CN118974657A - 感光性树脂组合物以及印刷布线板的制造方法 - Google Patents
感光性树脂组合物以及印刷布线板的制造方法 Download PDFInfo
- Publication number
- CN118974657A CN118974657A CN202380031229.9A CN202380031229A CN118974657A CN 118974657 A CN118974657 A CN 118974657A CN 202380031229 A CN202380031229 A CN 202380031229A CN 118974657 A CN118974657 A CN 118974657A
- Authority
- CN
- China
- Prior art keywords
- photosensitive resin
- resin composition
- photopolymerization initiator
- film
- carboxyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022-054426 | 2022-03-29 | ||
| JP2022054426 | 2022-03-29 | ||
| PCT/JP2023/012393 WO2023190454A1 (ja) | 2022-03-29 | 2023-03-28 | 感光性樹脂組成物およびプリント配線板の製造方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN118974657A true CN118974657A (zh) | 2024-11-15 |
Family
ID=88202437
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202380031229.9A Pending CN118974657A (zh) | 2022-03-29 | 2023-03-28 | 感光性树脂组合物以及印刷布线板的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPWO2023190454A1 (https=) |
| KR (1) | KR20240155931A (https=) |
| CN (1) | CN118974657A (https=) |
| WO (1) | WO2023190454A1 (https=) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3723036B2 (ja) | 2000-03-29 | 2005-12-07 | 太陽インキ製造株式会社 | 活性エネルギー線硬化性樹脂及びこれを用いた光硬化性・熱硬化性樹脂組成物 |
| JP4840865B2 (ja) * | 2006-11-07 | 2011-12-21 | 太陽ホールディングス株式会社 | アルカリ現像可能な感光性樹脂組成物およびそれを用いたプリント配線板 |
| CN103513515A (zh) * | 2012-06-29 | 2014-01-15 | 太阳油墨(苏州)有限公司 | 碱显影型感光性树脂组合物、干膜、固化物以及印刷电路板 |
| JP5572737B1 (ja) * | 2013-06-04 | 2014-08-13 | 太陽インキ製造株式会社 | 光硬化熱硬化性樹脂組成物、硬化物、及びプリント配線板 |
| JP5882510B2 (ja) * | 2014-06-30 | 2016-03-09 | 太陽インキ製造株式会社 | 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法 |
| JP6383621B2 (ja) * | 2014-09-24 | 2018-08-29 | 太陽インキ製造株式会社 | 硬化性組成物、ドライフィルム、硬化物、プリント配線板およびプリント配線板の製造方法 |
| JP6788372B2 (ja) * | 2015-06-05 | 2020-11-25 | 太陽インキ製造株式会社 | アルカリ現像可能な樹脂組成物、ドライフィルム、硬化物およびプリント配線板 |
| JP7254511B2 (ja) * | 2018-03-28 | 2023-04-10 | 太陽インキ製造株式会社 | 感光性樹脂組成物、ドライフィルム、およびプリント配線板の製造方法 |
| JP7084185B2 (ja) * | 2018-03-30 | 2022-06-14 | 太陽インキ製造株式会社 | 硬化性樹脂組成物、そのドライフィルムおよび硬化物、それらを用いたプリント配線板 |
-
2023
- 2023-03-28 JP JP2024512527A patent/JPWO2023190454A1/ja active Pending
- 2023-03-28 WO PCT/JP2023/012393 patent/WO2023190454A1/ja not_active Ceased
- 2023-03-28 KR KR1020247032206A patent/KR20240155931A/ko not_active Ceased
- 2023-03-28 CN CN202380031229.9A patent/CN118974657A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2023190454A1 (https=) | 2023-10-05 |
| KR20240155931A (ko) | 2024-10-29 |
| WO2023190454A1 (ja) | 2023-10-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |