CN117204124A - 等离子体处理装置 - Google Patents

等离子体处理装置 Download PDF

Info

Publication number
CN117204124A
CN117204124A CN202180097632.2A CN202180097632A CN117204124A CN 117204124 A CN117204124 A CN 117204124A CN 202180097632 A CN202180097632 A CN 202180097632A CN 117204124 A CN117204124 A CN 117204124A
Authority
CN
China
Prior art keywords
cathode electrode
hollow cathode
plasma processing
processing apparatus
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180097632.2A
Other languages
English (en)
Chinese (zh)
Inventor
大岸厚文
徳嵩佑
尾崎悟
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Industrial Systems Co Ltd
Original Assignee
Shimadzu Industrial Systems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Industrial Systems Co Ltd filed Critical Shimadzu Industrial Systems Co Ltd
Publication of CN117204124A publication Critical patent/CN117204124A/zh
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Treatment Of Fiber Materials (AREA)
CN202180097632.2A 2021-09-28 2021-09-28 等离子体处理装置 Pending CN117204124A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/035547 WO2023053171A1 (ja) 2021-09-28 2021-09-28 プラズマ処理装置

Publications (1)

Publication Number Publication Date
CN117204124A true CN117204124A (zh) 2023-12-08

Family

ID=85781464

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180097632.2A Pending CN117204124A (zh) 2021-09-28 2021-09-28 等离子体处理装置

Country Status (4)

Country Link
JP (1) JP7512567B2 (https=)
CN (1) CN117204124A (https=)
TW (1) TWI834148B (https=)
WO (1) WO2023053171A1 (https=)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) * 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JPH0927398A (ja) * 1995-07-10 1997-01-28 Tokyo Electron Ltd プラズマ処理装置
CN1551302A (zh) * 2003-05-13 2004-12-01 ���������ƴ���ʽ���� 上部电极和等离子体处理装置
JP2012054377A (ja) * 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
CN110993476A (zh) * 2018-10-02 2020-04-10 东京毅力科创株式会社 等离子体处理装置和等离子体处理方法
CN111383899A (zh) * 2018-12-27 2020-07-07 东京毅力科创株式会社 等离子体处理装置和等离子体处理方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648826Y2 (ja) * 1988-07-25 1994-12-12 三井東圧化学株式会社 着脱式の放電電極
JP2705190B2 (ja) * 1989-02-16 1998-01-26 富士通株式会社 ドライエッチング装置
JP2001135626A (ja) * 1999-11-02 2001-05-18 Hitachi Kokusai Electric Inc プラズマｃｖｄ装置及びプラズマｃｖｄ膜形成方法
JP2008028087A (ja) * 2006-07-20 2008-02-07 Nisshinbo Ind Inc プラズマエッチング電極
KR101046335B1 (ko) * 2008-07-29 2011-07-05 피에스케이 주식회사 할로우 캐소드 플라즈마 발생방법 및 할로우 캐소드플라즈마를 이용한 대면적 기판 처리방법
JP5227239B2 (ja) * 2009-04-13 2013-07-03 新明和工業株式会社 ホローカソード型放電管
CA2867451C (en) * 2013-10-28 2021-06-29 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
JP6745643B2 (ja) * 2016-05-17 2020-08-26 東京エレクトロン株式会社 プラズマ処理装置およびプラズマ処理方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4801839A (en) * 1986-12-08 1989-01-31 Applied Electron Corporation Mounting of a cold cathode directly to a vacuum chamber wall
JPH0927398A (ja) * 1995-07-10 1997-01-28 Tokyo Electron Ltd プラズマ処理装置
CN1551302A (zh) * 2003-05-13 2004-12-01 ���������ƴ���ʽ���� 上部电极和等离子体处理装置
JP2012054377A (ja) * 2010-09-01 2012-03-15 Toray Ind Inc プラズマｃｖｄ装置
CN110993476A (zh) * 2018-10-02 2020-04-10 东京毅力科创株式会社 等离子体处理装置和等离子体处理方法
CN111383899A (zh) * 2018-12-27 2020-07-07 东京毅力科创株式会社 等离子体处理装置和等离子体处理方法

Also Published As

Publication number Publication date
JPWO2023053171A1 (https=) 2023-04-06
WO2023053171A1 (ja) 2023-04-06
TW202315464A (zh) 2023-04-01
TWI834148B (zh) 2024-03-01
JP7512567B2 (ja) 2024-07-09

Similar Documents

Publication Publication Date Title
KR100757545B1 (ko) 상부 전극 및 플라즈마 처리 장치
US8829387B2 (en) Plasma processing apparatus having hollow electrode on periphery and plasma control method
KR20090127219A (ko) 마이크로파 플라즈마 처리 장치
CN102577629A (zh) 等离子体生成装置
CN117204124A (zh) 等离子体处理装置
CN103403219A (zh) 等离子体处理用磁控管电极
US10144040B2 (en) Plasma processing method and plasma processing apparatus
JP6418543B2 (ja) プラズマ処理装置及びプラズマ処理装置用アンテナユニット
JP2018101463A (ja) 誘導結合型アンテナユニット及びプラズマ処理装置
CN101959361A (zh) 等离子体处理装置
TW202123779A (zh) 電漿處理裝置
TWI570763B (zh) 蝕刻裝置
EP3629362B1 (en) Plasma treatment apparatus and driving method thereof
JP3819538B2 (ja) 静電チャック装置及び載置台
KR102357541B1 (ko) 플라즈마 발생 장치
JP4619817B2 (ja) 成膜装置用基板台、成膜装置及び成膜方法。
JP2024062955A (ja) 誘導結合型アンテナユニット及びプラズマ処理装置
JP3916469B2 (ja) プラズマ処理装置
JPS6214431A (ja) プラズマ処理装置
KR20220111661A (ko) 처리 용기와 플라즈마 처리 장치 및 처리 용기의 제조 방법
JP2021068600A (ja) アンテナ及びプラズマ処理装置
JPWO2023053171A5 (https=)
CN114496701A (zh) 等离子体处理装置及其制造方法和等离子体处理方法
JP2024105999A (ja) 基板処理装置及び基板支持部
JP2015014029A (ja) プラズマｃｖｄ成膜装置

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination