CN117897796A - 质量分析装置 - Google Patents

质量分析装置 Download PDF

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Publication number
CN117897796A
CN117897796A CN202280051888.4A CN202280051888A CN117897796A CN 117897796 A CN117897796 A CN 117897796A CN 202280051888 A CN202280051888 A CN 202280051888A CN 117897796 A CN117897796 A CN 117897796A
Authority
CN
China
Prior art keywords
gas
chamber
plasma
pump
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280051888.4A
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English (en)
Chinese (zh)
Inventor
松下知义
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Publication of CN117897796A publication Critical patent/CN117897796A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/24—Vacuum systems, e.g. maintaining desired pressures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/105—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation, Inductively Coupled Plasma [ICP]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
    • H01J49/0422—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components for gaseous samples

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
CN202280051888.4A 2021-07-30 2022-03-15 质量分析装置 Pending CN117897796A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021125039 2021-07-30
JP2021-125039 2021-07-30
PCT/JP2022/011509 WO2023007820A1 (ja) 2021-07-30 2022-03-15 質量分析装置

Publications (1)

Publication Number Publication Date
CN117897796A true CN117897796A (zh) 2024-04-16

Family

ID=85087786

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280051888.4A Pending CN117897796A (zh) 2021-07-30 2022-03-15 质量分析装置

Country Status (5)

Country Link
US (1) US20240363324A1 (https=)
EP (1) EP4379769A4 (https=)
JP (1) JP7544279B2 (https=)
CN (1) CN117897796A (https=)
WO (1) WO2023007820A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20240363324A1 (en) * 2021-07-30 2024-10-31 Shimadzu Corporation Mass spectrometer
GB2632683A (en) * 2023-08-17 2025-02-19 Thermo Fisher Scient Bremen Gmbh Mass spectrometer comprising a vacuum system and a method of operation

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2507518B2 (ja) * 1988-02-29 1996-06-12 株式会社日立製作所 真空排気装置
WO1993013241A1 (en) * 1991-12-23 1993-07-08 Genus, Inc. Purge gas in wafer coating area selection
JP3494457B2 (ja) * 1993-07-07 2004-02-09 株式会社大阪真空機器製作所 真空ポンプ装置
GB0411426D0 (en) * 2004-05-21 2004-06-23 Boc Group Plc Pumping arrangement
JP5452839B2 (ja) * 2006-10-05 2014-03-26 アジレント・テクノロジーズ・インク 分析装置
DE102007027352A1 (de) * 2007-06-11 2008-12-18 Oerlikon Leybold Vacuum Gmbh Massenspektrometer-Anordnung
SG183179A1 (en) * 2010-02-26 2012-09-27 Perkinelmer Health Sci Inc Plasma mass spectrometry with ion suppression
JP5497615B2 (ja) * 2010-11-08 2014-05-21 株式会社日立ハイテクノロジーズ 質量分析装置
JP6087056B2 (ja) * 2012-01-06 2017-03-01 アジレント・テクノロジーズ・インクＡｇｉｌｅｎｔ Ｔｅｃｈｎｏｌｏｇｉｅｓ， Ｉｎｃ． 誘導結合プラズマｍｓ／ｍｓ型質量分析装置
WO2014191746A1 (en) * 2013-05-31 2014-12-04 Micromass Uk Limited Compact mass spectrometer
EP3027989B1 (en) * 2013-07-30 2018-02-28 Board of Regents, The University of Texas System Sample transfer to high vacuum transition flow
GB201314841D0 (en) * 2013-08-20 2013-10-02 Thermo Fisher Scient Bremen Multiple port vacuum pump system
US10416131B2 (en) * 2014-03-31 2019-09-17 Leco Corporation GC-TOF MS with improved detection limit
FR3019298B1 (fr) * 2014-03-31 2016-04-15 Horiba Jobin Yvon Sas Procede et appareil de mesure d'un echantillon solide organique par spectrometrie de decharge luminescente
US10290482B1 (en) * 2018-03-13 2019-05-14 Agilent Technologies, Inc. Tandem collision/reaction cell for inductively coupled plasma-mass spectrometry (ICP-MS)
US10854438B2 (en) * 2018-03-19 2020-12-01 Agilent Technologies, Inc. Inductively coupled plasma mass spectrometry (ICP-MS) with improved signal-to-noise and signal-to-background ratios
GB2572819B (en) * 2018-04-13 2021-05-19 Thermo Fisher Scient Bremen Gmbh Method and apparatus for operating a vacuum interface of a mass spectrometer
US11075066B2 (en) * 2018-10-26 2021-07-27 Agilent Technologies, Inc. Automated detection of nanoparticles using single-particle inductively coupled plasma mass spectrometry (SP-ICP-MS)
CN111128671B (zh) * 2019-11-19 2021-08-10 清华大学 质谱仪气压调节系统及方法
JP7396237B2 (ja) * 2020-09-15 2023-12-12 株式会社島津製作所 質量分析装置
US20240363324A1 (en) * 2021-07-30 2024-10-31 Shimadzu Corporation Mass spectrometer
EP4435426A4 (en) * 2021-11-17 2025-03-12 Shimadzu Corporation INDUCTIVELY COUPLED PLASMA MASS SPECTROMETER
US20250275050A1 (en) * 2022-04-22 2025-08-28 Standard Biotools Canada Inc. Sealed Plasma Torch
JP2024064401A (ja) * 2022-10-28 2024-05-14 株式会社島津製作所 質量分析装置
DE202023102071U1 (de) * 2023-04-20 2023-06-12 Thermo Fisher Scientific (Bremen) Gmbh Massenspektrometriesystem zur Bestimmung eines Maßes für eine Abfallrate
US20250308877A1 (en) * 2024-04-01 2025-10-02 Kimia Analytics Inc. Hybrid inductively coupled plasma mass spectrometer (icp-ms) and methods

Also Published As

Publication number Publication date
EP4379769A4 (en) 2025-08-27
WO2023007820A1 (ja) 2023-02-02
JPWO2023007820A1 (https=) 2023-02-02
JP7544279B2 (ja) 2024-09-03
US20240363324A1 (en) 2024-10-31
EP4379769A1 (en) 2024-06-05

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