CN119620546A - 转印膜、层叠体的制造方法及触摸面板的制造方法 - Google Patents

转印膜、层叠体的制造方法及触摸面板的制造方法 Download PDF

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Publication number
CN119620546A
CN119620546A CN202411717947.4A CN202411717947A CN119620546A CN 119620546 A CN119620546 A CN 119620546A CN 202411717947 A CN202411717947 A CN 202411717947A CN 119620546 A CN119620546 A CN 119620546A
Authority
CN
China
Prior art keywords
photosensitive resin
resin layer
film
mass
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202411717947.4A
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English (en)
Chinese (zh)
Inventor
丰冈健太郎
有年阳平
霜山达也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN119620546A publication Critical patent/CN119620546A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/06—Interconnection of layers permitting easy separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Human Computer Interaction (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Laminated Bodies (AREA)
  • Graft Or Block Polymers (AREA)
CN202411717947.4A 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法 Pending CN119620546A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2019130239 2019-07-12
JP2019-130239 2019-07-12
CN202080045617.9A CN114026498B (zh) 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法
PCT/JP2020/022684 WO2021010058A1 (ja) 2019-07-12 2020-06-09 転写フィルム、積層体の製造方法およびタッチパネルの製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CN202080045617.9A Division CN114026498B (zh) 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法

Publications (1)

Publication Number Publication Date
CN119620546A true CN119620546A (zh) 2025-03-14

Family

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN202411717947.4A Pending CN119620546A (zh) 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法
CN202080045617.9A Active CN114026498B (zh) 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法

Family Applications After (1)

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CN202080045617.9A Active CN114026498B (zh) 2019-07-12 2020-06-09 转印膜、层叠体的制造方法及触摸面板的制造方法

Country Status (3)

Country Link
JP (1) JP7213981B2 (https=)
CN (2) CN119620546A (https=)
WO (1) WO2021010058A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116917123A (zh) * 2021-02-26 2023-10-20 富士胶片株式会社 转印膜以及导体图案的制造方法
WO2022209307A1 (ja) * 2021-03-30 2022-10-06 富士フイルム株式会社 積層体及び積層体の製造方法
WO2025099999A1 (ja) * 2023-11-07 2025-05-15 住友電気工業株式会社 ドライフィルムレジスト及びプリント配線板の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3212892B2 (ja) * 1996-11-01 2001-09-25 帝人株式会社 感光性積層体
JPH11260254A (ja) * 1998-03-13 1999-09-24 Dainippon Printing Co Ltd 転写シート
JP2002144504A (ja) 2000-09-04 2002-05-21 Toray Ind Inc ポリオレフィンフィルムおよび感光製版用フォトレジストカバーフィルム
JP2002229199A (ja) 2001-02-01 2002-08-14 Hitachi Chem Co Ltd スペーサ用２層フィルム
JP2002323759A (ja) 2001-04-25 2002-11-08 Asahi Kasei Corp 感光性樹脂積層体
US7083891B2 (en) * 2001-12-17 2006-08-01 Fuji Photo Film Co., Ltd. Multi-color image forming material and multi-color image forming method
JP4360769B2 (ja) 2001-12-21 2009-11-11 旭化成イーマテリアルズ株式会社 感光性樹脂積層体
JP4734380B2 (ja) * 2008-07-14 2011-07-27 富士フイルム株式会社 カラーフィルターの形成方法及びカラーフィルター
WO2013084282A1 (ja) 2011-12-05 2013-06-13 日立化成株式会社 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント
CN106794679B (zh) 2014-10-24 2019-06-11 富士胶片株式会社 转印薄膜及其制造方法和层叠体、静电电容型输入装置及图像显示装置的制造方法
JP6584357B2 (ja) * 2016-03-30 2019-10-02 富士フイルム株式会社 転写フィルム、静電容量型入力装置の電極保護膜、積層体および静電容量型入力装置
WO2017209193A1 (ja) * 2016-05-31 2017-12-07 富士フイルム株式会社 転写フィルム、加飾パターン及びタッチパネル
CN109983404B (zh) 2016-12-08 2022-10-28 富士胶片株式会社 转印薄膜、电极保护膜、层叠体、静电电容型输入装置及触摸面板的制造方法

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Publication number Publication date
JP7213981B2 (ja) 2023-01-27
JPWO2021010058A1 (https=) 2021-01-21
CN114026498A (zh) 2022-02-08
WO2021010058A1 (ja) 2021-01-21
CN114026498B (zh) 2024-12-13

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