CN1487114A - Coating template calibrating device and method for sputtering nano multilayer film - Google Patents
Coating template calibrating device and method for sputtering nano multilayer film Download PDFInfo
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- CN1487114A CN1487114A CNA021585601A CN02158560A CN1487114A CN 1487114 A CN1487114 A CN 1487114A CN A021585601 A CNA021585601 A CN A021585601A CN 02158560 A CN02158560 A CN 02158560A CN 1487114 A CN1487114 A CN 1487114A
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Abstract
The present invention is coating template calibrating device and method for sputtering nano multilayer film. The device consists of sample holder, spring clamp, template, substrate, calibrating frame, and their fixing parts. The metod includes setting the template inside the calibrating frame, and regulating the interval between the template and the calibrating frame to ensure the calibrating precision. The present invention is superior to available technology in that it has no relative sliding between the temperature and the substrate, less work load, lower cost and difficulty, raised quality and performance of the nano multilayer film.
Description
(1) technical field:
The present invention relates to a kind of manufacturing installation and method of nano material, particularly a kind of registration device and method of each rete template of sputter nano-multilayer film.
(2) background technology:
Nano-multilayer film is meant that generally two or more differing materials replaces the thin-film material of formation of deposits by certain nanometer grade thickness on substrate material.Because it has performances such as unusual physics, mechanics, and is with a wide range of applications and huge potential economic benefit, thereby becomes international research focus.The method for preparing at present nano-multilayer film mainly contains physical vaporous deposition (PVD) and chemical Vapor deposition process (CVD), and magnetron sputtering method promptly is a kind of of PVD method.For some requirement (as: element manufacturing, performance test etc.) to nano-multilayer film, need each tunic sputter is become different figures, and each layer pattern has definite position relation each other, this position relation needs certain register method to be guaranteed.Existing mask means is the common method that sputter has the nano-multilayer film of figure.The alignment of this method is that a template that will be carved with required figure of certain tunic and positioning pattern is stacked on the substrate (as: cover glass, silicon chip), put on the specimen mounting together, and it is fixed by the spring piece on the specimen mounting, certain material of sputter then, thus certain tunic of required figure and positioning pattern on substrate, obtained.When the rete of another figure of sputter, need to take out exhausted template last time, the template of another figure and identical positioning pattern will be carved with, be stacked in and spatter on the substrate that rete is arranged, and with the positioning pattern of this template with sputtered at on-chip positioning pattern Membrane cover standard, the another kind of material of sputter then is to obtain the rete of another template graphics.Repeat aforesaid operations, can obtain each layer pattern difference and have the nano-multilayer film of determining the position relation mutually.The problem that existing register method exists is: 1, in the alignment operating process of changing template, template very easily abrades the good nanometer film of sputter, makes the preparation serviceability rate lower, even causes performance failure; 2, being used for localized graphic films on the substrate also is the nano level film, and the color and the gloss contrast of itself and substrate are little, the obscure boundary of positioning pattern film, and naked eyes are difficult for identification, can cause the location inaccurate; 3, because naked eyes resolving power has only 200 microns, so to preparing the multilayer film that the intermembranous requirement of each layer pattern has the exact position relation, the alignment precision of existing register method is not high; 4, after template is aimed at, template and substrate are clamped in the operating process on the specimen mounting, very easily produce the relatively sliding of template and substrate, make alignment generation deviation; 5, template not only needs to process the figure of rete, also needs to process localized figure, has increased template cost of processing and difficulty.
(3) summary of the invention:
The objective of the invention is to design a kind of registration device and method of each rete template of sputter nano-multilayer film, it is overcome the problem that exists in the above-mentioned multilayer film preparation process.
Technical scheme of the present invention: a kind of registration device of each rete template of sputter nano-multilayer film, it is characterized in that it is by specimen mounting, spring pinchcock, template, substrate, the alignment frame, the mounting block of substrate and alignment frame constitutes, said alignment frame places on the specimen mounting and according to spring pinchcock and fixes, the alignment frame is one to downcut the frame of certain width around the template blank, the part that has the sputter figure of downcutting is template, alignment frame and substrate place in the mounting block and fix, the template that has the sputter figure places in the alignment frame, has gapped amount between the template of sputter figure and alignment frame.
The mounting block of above-mentioned said substrate and alignment frame can be copper folder and puller bolt, also can adopt spring pinchcock or adopt bonding method to fix.
The template in the above-mentioned said registration device and the material requirements of alignment frame should have obdurability, be easy to processing, nonmagnetic and thermotolerance, can select austenitic stainless steel sheet, copper and alcu alloy film, aluminium and aluminum alloy sheet.
The register method of above-mentioned said each rete template of sputter nano-multilayer film is characterized in that it is to be realized by following step: 1. select the mould material and the template billet size that are suitable for the sputter graphic films for use; 2. really in the dimensioning scope, process the required figure of a certain rete of sputter in template blank middle position; 3. downcut the frame of certain width all around along the template blank, the part that has figure of being cut is template, and frame is a template alignment frame, guarantees alignment precision by the gap value between template and the alignment frame; 4. the template size of other rete figures should be identical with the above-mentioned template size that has downcut; 5. adopt fixed form to fix, compress alignment frame and substrate; 6. clamp template with tweezers, one side make its on one side with the alignment frame in aim at after, unclamp tweezers, template will fall in the alignment frame automatically; 7. with four spring pinchcocks on the specimen mounting above-mentioned registration device is placed specimen mounting and be fixed, rete that can this template graphics of sputter; 8. this template graphics of sputter finishes, and only need remove spring pinchcock, pours out exhausted template; 9. the rete of other template graphics of sputter is that available same operation steps repeats said process, can obtain each layer pattern difference thus and have the nano-multilayer film of high registration accuracy.
The size of above-mentioned said template blank can be determined according to the size and the rete dimension of picture of specimen mounting.
The working method of above-mentioned said side cut frame or template can adopt laser miniature carving method or lithographic method, and amount is lasing beam diameter, the desirable 40 μ m that are not more than in laser miniature carving method intermediate gap; Its gap value is desirable in lithographic method is lower than μ m level, and said gap value is the alignment precision of this registration device.
Superiority of the present invention is: 1, when the replacing template, owing to adopt the alignment frame to aim at, avoided aiming at the template of generation and the scratch of the rete of sputter nanometer with positioning pattern, improved the serviceability rate of nanometer multilayer membrane prepare greatly; 2, adopt this alignment way and device, avoided little, the location that causes of obscure boundary is inaccurate on every side with positioning pattern film and substrate contrast; 3, because the alignment precision of original way depends on the resolving power (200 μ m) of human eye, and the alignment precision of this alignment way and device depends primarily on the gap value of template and alignment frame (if process with laser beam, its gap value is generally 40 μ m, if use lithographic method, the phase gap value can reach μ m level, even littler), improved the alignment precision of template greatly; 4, this alignment way has been owing to decided substrate and alignment frame with the copper clamping, avoided template and substrate are clamped in the operating process on the specimen mounting, the relatively sliding that produces template and substrate with abrade face, improved alignment precision; 5, this technology only need be processed an alignment frame, has reduced the workload that every template of original technology all will be processed positioning pattern, has reduced template tooling cost and difficulty; 6, related registration device of invention and the method disadvantage of having avoided existing mask method has improved the serviceability rate and the performance of preparation nano-multilayer film greatly, for the research and the application of nano-multilayer film provides a comparatively reliable preparation.
(4) description of drawings:
Accompanying drawing 2 is the one-piece construction user mode synoptic diagram of the registration device of related a kind of each the rete template of sputter nano-multilayer film of the present invention.
Wherein: 1 is the alignment frame, and 2 is template, and 3 are the sputter figure, and 4 is gap value, and 5 are the copper folder, and 6 is substrate, and 7 is puller bolt, and 8 is spring pinchcock, and 9 is specimen mounting.
(5) embodiment:
Embodiment: a kind of registration device of each rete template of sputter nano-multilayer film (is seen Fig. 1-a, Fig. 1-b, Fig. 2), it is characterized in that it is by specimen mounting 9, spring pinchcock 8, template 2, substrate 6, alignment frame 1, the copper folder 5 of substrate and alignment frame constitutes with puller bolt 7, said alignment frame 1 places on the specimen mounting 9 and according to spring pinchcock 8 and fixes, alignment frame 1 is one to downcut the frame of certain width around the template blank, the part that has the sputter figure of downcutting is template 2, alignment frame 1 places in the copper folder 5 with substrate 6, and fix according to puller bolt 7, the template 2 that has sputter figure 3 places in the alignment frame 1, has template 2 and 1 gapped amount 4 of alignment frame of sputter figure 3.
The register method of above-mentioned said each rete template of sputter nano-multilayer film is characterized in that it is to be realized by following step:
1. select the mould material and the template billet size that are suitable for the sputter graphic films for use;
2. really in the dimensioning scope, process the required figure of a certain rete of sputter in template blank middle position;
3. downcut the frame of certain width all around along the template blank, the part that has figure of being cut is template, and frame is a template alignment frame, guarantees alignment precision by the gap value between template and the alignment frame;
4. the template size of other rete figures should be identical with the above-mentioned template size that has downcut;
5. adopt mounting block (copper folder and puller bolt) to fix, compress alignment frame and substrate;
6. clamp template with tweezers, one side make its on one side with the alignment frame in aim at after, unclamp tweezers, template will fall in the alignment frame automatically;
7. with four spring pinchcocks on the specimen mounting above-mentioned registration device is placed specimen mounting and be fixed, rete that can this template graphics of sputter;
8. this template graphics of sputter finishes, and only need remove spring pinchcock, pours out exhausted template;
9. the rete of other template graphics of sputter is that available same operation steps repeats said process, can obtain each layer pattern difference thus and have the nano-multilayer film of high registration accuracy.
The size of above-mentioned said template blank can determine that 25 * 25 * 0.1mm is got in this case according to the size and the rete dimension of picture of specimen mounting.
The working method of above-mentioned said side cut frame or template can adopt laser miniature carving method, and amount is lasing beam diameter, the desirable 40 μ m that are not more than, the desirable 3mm of the width of frame in laser miniature carving method intermediate gap.
Claims (6)
1, a kind of registration device of each rete template of sputter nano-multilayer film, it is characterized in that it is that mounting block by specimen mounting, spring pinchcock, template, substrate, alignment frame, substrate and alignment frame is constituted, said alignment frame places on the specimen mounting and according to spring pinchcock and fixes, the alignment frame is one to downcut the frame of certain width around the template blank, the part that has the sputter figure of downcutting is template, alignment frame and substrate place in the mounting block and fix, the template that has the sputter figure places in the alignment frame, has gapped amount between the template of sputter figure and alignment frame.
2, according to the registration device of said a kind of each the rete template of sputter nano-multilayer film of claim 1, the mounting block that it is characterized in that said substrate and alignment frame can be copper folder and puller bolt, also can adopt spring pinchcock or adopt bonding method to fix.
3, according to the registration device of the said a kind of sputter nanometer multilayer of claim 1 from each rete template, the material requirements that it is characterized in that template in the said registration device and alignment frame should have obdurability, be easy to processing, nonmagnetic and thermotolerance, can select austenitic stainless steel sheet, copper and alcu alloy film, aluminium and aluminum alloy sheet.
4, a kind of register method in conjunction with said each the rete template of sputter nano-multilayer film of claim 1 is characterized in that it is to be realized by following step: 1. select the mould material and the template billet size that are suitable for the sputter graphic films for use; 2. really in the dimensioning scope, process the required figure of a certain rete of sputter in template blank middle position; 3. downcut the frame of certain width all around along the template blank, the part that has figure of being cut is template, and frame is a template alignment frame, guarantees alignment precision by the gap value between template and the alignment frame; 4. the template size of other rete figures should be identical with the above-mentioned template size that has downcut; 5. adopt fixed form to fix, compress alignment frame and substrate; 6. clamp template with tweezers, one side make its on one side with the alignment frame in aim at after, unclamp tweezers, template will fall in the alignment frame automatically; 7. with four spring pinchcocks on the specimen mounting above-mentioned registration device is placed specimen mounting and be fixed, rete that can this template graphics of sputter; 8. this template graphics of sputter finishes, and only need remove spring pinchcock, pours out exhausted template; 9. the rete of other template graphics of sputter is that available same operation steps repeats said process, can obtain each layer pattern difference thus and have the nano-multilayer film of high registration accuracy.
5,, it is characterized in that the size of said template blank can be determined according to the size and the rete dimension of picture of specimen mounting according to the register method of said each the rete template of sputter nano-multilayer film of claim 4.
6, according to the register method of said each the rete template of sputter nano-multilayer film of claim 4, the working method that it is characterized in that said side cut frame or template can adopt laser miniature carving method or lithographic method, amount is lasing beam diameter, the desirable 40 μ m that are not more than in laser miniature carving method intermediate gap; Its gap value is desirable in lithographic method is lower than μ m level, and said gap value is the alignment precision of this registration device.
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| Application Number | Priority Date | Filing Date | Title |
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| CN 02158560 CN1260388C (en) | 2002-12-26 | 2002-12-26 | Coating template calibrating device and method for sputtering nano multilayer film |
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| CN 02158560 CN1260388C (en) | 2002-12-26 | 2002-12-26 | Coating template calibrating device and method for sputtering nano multilayer film |
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| CN1487114A true CN1487114A (en) | 2004-04-07 |
| CN1260388C CN1260388C (en) | 2006-06-21 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102703856A (en) * | 2012-05-18 | 2012-10-03 | 河南大学 | Auxiliary device for preparing thin film electrode |
| CN102776474A (en) * | 2012-07-12 | 2012-11-14 | 济南大学 | Nano composite coating layer for surface treatment of substrate, and preparation method and device of nano composite coating layer |
| CN103668101A (en) * | 2012-09-21 | 2014-03-26 | 无锡华润华晶微电子有限公司 | Wafer fixing device used in deposition film forming device |
| CN105092899A (en) * | 2015-08-25 | 2015-11-25 | 中国科学院物理研究所 | Bracket positioning device |
-
2002
- 2002-12-26 CN CN 02158560 patent/CN1260388C/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102703856A (en) * | 2012-05-18 | 2012-10-03 | 河南大学 | Auxiliary device for preparing thin film electrode |
| CN102703856B (en) * | 2012-05-18 | 2014-04-30 | 河南大学 | Auxiliary device for preparing thin film electrode |
| CN102776474A (en) * | 2012-07-12 | 2012-11-14 | 济南大学 | Nano composite coating layer for surface treatment of substrate, and preparation method and device of nano composite coating layer |
| CN103668101A (en) * | 2012-09-21 | 2014-03-26 | 无锡华润华晶微电子有限公司 | Wafer fixing device used in deposition film forming device |
| CN103668101B (en) * | 2012-09-21 | 2015-12-16 | 无锡华润华晶微电子有限公司 | Be deposited as the wafer mounting apparatus used in film device |
| CN105092899A (en) * | 2015-08-25 | 2015-11-25 | 中国科学院物理研究所 | Bracket positioning device |
| CN105092899B (en) * | 2015-08-25 | 2018-06-29 | 中国科学院物理研究所 | A kind of support frame positioning device |
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| Publication number | Publication date |
|---|---|
| CN1260388C (en) | 2006-06-21 |
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