CN118648203A - 气体激光装置以及电子器件的制造方法 - Google Patents

气体激光装置以及电子器件的制造方法 Download PDF

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Publication number
CN118648203A
CN118648203A CN202280090891.7A CN202280090891A CN118648203A CN 118648203 A CN118648203 A CN 118648203A CN 202280090891 A CN202280090891 A CN 202280090891A CN 118648203 A CN118648203 A CN 118648203A
Authority
CN
China
Prior art keywords
magnetic switch
magnetic
volt
product
gas laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280090891.7A
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English (en)
Chinese (zh)
Inventor
山之内庸一
梅田博
植山健史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gigaphoton Inc
Original Assignee
Gigaphoton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gigaphoton Inc filed Critical Gigaphoton Inc
Publication of CN118648203A publication Critical patent/CN118648203A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0975—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser using inductive or capacitive excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Lasers (AREA)
CN202280090891.7A 2022-03-23 2022-03-23 气体激光装置以及电子器件的制造方法 Pending CN118648203A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2022/013639 WO2023181207A1 (ja) 2022-03-23 2022-03-23 ガスレーザ装置及び電子デバイスの製造方法

Publications (1)

Publication Number Publication Date
CN118648203A true CN118648203A (zh) 2024-09-13

Family

ID=88100558

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280090891.7A Pending CN118648203A (zh) 2022-03-23 2022-03-23 气体激光装置以及电子器件的制造方法

Country Status (4)

Country Link
US (1) US20240405501A1 (https=)
JP (1) JPWO2023181207A1 (https=)
CN (1) CN118648203A (https=)
WO (1) WO2023181207A1 (https=)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0265371U (https=) * 1988-11-04 1990-05-16
JPH03114282A (ja) * 1989-09-28 1991-05-15 Toshiba Corp パルスレーザ装置
JP3271711B2 (ja) * 1991-06-28 2002-04-08 株式会社小松製作所 ガスレーザ装置のレーザ放電回路
JP2004047892A (ja) * 2002-07-15 2004-02-12 Sumitomo Heavy Ind Ltd パルス放電回路
US20070071047A1 (en) * 2005-09-29 2007-03-29 Cymer, Inc. 6K pulse repetition rate and above gas discharge laser system solid state pulse power system improvements
JP5050240B2 (ja) * 2006-03-14 2012-10-17 ウシオ電機株式会社 高電圧パルス発生装置及びこれを用いた放電励起ガスレーザ装置
JP2009099727A (ja) * 2007-10-16 2009-05-07 Gigaphoton Inc 注入同期式放電励起レーザ装置及び注入同期式放電励起レーザ装置における同期制御方法
JP2010073948A (ja) * 2008-09-19 2010-04-02 Gigaphoton Inc パルスレーザ用電源装置

Also Published As

Publication number Publication date
WO2023181207A1 (ja) 2023-09-28
JPWO2023181207A1 (https=) 2023-09-28
US20240405501A1 (en) 2024-12-05

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