CN1194381A - 光波导器件的制造方法 - Google Patents
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
- G02B2006/12071—PMMA
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12173—Masking
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12176—Etching
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Abstract
光波导器件的一种制造方法。制取光波导器件时,先在玻璃衬底表面形成下被覆层,再在下被覆层上形成金属层,然后通过有选择地腐蚀金属层形成金属图形,以便在其中形成波导核。接着,在金属图形中形成光学聚合物层,再用UV光照射衬底的下表面固化金属图形无金属部分中的光学聚合物层,然后除去光学聚合物层除固化部分和金属层以外的其它部分,由此形成波导核。最后,在下被覆层和波导核上形成上被覆层。
Description
本发明涉及一种光波导器件,具体地说,涉及一种用光学聚合物制造光波导器件的方法,这种方法通过从后面照射紫外(UV)光达到简化制造工艺的目的。
用光学聚合物制造光波导器件通常采用RIE(应离子蚀刻)法、光致漂白法或还原引发波导法。然而,这些方法需要增设真空设备,而且增加处理时间和工艺的复杂性,从而降低生产率。
因此,本发明的目的是提供一种采用可用UV光固化的光学聚合物因而大大简化了的制造光波导器件的方法。
本发明的另一个目的是提供一种无需增设制取光波导器件的真空设备,能缩短处理时间的制造光波导器件的方法。
为达到上述目的,本发明提供的制造光波导器件的方法是先在玻璃衬底表面形成下被覆层,再在下被覆层上形成金属层,然后通过有选择地腐蚀金属层形成金属图形,以便在其中形成波导核。接着,在金属图形中形成光学聚合物层,用UV光照射衬底的下表面来固化金属图形无金属部分中的光学聚合物层,再除去光学聚合物层除其固化部分和金属层以外的其它部分来形成波导核。最后,在下被覆层和波导核上形成上被覆层。
参看附图详细说明本发明的最佳实施例可以更清楚了解本发明的上述目的和优点。附图中:
图1至图9是依次举例说明本发明最佳实施例光波导器件制造方法的剖视图。
现在参看附图详细说明本发明的一个最佳实施例。本发明的那些认为可能会使本发明的主题变得模糊的周知功能或结构,这里就不详细说明了。
图1至图9是依次举例说明本发明最佳实施例光波导器件制造方法的剖视图。
图1中,下被覆层102是通过在透明玻璃衬底100上淀积被覆材料形成的。这里,衬底100能让固化处理光学聚合层110的UV光108透过,是由幻灯片玻璃或聚碳酸酯或聚甲基丙烯酸甲酯制成的聚合物玻璃构成的。下被覆层102的折射率小于形成波导核114的光学聚合物材料,且在所使用的光波长范围能让光透过。
图2中,金属层104淀积在下被覆层102上,光致抗蚀剂106通过旋转被覆法淀积在金属层104上,将波导核114掩埋起来。
接着,如图3所示用UV光108通过掩模照射上面形成有光致抗蚀剂106的金属层104,从而如图4所示形成波导核114相应的金属图形W。接着,将光致抗蚀剂106浸渍在显影液中使光致抗蚀剂106显影,然后烘焙。这样,金属图形W就在金属层104上形成,如图5所示。
图6中,为形成波导核114,用旋转被履法在金属层104上淀积可用UV光108固化的光学聚合物,形成光学聚合物层110。这里,光学聚合物层110的光学聚合物可以是线性或非线性的,其折射率大于下被覆层102和上被覆层116,而且在所使用的光波长范围的光透射损耗低。接着,将UV光108照射到上面形成有光学聚合物层110的衬底100下表面。于是,由于采用金属层104作为掩模,固化的只是金属图形W中光学聚合物层110的一部分,金属层104的其它部分仍然处在未固化状态。
图7中,用适当的腐蚀液清理光学聚合物层110时,光学聚合物层110未固化的部分被腐蚀,金属图形W中的固化部分没有受到腐蚀,从而形成波导核114。接着,用适当的腐蚀液将作为掩模的金属层104腐蚀掉,如图8中所示。
图9中,上被覆层116由折射率小于波导核114的被覆材料在上面有波导核114的下被覆层102上形成,这样就完成了光波导器件的制造过程。
这里,要使非线性光学聚合物的电场产生还原作用可以在衬底100上配备透明电极,而这些电极可用来制造依靠光电效应的器件。此外,还可以在上被覆层116上形成金属电极加热器或金属电极,以便制造利用光热或光电效应的器件。
综上所述,在本发明实施例制造光波导器件的方法,采用UV光可固化的光学聚合物制取光波导器件可以简化制造工艺。此外,从背后照射UV光可以防止光学聚合物和光掩膜因光掩膜与光学聚合物层直接接触而受污染。形成金属层作为UV光照射到衬底下表面时的掩模,可以无需在衬底上对正光掩膜,从而产生自行对准的作用。
上面已就本发明的某一最佳实施例进行示范和说明,但本技术领域的行家们都知道,在不脱离本发明在所附权利要求书所述的精神实质和范围的前提下是可以在形式和细节上作种种修改的。
Claims (5)
1.一种制造光波导器件的方法,其特征在于,它包括下列步骤:
在玻璃衬底表面形成下被覆层;
在下被覆层上形成金属层;
通过有选择地蚀刻金属层形成金属图形,以便在其中形成波导核;
在金属图形中形成光学聚合物层;
用UV光照射衬底的下表面固化金属图形无金属部分的光学聚合物层;
除去光学聚合物层除固化部分和金属层以外的其它部分,由此形成波导核;
在下被覆层和波导核上形成上被覆层。
2.如权利要求1所述的制造光波导器件的方法,其特征在于,衬底由幻灯片玻璃、聚碳酸酯或聚甲基丙烯酸甲酯制成。
3.如权利要求1所述的制造光波导器件的方法,其特征在于,光学聚合物层在所使用的光波长范围能让光透过,且由折射率大于上被覆层和下被覆层的非线性聚合物材料制成。
4.如权利要求1所述的制造光波导器件的方法,其特征在于,光学聚合物层在所使用的光波长范围能让光透过,且由折射率大于上被覆层和下被覆层的线性聚合物材料制成。
5.如权利要求1所述的制造光波导器件的方法,其特征在于,光学聚合物层和金属层用腐蚀除去。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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KR8200/97 | 1997-03-12 | ||
KR8200/1997 | 1997-03-12 | ||
KR1019970008200A KR100288742B1 (ko) | 1997-03-12 | 1997-03-12 | 광도파로소자의제조방법 |
Publications (2)
Publication Number | Publication Date |
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CN1194381A true CN1194381A (zh) | 1998-09-30 |
CN1101001C CN1101001C (zh) | 2003-02-05 |
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Application Number | Title | Priority Date | Filing Date |
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CN98105599A Expired - Fee Related CN1101001C (zh) | 1997-03-12 | 1998-03-12 | 光波导器件的制造方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6037105A (zh) |
JP (1) | JP2968508B2 (zh) |
KR (1) | KR100288742B1 (zh) |
CN (1) | CN1101001C (zh) |
DE (1) | DE19810584A1 (zh) |
FR (1) | FR2760851A1 (zh) |
GB (1) | GB2323182B (zh) |
RU (1) | RU2151412C1 (zh) |
Cited By (2)
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CN100416320C (zh) * | 2003-10-27 | 2008-09-03 | Rpo私人有限公司 | 具有形成图案的包层的平面波导及其生产方法 |
CN104505471A (zh) * | 2014-12-22 | 2015-04-08 | 昆山工研院新型平板显示技术中心有限公司 | 一种高开口率掩膜板的制备方法及掩膜板 |
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JP2000035524A (ja) * | 1998-07-21 | 2000-02-02 | Sony Corp | 光導波路およびその製造方法 |
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KR100319299B1 (ko) * | 1999-04-14 | 2002-01-05 | 윤종용 | 광통신용 폴리이미드 |
US6649715B1 (en) | 2000-06-27 | 2003-11-18 | Clemson University | Fluoropolymers and methods of applying fluoropolymers in molding processes |
US6489420B1 (en) | 2000-06-27 | 2002-12-03 | Dyneon Llc | Fluoropolymers with improved characteristics |
US6625366B2 (en) | 2001-02-20 | 2003-09-23 | Ramot At Tel-Aviv University Ltd. | Polymer on substrate waveguide structure and corresponding production method |
US7265174B2 (en) * | 2001-03-22 | 2007-09-04 | Clemson University | Halogen containing-polymer nanocomposite compositions, methods, and products employing such compositions |
US6953653B2 (en) | 2001-08-30 | 2005-10-11 | Clemson University | Fluoropolymer compositions, optical devices, and methods for fabricating optical devices |
US6740474B2 (en) * | 2001-11-06 | 2004-05-25 | Eastman Kodak Company | Technique for making deep microstructures in photoresist |
EP1372005A3 (en) * | 2002-06-07 | 2004-11-17 | Fuji Photo Film Co., Ltd. | Optical integrated circuit and method of fabrication |
JP4468843B2 (ja) * | 2005-03-09 | 2010-05-26 | 日東電工株式会社 | 光導波路の製造方法 |
US8529993B2 (en) * | 2006-05-01 | 2013-09-10 | Zetta Research andDevelopment LLC—RPO Series | Low volatility polymers for two-stage deposition processes |
DE102008013073B4 (de) * | 2008-03-06 | 2011-02-03 | Leonhard Kurz Stiftung & Co. Kg | Verfahren zur Herstellung eines Folienelements und Folienelement |
KR100972894B1 (ko) * | 2008-05-26 | 2010-07-28 | 주식회사 두산 | 광회로기판의 제조방법 |
US8173045B2 (en) | 2008-05-28 | 2012-05-08 | University Of Washington | Diels-Alder crosslinkable dendritic nonlinear optic chromophores and polymer composites |
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1997
- 1997-03-12 KR KR1019970008200A patent/KR100288742B1/ko not_active IP Right Cessation
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1998
- 1998-03-04 JP JP10051193A patent/JP2968508B2/ja not_active Expired - Fee Related
- 1998-03-11 GB GB9805128A patent/GB2323182B/en not_active Expired - Fee Related
- 1998-03-11 DE DE19810584A patent/DE19810584A1/de not_active Ceased
- 1998-03-11 RU RU98104449/28A patent/RU2151412C1/ru not_active IP Right Cessation
- 1998-03-12 CN CN98105599A patent/CN1101001C/zh not_active Expired - Fee Related
- 1998-03-12 US US09/038,960 patent/US6037105A/en not_active Expired - Fee Related
- 1998-03-12 FR FR9803051A patent/FR2760851A1/fr active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN100416320C (zh) * | 2003-10-27 | 2008-09-03 | Rpo私人有限公司 | 具有形成图案的包层的平面波导及其生产方法 |
CN104505471A (zh) * | 2014-12-22 | 2015-04-08 | 昆山工研院新型平板显示技术中心有限公司 | 一种高开口率掩膜板的制备方法及掩膜板 |
Also Published As
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GB2323182A (en) | 1998-09-16 |
CN1101001C (zh) | 2003-02-05 |
KR19980073082A (ko) | 1998-11-05 |
GB2323182B (en) | 1999-05-26 |
KR100288742B1 (ko) | 2001-05-02 |
GB9805128D0 (en) | 1998-05-06 |
US6037105A (en) | 2000-03-14 |
JPH10293224A (ja) | 1998-11-04 |
DE19810584A1 (de) | 1998-09-24 |
JP2968508B2 (ja) | 1999-10-25 |
RU2151412C1 (ru) | 2000-06-20 |
FR2760851A1 (fr) | 1998-09-18 |
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