CN1757429A - Method and apparatus for reducing content of ozone in waste-gas - Google Patents
Method and apparatus for reducing content of ozone in waste-gas Download PDFInfo
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- CN1757429A CN1757429A CNA2004100849842A CN200410084984A CN1757429A CN 1757429 A CN1757429 A CN 1757429A CN A2004100849842 A CNA2004100849842 A CN A2004100849842A CN 200410084984 A CN200410084984 A CN 200410084984A CN 1757429 A CN1757429 A CN 1757429A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02A—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
- Y02A50/00—TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
- Y02A50/20—Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters
Abstract
A process for decreasing the concentration of ozone in waste gas includes such steps as providing a water-washing device consisting of a gas inlet, a gas outlet and several slots containing filler in them, a liquid filling element for making the reducer solution flow through said filler and a storage tank connected with said liquid filling element, filling said waste gas in to the device for making it in contact with the reducer solution, and exhausting the gas from said gas outlet.
Description
Technical field
The invention relates to a kind of water washing device and method, refer to a kind of water washing device and method that reduces ozone concentration in the waste gas that be applicable to especially.
Background technology
Flourish with work Taiwan high-tech industry puppet, it is quicker to make semiconductor industry grow up, wherein semiconductor industry includes IC industry and opto-electronics, development has great influence power to domestic economy, but because environmental issues such as the waste liquids, waste water, waste gas of deriving in the semiconductor element processing procedure, attention that all should height.Wherein, the oxide film processing procedure of optoelectronic semiconductor processing procedure and wet-cleaned processing procedure all use high-concentrated ozone (O
3), the light remaining ozone (O of this system
3) if without dealing carefully with, the multiple worker that will derive pacifies environmental protection and the personnel health endangers problem.
Yet, present most semiconductor manufacturing selects for use electrothermal to handle the relevant processing procedure waste gas of ozone with the rinsing type treatment facility, electrothermal is handled except the defective of tool consumed power, the SiO that the TEOS (Tetraethoxylsilane) in the ozone processing procedure waste gas produces after the electric heating oxidation
2Seriously block pipeline, and influence the stability of front end process system, and then increase the risk cost of front end processing procedure.If single with the water-washing method processing, then the reduction rate of ozone is too low again can't effectively handle.In addition, also the someone advises using the macromolecular organic thing to handle ozone, cut down gaseous ozone by solid, gas-phase reaction, but the chemical substance complexity of its use and cost height, so its design and be not suitable for photoelectricity, semi-conductive terminal processing the (design air flow is low and the processing ozone concentration is low).Say that to sum up prior art is for reducing ozone concentration and none simple and effective processing method or device, so the utmost point needs a kind of method that can effectively reduce ozone concentration and can not cause ozone concentration in the minimizing waste gas of pipe blocking.
Summary of the invention
The object of the present invention is to provide a kind of method and apparatus that reduces ozone concentration in the waste gas.
The present invention can also effectively reduce its concentration simultaneously for the TEOS in the ozone processing procedure waste gas, and can not produce SiO except reducing ozone with high concentration
2The serious pipeline that blocks.The method of ozone concentration in the minimizing waste gas of the present invention, preferable can be used for, handled the oxide film processing procedure of optoelectronic semiconductor processing procedure or the waste gas that the wet-cleaned processing procedure is produced, can solve existing electric heating rinsing type device ubiquitous instable defective or rinsing type device can't effectively handle the problem of ozone.
For achieving the above object, the method for ozone concentration in the minimizing waste gas provided by the invention comprises following steps:
(1) provides a water washing device, this water washing device comprises that one has the cell body of a gas input port, a gas discharge outlet and a plurality of fillers, one makes the liquid injection element of reductant solution through this filler, and an accumulator tank that is connected with the liquid injection element; Wherein this input port is positioned at this cell body lower end, and this outlet is positioned at this cell body upper end; These a plurality of fillers are filled in this cell body;
(2) gas is imported in this water washing device from this input port, so that this gas contacts with reductant solution; And
(3) this gas is discharged by this gas discharge outlet.
Wherein the contained ozone concentration scope of this gas is 0 to 10,000ppm.
Wherein the weight percent concentration scope of this reductant solution is 0 to 3%.
Wherein this processing gas flow is 10 to 10,000L/min.
Wherein this gas is the waste gas that oxide film processing procedure or wet-cleaned processing procedure are produced.
Wherein this reducing agent is phosphate, sulphite or nitrite.
The device of ozone concentration in the minimizing waste gas provided by the invention, comprising: one has the cell body of at least one gas input port, at least one gas discharge outlet and a plurality of fillers; Wherein this input port is positioned at this cell body lower end, and this outlet is positioned at this cell body upper end;
One liquid injection element is that this reductant solution is imported this cell body, makes this reductant solution through this filler; And
One accumulator tank is connected in this liquid injection element.
Wherein this liquid injection element also comprises a water pump.
Wherein this liquid injection element is a sprinkler.
Wherein this outlet also comprises a scavenger fan, and this scavenger fan is installed in this outlet.
Wherein this reducing agent is phosphate, sulphite or nitrite.
Description of drawings
Fig. 1 is the schematic diagram that the present invention one adds the water washing device of natrium nitrosum.
The specific embodiment
For more understanding technology contents of the present invention, be described as follows especially exemplified by ozone concentration method and apparatus preferred embodiment in the following minimizing waste gas.
At first please refer to Fig. 1, be ozone concentration device signal circle in the minimizing waste gas of the present invention.As shown in the figure, there is a gas input port 11 lower end of cell body 1, and its pipe is connected to a pipeline 5; There is a gas discharge outlet 12 cell body 1 upper end, and this gas discharge outlet 12 is equiped with a ventilating fan 15 effectively discharges gas; And, have a plurality of filler particles 13 to be filled in the cell body 1 in the cell body 1.Therefore, when the gas in the pipeline 5 was imported cell bodies 1 by gas input port 11, this gas can be discharged from the gas discharge outlet 12 that cell body is breathed heavily earlier by the space of filler 13 again.On the other hand, reductant solution in the accumulator tank 2 then can import sprinkler 4 via water pump 3 pressurizations, reductant solution evenly is sprayed on the filler 13 via the nozzle 41 at sprinkler 4 two ends, and flows to cell body 1 bottom, be stored in the tank 14 of bottom land via the space of filler 13.
Present embodiment is that the high-concentrated ozone with oxide film processing procedure or wet etch process remnants enters pipeline 5, and this waste gas can be entered in the cell body 1 by gas input port 11.Owing to after waste gas enters cell body 1, can arrange-go out by the ventilating fan 15 of gas discharge outlet 12 again through filler 13 earlier, make waste gas to advance along the space of filler 13.Same, after reductant solution is sprayed on the filler 13, also can down flow to cell body 1 bottom along the space of filler 13, therefore, when being passed in hole between the filler 13, waste gas can fully contact with the reductant solution that passes filler 13 holes equally.Thus, the flow path of waste gas and reductant solution could significantly increase, and has therefore also significantly increased the contact area and the time of contact of waste gas and reductant solution, makes reducing agent and ozone fully to produce chemical reaction, is enough to effectively to reduce in the waste gas high! Concentration of ozone.In other words, the ozone concentration device can significantly increase the reacting dose and the reaction time of ozone and reducing agent generation chemical reaction in the minimizing waste gas of the present invention, therefore can effectively reduce the ozone of waste gas middle and high concentration.
Reducing agent used in the present invention can be phosphate, sulphite or nitrite.Be to use the aqueous solution and the aqueous solution that adds natrium nitrosum of same traffic (1.71gpm) in present embodiment, come comparison water-washing method and the move sound of the water-washing method of adding reducing agent abundant oxygen concentration in the waste gas.The real factory test result of present embodiment is as shown in table 1, and when only handling waste gas with water-washing method, the rate of subduing of ozone concentration only is 10.1% in the waste gas.That is water-washing method can't effectively reduce the ozone concentration in the waste gas.Yet when handling waste gas with the water-washing method of adding natrium nitrosum, the reduction rate of ozone can be at a high speed more than 98.5% in the waste gas, and the more important thing is that the addition of natrium nitrosum in the solution only needs 0.003% percentage by weight to the greatest extent.Even the addition that reduces natrium nitrosum again is to 0.002% percentage by weight, the reduction rate of ozone is still up to 90.8% in its waste gas.In other words, the method for ozone concentration only need be added the reducing agent of minute quantity in the minimizing waste gas of the present invention, and the reduction effect of ozone is a highly significant in its waste gas, even makes the terminal concentration of ozone after the processing less than detecting limit.In addition, the present invention reduces the method for ozone concentration in the waste gas except cutting down ozone, also can reduce TEOS concentration remaining in the waste gas simultaneously.Factory's test result is as shown in table 2 in fact.Handle TEOS in the processing procedure waste gas to add natrium nitrosum in conjunction with water-washing method, the reduction effect of TEOS concentration is under the interpolation concentration of percentage by weight 0.003% natrium nitrosum in its waste gas, reduction rate also is higher than 95.9%, and the not end concentration that makes TEOS in the waste gas is less than detecting limit.And the waste gas of only handling with water-washing method, the concentration elimination rate of TEOS has only 48.1% in its waste gas, far below the water-washing method of adding natrium nitrosum.And, handle compared to traditional electrothermal, because the present invention does not need heating, so the TEOS in the waste gas can not generate SiO
2Block pipeline.Therefore, the water-washing method of interpolation reducing agent also can increase the stability of processing procedure.Hence one can see that, and the method for ozone concentration in the minimizing waste gas of the present invention not only can effectively reduce simultaneously ozone and TEOS concentration in the waste gas, and do not have pipe blocking and influence the problem of front end processing procedure, also can save the electric heating operating cost in addition.
Table 1
| NaNO 2 Conc. wt％ | Fresh Water Flow Rate gpm | DRE of O 3 ％ |
| 0 | 1.71 | 10.1 |
| -＜0.002 | 1.71 | 90.8 |
| 0.003 | 1.71 | ＞98.5 (terminal N.D) |
Table 2
| NaNO 2 Conc. Wt％ | Fresh Water Flow Rate gpm | DRE of O 3 ％ |
| 0 | 1.71 | 34.0 |
| -＜0.002 | 1.71 | 48.1 |
| 0.003 | 1.71 | ＞95.9 (terminal N.D) |
The foregoing description is only given an example for convenience of description, and the present invention advocates that the principal right scope should be as the criterion so that claim is described certainly, but not only limits to the foregoing description.
Claims (11)
1. method that reduces ozone concentration in the waste gas comprises following steps:
(1) provides a water washing device, this water washing device comprises that one has the cell body of a gas input port, a gas discharge outlet and a plurality of fillers, one makes the liquid injection element of reductant solution through this filler, and an accumulator tank that is connected with the liquid injection element; Wherein this input port is positioned at this cell body lower end, and this outlet is positioned at this cell body upper end; These a plurality of fillers are filled in this cell body;
(2) gas is imported in this water washing device from this input port, so that this gas contacts with reductant solution; And
(3) this gas is discharged by this gas discharge outlet.
2. reduce the method for ozone concentration in the waste gas according to claim 1, it is characterized in that, wherein the contained ozone concentration scope of this gas is 0 to 10,000ppm.
3. reduce the method for ozone concentration in the waste gas according to claim 1, it is characterized in that, wherein the weight percent concentration scope of this reductant solution is 0 to 3%.
4. reduce the method for ozone concentration in the waste gas according to claim 1, it is characterized in that, wherein this processing gas flow is 10 to 10,000L/min.
5. reduce the method for ozone concentration in the waste gas according to claim 1, it is characterized in that, wherein this gas is the waste gas that oxide film processing procedure or wet-cleaned processing procedure are produced.
6. reduce the method for abundant oxygen concentration in the waste gas according to claim 1, it is characterized in that, wherein this reducing agent is phosphate, sulphite or nitrite.
7. device that reduces ozone concentration in the waste gas, comprising: one has the cell body of at least one gas input port, at least one gas discharge outlet and a plurality of fillers; Wherein this input port is positioned at this cell body lower end, and this outlet is positioned at this cell body upper end;
One liquid injection element is that this reductant solution is imported this cell body, makes this reductant solution through this filler; And
One accumulator tank is connected in this liquid injection element.
8. device as claimed in claim 7 is characterized in that, wherein this liquid injection element also comprises a water pump.
9. device as claimed in claim 7 is characterized in that, wherein this liquid injection element is a sprinkler.
10. device as claimed in claim 7 is characterized in that wherein this outlet also comprises a scavenger fan, and this scavenger fan is installed in this outlet.
11. device as claimed in claim 7 is characterized in that, wherein this reducing agent is phosphate, sulphite or nitrite.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100849842A CN100486677C (en) | 2004-10-09 | 2004-10-09 | Method and apparatus for reducing content of ozone in waste-gas |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2004100849842A CN100486677C (en) | 2004-10-09 | 2004-10-09 | Method and apparatus for reducing content of ozone in waste-gas |
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| Publication Number | Publication Date |
|---|---|
| CN1757429A true CN1757429A (en) | 2006-04-12 |
| CN100486677C CN100486677C (en) | 2009-05-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100849842A Expired - Fee Related CN100486677C (en) | 2004-10-09 | 2004-10-09 | Method and apparatus for reducing content of ozone in waste-gas |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101602537B (en) * | 2009-07-15 | 2012-08-08 | 华南理工大学 | Processing method employing ozone for catalytic oxidation of sulphite water solution |
| CN102764589A (en) * | 2012-08-03 | 2012-11-07 | 北京化工大学常州先进材料研究院 | Ozone-containing waste gas treatment device |
| CN104307340A (en) * | 2014-10-31 | 2015-01-28 | 张伟 | Single-pipeline ozone removing device |
| CN104324405A (en) * | 2014-10-31 | 2015-02-04 | 张伟 | Small and exquisite ozone air purifier |
| CN104344667A (en) * | 2014-10-31 | 2015-02-11 | 张伟 | Refrigerator with ozone disinfection function |
| CN104338430A (en) * | 2014-10-31 | 2015-02-11 | 张伟 | Multi-pipeline ozone removing device |
| CN104667731A (en) * | 2015-02-06 | 2015-06-03 | 宁波市雨辰环保科技有限公司 | Ozone clearer |
| CN107321147A (en) * | 2017-06-29 | 2017-11-07 | 西北农林科技大学 | A kind of device for eliminating Ozone in Atmosphere |
-
2004
- 2004-10-09 CN CNB2004100849842A patent/CN100486677C/en not_active Expired - Fee Related
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101602537B (en) * | 2009-07-15 | 2012-08-08 | 华南理工大学 | Processing method employing ozone for catalytic oxidation of sulphite water solution |
| CN102764589A (en) * | 2012-08-03 | 2012-11-07 | 北京化工大学常州先进材料研究院 | Ozone-containing waste gas treatment device |
| CN102764589B (en) * | 2012-08-03 | 2014-06-25 | 北京化工大学常州先进材料研究院 | Ozone-containing waste gas treatment device |
| CN104307340A (en) * | 2014-10-31 | 2015-01-28 | 张伟 | Single-pipeline ozone removing device |
| CN104324405A (en) * | 2014-10-31 | 2015-02-04 | 张伟 | Small and exquisite ozone air purifier |
| CN104344667A (en) * | 2014-10-31 | 2015-02-11 | 张伟 | Refrigerator with ozone disinfection function |
| CN104338430A (en) * | 2014-10-31 | 2015-02-11 | 张伟 | Multi-pipeline ozone removing device |
| CN104344667B (en) * | 2014-10-31 | 2016-07-06 | 张伟 | A kind of refrigerator of band ozone sterilizing function |
| CN104667731A (en) * | 2015-02-06 | 2015-06-03 | 宁波市雨辰环保科技有限公司 | Ozone clearer |
| CN104667731B (en) * | 2015-02-06 | 2017-04-05 | 宁波市雨辰环保科技有限公司 | A kind of ozone remover |
| CN107321147A (en) * | 2017-06-29 | 2017-11-07 | 西北农林科技大学 | A kind of device for eliminating Ozone in Atmosphere |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100486677C (en) | 2009-05-13 |
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