN200510120441 A CN 200510120441A CN 1773671 A CN1773671 A CN 1773671A
- Authority
- CN
- China
- Prior art keywords
- substrate
- mentioned
- exposure
- maintaining part
- exposure device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (12)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004326310A JP4463081B2 (ja) | 2004-11-10 | 2004-11-10 | 基板処理装置および基板処理方法 |
JP2004326310 | 2004-11-10 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1773671A true CN1773671A (zh) | 2006-05-17 |
CN100377298C CN100377298C (zh) | 2008-03-26 |
Family
ID=36316444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2005101204416A Active CN100377298C (zh) | 2004-11-10 | 2005-11-10 | 基板处理装置以及基板处理方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7658560B2 (zh) |
JP (1) | JP4463081B2 (zh) |
KR (1) | KR100708318B1 (zh) |
CN (1) | CN100377298C (zh) |
TW (1) | TWI279874B (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5008280B2 (ja) * | 2004-11-10 | 2012-08-22 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP5154008B2 (ja) * | 2004-11-10 | 2013-02-27 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP4794232B2 (ja) * | 2004-12-06 | 2011-10-19 | 株式会社Sokudo | 基板処理装置 |
JP5154007B2 (ja) | 2004-12-06 | 2013-02-27 | 株式会社Sokudo | 基板処理装置 |
JP4926433B2 (ja) * | 2004-12-06 | 2012-05-09 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP4514657B2 (ja) * | 2005-06-24 | 2010-07-28 | 株式会社Sokudo | 基板処理装置 |
JP4761907B2 (ja) * | 2005-09-28 | 2011-08-31 | 株式会社Sokudo | 基板処理装置 |
JP5132108B2 (ja) * | 2006-02-02 | 2013-01-30 | 株式会社Sokudo | 基板処理装置 |
JP4832201B2 (ja) * | 2006-07-24 | 2011-12-07 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP2008060302A (ja) * | 2006-08-31 | 2008-03-13 | Sokudo:Kk | 基板処理装置 |
KR100898396B1 (ko) | 2007-10-11 | 2009-05-21 | 세메스 주식회사 | 기판 처리 장치 |
KR101462509B1 (ko) * | 2012-10-19 | 2014-11-19 | 한국식품연구원 | 바실러스 아밀로리쿼파시엔스 서브스페시스 플란타럼 f1275를 포함하는 항당뇨 효과가 증강된 콩발효물 및 이의 제조방법 |
JP5779168B2 (ja) * | 2012-12-04 | 2015-09-16 | 東京エレクトロン株式会社 | 周縁部塗布装置、周縁部塗布方法及び周縁部塗布用記録媒体 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5202716A (en) * | 1988-02-12 | 1993-04-13 | Tokyo Electron Limited | Resist process system |
KR970003907B1 (ko) * | 1988-02-12 | 1997-03-22 | 도오교오 에레구토론 가부시끼 가이샤 | 기판처리 장치 및 기판처리 방법 |
JP2931820B2 (ja) | 1991-11-05 | 1999-08-09 | 東京エレクトロン株式会社 | 板状体の処理装置及び搬送装置 |
JP3734295B2 (ja) | 1995-09-04 | 2006-01-11 | 大日本スクリーン製造株式会社 | 基板搬送装置 |
JP3734294B2 (ja) | 1995-09-04 | 2006-01-11 | 大日本スクリーン製造株式会社 | 基板搬送装置 |
US5788868A (en) * | 1995-09-04 | 1998-08-04 | Dainippon Screen Mfg. Co., Ltd. | Substrate transfer method and interface apparatus |
JP3360001B2 (ja) | 1996-10-30 | 2002-12-24 | 芝浦メカトロニクス株式会社 | 処理装置 |
JP3562748B2 (ja) | 1997-03-05 | 2004-09-08 | 大日本スクリーン製造株式会社 | 基板処理装置 |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
JP3197541B2 (ja) | 1999-10-21 | 2001-08-13 | 大日本スクリーン製造株式会社 | フォトレジスト処理装置 |
JP3559219B2 (ja) * | 2000-05-09 | 2004-08-25 | 東京エレクトロン株式会社 | 塗布現像処理システム及び塗布現像処理方法 |
TW594835B (en) * | 2000-05-09 | 2004-06-21 | Tokyo Electron Ltd | System for coating and developing |
JP3943828B2 (ja) * | 2000-12-08 | 2007-07-11 | 東京エレクトロン株式会社 | 塗布、現像装置及びパターン形成方法 |
JP4342147B2 (ja) * | 2002-05-01 | 2009-10-14 | 大日本スクリーン製造株式会社 | 基板処理装置 |
EP1394611A1 (en) * | 2002-08-30 | 2004-03-03 | ASML Netherlands BV | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP4170864B2 (ja) * | 2003-02-03 | 2008-10-22 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理装置における基板搬送方法および基板処理方法 |
JP4194495B2 (ja) | 2004-01-07 | 2008-12-10 | 東京エレクトロン株式会社 | 塗布・現像装置 |
JP4535489B2 (ja) | 2004-03-31 | 2010-09-01 | 東京エレクトロン株式会社 | 塗布・現像装置 |
-
2004
- 2004-11-10 JP JP2004326310A patent/JP4463081B2/ja active Active
-
2005
- 2005-11-07 KR KR1020050106059A patent/KR100708318B1/ko active IP Right Grant
- 2005-11-08 TW TW094139079A patent/TWI279874B/zh active
- 2005-11-10 CN CNB2005101204416A patent/CN100377298C/zh active Active
- 2005-11-10 US US11/273,441 patent/US7658560B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR100708318B1 (ko) | 2007-04-17 |
US7658560B2 (en) | 2010-02-09 |
CN100377298C (zh) | 2008-03-26 |
US20060098977A1 (en) | 2006-05-11 |
JP2006140199A (ja) | 2006-06-01 |
JP4463081B2 (ja) | 2010-05-12 |
TWI279874B (en) | 2007-04-21 |
KR20060052516A (ko) | 2006-05-19 |
TW200625495A (en) | 2006-07-16 |
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Legal Events
Date | Code | Title | Description |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: DAINIPPON SCREEN MFG. CO., LTD. Free format text: FORMER NAME: DAINIPPON MESH PLATE MFR. CO., LTD. Owner name: SCREEN GROUP CO., LTD. Free format text: FORMER NAME: DAINIPPON SCREEN MFG. CO., LTD. |
|
CP01 | Change in the name or title of a patent holder |
Address after: Kyoto Japan Patentee after: Skilling Group Address before: Kyoto Japan Patentee before: DAINIPPON SCREEN MFG Co.,Ltd. Address after: Kyoto Japan Patentee after: DAINIPPON SCREEN MFG Co.,Ltd. Address before: Kyoto Japan Patentee before: Dainippon Screen Mfg. Co.,Ltd. |